DE2964735D1 - Cathodic sputtering method for depositing an autolubricant coating of metallic chalcogenides onto substrates - Google Patents

Cathodic sputtering method for depositing an autolubricant coating of metallic chalcogenides onto substrates

Info

Publication number
DE2964735D1
DE2964735D1 DE7979810117T DE2964735T DE2964735D1 DE 2964735 D1 DE2964735 D1 DE 2964735D1 DE 7979810117 T DE7979810117 T DE 7979810117T DE 2964735 T DE2964735 T DE 2964735T DE 2964735 D1 DE2964735 D1 DE 2964735D1
Authority
DE
Germany
Prior art keywords
coating
autolubricant
depositing
sputtering method
onto substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE7979810117T
Other languages
German (de)
English (en)
Inventor
Erich Bergmann
Georges Melet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asu Composants SA
Original Assignee
Asu Composants SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asu Composants SA filed Critical Asu Composants SA
Application granted granted Critical
Publication of DE2964735D1 publication Critical patent/DE2964735D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B31/00—Bearings; Point suspensions or counter-point suspensions; Pivot bearings; Single parts therefor
    • G04B31/08—Lubrication

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Coating By Spraying Or Casting (AREA)
DE7979810117T 1978-10-09 1979-10-08 Cathodic sputtering method for depositing an autolubricant coating of metallic chalcogenides onto substrates Expired DE2964735D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1045578 1978-10-09

Publications (1)

Publication Number Publication Date
DE2964735D1 true DE2964735D1 (en) 1983-03-17

Family

ID=4363410

Family Applications (1)

Application Number Title Priority Date Filing Date
DE7979810117T Expired DE2964735D1 (en) 1978-10-09 1979-10-08 Cathodic sputtering method for depositing an autolubricant coating of metallic chalcogenides onto substrates

Country Status (6)

Country Link
US (1) US4324803A (enExample)
EP (1) EP0010070B1 (enExample)
JP (1) JPS55500784A (enExample)
AT (1) ATE2443T1 (enExample)
DE (1) DE2964735D1 (enExample)
WO (1) WO1980000712A1 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5462772A (en) * 1957-06-27 1995-10-31 Lemelson; Jerome H. Methods for forming artificial diamond
DE3266380D1 (en) * 1981-06-30 1985-10-24 Suisse Horlogerie Rech Lab Process for forming a corrosion-resistant coating of a solid lubricant
US4508608A (en) * 1983-04-21 1985-04-02 Combustion Engineering, Inc. Method for making chalcogenide cathodes
DE3516933A1 (de) * 1985-05-10 1986-11-13 Deutsche Forschungs- und Versuchsanstalt für Luft- und Raumfahrt e.V., 5300 Bonn Verfahren zum aufbringen einer mos(pfeil abwaerts)2(pfeil abwaerts)-beschichtung auf ein substrat
US4891112A (en) * 1985-11-12 1990-01-02 Eastman Kodak Company Sputtering method for reducing hillocking in aluminum layers formed on substrates
FR2638764B1 (fr) * 1988-11-04 1993-05-07 Centre Nat Rech Scient Element composite comportant une couche en chalcogenure ou oxychalcogenure de titane, utilisable en particulier comme electrode positive dans une cellule electrochimique en couches minces
CA2078245A1 (en) * 1991-09-23 1993-03-24 Roland Dubach Machining tools
FR2697317B1 (fr) * 1992-10-28 1995-01-27 Lyon Ecole Centrale Pièce mécanique de frottement lubrifiée et procédé de lubrification permettant son obtention.
US5370778A (en) * 1992-11-19 1994-12-06 Iowa State University Research Foundation, Inc. Method for preparing basal oriented molybdenum disulfide (MoS2) thin films
US5740941A (en) * 1993-08-16 1998-04-21 Lemelson; Jerome Sheet material with coating
DE19825572A1 (de) * 1998-06-08 1999-12-09 Widia Gmbh Werkzeug aus einem Grundkörper und mindestens einer hierauf abgeschiedenen Schicht sowie Verfahren zur Herstellung einer Molybdänsulfidschicht auf einem Substratkörper
GB2360790A (en) * 2000-03-28 2001-10-03 Gehan Anil Joseph Amaratunga Low friction coatings produced by cathodic arc evaporation
WO2002084362A1 (en) * 2001-04-12 2002-10-24 Omniguide Communications Inc. High index-contrast fiber waveguides and applications
JP4220253B2 (ja) * 2001-05-18 2009-02-04 ケンブリッジ・ユニバーシティ・テクニカル・サービシズ・リミテッド エレクトロルミネセンス装置
US6660136B2 (en) * 2002-03-27 2003-12-09 Micron Technology, Inc. Method of forming a non-volatile resistance variable device and method of forming a metal layer comprising silver and tungsten
WO2004049042A2 (en) * 2002-11-22 2004-06-10 Omniguide Communications Inc. Dielectric waveguide and method of making the same
EP1486582A1 (fr) * 2003-06-13 2004-12-15 Asulab S.A. Pièce de micro-mécanique à frottement réduit
DE102004015231B4 (de) * 2004-03-29 2015-12-31 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Behandeln von Substratoberflächen mittels Ladungsträgerbeschuss
US20070007505A1 (en) * 2005-07-07 2007-01-11 Honeywell International Inc. Chalcogenide PVD components
US8901943B1 (en) * 2008-05-13 2014-12-02 Ronald J. Kita Gravitational attenuating material
CN102449430B (zh) * 2009-05-26 2014-04-23 乌多·W·布赫 干涂层厚度测量方法和仪器
JP6211754B2 (ja) * 2012-09-28 2017-10-11 セイコーインスツル株式会社 機械部品の製造方法、及び機械部品
US20150345010A1 (en) * 2013-09-30 2015-12-03 University Of Dayton Methods of magnetically enhanced physical vapor deposition

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH431395A (fr) * 1964-08-17 1966-09-30 Ebauches Sa Dispositif de frottement auto-lubrifiant entre deux surfaces
US4025410A (en) * 1975-08-25 1977-05-24 Western Electric Company, Inc. Sputtering apparatus and methods using a magnetic field

Also Published As

Publication number Publication date
WO1980000712A1 (fr) 1980-04-17
ATE2443T1 (de) 1983-03-15
JPS55500784A (enExample) 1980-10-16
US4324803A (en) 1982-04-13
EP0010070B1 (fr) 1983-02-09
EP0010070A1 (fr) 1980-04-16

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee