DE2146941A1 - Strahlenformungs- und Abbildungssystem - Google Patents

Strahlenformungs- und Abbildungssystem

Info

Publication number
DE2146941A1
DE2146941A1 DE19712146941 DE2146941A DE2146941A1 DE 2146941 A1 DE2146941 A1 DE 2146941A1 DE 19712146941 DE19712146941 DE 19712146941 DE 2146941 A DE2146941 A DE 2146941A DE 2146941 A1 DE2146941 A1 DE 2146941A1
Authority
DE
Germany
Prior art keywords
source
receiving body
slot
mask
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19712146941
Other languages
German (de)
English (en)
Inventor
Louis N.; Westerberg Eugene R.; Palo Alto Calif. Heynick (V.StA.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SRI International Inc
Original Assignee
Stanford Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanford Research Institute filed Critical Stanford Research Institute
Publication of DE2146941A1 publication Critical patent/DE2146941A1/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/22—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
    • G03G15/32—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head
    • G03G15/321—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head by charge transfer onto the recording material in accordance with the image
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/027—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/09—Treatments involving charged particles
    • H05K2203/092—Particle beam, e.g. using an electron beam or an ion beam
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/107—Using laser light

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE19712146941 1970-09-21 1971-09-20 Strahlenformungs- und Abbildungssystem Pending DE2146941A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7389870A 1970-09-21 1970-09-21

Publications (1)

Publication Number Publication Date
DE2146941A1 true DE2146941A1 (de) 1972-03-30

Family

ID=22116466

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712146941 Pending DE2146941A1 (de) 1970-09-21 1971-09-20 Strahlenformungs- und Abbildungssystem

Country Status (5)

Country Link
US (1) US3614423A (enExample)
DE (1) DE2146941A1 (enExample)
FR (1) FR2106298A5 (enExample)
GB (1) GB1328320A (enExample)
NL (1) NL7112975A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0056179A1 (en) * 1981-01-12 1982-07-21 Sony Corporation Process and apparatus for converged fine line electron beam treatment of objects
US4559102A (en) * 1983-05-09 1985-12-17 Sony Corporation Method for recrystallizing a polycrystalline, amorphous or small grain material
US4592799A (en) * 1983-05-09 1986-06-03 Sony Corporation Method of recrystallizing a polycrystalline, amorphous or small grain material
US4703256A (en) * 1983-05-09 1987-10-27 Sony Corporation Faraday cups

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3689782A (en) * 1971-07-01 1972-09-05 Thomson Csf Electronic transducer for a piezoelectric line
DE2446789A1 (de) * 1974-09-27 1976-09-02 Siemens Ag Korpuskularstrahloptisches geraet zur korpuskelbestrahlung eines praeparats
US3924136A (en) * 1975-02-18 1975-12-02 Stanford Research Inst Charged particle apodized pattern imaging and exposure system
DE2644208C3 (de) * 1976-09-30 1981-04-30 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung einer einkristallinen Schicht auf einer Unterlage
FR2391538A1 (fr) * 1977-05-16 1978-12-15 Asahi Chemical Ind Resistance en couche mince et procede de fabrication
DE2739502C3 (de) * 1977-09-02 1980-07-03 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Belichtung durch Korpuskularstrahlen-Schattenwurf und Vorrichtung zur Durchführung des Verfahrens
US4446373A (en) * 1981-01-12 1984-05-01 Sony Corporation Process and apparatus for converged fine line electron beam treatment objects
US4465934A (en) * 1981-01-23 1984-08-14 Veeco Instruments Inc. Parallel charged particle beam exposure system
GB8911391D0 (en) * 1989-05-18 1989-07-05 Humphreys Colin J Preparation of substrates
US8878147B2 (en) * 2010-09-07 2014-11-04 Joseph C. Robinson Method and apparatus for in situ preparation of serial planar surfaces for microscopy

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0056179A1 (en) * 1981-01-12 1982-07-21 Sony Corporation Process and apparatus for converged fine line electron beam treatment of objects
US4559102A (en) * 1983-05-09 1985-12-17 Sony Corporation Method for recrystallizing a polycrystalline, amorphous or small grain material
US4592799A (en) * 1983-05-09 1986-06-03 Sony Corporation Method of recrystallizing a polycrystalline, amorphous or small grain material
US4703256A (en) * 1983-05-09 1987-10-27 Sony Corporation Faraday cups

Also Published As

Publication number Publication date
GB1328320A (en) 1973-08-30
NL7112975A (enExample) 1972-03-23
US3614423A (en) 1971-10-19
FR2106298A5 (enExample) 1972-04-28

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