DE2302121A1 - Elektronenmikroskop - Google Patents

Elektronenmikroskop

Info

Publication number
DE2302121A1
DE2302121A1 DE19732302121 DE2302121A DE2302121A1 DE 2302121 A1 DE2302121 A1 DE 2302121A1 DE 19732302121 DE19732302121 DE 19732302121 DE 2302121 A DE2302121 A DE 2302121A DE 2302121 A1 DE2302121 A1 DE 2302121A1
Authority
DE
Germany
Prior art keywords
opening
metallic layer
lens
layer
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19732302121
Other languages
German (de)
English (en)
Inventor
Klaus Heinemann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Aeronautics and Space Administration NASA
Original Assignee
National Aeronautics and Space Administration NASA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Aeronautics and Space Administration NASA filed Critical National Aeronautics and Space Administration NASA
Publication of DE2302121A1 publication Critical patent/DE2302121A1/de
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Microscoopes, Condenser (AREA)
DE19732302121 1972-01-28 1973-01-17 Elektronenmikroskop Pending DE2302121A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22167072A 1972-01-28 1972-01-28

Publications (1)

Publication Number Publication Date
DE2302121A1 true DE2302121A1 (de) 1973-08-09

Family

ID=22828815

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19732302121 Pending DE2302121A1 (de) 1972-01-28 1973-01-17 Elektronenmikroskop

Country Status (6)

Country Link
JP (1) JPS4885069A (enrdf_load_stackoverflow)
CA (1) CA982705A (enrdf_load_stackoverflow)
DE (1) DE2302121A1 (enrdf_load_stackoverflow)
FR (1) FR2169232B1 (enrdf_load_stackoverflow)
GB (1) GB1416043A (enrdf_load_stackoverflow)
NL (1) NL7301164A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009016861A1 (de) * 2009-04-08 2010-10-21 Carl Zeiss Nts Gmbh Teilchenstrahlmikroskop

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54143579U (enrdf_load_stackoverflow) * 1978-03-27 1979-10-05
JP3987276B2 (ja) 2000-10-12 2007-10-03 株式会社日立製作所 試料像形成方法
NL1025500C2 (nl) * 2004-02-17 2005-08-19 Fei Co Deeltjesbron met selecteerbare bundelstroom en energiespreiding.
EP2128885A1 (en) 2008-05-26 2009-12-02 FEI Company Charged particle source with integrated energy filter

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL285301A (enrdf_load_stackoverflow) * 1961-11-15

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009016861A1 (de) * 2009-04-08 2010-10-21 Carl Zeiss Nts Gmbh Teilchenstrahlmikroskop
US8471203B2 (en) 2009-04-08 2013-06-25 Carl Zeiss Microscopy Gmbh Particle-beam microscope

Also Published As

Publication number Publication date
CA982705A (en) 1976-01-27
GB1416043A (en) 1975-12-03
JPS4885069A (enrdf_load_stackoverflow) 1973-11-12
FR2169232A1 (enrdf_load_stackoverflow) 1973-09-07
NL7301164A (enrdf_load_stackoverflow) 1973-07-31
FR2169232B1 (enrdf_load_stackoverflow) 1978-08-04

Similar Documents

Publication Publication Date Title
DE3852296T2 (de) Beugungsgitter und Herstellungsverfahren dafür.
DE69209260T2 (de) Photokathode für einen Bildverstärker
EP1329936B1 (de) Phasenkontrast-Elektronenmikroskop mit ringförmiger Beleuchtungsapertur
DE69908727T2 (de) Gate-photokathode für kontrollierte einfach oder mehrfach elektronenstrahlemission
DE112014003760B4 (de) Elektronenmikroskop und Beobachtungsverfahren
DE112016006486T5 (de) Elektronenmikroskop
DE10114949A1 (de) Dünnfilmphasenplatte, Phasenkontrast-Elektronenmikroskop mit solche einer Dünnfilmphasenplatte und Verfahren zur Verhinderung des Ladens der Phasenplatte
DE2360197A1 (de) Verfahren zur erhoehung der schaerfentiefe und/oder des aufloesungsvermoegens von lichtmikroskopen
DE102014118135A1 (de) Ladungsteilchenstrahl-Belichtungsgerät
DE102010010937A1 (de) Verfahren und Vorrichtung zur Herstellung einer Fresnel-Zonenplatte
WO2010023189A1 (de) Phasenplatte, insbesondere für ein elektronenmikroskop
EP0840940A1 (de) Verfahren und vorrichtung zur ionendünnung in einem hochauflösenden transmissionselektronenmikroskop
DE2547079C3 (de) Verfahren zur Korpuskularbestrahlung eines Präparats
DE19647975C2 (de) Reflexionselektronenmikroskop
US3996468A (en) Electron microscope aperture system
DE2302121A1 (de) Elektronenmikroskop
DE2416186C3 (de) Maske zur Strukturierung dünner Schichten
EP1476890B1 (de) Phasenplatte für die elektronenmikroskopie und elektronenmik roskopische bildgebung
DE69402118T2 (de) Verfahren und Vorrichtung zur Herstellung von nadelförmigen Materialien sowie Verfahren zur Herstellung von Mikroemittern
DE102011014399B4 (de) Phasenplatte, Verfahren zum Herstellen einer Phasenplatte sowie Elektronenmikroskop
DE102014019408B4 (de) Abbildende Energiefiltervorrichtung und Verfahren zu deren Betrieb
EP0104684B1 (de) Maske für die Mustererzeugung in Lackschichten mittels Röntgenstrahllithographie und Verfahren zu ihrer Herstellung
WO2004091264A2 (de) Hochfrequenz-plasmastrahlquelle und verfahren zum bestrahlen einer oberfläche
EP1454334A2 (de) Linsenanordnung mit lateral verschiebbarer optischer achse für teilchenstrahlen
DE1810818A1 (de) Korpuskularstrahlgeraet mit einer Abbildungslinse und einer dieser zugeordneten phasenschiebenden Folie

Legal Events

Date Code Title Description
OHJ Non-payment of the annual fee