Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Hugo Dr.Rer.Nat. Dipl.-Phys. 8035 Gauting De Ruechardt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AGfiledCriticalSiemens AG
Priority to DE19772740764priorityCriticalpatent/DE2740764A1/de
Publication of DE2740764A1publicationCriticalpatent/DE2740764A1/de
Application grantedgrantedCritical
Publication of DE2740764C2publicationCriticalpatent/DE2740764C2/de
H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
H10P76/2045—Electron beam lithography processes
Landscapes
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)
Electron Beam Exposure
(AREA)
DE197727407641977-09-091977-09-09Verfahren zum herstellen einer halbleitervorrichtung
GrantedDE2740764A1
(de)
Verfahren zur elektronenstrahlaufzeichnung und system in verbindung mit kontinuierlich verschiebbarem tisch unter verwendung von gross-bereichsablenkung.
Verfahren zur Feststellung der Lage eines Elektronenstrahls in bezug auf auf einem Objekt angeordnete Ausrichtmarkierungen und Vorrichtung zur Durchführung des Verfahrens
Korpuskularstrahlmikroskop, insbesondere elektronenmikroskop, mit verstelleinrichtungen zur aenderung der lage des abzubildenen objekts oder des objektbildes
Korpuskularstrahloptisches Gerät zur Projektion einer Maske auf ein Präparat mit einer Einrichtung zur Justierung der Maske relativ zum Präparat und Verfahren zur Justierung