DE2809261C2 - - Google Patents
Info
- Publication number
- DE2809261C2 DE2809261C2 DE2809261A DE2809261A DE2809261C2 DE 2809261 C2 DE2809261 C2 DE 2809261C2 DE 2809261 A DE2809261 A DE 2809261A DE 2809261 A DE2809261 A DE 2809261A DE 2809261 C2 DE2809261 C2 DE 2809261C2
- Authority
- DE
- Germany
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/38—Esters containing sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Drying Of Semiconductors (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7706441A FR2382709A1 (fr) | 1977-03-04 | 1977-03-04 | Famille de composes comportant un cycle thiirane, reticulables par irradiation photonique |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2809261A1 DE2809261A1 (de) | 1978-09-07 |
DE2809261C2 true DE2809261C2 (US20110009641A1-20110113-C00116.png) | 1987-04-30 |
Family
ID=9187592
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19782809261 Granted DE2809261A1 (de) | 1977-03-04 | 1978-03-03 | Durch photonenbestrahlung vernetzbare zusammensetzungen und deren verwendung |
Country Status (5)
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2472768A1 (fr) * | 1979-12-27 | 1981-07-03 | Thomson Csf | Composition photopolymerisable comportant un cycle thiirane, procede de revetement d'une fibre optique utilisant une telle composition, et fibre ainsi revetue |
JPS5759920A (en) * | 1980-09-29 | 1982-04-10 | Hiroaki Egawa | Photocrosslinkable resin composition |
JPS57158253A (en) * | 1981-03-26 | 1982-09-30 | Hiroaki Egawa | Photo-crosslinkable resin composition |
JPS59180543A (ja) * | 1983-03-31 | 1984-10-13 | Konishiroku Photo Ind Co Ltd | 感光性組成物 |
US4550059A (en) * | 1983-08-04 | 1985-10-29 | Gentex Corporation | Method of forming a tintable abrasion-resistant coating on a substrate and article produced thereby |
GB2163435B (en) * | 1984-07-11 | 1987-07-22 | Asahi Chemical Ind | Image-forming materials sensitive to high-energy beam |
JPH0785168B2 (ja) * | 1986-04-26 | 1995-09-13 | 日本合成ゴム株式会社 | 放射線感応性重合体組成物 |
FR2630744B1 (fr) * | 1988-04-29 | 1992-04-17 | Thomson Csf | Procede d'obtention d'un materiau polymere utilisable en optique non lineaire et materiau polymere obtenu |
GB2327892B (en) * | 1997-07-31 | 2001-11-14 | Perstorp Ltd | Improvements in or relating to curable coating |
US7448258B2 (en) * | 1999-10-29 | 2008-11-11 | Avery Dennison Corporation | High throughput screening for moisture barrier characteristics of materials |
JP2003513257A (ja) * | 1999-10-29 | 2003-04-08 | アベリー・デニソン・コーポレイション | コーティング材料の配合および方法のための改良された組み合わせ型試験方法および装置 |
JP4930405B2 (ja) * | 2007-03-16 | 2012-05-16 | 三菱瓦斯化学株式会社 | 光学材料 |
TWI482814B (zh) * | 2007-03-16 | 2015-05-01 | Mitsubishi Gas Chemical Co | 光學材料用樹脂組成物及由該組成物得到之光學材料 |
US9051426B2 (en) * | 2011-09-08 | 2015-06-09 | Ppg Industries Ohio, Inc. | Polymerizable compositions containing ethylenically unsaturated monomers having episulfide functional groups and related methods |
CN106886128B (zh) * | 2017-03-28 | 2021-02-19 | 深圳市道尔顿电子材料有限公司 | 一种负性光刻胶 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA888111A (en) | 1971-12-14 | W. H. Howson Limited | Lithographic printing plates | |
US3364184A (en) * | 1959-12-04 | 1968-01-16 | Shell Oil Co | Oil - soluble polymeric glycidyl compounds and functional organic compositions containing them |
US3404158A (en) * | 1964-05-18 | 1968-10-01 | Thiokol Chemical Corp | Thioglycidyl compounds |
GB1235281A (en) | 1967-02-18 | 1971-06-09 | Howson Algraphy Ltd | Improvements in or relating to lithographic printing plates |
FR1534152A (fr) | 1967-08-10 | 1968-07-26 | Basf Ag | Procédé de fabrication de copolymères réticulables |
US3708296A (en) * | 1968-08-20 | 1973-01-02 | American Can Co | Photopolymerization of epoxy monomers |
US4058400A (en) * | 1974-05-02 | 1977-11-15 | General Electric Company | Cationically polymerizable compositions containing group VIa onium salts |
US3997344A (en) * | 1974-07-05 | 1976-12-14 | American Can Company | Dry positive photopolymer imaging process involving heating and application of toner |
FR2352007A1 (fr) | 1976-05-21 | 1977-12-16 | Thomson Csf | Resine sensible aux electrons et procede de fabrication de ladite resine |
US4130424A (en) * | 1976-08-06 | 1978-12-19 | Bell Telephone Laboratories, Incorporated | Process using radiation curable epoxy containing resist and resultant product |
FR2441634A1 (fr) * | 1978-11-14 | 1980-06-13 | Thomson Csf | Resine a cycle thietane reticulable par irradiation electronique ou photonique et son utilisation pour la fabrication de composants electroniques et de couches de protection |
-
1977
- 1977-03-04 FR FR7706441A patent/FR2382709A1/fr active Granted
-
1978
- 1978-02-28 US US05/882,169 patent/US4259162A/en not_active Expired - Lifetime
- 1978-03-01 GB GB8172/78A patent/GB1580302A/en not_active Expired
- 1978-03-03 DE DE19782809261 patent/DE2809261A1/de active Granted
- 1978-03-04 JP JP53024916A patent/JPS5914499B2/ja not_active Expired
-
1979
- 1979-08-20 US US06/067,905 patent/US4285788A/en not_active Expired - Lifetime
-
1981
- 1981-11-06 US US06/318,940 patent/US4414081A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS53109550A (en) | 1978-09-25 |
JPS5914499B2 (ja) | 1984-04-04 |
US4259162A (en) | 1981-03-31 |
US4414081A (en) | 1983-11-08 |
FR2382709A1 (fr) | 1978-09-29 |
GB1580302A (en) | 1980-12-03 |
DE2809261A1 (de) | 1978-09-07 |
US4285788A (en) | 1981-08-25 |
FR2382709B1 (US20110009641A1-20110113-C00116.png) | 1981-06-19 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8110 | Request for examination paragraph 44 | ||
8125 | Change of the main classification |
Ipc: C08F220/38 |
|
8128 | New person/name/address of the agent |
Representative=s name: PRINZ, E., DIPL.-ING. LEISER, G., DIPL.-ING., PAT. |
|
8125 | Change of the main classification |
Ipc: C08L 33/10 |
|
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |