DE112019008000T5 - Plasmavorrichtung - Google Patents

Plasmavorrichtung Download PDF

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Publication number
DE112019008000T5
DE112019008000T5 DE112019008000.8T DE112019008000T DE112019008000T5 DE 112019008000 T5 DE112019008000 T5 DE 112019008000T5 DE 112019008000 T DE112019008000 T DE 112019008000T DE 112019008000 T5 DE112019008000 T5 DE 112019008000T5
Authority
DE
Germany
Prior art keywords
leakage current
value
plasma
gas
threshold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE112019008000.8T
Other languages
German (de)
English (en)
Inventor
Shinji Takikawa
Takahiro Jindo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Corp
Original Assignee
Fuji Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Corp filed Critical Fuji Corp
Publication of DE112019008000T5 publication Critical patent/DE112019008000T5/de
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3473—Safety means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
DE112019008000.8T 2019-12-24 2019-12-24 Plasmavorrichtung Pending DE112019008000T5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2019/050549 WO2021130846A1 (ja) 2019-12-24 2019-12-24 プラズマ装置

Publications (1)

Publication Number Publication Date
DE112019008000T5 true DE112019008000T5 (de) 2022-10-27

Family

ID=76575769

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112019008000.8T Pending DE112019008000T5 (de) 2019-12-24 2019-12-24 Plasmavorrichtung

Country Status (4)

Country Link
JP (1) JP7212801B2 (zh)
CN (1) CN114747299A (zh)
DE (1) DE112019008000T5 (zh)
WO (1) WO2021130846A1 (zh)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004079453A (ja) 2002-08-22 2004-03-11 Matsushita Electric Ind Co Ltd プラズマ処理方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4699235B2 (ja) * 2006-02-20 2011-06-08 株式会社サイアン プラズマ発生装置およびそれを用いるワーク処理装置
IN2014KN03122A (zh) * 2012-09-05 2015-05-08 Kyosan Electric Mfg
JP2018117033A (ja) * 2017-01-18 2018-07-26 ルネサスエレクトロニクス株式会社 半導体製造装置および半導体製造方法
WO2018185834A1 (ja) * 2017-04-04 2018-10-11 株式会社Ｆｕｊｉ プラズマ発生装置
JP2019127933A (ja) * 2018-01-26 2019-08-01 ダイハツ工業株式会社 プラズマリアクター用電源システム

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004079453A (ja) 2002-08-22 2004-03-11 Matsushita Electric Ind Co Ltd プラズマ処理方法

Also Published As

Publication number Publication date
WO2021130846A1 (ja) 2021-07-01
CN114747299A (zh) 2022-07-12
JPWO2021130846A1 (zh) 2021-07-01
JP7212801B2 (ja) 2023-01-25

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