DE2606937A1 - Verfahren und vorrichtung zum erzeugen magnetoaktiven plasmas zum duennen beschichten fester substrate - Google Patents
Verfahren und vorrichtung zum erzeugen magnetoaktiven plasmas zum duennen beschichten fester substrateInfo
- Publication number
- DE2606937A1 DE2606937A1 DE19762606937 DE2606937A DE2606937A1 DE 2606937 A1 DE2606937 A1 DE 2606937A1 DE 19762606937 DE19762606937 DE 19762606937 DE 2606937 A DE2606937 A DE 2606937A DE 2606937 A1 DE2606937 A1 DE 2606937A1
- Authority
- DE
- Germany
- Prior art keywords
- plasma
- discharge tube
- microwave
- magnetoactive
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 24
- 210000002381 plasma Anatomy 0.000 title claims description 28
- 239000007787 solid Substances 0.000 title claims description 16
- 238000000576 coating method Methods 0.000 title claims description 6
- 239000002184 metal Substances 0.000 title claims description 5
- 229910052751 metal Inorganic materials 0.000 title claims description 5
- 150000002739 metals Chemical class 0.000 title 1
- 239000007789 gas Substances 0.000 claims abstract description 7
- 239000002245 particle Substances 0.000 claims abstract description 7
- 238000000034 method Methods 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS143675A CS176690B1 (enrdf_load_stackoverflow) | 1975-03-04 | 1975-03-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2606937A1 true DE2606937A1 (de) | 1976-09-23 |
Family
ID=5348709
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19762606937 Pending DE2606937A1 (de) | 1975-03-04 | 1976-02-20 | Verfahren und vorrichtung zum erzeugen magnetoaktiven plasmas zum duennen beschichten fester substrate |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS51112182A (enrdf_load_stackoverflow) |
| CS (1) | CS176690B1 (enrdf_load_stackoverflow) |
| DE (1) | DE2606937A1 (enrdf_load_stackoverflow) |
| NL (1) | NL7602116A (enrdf_load_stackoverflow) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1987001738A1 (fr) * | 1985-09-24 | 1987-03-26 | Centre National De La Recherche Scientifique (Cnrs | Procede et dispositif de traitement chimique, notamment de traitement thermochimique et de depot chimique dans un plasma homogene de grand volume |
| FR2600082A1 (fr) * | 1986-06-13 | 1987-12-18 | Balzers Hochvakuum | Procede thermochimique de traitement de surface dans un plasma de gaz reactif, et pieces traitees par ce procede |
| DE3915477A1 (de) * | 1988-05-11 | 1989-11-23 | Hitachi Ltd | Mikrowellen-plasmaherstellungsvorrichtung |
| DE4107753A1 (de) * | 1990-03-12 | 1991-09-19 | Fuji Electric Co Ltd | Plasmabearbeitungseinrichtung |
-
1975
- 1975-03-04 CS CS143675A patent/CS176690B1/cs unknown
-
1976
- 1976-02-20 DE DE19762606937 patent/DE2606937A1/de active Pending
- 1976-03-01 NL NL7602116A patent/NL7602116A/xx not_active Application Discontinuation
- 1976-03-04 JP JP2270076A patent/JPS51112182A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1987001738A1 (fr) * | 1985-09-24 | 1987-03-26 | Centre National De La Recherche Scientifique (Cnrs | Procede et dispositif de traitement chimique, notamment de traitement thermochimique et de depot chimique dans un plasma homogene de grand volume |
| FR2587729A1 (fr) * | 1985-09-24 | 1987-03-27 | Centre Nat Rech Scient | Procede et dispositif de traitement chimique, notamment de traitement thermochimique et de depot chimique dans un plasma homogene de grand volume |
| FR2600082A1 (fr) * | 1986-06-13 | 1987-12-18 | Balzers Hochvakuum | Procede thermochimique de traitement de surface dans un plasma de gaz reactif, et pieces traitees par ce procede |
| DE3915477A1 (de) * | 1988-05-11 | 1989-11-23 | Hitachi Ltd | Mikrowellen-plasmaherstellungsvorrichtung |
| DE4107753A1 (de) * | 1990-03-12 | 1991-09-19 | Fuji Electric Co Ltd | Plasmabearbeitungseinrichtung |
| DE4107753C2 (de) * | 1990-03-12 | 1998-03-19 | Fuji Electric Co Ltd | Verfahren zum Betrieb einer Plasmabearbeitungseinrichtung |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS51112182A (en) | 1976-10-04 |
| CS176690B1 (enrdf_load_stackoverflow) | 1977-06-30 |
| NL7602116A (nl) | 1976-09-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHJ | Non-payment of the annual fee |