JPS5217717B1 - - Google Patents
Info
- Publication number
- JPS5217717B1 JPS5217717B1 JP46036422A JP3642271A JPS5217717B1 JP S5217717 B1 JPS5217717 B1 JP S5217717B1 JP 46036422 A JP46036422 A JP 46036422A JP 3642271 A JP3642271 A JP 3642271A JP S5217717 B1 JPS5217717 B1 JP S5217717B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/153—Multiple image producing on single receiver
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US4749770A | 1970-06-18 | 1970-06-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5217717B1 true JPS5217717B1 (ja) | 1977-05-17 |
Family
ID=21949314
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP46036422A Pending JPS5217717B1 (ja) | 1970-06-18 | 1971-05-28 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3674487A (ja) |
| JP (1) | JPS5217717B1 (ja) |
| DE (1) | DE2122617A1 (ja) |
| FR (1) | FR2095547A5 (ja) |
| GB (1) | GB1326293A (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5320308U (ja) * | 1976-07-29 | 1978-02-21 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3745897A (en) * | 1971-06-21 | 1973-07-17 | Ibm | Mask bit error indicator |
| US4374911A (en) * | 1978-04-28 | 1983-02-22 | International Business Machines Corporation | Photo method of making tri-level density photomask |
| US4229099A (en) * | 1978-12-22 | 1980-10-21 | Watkins Ronald C | Method and apparatus for burning or dodging preselected portions of an image formed on photographic paper |
-
1970
- 1970-06-18 US US47497A patent/US3674487A/en not_active Expired - Lifetime
-
1971
- 1971-04-29 FR FR7116462A patent/FR2095547A5/fr not_active Expired
- 1971-05-07 DE DE19712122617 patent/DE2122617A1/de active Granted
- 1971-05-26 GB GB1710671A patent/GB1326293A/en not_active Expired
- 1971-05-28 JP JP46036422A patent/JPS5217717B1/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5320308U (ja) * | 1976-07-29 | 1978-02-21 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2122617A1 (de) | 1971-12-23 |
| DE2122617C3 (ja) | 1979-11-08 |
| FR2095547A5 (ja) | 1972-02-11 |
| DE2122617B2 (ja) | 1979-03-08 |
| GB1326293A (en) | 1973-08-08 |
| US3674487A (en) | 1972-07-04 |