DE2122617C3 - - Google Patents

Info

Publication number
DE2122617C3
DE2122617C3 DE2122617A DE2122617A DE2122617C3 DE 2122617 C3 DE2122617 C3 DE 2122617C3 DE 2122617 A DE2122617 A DE 2122617A DE 2122617 A DE2122617 A DE 2122617A DE 2122617 C3 DE2122617 C3 DE 2122617C3
Authority
DE
Germany
Prior art keywords
masks
areas
mask
area
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2122617A
Other languages
German (de)
English (en)
Other versions
DE2122617B2 (US06589383-20030708-C00041.png
DE2122617A1 (de
Inventor
William Otto Granite Springs N.Y. Druschel (V.St.A.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2122617A1 publication Critical patent/DE2122617A1/de
Publication of DE2122617B2 publication Critical patent/DE2122617B2/de
Application granted granted Critical
Publication of DE2122617C3 publication Critical patent/DE2122617C3/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/153—Multiple image producing on single receiver

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE19712122617 1970-06-18 1971-05-07 Verfahren zum Prüfen von Masken Granted DE2122617A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4749770A 1970-06-18 1970-06-18

Publications (3)

Publication Number Publication Date
DE2122617A1 DE2122617A1 (de) 1971-12-23
DE2122617B2 DE2122617B2 (US06589383-20030708-C00041.png) 1979-03-08
DE2122617C3 true DE2122617C3 (US06589383-20030708-C00041.png) 1979-11-08

Family

ID=21949314

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712122617 Granted DE2122617A1 (de) 1970-06-18 1971-05-07 Verfahren zum Prüfen von Masken

Country Status (5)

Country Link
US (1) US3674487A (US06589383-20030708-C00041.png)
JP (1) JPS5217717B1 (US06589383-20030708-C00041.png)
DE (1) DE2122617A1 (US06589383-20030708-C00041.png)
FR (1) FR2095547A5 (US06589383-20030708-C00041.png)
GB (1) GB1326293A (US06589383-20030708-C00041.png)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3745897A (en) * 1971-06-21 1973-07-17 Ibm Mask bit error indicator
JPS5320308U (US06589383-20030708-C00041.png) * 1976-07-29 1978-02-21
US4374911A (en) * 1978-04-28 1983-02-22 International Business Machines Corporation Photo method of making tri-level density photomask
US4229099A (en) * 1978-12-22 1980-10-21 Watkins Ronald C Method and apparatus for burning or dodging preselected portions of an image formed on photographic paper

Also Published As

Publication number Publication date
FR2095547A5 (US06589383-20030708-C00041.png) 1972-02-11
DE2122617B2 (US06589383-20030708-C00041.png) 1979-03-08
JPS5217717B1 (US06589383-20030708-C00041.png) 1977-05-17
GB1326293A (en) 1973-08-08
US3674487A (en) 1972-07-04
DE2122617A1 (de) 1971-12-23

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
8339 Ceased/non-payment of the annual fee