DE2419567C3 - Einrichtung zur gleichmäßigen Beleuchtung einer Projektionsvorlage - Google Patents
Einrichtung zur gleichmäßigen Beleuchtung einer ProjektionsvorlageInfo
- Publication number
- DE2419567C3 DE2419567C3 DE2419567A DE2419567A DE2419567C3 DE 2419567 C3 DE2419567 C3 DE 2419567C3 DE 2419567 A DE2419567 A DE 2419567A DE 2419567 A DE2419567 A DE 2419567A DE 2419567 C3 DE2419567 C3 DE 2419567C3
- Authority
- DE
- Germany
- Prior art keywords
- condenser
- light
- projection
- light source
- field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005286 illumination Methods 0.000 title claims description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 18
- 230000003287 optical effect Effects 0.000 claims description 18
- 229910052753 mercury Inorganic materials 0.000 claims description 12
- 239000010453 quartz Substances 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 9
- VQKWAUROYFTROF-UHFFFAOYSA-N arc-31 Chemical compound O=C1N(CCN(C)C)C2=C3C=C4OCOC4=CC3=NN=C2C2=C1C=C(OC)C(OC)=C2 VQKWAUROYFTROF-UHFFFAOYSA-N 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- -1 silver halide Chemical class 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Microscoopes, Condenser (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US354644A US3860335A (en) | 1973-04-26 | 1973-04-26 | Optical system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2419567A1 DE2419567A1 (de) | 1974-11-14 |
| DE2419567B2 DE2419567B2 (de) | 1979-11-15 |
| DE2419567C3 true DE2419567C3 (de) | 1980-07-31 |
Family
ID=23394302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2419567A Expired DE2419567C3 (de) | 1973-04-26 | 1974-04-23 | Einrichtung zur gleichmäßigen Beleuchtung einer Projektionsvorlage |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US3860335A (enExample) |
| JP (1) | JPS556209B2 (enExample) |
| BE (1) | BE814040A (enExample) |
| DE (1) | DE2419567C3 (enExample) |
| IN (1) | IN139363B (enExample) |
| IT (1) | IT1011786B (enExample) |
| SE (1) | SE386987B (enExample) |
| YU (1) | YU39652B (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4378583A (en) * | 1980-12-10 | 1983-03-29 | Rca Corporation | Xenon flash lamp shield |
| US4348105A (en) * | 1981-04-30 | 1982-09-07 | Rca Corporation | Radiation shadow projection exposure system |
| US4432641A (en) * | 1981-10-16 | 1984-02-21 | Rca Corporation | Visual defect inspection of masks |
| US4532427A (en) * | 1982-03-29 | 1985-07-30 | Fusion Systems Corp. | Method and apparatus for performing deep UV photolithography |
| JPS6382237U (enExample) * | 1986-11-19 | 1988-05-30 | ||
| JP2841424B2 (ja) * | 1989-02-15 | 1998-12-24 | 日本電気株式会社 | 周波数切替型戦術航法システム |
| EP0660373A3 (en) * | 1993-12-21 | 1996-11-20 | Hughes Aircraft Co | Punctual light source including a Xenon arc lamp. |
| US5703374A (en) * | 1996-08-08 | 1997-12-30 | Actinic Systems, Inc. | Telecentric NUV-DUV irradiator for out-of-contact exposure of large substrates |
| CN106886124B (zh) * | 2015-12-16 | 2019-02-01 | 深圳光峰科技股份有限公司 | 一种分束装置、光源系统及投影系统 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1908043A (en) * | 1930-02-07 | 1933-05-09 | Projector G M B H | Optical projection system |
| US3222981A (en) * | 1961-11-24 | 1965-12-14 | James W Lucas | Two-element projection lens |
-
1973
- 1973-04-26 US US354644A patent/US3860335A/en not_active Expired - Lifetime
-
1974
- 1974-02-28 IN IN417/CAL/74A patent/IN139363B/en unknown
- 1974-03-20 SE SE7403751A patent/SE386987B/xx unknown
- 1974-04-22 BE BE143487A patent/BE814040A/xx unknown
- 1974-04-23 DE DE2419567A patent/DE2419567C3/de not_active Expired
- 1974-04-25 YU YU1168/74A patent/YU39652B/xx unknown
- 1974-04-25 JP JP4742474A patent/JPS556209B2/ja not_active Expired
- 1974-04-26 IT IT68317/74A patent/IT1011786B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5015555A (enExample) | 1975-02-19 |
| JPS556209B2 (enExample) | 1980-02-14 |
| DE2419567A1 (de) | 1974-11-14 |
| YU116874A (en) | 1982-05-31 |
| BE814040A (fr) | 1974-08-16 |
| IT1011786B (it) | 1977-02-10 |
| IN139363B (enExample) | 1976-06-12 |
| YU39652B (en) | 1985-03-20 |
| US3860335A (en) | 1975-01-14 |
| DE2419567B2 (de) | 1979-11-15 |
| SE386987B (sv) | 1976-08-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| 8339 | Ceased/non-payment of the annual fee |