DE3170300D1 - Field effect transistor having a high cut-off frequency - Google Patents

Field effect transistor having a high cut-off frequency

Info

Publication number
DE3170300D1
DE3170300D1 DE8181401484T DE3170300T DE3170300D1 DE 3170300 D1 DE3170300 D1 DE 3170300D1 DE 8181401484 T DE8181401484 T DE 8181401484T DE 3170300 T DE3170300 T DE 3170300T DE 3170300 D1 DE3170300 D1 DE 3170300D1
Authority
DE
Germany
Prior art keywords
frequency
field effect
effect transistor
high cut
cut
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8181401484T
Other languages
German (de)
English (en)
Inventor
Tronglinh Nuyen
Daniel Delagebeaudeuf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Application granted granted Critical
Publication of DE3170300D1 publication Critical patent/DE3170300D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L29/201—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds, e.g. alloys
    • H01L29/205—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds, e.g. alloys in different semiconductor regions, e.g. heterojunctions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Bipolar Transistors (AREA)
DE8181401484T 1980-10-14 1981-09-24 Field effect transistor having a high cut-off frequency Expired DE3170300D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8021942A FR2492167A1 (fr) 1980-10-14 1980-10-14 Transistor a effet de champ a frequence de coupure elevee

Publications (1)

Publication Number Publication Date
DE3170300D1 true DE3170300D1 (en) 1985-06-05

Family

ID=9246865

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8181401484T Expired DE3170300D1 (en) 1980-10-14 1981-09-24 Field effect transistor having a high cut-off frequency

Country Status (5)

Country Link
EP (1) EP0050064B1 (US06168655-20010102-C00055.png)
JP (1) JPS5795672A (US06168655-20010102-C00055.png)
CA (1) CA1182930A (US06168655-20010102-C00055.png)
DE (1) DE3170300D1 (US06168655-20010102-C00055.png)
FR (1) FR2492167A1 (US06168655-20010102-C00055.png)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5913376A (ja) * 1982-07-13 1984-01-24 Nippon Telegr & Teleph Corp <Ntt> ヘテロ接合を有する半導体薄膜
FR2537781B1 (fr) * 1982-12-14 1986-05-30 Thomson Csf Transistor a effet de champ, fonctionnant en regime d'accumulation par gaz d'electrons
JPS6052060A (ja) * 1983-08-31 1985-03-23 Masataka Inoue 電界効果トランジスタ
JPS60113475A (ja) * 1983-11-24 1985-06-19 Fujitsu Ltd 半導体装置
JPH07120790B2 (ja) * 1984-06-18 1995-12-20 株式会社日立製作所 半導体装置
GB2166286B (en) * 1984-10-26 1988-07-20 Stc Plc Photo-detectors
JPS61107758A (ja) * 1984-10-31 1986-05-26 Fujitsu Ltd ＧａＡｓ集積回路及びその製造方法
JPH0714056B2 (ja) * 1985-04-05 1995-02-15 日本電気株式会社 半導体装置
JPH0216102Y2 (US06168655-20010102-C00055.png) * 1985-05-17 1990-05-01
JPS62145779A (ja) * 1985-12-19 1987-06-29 Sumitomo Electric Ind Ltd 電界効果トランジスタ
JPS6328072A (ja) 1986-07-21 1988-02-05 Sumitomo Electric Ind Ltd 電界効果トランジスタ
EP0264932A1 (en) * 1986-10-24 1988-04-27 Sumitomo Electric Industries Limited Field effect transistor
US4839702A (en) * 1987-11-20 1989-06-13 Bell Communications Research, Inc. Semiconductor device based on charge emission from a quantum well
JP2873583B2 (ja) * 1989-05-10 1999-03-24 富士通株式会社 高速半導体装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4160261A (en) * 1978-01-13 1979-07-03 Bell Telephone Laboratories, Incorporated Mis heterojunction structures
US4163237A (en) * 1978-04-24 1979-07-31 Bell Telephone Laboratories, Incorporated High mobility multilayered heterojunction devices employing modulated doping
FR2465318A1 (fr) * 1979-09-10 1981-03-20 Thomson Csf Transistor a effet de champ a frequence de coupure elevee
CA1145482A (en) * 1979-12-28 1983-04-26 Takashi Mimura High electron mobility single heterojunction semiconductor device
JPS577165A (en) * 1980-06-17 1982-01-14 Fujitsu Ltd Semiconductor device

Also Published As

Publication number Publication date
FR2492167A1 (fr) 1982-04-16
CA1182930A (en) 1985-02-19
EP0050064A2 (fr) 1982-04-21
EP0050064B1 (fr) 1985-05-02
JPS5795672A (en) 1982-06-14
FR2492167B1 (US06168655-20010102-C00055.png) 1984-02-17
EP0050064A3 (en) 1982-05-05

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee