YU39652B - Optical system - Google Patents

Optical system

Info

Publication number
YU39652B
YU39652B YU1168/74A YU116874A YU39652B YU 39652 B YU39652 B YU 39652B YU 1168/74 A YU1168/74 A YU 1168/74A YU 116874 A YU116874 A YU 116874A YU 39652 B YU39652 B YU 39652B
Authority
YU
Yugoslavia
Prior art keywords
optical system
optical
Prior art date
Application number
YU1168/74A
Other languages
English (en)
Other versions
YU116874A (en
Inventor
F Caprari
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of YU116874A publication Critical patent/YU116874A/xx
Publication of YU39652B publication Critical patent/YU39652B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
YU1168/74A 1973-04-26 1974-04-25 Optical system YU39652B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US354644A US3860335A (en) 1973-04-26 1973-04-26 Optical system

Publications (2)

Publication Number Publication Date
YU116874A YU116874A (en) 1982-05-31
YU39652B true YU39652B (en) 1985-03-20

Family

ID=23394302

Family Applications (1)

Application Number Title Priority Date Filing Date
YU1168/74A YU39652B (en) 1973-04-26 1974-04-25 Optical system

Country Status (8)

Country Link
US (1) US3860335A (xx)
JP (1) JPS556209B2 (xx)
BE (1) BE814040A (xx)
DE (1) DE2419567C3 (xx)
IN (1) IN139363B (xx)
IT (1) IT1011786B (xx)
SE (1) SE386987B (xx)
YU (1) YU39652B (xx)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4378583A (en) * 1980-12-10 1983-03-29 Rca Corporation Xenon flash lamp shield
US4348105A (en) * 1981-04-30 1982-09-07 Rca Corporation Radiation shadow projection exposure system
US4432641A (en) * 1981-10-16 1984-02-21 Rca Corporation Visual defect inspection of masks
US4532427A (en) * 1982-03-29 1985-07-30 Fusion Systems Corp. Method and apparatus for performing deep UV photolithography
JPS6382237U (xx) * 1986-11-19 1988-05-30
JP2841424B2 (ja) * 1989-02-15 1998-12-24 日本電気株式会社 周波数切替型戦術航法システム
EP0660373A3 (en) * 1993-12-21 1996-11-20 Hughes Aircraft Co Punctual light source including a Xenon arc lamp.
US5703374A (en) * 1996-08-08 1997-12-30 Actinic Systems, Inc. Telecentric NUV-DUV irradiator for out-of-contact exposure of large substrates
CN106886124B (zh) * 2015-12-16 2019-02-01 深圳光峰科技股份有限公司 一种分束装置、光源系统及投影系统

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1908043A (en) * 1930-02-07 1933-05-09 Projector G M B H Optical projection system
US3222981A (en) * 1961-11-24 1965-12-14 James W Lucas Two-element projection lens

Also Published As

Publication number Publication date
JPS556209B2 (xx) 1980-02-14
DE2419567C3 (de) 1980-07-31
US3860335A (en) 1975-01-14
IN139363B (xx) 1976-06-12
YU116874A (en) 1982-05-31
JPS5015555A (xx) 1975-02-19
SE386987B (sv) 1976-08-23
DE2419567B2 (de) 1979-11-15
DE2419567A1 (de) 1974-11-14
IT1011786B (it) 1977-02-10
BE814040A (fr) 1974-08-16

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