DE150482C - - Google Patents

Info

Publication number
DE150482C
DE150482C DENDAT150482D DE150482DC DE150482C DE 150482 C DE150482 C DE 150482C DE NDAT150482 D DENDAT150482 D DE NDAT150482D DE 150482D C DE150482D C DE 150482DC DE 150482 C DE150482 C DE 150482C
Authority
DE
Germany
Prior art keywords
oil
container
filter
cleaned
filters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DENDAT150482D
Other languages
German (de)
English (en)
Publication of DE150482C publication Critical patent/DE150482C/de
Active legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/11—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with bag, cage, hose, tube, sleeve or like filtering elements
    • B01D29/13—Supported filter elements
    • B01D29/23—Supported filter elements arranged for outward flow filtration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D24/00—Filters comprising loose filtering material, i.e. filtering material without any binder between the individual particles or fibres thereof
    • B01D24/02—Filters comprising loose filtering material, i.e. filtering material without any binder between the individual particles or fibres thereof with the filter bed stationary during the filtration
    • B01D24/04—Filters comprising loose filtering material, i.e. filtering material without any binder between the individual particles or fibres thereof with the filter bed stationary during the filtration the filtering material being clamped between pervious fixed walls
    • B01D24/045—Filters comprising loose filtering material, i.e. filtering material without any binder between the individual particles or fibres thereof with the filter bed stationary during the filtration the filtering material being clamped between pervious fixed walls with at least one flat vertical wall
    • B01D24/047—Filters comprising loose filtering material, i.e. filtering material without any binder between the individual particles or fibres thereof with the filter bed stationary during the filtration the filtering material being clamped between pervious fixed walls with at least one flat vertical wall with vertical tubes distributing the liquid to be filtered or for collecting filtrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Production Of Liquid Hydrocarbon Mixture For Refining Petroleum (AREA)
DENDAT150482D Active DE150482C (ja)

Publications (1)

Publication Number Publication Date
DE150482C true DE150482C (ja)

Family

ID=417390

Family Applications (1)

Application Number Title Priority Date Filing Date
DENDAT150482D Active DE150482C (ja)

Country Status (1)

Country Link
DE (1) DE150482C (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5538603A (en) * 1993-05-19 1996-07-23 Applied Materials, Inc. Apparatus and process for increasing uniformity of sputtering rate in sputtering apparatus
US5753090A (en) * 1995-07-14 1998-05-19 Nihon Shinku Gijutsu Kabushiki Kaisha Small size sputtering target and high vacuum sputtering apparatus using the same
US5914018A (en) * 1996-08-23 1999-06-22 Applied Materials, Inc. Sputter target for eliminating redeposition on the target sidewall
US5919345A (en) * 1994-09-27 1999-07-06 Applied Materials, Inc. Uniform film thickness deposition of sputtered materials
US6042706A (en) * 1997-01-14 2000-03-28 Applied Materials, Inc. Ionized PVD source to produce uniform low-particle deposition
US6086735A (en) * 1998-06-01 2000-07-11 Praxair S.T. Technology, Inc. Contoured sputtering target
US6277250B1 (en) * 2000-10-19 2001-08-21 Tokyo Electron Limited Dual cathode arrangement for physical vapor deposition of materials onto a round substrate with high aspect ratio features

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5538603A (en) * 1993-05-19 1996-07-23 Applied Materials, Inc. Apparatus and process for increasing uniformity of sputtering rate in sputtering apparatus
US5919345A (en) * 1994-09-27 1999-07-06 Applied Materials, Inc. Uniform film thickness deposition of sputtered materials
US5753090A (en) * 1995-07-14 1998-05-19 Nihon Shinku Gijutsu Kabushiki Kaisha Small size sputtering target and high vacuum sputtering apparatus using the same
US5914018A (en) * 1996-08-23 1999-06-22 Applied Materials, Inc. Sputter target for eliminating redeposition on the target sidewall
US6059945A (en) * 1996-08-23 2000-05-09 Applied Materials, Inc. Sputter target for eliminating redeposition on the target sidewall
US6042706A (en) * 1997-01-14 2000-03-28 Applied Materials, Inc. Ionized PVD source to produce uniform low-particle deposition
US6086735A (en) * 1998-06-01 2000-07-11 Praxair S.T. Technology, Inc. Contoured sputtering target
US6277250B1 (en) * 2000-10-19 2001-08-21 Tokyo Electron Limited Dual cathode arrangement for physical vapor deposition of materials onto a round substrate with high aspect ratio features

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