DE2249999A1 - Ionenquelle - Google Patents
IonenquelleInfo
- Publication number
- DE2249999A1 DE2249999A1 DE2249999A DE2249999A DE2249999A1 DE 2249999 A1 DE2249999 A1 DE 2249999A1 DE 2249999 A DE2249999 A DE 2249999A DE 2249999 A DE2249999 A DE 2249999A DE 2249999 A1 DE2249999 A1 DE 2249999A1
- Authority
- DE
- Germany
- Prior art keywords
- electrode
- ion source
- anode
- chamber
- source according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000002500 ions Chemical class 0.000 claims description 58
- 239000007789 gas Substances 0.000 claims description 18
- 238000000605 extraction Methods 0.000 claims description 17
- 230000006698 induction Effects 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims 1
- 230000008020 evaporation Effects 0.000 claims 1
- 238000001125 extrusion Methods 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000000370 acceptor Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002085 irritant Substances 0.000 description 1
- 231100000021 irritant Toxicity 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/10—Duoplasmatrons ; Duopigatrons
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7136701A FR2156978A5 (enrdf_load_stackoverflow) | 1971-10-13 | 1971-10-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2249999A1 true DE2249999A1 (de) | 1973-04-19 |
Family
ID=9084273
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2249999A Pending DE2249999A1 (de) | 1971-10-13 | 1972-10-12 | Ionenquelle |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3890535A (enrdf_load_stackoverflow) |
| DE (1) | DE2249999A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2156978A5 (enrdf_load_stackoverflow) |
| GB (1) | GB1411428A (enrdf_load_stackoverflow) |
| NL (1) | NL7213791A (enrdf_load_stackoverflow) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4045677A (en) * | 1976-06-11 | 1977-08-30 | Cornell Research Foundation, Inc. | Intense ion beam generator |
| US4301391A (en) * | 1979-04-26 | 1981-11-17 | Hughes Aircraft Company | Dual discharge plasma device |
| USRE34806E (en) * | 1980-11-25 | 1994-12-13 | Celestech, Inc. | Magnetoplasmadynamic processor, applications thereof and methods |
| JPS58225537A (ja) * | 1982-06-25 | 1983-12-27 | Hitachi Ltd | イオン源装置 |
| US4529571A (en) * | 1982-10-27 | 1985-07-16 | The United States Of America As Represented By The United States Department Of Energy | Single-ring magnetic cusp low gas pressure ion source |
| US4587430A (en) * | 1983-02-10 | 1986-05-06 | Mission Research Corporation | Ion implantation source and device |
| FR2550681B1 (fr) * | 1983-08-12 | 1985-12-06 | Centre Nat Rech Scient | Source d'ions a au moins deux chambres d'ionisation, en particulier pour la formation de faisceaux d'ions chimiquement reactifs |
| US4620095A (en) * | 1984-01-18 | 1986-10-28 | Miziolek Andrzej W | Ion neutralization resonance emission elemental detector |
| AT381826B (de) * | 1984-10-11 | 1986-12-10 | Voest Alpine Ag | Plasmabrenner |
| US5838012A (en) * | 1997-03-19 | 1998-11-17 | Genus, Inc. | Charge exchange cell |
| US7838850B2 (en) * | 1999-12-13 | 2010-11-23 | Semequip, Inc. | External cathode ion source |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL285354A (enrdf_load_stackoverflow) * | 1961-12-11 | |||
| US3238414A (en) * | 1965-07-28 | 1966-03-01 | George G Kelley | High output duoplasmatron-type ion source |
| FR1585902A (enrdf_load_stackoverflow) * | 1968-04-09 | 1970-02-06 |
-
1971
- 1971-10-13 FR FR7136701A patent/FR2156978A5/fr not_active Expired
-
1972
- 1972-10-11 US US296594A patent/US3890535A/en not_active Expired - Lifetime
- 1972-10-12 GB GB4708572A patent/GB1411428A/en not_active Expired
- 1972-10-12 NL NL7213791A patent/NL7213791A/xx not_active Application Discontinuation
- 1972-10-12 DE DE2249999A patent/DE2249999A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB1411428A (en) | 1975-10-22 |
| US3890535A (en) | 1975-06-17 |
| FR2156978A5 (enrdf_load_stackoverflow) | 1973-06-01 |
| NL7213791A (enrdf_load_stackoverflow) | 1973-04-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHN | Withdrawal |