DE2043865C2 - Vorrichtung zum Beschießen eines Targets mit Ionen - Google Patents

Vorrichtung zum Beschießen eines Targets mit Ionen

Info

Publication number
DE2043865C2
DE2043865C2 DE2043865A DE2043865A DE2043865C2 DE 2043865 C2 DE2043865 C2 DE 2043865C2 DE 2043865 A DE2043865 A DE 2043865A DE 2043865 A DE2043865 A DE 2043865A DE 2043865 C2 DE2043865 C2 DE 2043865C2
Authority
DE
Germany
Prior art keywords
ion beam
target
diaphragm
targets
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2043865A
Other languages
German (de)
English (en)
Other versions
DE2043865A1 (de
Inventor
James Harry Abingdon Berkshire Freeman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UK Atomic Energy Authority
Original Assignee
UK Atomic Energy Authority
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UK Atomic Energy Authority filed Critical UK Atomic Energy Authority
Publication of DE2043865A1 publication Critical patent/DE2043865A1/de
Application granted granted Critical
Publication of DE2043865C2 publication Critical patent/DE2043865C2/de
Expired legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D59/00—Separation of different isotopes of the same chemical element
    • B01D59/44—Separation by mass spectrography
    • B01D59/48—Separation by mass spectrography using electrostatic and magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/022—Circuit arrangements, e.g. for generating deviation currents or voltages ; Components associated with high voltage supply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/025—Detectors specially adapted to particle spectrometers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/961—Ion beam source and generation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
DE2043865A 1969-09-05 1970-09-04 Vorrichtung zum Beschießen eines Targets mit Ionen Expired DE2043865C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB44171/69A GB1280013A (en) 1969-09-05 1969-09-05 Improvements in or relating to apparatus bombarding a target with ions

Publications (2)

Publication Number Publication Date
DE2043865A1 DE2043865A1 (de) 1971-03-11
DE2043865C2 true DE2043865C2 (de) 1983-08-04

Family

ID=10432104

Family Applications (2)

Application Number Title Priority Date Filing Date
DE2043865A Expired DE2043865C2 (de) 1969-09-05 1970-09-04 Vorrichtung zum Beschießen eines Targets mit Ionen
DE7032987U Expired DE7032987U (de) 1969-09-05 1970-09-04 Geraet fuer das beschiessen mit ionen.

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE7032987U Expired DE7032987U (de) 1969-09-05 1970-09-04 Geraet fuer das beschiessen mit ionen.

Country Status (6)

Country Link
US (1) US3689766A (enExample)
JP (1) JPS521159B1 (enExample)
DE (2) DE2043865C2 (enExample)
FR (1) FR2060966A5 (enExample)
GB (1) GB1280013A (enExample)
NL (1) NL172805C (enExample)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3983397A (en) * 1972-05-08 1976-09-28 Albert Richard D Selectable wavelength X-ray source
US3778626A (en) * 1972-07-28 1973-12-11 Western Electric Co Mechanical scan system for ion implantation
US4021675A (en) * 1973-02-20 1977-05-03 Hughes Aircraft Company System for controlling ion implantation dosage in electronic materials
US3993909A (en) * 1973-03-16 1976-11-23 U.S. Philips Corporation Substrate holder for etching thin films
DE2326279A1 (de) * 1973-05-23 1974-12-19 Siemens Ag Ionenstrahlschnellschaltung zur erzielung definierter festkoerperdotierungen durch ionenimplantation
US4033904A (en) * 1974-03-22 1977-07-05 Varian Associates, Inc. Interchangeable specimen trays and apparatus for a vacuum type testing system
JPS515961A (en) * 1974-07-03 1976-01-19 Dan Kagaku Kk Konseisosasochi
US4017403A (en) * 1974-07-31 1977-04-12 United Kingdom Atomic Energy Authority Ion beam separators
US4013262A (en) * 1974-12-13 1977-03-22 Varian Associates Rotary apparatus for moving workpieces through treatment beam with controlled angle of orientation and ion implanter incorporating such apparatus
US4024399A (en) * 1975-01-06 1977-05-17 Jersey Nuclear-Avco Isotopes, Inc. Method and apparatus for measuring vapor flow in isotope separation
FR2298880A1 (fr) * 1975-01-22 1976-08-20 Commissariat Energie Atomique Procede et dispositif d'implantation ionique
US4000426A (en) * 1975-05-15 1976-12-28 Aita Konstantinovna Zaitseva Apparatus for feeding parts in ion-beam machining
US4011449A (en) * 1975-11-05 1977-03-08 Ibm Corporation Apparatus for measuring the beam current of charged particle beam
DE2557685A1 (de) * 1975-12-20 1977-06-30 Ibm Deutschland Verfahren zur herstellung einer gerasterten photoleiterschicht
CH607836A5 (enExample) * 1976-12-27 1978-11-15 Balzers Hochvakuum
US4234797A (en) * 1979-05-23 1980-11-18 Nova Associates, Inc. Treating workpieces with beams
US4258266A (en) * 1979-07-30 1981-03-24 Hughes Aircraft Company Ion implantation system
US4514636A (en) * 1979-09-14 1985-04-30 Eaton Corporation Ion treatment apparatus
JPS56126918A (en) * 1980-03-11 1981-10-05 Hitachi Ltd Injecting device for ion
US4361762A (en) * 1980-07-30 1982-11-30 Rca Corporation Apparatus and method for neutralizing the beam in an ion implanter
JPS58164134A (ja) * 1982-03-24 1983-09-29 Hitachi Ltd 半導体装置の製造方法
US4517465A (en) * 1983-03-29 1985-05-14 Veeco/Ai, Inc. Ion implantation control system
US4587433A (en) * 1984-06-27 1986-05-06 Eaton Corporation Dose control apparatus
JPS6324536A (ja) * 1986-01-29 1988-02-01 イ−トン　コ−ポレ−シヨン イオン注入装置および方法
DE3752358T2 (de) * 1986-04-09 2003-03-27 Varian Semiconductor Equipment Associates Inc., Gloucester Ionenstrahlabtastverfahren und vorrichtung
US4980562A (en) * 1986-04-09 1990-12-25 Varian Associates, Inc. Method and apparatus for high efficiency scanning in an ion implanter
JPS62295347A (ja) * 1986-04-09 1987-12-22 イクリプス・イオン・テクノロジ−・インコ−ポレイテツド イオンビ−ム高速平行走査装置
US4751393A (en) * 1986-05-16 1988-06-14 Varian Associates, Inc. Dose measurement and uniformity monitoring system for ion implantation
US4745281A (en) * 1986-08-25 1988-05-17 Eclipse Ion Technology, Inc. Ion beam fast parallel scanning having dipole magnetic lens with nonuniform field
US4804852A (en) * 1987-01-29 1989-02-14 Eaton Corporation Treating work pieces with electro-magnetically scanned ion beams
US4816693A (en) * 1987-08-21 1989-03-28 National Electrostatics Corp. Apparatus and method for uniform ion dose control
US5309064A (en) * 1993-03-22 1994-05-03 Armini Anthony J Ion source generator auxiliary device
US5981961A (en) * 1996-03-15 1999-11-09 Applied Materials, Inc. Apparatus and method for improved scanning efficiency in an ion implanter
US5808416A (en) * 1996-11-01 1998-09-15 Implant Sciences Corp. Ion source generator auxiliary device
US5852345A (en) * 1996-11-01 1998-12-22 Implant Sciences Corp. Ion source generator auxiliary device for phosphorus and arsenic beams
US6060715A (en) * 1997-10-31 2000-05-09 Applied Materials, Inc. Method and apparatus for ion beam scanning in an ion implanter
US6084241A (en) * 1998-06-01 2000-07-04 Motorola, Inc. Method of manufacturing semiconductor devices and apparatus therefor
US6677599B2 (en) * 2000-03-27 2004-01-13 Applied Materials, Inc. System and method for uniformly implanting a wafer with an ion beam
US6661016B2 (en) 2000-06-22 2003-12-09 Proteros, Llc Ion implantation uniformity correction using beam current control
US7547460B2 (en) 2000-09-15 2009-06-16 Varian Semiconductor Equipment Associates, Inc. Ion implanter optimizer scan waveform retention and recovery
US6765219B2 (en) * 2000-11-22 2004-07-20 Variah Semiconductor Equipment Associates, Inc. Hybrid scanning system and methods for ion implantation
US6710359B2 (en) 2001-03-23 2004-03-23 Varian Semiconductor Equipment Associates, Inc. Methods and apparatus for scanned beam uniformity adjustment in ion implanters
US20130114773A1 (en) * 2011-11-08 2013-05-09 Alexander R. Vaucher Superconducting neutron source
CN112361892A (zh) * 2020-11-04 2021-02-12 山东战勤特种装备有限公司 一种射击智能对抗自动报靶训练方法及装置
CN112516797B (zh) * 2020-12-01 2022-09-16 中国科学院近代物理研究所 一种用于同位素分离系统的静电聚焦和加速系统及方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE426347A (enExample) * 1937-02-18
US2348031A (en) * 1941-04-30 1944-05-02 Rca Corp Method of focusing electron microscopes
NL270945A (enExample) * 1961-03-02
NL276412A (enExample) * 1961-03-30
US3131300A (en) * 1962-11-16 1964-04-28 Thomas R Jeter Apparatus for reducing energy variations of a van de graaff ion beam
US3326176A (en) * 1964-10-27 1967-06-20 Nat Res Corp Work-registration device including ionic beam probe
US3358239A (en) * 1965-07-27 1967-12-12 Transformatoren & Roentgenwerk Equipment for controlling and monitoring the electron beam of a horizontaltype particle accelerator
US3434894A (en) * 1965-10-06 1969-03-25 Ion Physics Corp Fabricating solid state devices by ion implantation
US3547074A (en) * 1967-04-13 1970-12-15 Block Engineering Apparatus for forming microelements

Also Published As

Publication number Publication date
US3689766A (en) 1972-09-05
GB1280013A (en) 1972-07-05
JPS521159B1 (enExample) 1977-01-12
DE2043865A1 (de) 1971-03-11
NL172805B (nl) 1983-05-16
DE7032987U (de) 1971-02-18
FR2060966A5 (enExample) 1971-06-18
NL7013146A (enExample) 1971-03-09
NL172805C (nl) 1983-10-17

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Legal Events

Date Code Title Description
8125 Change of the main classification

Ipc: H01J 37/317

D2 Grant after examination
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee