DE3173512D1 - Patterning process and process for production of electronic devices utilizing said patterning process - Google Patents
Patterning process and process for production of electronic devices utilizing said patterning processInfo
- Publication number
- DE3173512D1 DE3173512D1 DE8181304436T DE3173512T DE3173512D1 DE 3173512 D1 DE3173512 D1 DE 3173512D1 DE 8181304436 T DE8181304436 T DE 8181304436T DE 3173512 T DE3173512 T DE 3173512T DE 3173512 D1 DE3173512 D1 DE 3173512D1
- Authority
- DE
- Germany
- Prior art keywords
- patterning process
- production
- electronic devices
- devices utilizing
- patterning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title 3
- 238000000059 patterning Methods 0.000 title 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
- H01L21/02137—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material comprising alkyl silsesquioxane, e.g. MSQ
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
- H01L21/02345—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light
- H01L21/02348—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light treatment by exposure to UV light
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
- H01L21/02345—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light
- H01L21/02351—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to radiation, e.g. visible light treatment by exposure to corpuscular radiation, e.g. exposure to electrons, alpha-particles, protons or ions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/312—Organic layers, e.g. photoresist
- H01L21/3121—Layers comprising organo-silicon compounds
- H01L21/3122—Layers comprising organo-silicon compounds layers comprising polysiloxane compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02214—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen
- H01L21/02216—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Silicon Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55134542A JPS5760330A (en) | 1980-09-27 | 1980-09-27 | Resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3173512D1 true DE3173512D1 (en) | 1986-02-27 |
Family
ID=15130746
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8181304436T Expired DE3173512D1 (en) | 1980-09-27 | 1981-09-25 | Patterning process and process for production of electronic devices utilizing said patterning process |
Country Status (4)
Country | Link |
---|---|
US (1) | US4600685A (de) |
EP (1) | EP0049127B1 (de) |
JP (1) | JPS5760330A (de) |
DE (1) | DE3173512D1 (de) |
Families Citing this family (55)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1204527A (en) * | 1982-08-13 | 1986-05-13 | Theodore F. Retajczyk, Jr. | Polymeric films for electronic circuits |
US4510173A (en) * | 1983-04-25 | 1985-04-09 | Kabushiki Kaisha Toshiba | Method for forming flattened film |
EP0130599B1 (de) * | 1983-06-29 | 1988-08-10 | Fuji Photo Film Co., Ltd. | Photolösungsfähige Zusammensetzung |
JPS60117242A (ja) * | 1983-11-29 | 1985-06-24 | Fujitsu Ltd | 微細パタ−ン形成材料 |
EP0163538B1 (de) * | 1984-05-30 | 1989-11-23 | Fujitsu Limited | Bilderzeugendes Material, Herstellung und Anwendung desselben |
JPS60254036A (ja) * | 1984-05-30 | 1985-12-14 | Fujitsu Ltd | パタ−ン形成方法 |
JPS60254132A (ja) * | 1984-05-31 | 1985-12-14 | Fujitsu Ltd | パタ−ン形成材料 |
JPS6129153A (ja) * | 1984-07-20 | 1986-02-10 | Fujitsu Ltd | 凹凸基板の平坦化方法 |
US4670299A (en) * | 1984-11-01 | 1987-06-02 | Fujitsu Limited | Preparation of lower alkyl polysilsesquioxane and formation of insulating layer of silylated polymer on electronic circuit board |
JPS61144639A (ja) * | 1984-12-19 | 1986-07-02 | Hitachi Ltd | 放射線感応性組成物及びそれを用いたパタ−ン形成法 |
JPS61201430A (ja) * | 1985-03-04 | 1986-09-06 | Fujitsu Ltd | 半導体装置用シリコ−ン樹脂膜及びその形成方法 |
WO1986005284A1 (en) * | 1985-03-07 | 1986-09-12 | Hughes Aircraft Company | Polysiloxane resist for ion beam and electron beam lithography |
EP0204963B1 (de) * | 1985-05-10 | 1993-01-13 | Hitachi, Ltd. | Verwendung von in alkalische Milieu löslichen Silsesquioxanpolymeren in einem Resist zur Herstellung von electronischen Teilen |
US4663414A (en) * | 1985-05-14 | 1987-05-05 | Stauffer Chemical Company | Phospho-boro-silanol interlayer dielectric films and preparation |
JP2607870B2 (ja) * | 1985-07-26 | 1997-05-07 | 富士写真フイルム株式会社 | 画像形成方法 |
EP0232167B1 (de) * | 1986-02-07 | 1988-12-28 | Nippon Telegraph And Telephone Corporation | Für Licht und hochenergetische Strahlung empfindliche Zusammensetzung mit substituierten Polysiloxanen |
US4782009A (en) * | 1987-04-03 | 1988-11-01 | General Electric Company | Method of coating and imaging photopatternable silicone polyamic acid |
US4855199A (en) * | 1987-04-03 | 1989-08-08 | General Electric Company | Photopatterned product of silicone polyamic acid on a transparent substrate |
US4765866A (en) * | 1987-07-02 | 1988-08-23 | Akzo America Inc. | Energy ray curing of arylsiloxane/silicate compositions and subsequent etching thereof |
US4801507A (en) * | 1987-07-02 | 1989-01-31 | Akzo American Inc. | Arylsiloxane/silicate compositions useful as interlayer dielectric films |
US4758620A (en) * | 1987-07-02 | 1988-07-19 | Akzo America Inc. | Blend of solvent and arylsiloxane interlayer dielectric materials |
US5057396A (en) * | 1988-09-22 | 1991-10-15 | Tosoh Corporation | Photosensitive material having a silicon-containing polymer |
US5106658A (en) * | 1989-04-24 | 1992-04-21 | Akzo Nv | Hardness improvement of film containing arylsiloxane and organosilicate |
US5118742A (en) * | 1989-04-24 | 1992-06-02 | Akzo Nv | Blend of silicate and photocurable arylsiloxane materials |
US5089303A (en) * | 1989-04-24 | 1992-02-18 | Akzo America Inc. | Blend of solvent and photocurable arylsiloxane materials |
US5098816A (en) * | 1989-10-10 | 1992-03-24 | International Business Machines Corporation | Method for forming a pattern of a photoresist |
US5110711A (en) * | 1989-10-10 | 1992-05-05 | International Business Machines Corporation | Method for forming a pattern |
US5059512A (en) * | 1989-10-10 | 1991-10-22 | International Business Machines Corporation | Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions |
US5024969A (en) * | 1990-02-23 | 1991-06-18 | Reche John J | Hybrid circuit structure fabrication methods using high energy electron beam curing |
KR950002874B1 (ko) * | 1990-06-25 | 1995-03-27 | 마쯔시다덴시고오교오 가부시기가이샤 | 광 또는 방사선감응성 조성물과 패턴형성방법과 포토마스크의 제조방법 및 반도체 |
JPH04233732A (ja) * | 1990-08-16 | 1992-08-21 | Motorola Inc | 半導体の製造工程で使用するスピン・オン誘電体 |
US5093225A (en) * | 1990-09-14 | 1992-03-03 | Gte Laboratories Incorporated | Processing method for fabricating electrical contacts to mesa structures in semiconductor devices |
US5312684A (en) * | 1991-05-02 | 1994-05-17 | Dow Corning Corporation | Threshold switching device |
JPH05197304A (ja) * | 1992-01-20 | 1993-08-06 | Hitachi Ltd | 溶着部材 |
JP2934353B2 (ja) * | 1992-06-24 | 1999-08-16 | 三菱電機株式会社 | 半導体装置およびその製造方法 |
US5397741A (en) * | 1993-03-29 | 1995-03-14 | International Business Machines Corporation | Process for metallized vias in polyimide |
TW434458B (en) * | 1995-04-04 | 2001-05-16 | Shinetsu Chemical Co | Chemically amplified positive resist compositions |
US6607991B1 (en) | 1995-05-08 | 2003-08-19 | Electron Vision Corporation | Method for curing spin-on dielectric films utilizing electron beam radiation |
MY113904A (en) * | 1995-05-08 | 2002-06-29 | Electron Vision Corp | Method for curing spin-on-glass film utilizing electron beam radiation |
JP2697680B2 (ja) * | 1995-05-31 | 1998-01-14 | 日本電気株式会社 | 珪素含有高分子化合物および感光性樹脂組成物 |
US6157079A (en) * | 1997-11-10 | 2000-12-05 | Citizen Watch Co., Ltd | Semiconductor device with a bump including a bump electrode film covering a projecting photoresist |
JP3543669B2 (ja) * | 1999-03-31 | 2004-07-14 | 信越化学工業株式会社 | 絶縁膜形成用塗布液及び絶縁膜の形成方法 |
CA2374944A1 (en) * | 1999-06-10 | 2000-12-21 | Nigel Hacker | Spin-on-glass anti-reflective coatings for photolithography |
KR20000063142A (ko) * | 2000-02-17 | 2000-11-06 | 이응찬 | 폴리오르가노실세스키옥산 제조용 출발물질,폴리오르가노실세스키옥산 및 폴리오르가노실세스키옥산제조방법 |
US6368400B1 (en) * | 2000-07-17 | 2002-04-09 | Honeywell International | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
US6653045B2 (en) * | 2001-02-16 | 2003-11-25 | International Business Machines Corporation | Radiation sensitive silicon-containing negative resists and use thereof |
KR100985272B1 (ko) * | 2002-01-17 | 2010-10-04 | 질렉스 오와이 | 집적 회로에 적용하기 위한 혼성 유기-무기 유전체를 위한폴리(유기실록산) 물질 및 방법 |
US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
US7659050B2 (en) * | 2005-06-07 | 2010-02-09 | International Business Machines Corporation | High resolution silicon-containing resist |
US20070212886A1 (en) * | 2006-03-13 | 2007-09-13 | Dong Seon Uh | Organosilane polymers, hardmask compositions including the same and methods of producing semiconductor devices using organosilane hardmask compositions |
US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
KR101249798B1 (ko) * | 2010-08-18 | 2013-04-03 | 한국과학기술연구원 | 선택적으로 구조가 제어된 폴리실세스퀴옥산의 제조방법 및 이로부터 제조된 폴리실세스퀴옥산 |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
EP3194502A4 (de) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US162017A (en) * | 1875-04-13 | Improvement in door-bolts | ||
US3162614A (en) * | 1962-02-23 | 1964-12-22 | Gen Electric | Process for making benzene-soluble phenyl silsesquioxane |
NL290390A (de) * | 1962-03-29 | |||
US3294738A (en) * | 1963-12-23 | 1966-12-27 | Gen Electric | Method for making arylsilsesquioxane ladder polymers |
US4041190A (en) * | 1971-06-29 | 1977-08-09 | Thomson-Csf | Method for producing a silica mask on a semiconductor substrate |
US3944520A (en) * | 1974-04-18 | 1976-03-16 | Andrianov Kuzma A | Cyclolinear polyorganosiloxanes and method for preparing same |
US4209356A (en) * | 1978-10-18 | 1980-06-24 | General Electric Company | Selective etching of polymeric materials embodying silicones via reactor plasmas |
US4209358A (en) * | 1978-12-04 | 1980-06-24 | Western Electric Company, Incorporated | Method of fabricating a microelectronic device utilizing unfilled epoxy adhesive |
US4349609A (en) * | 1979-06-21 | 1982-09-14 | Fujitsu Limited | Electronic device having multilayer wiring structure |
-
1980
- 1980-09-27 JP JP55134542A patent/JPS5760330A/ja active Granted
-
1981
- 1981-09-25 DE DE8181304436T patent/DE3173512D1/de not_active Expired
- 1981-09-25 EP EP81304436A patent/EP0049127B1/de not_active Expired
-
1985
- 1985-05-29 US US06/738,891 patent/US4600685A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4600685A (en) | 1986-07-15 |
EP0049127B1 (de) | 1986-01-15 |
JPS6360374B2 (de) | 1988-11-24 |
EP0049127A1 (de) | 1982-04-07 |
JPS5760330A (en) | 1982-04-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |