DE19707981A1 - Verfahren und Einrichtung zum Beschichten eines Metallbandes - Google Patents

Verfahren und Einrichtung zum Beschichten eines Metallbandes

Info

Publication number
DE19707981A1
DE19707981A1 DE19707981A DE19707981A DE19707981A1 DE 19707981 A1 DE19707981 A1 DE 19707981A1 DE 19707981 A DE19707981 A DE 19707981A DE 19707981 A DE19707981 A DE 19707981A DE 19707981 A1 DE19707981 A1 DE 19707981A1
Authority
DE
Germany
Prior art keywords
coating
current
fuzzy
galvanic cell
strip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19707981A
Other languages
German (de)
English (en)
Inventor
Wilfried Dr Ing Tautz
Joachim Dipl Ing Goepel
Eckhard Dipl Ing Wilke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to DE19707981A priority Critical patent/DE19707981A1/de
Priority to PCT/DE1998/000464 priority patent/WO1998038355A2/de
Priority to DE19880201T priority patent/DE19880201D2/de
Priority to KR1019997007865A priority patent/KR20000075792A/ko
Publication of DE19707981A1 publication Critical patent/DE19707981A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0692—Regulating the thickness of the coating
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/0265—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion
    • G05B13/0275—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion using fuzzy logic only

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Artificial Intelligence (AREA)
  • Software Systems (AREA)
  • Physics & Mathematics (AREA)
  • Fuzzy Systems (AREA)
  • Mathematical Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Evolutionary Computation (AREA)
  • Medical Informatics (AREA)
  • General Physics & Mathematics (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Coating With Molten Metal (AREA)
DE19707981A 1997-02-27 1997-02-27 Verfahren und Einrichtung zum Beschichten eines Metallbandes Withdrawn DE19707981A1 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE19707981A DE19707981A1 (de) 1997-02-27 1997-02-27 Verfahren und Einrichtung zum Beschichten eines Metallbandes
PCT/DE1998/000464 WO1998038355A2 (de) 1997-02-27 1998-02-17 Verfahren und einrichtung zum beschichten eines metallbandes
DE19880201T DE19880201D2 (de) 1997-02-27 1998-02-17 Verfahren und Einrichtung zum Beschichten eines Metallbandes
KR1019997007865A KR20000075792A (ko) 1997-02-27 1998-02-17 금속 스트립의 코팅 방법 및 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19707981A DE19707981A1 (de) 1997-02-27 1997-02-27 Verfahren und Einrichtung zum Beschichten eines Metallbandes

Publications (1)

Publication Number Publication Date
DE19707981A1 true DE19707981A1 (de) 1998-09-03

Family

ID=7821734

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19707981A Withdrawn DE19707981A1 (de) 1997-02-27 1997-02-27 Verfahren und Einrichtung zum Beschichten eines Metallbandes
DE19880201T Expired - Fee Related DE19880201D2 (de) 1997-02-27 1998-02-17 Verfahren und Einrichtung zum Beschichten eines Metallbandes

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE19880201T Expired - Fee Related DE19880201D2 (de) 1997-02-27 1998-02-17 Verfahren und Einrichtung zum Beschichten eines Metallbandes

Country Status (3)

Country Link
KR (1) KR20000075792A (ko)
DE (2) DE19707981A1 (ko)
WO (1) WO1998038355A2 (ko)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1247881A1 (en) * 2001-04-05 2002-10-09 Yamamoto-Ms Co, Ltd. Experimental management apparatus and experimental management program for electroplating
WO2004090200A1 (de) * 2002-10-04 2004-10-21 Ehrfeld Mikrotechnik Ag Kennfeldgesteuerte abscheidung von legierungen
WO2005052700A1 (en) * 2003-11-27 2005-06-09 Outokumpu Technology Oy Method for defining status index in copper electrolysis
DE102007063411B3 (de) * 2007-12-18 2009-02-19 Salzgitter Flachstahl Gmbh Verfahren zur elektrolytischen Verzinkung von Stahlband
DE102010043206A1 (de) * 2010-11-02 2012-05-03 Robert Bosch Gmbh Beschichtungsvorrichtung und Verfahren zum geregelten galvanischen Beschichten eines Objekts

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05226541A (ja) * 1992-02-14 1993-09-03 Mitsui High Tec Inc めっき装置の制御方法
JPH05263299A (ja) * 1992-03-17 1993-10-12 Mitsui High Tec Inc 電気めっき用の電源装置
JPH07173700A (ja) * 1993-12-17 1995-07-11 Nec Corp 分割アノードめっき装置および電流値決定方法
JPH07252698A (ja) * 1994-03-16 1995-10-03 Toshiba Corp 電気メッキ監視装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2987661B2 (ja) * 1992-02-14 1999-12-06 株式会社三井ハイテック めっき装置およびこれを用いためっき方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05226541A (ja) * 1992-02-14 1993-09-03 Mitsui High Tec Inc めっき装置の制御方法
JPH05263299A (ja) * 1992-03-17 1993-10-12 Mitsui High Tec Inc 電気めっき用の電源装置
JPH07173700A (ja) * 1993-12-17 1995-07-11 Nec Corp 分割アノードめっき装置および電流値決定方法
JPH07252698A (ja) * 1994-03-16 1995-10-03 Toshiba Corp 電気メッキ監視装置

Non-Patent Citations (8)

* Cited by examiner, † Cited by third party
Title
Derwent Abstract zu 05-2 63 299 (A) *
Derwent Abstract zu JP 05-2 26 541 (A) *
Derwent Abstract zu JP 07-1 73 700 (A) *
Derwent Abstract zu JP 07-2 52 698 (A) *
Japio Abstract zu JP 05-2 26 541 (A) *
Japio Abstract zu JP 05-2 63 299 (A) *
Japio Abstract zu JP 07-1 73 700 (A) *
Japio Abstract zu JP 07-2 52 698 (A) *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1247881A1 (en) * 2001-04-05 2002-10-09 Yamamoto-Ms Co, Ltd. Experimental management apparatus and experimental management program for electroplating
US6826440B2 (en) 2001-04-05 2004-11-30 Yamamoto-Ms Co., Ltd. Experimental management apparatus and experimental management program for electroplating
WO2004090200A1 (de) * 2002-10-04 2004-10-21 Ehrfeld Mikrotechnik Ag Kennfeldgesteuerte abscheidung von legierungen
WO2005052700A1 (en) * 2003-11-27 2005-06-09 Outokumpu Technology Oy Method for defining status index in copper electrolysis
DE102007063411B3 (de) * 2007-12-18 2009-02-19 Salzgitter Flachstahl Gmbh Verfahren zur elektrolytischen Verzinkung von Stahlband
DE102010043206A1 (de) * 2010-11-02 2012-05-03 Robert Bosch Gmbh Beschichtungsvorrichtung und Verfahren zum geregelten galvanischen Beschichten eines Objekts

Also Published As

Publication number Publication date
KR20000075792A (ko) 2000-12-26
WO1998038355A3 (de) 1998-12-10
DE19880201D2 (de) 1999-12-16
WO1998038355A2 (de) 1998-09-03

Similar Documents

Publication Publication Date Title
DE4338608B4 (de) Verfahren und Vorrichtung zur Führung eines Prozesses in einem geregelten System
WO1996028771A1 (de) Intelligentes rechner-leitsystem
WO1996001705A1 (de) Verfahren zum walzen eines metallbandes
EP0534221B1 (de) Regelparameter-Verbesserungsverfahren für industrielle Anlagen
DE3311048A1 (de) Regelverfahren und -einrichtung
DE19637917C2 (de) Verfahren und Einrichtung zum Entwurf oder zur Steuerung des Prozeßablaufs einer Anlage der Grundstoffindustrie
DE19707981A1 (de) Verfahren und Einrichtung zum Beschichten eines Metallbandes
DE2344920A1 (de) Vorrichtung und verfahren zur regelung eines walzwerkes
AT502525B1 (de) Verfahren zum stranggiessen einer metallschmelze
DE19707980C2 (de) Verfahren und Einrichtung zum Beschichten eines Metallbandes
EP0815498A1 (de) Verfahren und vorrichtung zur führung eines prozesses
DE3832789A1 (de) Stoerungsfolgevorrichtung
DE19731980A1 (de) Verfahren zur Steuerung und Voreinstellung eines Walzgerüstes oder einer Walzstraße zum Walzen eines Walzbandes
DE3300082A1 (de) Verfahren und einrichtung zum optimieren der heizkurve einer heizungsanlage
DE3445850C2 (ko)
AT408728B (de) Verfahren und einrichtung zur voreinstellung einer walzstrasse
EP0369983B1 (de) Verfahren und Vorrichtung zur elektrolytischen Herstellung einer Metallfolie
WO2019068376A1 (de) Planheitsregelung mit optimierer
DE19641432C2 (de) Verfahren und Einrichtung zur Vorausberechnung von vorab unbekannten Parametern eines industriellen Prozesses
EP0977897A1 (de) Verfahren und einrichtung zur kühlung von metallen in einem hüttenwerk
DE3151448C2 (de) Einrichtung zur Regelung der Dicke von Beschichtungen auf Metallbändern
DE4323432C2 (de) Spannungs- und Blindleistungsregler für ein Stromsystem auf der Basis neuronaler Netzwerke
DE19740691A1 (de) Verfahren und Einrichtung zur Kühlung von Metallen in einem Hüttenwerk
EP0575636A1 (de) Verfahren zur Regelung totzeitbehafteter Regelstrecken
DE19510342C2 (de) Verfahren zum Regeln der Ausgangsgröße eines Kraftwerksparks

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8143 Withdrawn due to claiming internal priority