DE2658239C3 - Vorrichtung zur Feststellung von Fehlern in einem Muster bzw. einer Schablone - Google Patents
Vorrichtung zur Feststellung von Fehlern in einem Muster bzw. einer SchabloneInfo
- Publication number
- DE2658239C3 DE2658239C3 DE2658239A DE2658239A DE2658239C3 DE 2658239 C3 DE2658239 C3 DE 2658239C3 DE 2658239 A DE2658239 A DE 2658239A DE 2658239 A DE2658239 A DE 2658239A DE 2658239 C3 DE2658239 C3 DE 2658239C3
- Authority
- DE
- Germany
- Prior art keywords
- pattern
- filter
- light
- arm parts
- coherent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001514 detection method Methods 0.000 title claims description 5
- 230000007547 defect Effects 0.000 title description 8
- 230000001427 coherent effect Effects 0.000 claims description 28
- 230000003287 optical effect Effects 0.000 claims description 8
- 230000009466 transformation Effects 0.000 claims description 5
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 238000001228 spectrum Methods 0.000 description 6
- 210000001747 pupil Anatomy 0.000 description 5
- 238000010276 construction Methods 0.000 description 3
- 108010010803 Gelatin Proteins 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005094 computer simulation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920000159 gelatin Polymers 0.000 description 2
- 239000008273 gelatin Substances 0.000 description 2
- 235000019322 gelatine Nutrition 0.000 description 2
- 235000011852 gelatine desserts Nutrition 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/2433—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures for measuring outlines by shadow casting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50151951A JPS5276088A (en) | 1975-12-22 | 1975-12-22 | System for inspecting defects of pattern having directivity |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2658239A1 DE2658239A1 (de) | 1977-06-30 |
| DE2658239B2 DE2658239B2 (de) | 1979-11-15 |
| DE2658239C3 true DE2658239C3 (de) | 1980-08-07 |
Family
ID=15529758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2658239A Expired DE2658239C3 (de) | 1975-12-22 | 1976-12-22 | Vorrichtung zur Feststellung von Fehlern in einem Muster bzw. einer Schablone |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US4153336A (enExample) |
| JP (1) | JPS5276088A (enExample) |
| DE (1) | DE2658239C3 (enExample) |
| FR (1) | FR2336662A1 (enExample) |
| GB (1) | GB1563259A (enExample) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4308521A (en) * | 1979-02-12 | 1981-12-29 | The United States Of America As Represented By The Secretary Of The Air Force | Multiple-invariant space-variant optical processing |
| JPS55124117A (en) * | 1979-03-19 | 1980-09-25 | Toshiba Corp | Pattern inspecting apparatus |
| JPS6027964B2 (ja) * | 1979-08-28 | 1985-07-02 | 工業技術院長 | 方向性ハイカツト空間周波数フイルタ |
| US4456375A (en) * | 1981-11-23 | 1984-06-26 | Discovision Associates | Optical disc measurement by refraction |
| US4416538A (en) * | 1981-12-07 | 1983-11-22 | Aerodyne Research, Inc. | Image enhancement |
| US4478481A (en) * | 1982-02-12 | 1984-10-23 | University Of Dayton | Production of diffraction limited holographic images |
| DE3237826A1 (de) * | 1982-10-12 | 1984-04-12 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur optischen erkennung von defekten auf reflektierenden oberflaechen von mit strukturen im (my)m-bereich versehenen substraten |
| DE3242219C1 (de) * | 1982-11-15 | 1984-02-16 | Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch | Optisches Markenerkennungsgeraet |
| JPS59934A (ja) * | 1983-06-06 | 1984-01-06 | Hitachi Ltd | 欠陥検査装置 |
| US4647154A (en) * | 1983-07-29 | 1987-03-03 | Quantum Diagnostics Ltd. | Optical image processor |
| JPS61235118A (ja) * | 1985-04-12 | 1986-10-20 | Isamu Yamakawa | 成形物選別装置 |
| US4730930A (en) * | 1986-06-24 | 1988-03-15 | Technical Arts Corporation | Scanning apparatus and method |
| US5159474A (en) * | 1986-10-17 | 1992-10-27 | E. I. Du Pont De Nemours And Company | Transform optical processing system |
| US5078501A (en) * | 1986-10-17 | 1992-01-07 | E. I. Du Pont De Nemours And Company | Method and apparatus for optically evaluating the conformance of unknown objects to predetermined characteristics |
| US4761057A (en) * | 1987-02-19 | 1988-08-02 | General Electric Company | Aperture member for photo plotting apparatus |
| US4976520A (en) * | 1988-09-09 | 1990-12-11 | Grumman Aerospace Corporation | Common path multichannel optical processor |
| US4884083A (en) * | 1988-10-03 | 1989-11-28 | Xerox Corporation | Printer compensated for vibration-generated scan line errors |
| US5063442A (en) * | 1990-02-06 | 1991-11-05 | E. I. Dupont De Nemours & Company | Image converter |
| US7656504B1 (en) * | 1990-08-21 | 2010-02-02 | Nikon Corporation | Projection exposure apparatus with luminous flux distribution |
| IL99823A0 (en) * | 1990-11-16 | 1992-08-18 | Orbot Instr Ltd | Optical inspection method and apparatus |
| US6411377B1 (en) | 1991-04-02 | 2002-06-25 | Hitachi, Ltd. | Optical apparatus for defect and particle size inspection |
| US5177559A (en) * | 1991-05-17 | 1993-01-05 | International Business Machines Corporation | Dark field imaging defect inspection system for repetitive pattern integrated circuits |
| DE69224514T2 (de) * | 1992-03-23 | 1998-06-18 | Erland Torbjoern Moelnlycke Sandstroem | Verfahren und Vorrichtung zur Erzeugung eines Bildes |
| FR2707447B1 (fr) * | 1993-07-09 | 1995-09-01 | Thomson Csf | Dispositif de visualisation couleurs. |
| US5642456A (en) * | 1993-09-14 | 1997-06-24 | Cogent Light Technologies, Inc. | Light intensity attenuator for optical transmission systems |
| KR960015001A (ko) * | 1994-10-07 | 1996-05-22 | 가나이 쓰토무 | 반도체 기판의 제조방법과 피검사체상의 패턴결함을 검사하기 위한 방법 및 장치 |
| US5742422A (en) * | 1995-09-19 | 1998-04-21 | Inspex, Inc. | Adjustable fourier mask |
| JP2001524215A (ja) * | 1997-05-06 | 2001-11-27 | ジェイ． ホルコム、マシュー | ガウス・ビーム分布を使用した表面解析 |
| TW571089B (en) * | 2000-04-21 | 2004-01-11 | Nikon Corp | Defect testing apparatus and defect testing method |
| US8439520B2 (en) * | 2010-10-21 | 2013-05-14 | Rambus Delaware Llc | Color-configurable lighting assembly |
| CN114264669B (zh) * | 2022-03-03 | 2022-05-17 | 武汉精立电子技术有限公司 | 屏幕损伤缺陷检测方法、装置、设备及可读存储介质 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3560093A (en) * | 1968-07-16 | 1971-02-02 | Western Electric Co | Superimposed common carrier mask inspection system |
| US3614232A (en) * | 1968-11-25 | 1971-10-19 | Ibm | Pattern defect sensing using error free blocking spacial filter |
| US3658420A (en) * | 1969-12-10 | 1972-04-25 | Bell Telephone Labor Inc | Photomask inspection by spatial filtering |
| US3813173A (en) * | 1972-02-22 | 1974-05-28 | Corning Glass Works | Defect sensing apparatus and method |
| US3743423A (en) * | 1972-05-03 | 1973-07-03 | Westinghouse Electric Corp | Intensity spatial filter having uniformly spaced filter elements |
| JPS5324301B2 (enExample) * | 1974-09-09 | 1978-07-20 |
-
1975
- 1975-12-22 JP JP50151951A patent/JPS5276088A/ja active Granted
-
1976
- 1976-12-21 US US05/752,984 patent/US4153336A/en not_active Expired - Lifetime
- 1976-12-22 GB GB53702/76D patent/GB1563259A/en not_active Expired
- 1976-12-22 DE DE2658239A patent/DE2658239C3/de not_active Expired
- 1976-12-22 FR FR7638733A patent/FR2336662A1/fr active Granted
-
1979
- 1979-03-22 US US06/022,842 patent/US4299443A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US4299443A (en) | 1981-11-10 |
| US4153336A (en) | 1979-05-08 |
| JPS576521B2 (enExample) | 1982-02-05 |
| FR2336662B1 (enExample) | 1982-04-16 |
| DE2658239B2 (de) | 1979-11-15 |
| DE2658239A1 (de) | 1977-06-30 |
| JPS5276088A (en) | 1977-06-25 |
| GB1563259A (en) | 1980-03-26 |
| FR2336662A1 (fr) | 1977-07-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| 8328 | Change in the person/name/address of the agent |
Free format text: HENKEL, G., DR.PHIL. FEILER, L., DR.RER.NAT. HAENZEL, W., DIPL.-ING., PAT.-ANW., 8000 MUENCHEN |
|
| 8320 | Willingness to grant licences declared (paragraph 23) | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: KABUSHIKI KAISHA TOSHIBA, KAWASAKI, KANAGAWA, JP |
|
| 8339 | Ceased/non-payment of the annual fee |