DE2415578A1 - Verwerfungsbestaendiges roentgenstrahltarget und verfahren zu dessen herstellung - Google Patents
Verwerfungsbestaendiges roentgenstrahltarget und verfahren zu dessen herstellungInfo
- Publication number
- DE2415578A1 DE2415578A1 DE19742415578 DE2415578A DE2415578A1 DE 2415578 A1 DE2415578 A1 DE 2415578A1 DE 19742415578 DE19742415578 DE 19742415578 DE 2415578 A DE2415578 A DE 2415578A DE 2415578 A1 DE2415578 A1 DE 2415578A1
- Authority
- DE
- Germany
- Prior art keywords
- target
- reinforcement
- layer
- tungsten
- target according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 238000000034 method Methods 0.000 title claims description 11
- 230000002787 reinforcement Effects 0.000 claims description 112
- 239000000463 material Substances 0.000 claims description 47
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 46
- 239000010937 tungsten Substances 0.000 claims description 46
- 229910052721 tungsten Inorganic materials 0.000 claims description 45
- 229910052751 metal Inorganic materials 0.000 claims description 37
- 239000002184 metal Substances 0.000 claims description 37
- 239000000843 powder Substances 0.000 claims description 30
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 27
- 239000011733 molybdenum Substances 0.000 claims description 27
- 229910052750 molybdenum Inorganic materials 0.000 claims description 26
- 230000003014 reinforcing effect Effects 0.000 claims description 9
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 9
- 238000003754 machining Methods 0.000 claims description 8
- 229910052702 rhenium Inorganic materials 0.000 claims description 7
- 239000003779 heat-resistant material Substances 0.000 claims description 6
- 238000005242 forging Methods 0.000 claims description 5
- 238000005245 sintering Methods 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 239000013077 target material Substances 0.000 claims description 4
- 238000003825 pressing Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000011819 refractory material Substances 0.000 claims 1
- 239000003870 refractory metal Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 83
- 229910001080 W alloy Inorganic materials 0.000 description 12
- 229910001182 Mo alloy Inorganic materials 0.000 description 5
- 230000006378 damage Effects 0.000 description 5
- 229910000691 Re alloy Inorganic materials 0.000 description 4
- 238000004663 powder metallurgy Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- DECCZIUVGMLHKQ-UHFFFAOYSA-N rhenium tungsten Chemical compound [W].[Re] DECCZIUVGMLHKQ-UHFFFAOYSA-N 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052762 osmium Inorganic materials 0.000 description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000012779 reinforcing material Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000007596 consolidation process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- MGRWKWACZDFZJT-UHFFFAOYSA-N molybdenum tungsten Chemical compound [Mo].[W] MGRWKWACZDFZJT-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052713 technetium Inorganic materials 0.000 description 1
- GKLVYJBZJHMRIY-UHFFFAOYSA-N technetium atom Chemical compound [Tc] GKLVYJBZJHMRIY-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
- H01J35/02—Details
- H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
- H01J35/08—Anodes; Anti cathodes
- H01J35/10—Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes
- H01J35/108—Substrates for and bonding of emissive target, e.g. composite structures
Landscapes
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US35011173A | 1973-04-11 | 1973-04-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2415578A1 true DE2415578A1 (de) | 1974-10-31 |
Family
ID=23375287
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19742415578 Pending DE2415578A1 (de) | 1973-04-11 | 1974-03-30 | Verwerfungsbestaendiges roentgenstrahltarget und verfahren zu dessen herstellung |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE2415578A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2225839A1 (enrdf_load_stackoverflow) |
| NL (1) | NL7401849A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2719408A1 (de) * | 1976-05-03 | 1977-11-24 | Gen Electric | Anode fuer eine roentgenroehre und verfahren zu deren herstellung |
| US4099778A (en) * | 1975-10-03 | 1978-07-11 | Bayerische Motoren Werke Aktiengesellschaft | Retention installation for children in motor vehicles |
| WO2016179615A1 (de) * | 2015-05-08 | 2016-11-17 | Plansee Se | Röntgenanode |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4005322A (en) * | 1976-03-08 | 1977-01-25 | The Machlett Laboratories, Incorporated | Rotating anode target structure |
| EP0055828A3 (en) * | 1981-01-02 | 1982-08-04 | General Electric Company | X-ray tube having a unitary target, stem and rotor hub |
| FR2655190B1 (fr) * | 1989-11-28 | 1995-11-17 | Gen Electric Cgr | Anode pour tube a rayons x a resistance mecanique elevee. |
-
1974
- 1974-02-11 NL NL7401849A patent/NL7401849A/xx unknown
- 1974-03-30 DE DE19742415578 patent/DE2415578A1/de active Pending
- 1974-04-11 FR FR7412709A patent/FR2225839A1/fr not_active Withdrawn
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4099778A (en) * | 1975-10-03 | 1978-07-11 | Bayerische Motoren Werke Aktiengesellschaft | Retention installation for children in motor vehicles |
| DE2719408A1 (de) * | 1976-05-03 | 1977-11-24 | Gen Electric | Anode fuer eine roentgenroehre und verfahren zu deren herstellung |
| WO2016179615A1 (de) * | 2015-05-08 | 2016-11-17 | Plansee Se | Röntgenanode |
| CN107592940A (zh) * | 2015-05-08 | 2018-01-16 | 攀时奥地利公司 | X射线阳极 |
| JP2018514925A (ja) * | 2015-05-08 | 2018-06-07 | プランゼー エスエー | Ｘ線陽極 |
| CN107592940B (zh) * | 2015-05-08 | 2019-12-13 | 攀时奥地利公司 | X射线阳极 |
| US10622182B2 (en) | 2015-05-08 | 2020-04-14 | Plansee Se | X-ray anode |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2225839A1 (enrdf_load_stackoverflow) | 1974-11-08 |
| NL7401849A (enrdf_load_stackoverflow) | 1974-10-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHJ | Non-payment of the annual fee |