DE3070015D1 - Method of detecting the position of a substrate using an electron beam - Google Patents

Method of detecting the position of a substrate using an electron beam

Info

Publication number
DE3070015D1
DE3070015D1 DE8080302884T DE3070015T DE3070015D1 DE 3070015 D1 DE3070015 D1 DE 3070015D1 DE 8080302884 T DE8080302884 T DE 8080302884T DE 3070015 T DE3070015 T DE 3070015T DE 3070015 D1 DE3070015 D1 DE 3070015D1
Authority
DE
Germany
Prior art keywords
detecting
substrate
electron beam
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080302884T
Other languages
English (en)
Inventor
Kenyu Uema
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of DE3070015D1 publication Critical patent/DE3070015D1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE8080302884T 1979-08-29 1980-08-20 Method of detecting the position of a substrate using an electron beam Expired DE3070015D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10989479A JPS5633830A (en) 1979-08-29 1979-08-29 Detecting method for mark positioning by electron beam

Publications (1)

Publication Number Publication Date
DE3070015D1 true DE3070015D1 (en) 1985-03-07

Family

ID=14521850

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080302884T Expired DE3070015D1 (en) 1979-08-29 1980-08-20 Method of detecting the position of a substrate using an electron beam

Country Status (5)

Country Link
US (1) US4413186A (de)
EP (1) EP0024884B1 (de)
JP (1) JPS5633830A (de)
DE (1) DE3070015D1 (de)
IE (1) IE50264B1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5946026A (ja) * 1982-09-09 1984-03-15 Toshiba Corp 試料位置測定方法
US4627009A (en) * 1983-05-24 1986-12-02 Nanometrics Inc. Microscope stage assembly and control system
US4546260A (en) * 1983-06-30 1985-10-08 International Business Machines Corporation Alignment technique
US4713784A (en) * 1983-07-04 1987-12-15 Canon Kabushiki Kaisha Alignment apparatus
US4641257A (en) * 1983-07-07 1987-02-03 Canon Kabushiki Kaisha Measurement method and apparatus for alignment
JPS60130133A (ja) * 1983-12-16 1985-07-11 Matsushita Electric Ind Co Ltd 半導体デバイス位置合わせ装置
SE452526B (sv) * 1984-05-09 1987-11-30 Stiftelsen Inst Mikrovags Forfarande for att inspektera integrerade kretsar eller andra objekt
EP0320122A3 (de) * 1987-11-30 1992-04-29 United Kingdom Atomic Energy Authority Verfahren und Vorrichtung zur Positionsüberwachung
GB8727963D0 (en) * 1987-11-30 1988-01-06 Atomic Energy Authority Uk Displacement monitoring
US5258931A (en) * 1988-07-08 1993-11-02 Parker-Hannifin Corporation Precision electronic absolute and relative position sensing device and method of using same
US4977328A (en) * 1989-03-02 1990-12-11 U.S. Philips Corporation Method of detecting a marker provided on a specimen
JPH0392433A (ja) * 1989-09-04 1991-04-17 Nippon Yusoki Co Ltd 電気車における異常部品の経歴データ表示方法
US5087537A (en) * 1989-10-11 1992-02-11 International Business Machines Corporation Lithography imaging tool and related photolithographic processes
US5136169A (en) * 1991-04-05 1992-08-04 Massachusetts Institute Of Technology Energy beam locating
JPH05206017A (ja) * 1991-08-09 1993-08-13 Internatl Business Mach Corp <Ibm> リソグラフイ露光システム及びその方法
US6126382A (en) * 1997-11-26 2000-10-03 Novellus Systems, Inc. Apparatus for aligning substrate to chuck in processing chamber
US6399953B1 (en) * 1998-01-09 2002-06-04 Seiko Instruments Inc. Scanning electronic microscope and method for automatically observing semiconductor wafer
US6410927B1 (en) * 1999-04-21 2002-06-25 Advanced Micro Devices, Inc Semiconductor wafer alignment method using an identification scribe
JP4777731B2 (ja) * 2005-03-31 2011-09-21 富士通セミコンダクター株式会社 半導体装置の製造方法
NL2001369C2 (nl) * 2007-03-29 2010-06-14 Ims Nanofabrication Ag Werkwijze voor maskerloze deeltjesbundelbelichting.
FR2936608B1 (fr) * 2008-09-26 2010-09-24 Thales Sa Systeme de detection par balayage optique de position et/ou d'orientation d'objets
EP3514630B1 (de) 2013-06-18 2022-06-22 ASML Netherlands B.V. Freie-elektronen-laser und verfahren zum erzeugen eines euv strahlungsbündels unter verwendung desselben
TWI714226B (zh) * 2013-06-18 2020-12-21 荷蘭商Ａｓｍｌ荷蘭公司 控制自由電子雷射之方法、用於自由電子雷射之注入器及相關之自由電子雷射、微影系統及非暫態電腦可讀取媒體

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3783228A (en) * 1970-12-28 1974-01-01 Agency Ind Science Techn Method of manufacturing integrated circuits
FR2181467B1 (de) * 1972-04-25 1974-07-26 Thomson Csf
US3875414A (en) * 1973-08-20 1975-04-01 Secr Defence Brit Methods suitable for use in or in connection with the production of microelectronic devices
DE2559209A1 (de) * 1975-12-30 1977-07-14 Jenoptik Jena Gmbh Verfahren zur automatischen feinjustierung eines elektronenstrahls in einer elektronenstrahlbearbeitungsanlage
US4109029A (en) * 1977-01-24 1978-08-22 Hughes Aircraft Company High resolution electron beam microfabrication process for fabricating small geometry semiconductor devices
JPS5412676A (en) * 1977-06-30 1979-01-30 Fujitsu Ltd Position matching method for electron beam exposure
US4365163A (en) * 1980-12-19 1982-12-21 International Business Machines Corporation Pattern inspection tool - method and apparatus
US4357540A (en) * 1980-12-19 1982-11-02 International Business Machines Corporation Semiconductor device array mask inspection method and apparatus

Also Published As

Publication number Publication date
IE801825L (en) 1981-02-28
JPS6335094B2 (de) 1988-07-13
IE50264B1 (en) 1986-03-19
US4413186A (en) 1983-11-01
EP0024884B1 (de) 1985-01-23
EP0024884A3 (en) 1982-03-10
JPS5633830A (en) 1981-04-04
EP0024884A2 (de) 1981-03-11

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee