DE112018004818A5 - Optoelektronisches Halbleiterbauelement - Google Patents

Optoelektronisches Halbleiterbauelement Download PDF

Info

Publication number
DE112018004818A5
DE112018004818A5 DE112018004818.7T DE112018004818T DE112018004818A5 DE 112018004818 A5 DE112018004818 A5 DE 112018004818A5 DE 112018004818 T DE112018004818 T DE 112018004818T DE 112018004818 A5 DE112018004818 A5 DE 112018004818A5
Authority
DE
Germany
Prior art keywords
semiconductor component
optoelectronic semiconductor
optoelectronic
component
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE112018004818.7T
Other languages
English (en)
Inventor
Matthias Peter
Teresa Wurm
Christoph Eichler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osram Oled GmbH
Original Assignee
Osram Oled GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osram Oled GmbH filed Critical Osram Oled GmbH
Publication of DE112018004818A5 publication Critical patent/DE112018004818A5/de
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/14Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a carrier transport control structure, e.g. highly-doped semiconductor layer or current-blocking structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/0304Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L31/03046Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds including ternary or quaternary compounds, e.g. GaAlAs, InGaAs, InGaAsP
    • H01L31/03048Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds including ternary or quaternary compounds, e.g. GaAlAs, InGaAs, InGaAsP comprising a nitride compounds, e.g. InGaN
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/04Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/042Electrical excitation ; Circuits therefor
    • H01S5/0421Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/34Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34333Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/26Materials of the light emitting region
    • H01L33/30Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table
    • H01L33/32Materials of the light emitting region containing only elements of Group III and Group V of the Periodic Table containing nitrogen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2004Confining in the direction perpendicular to the layer structure
    • H01S5/2009Confining in the direction perpendicular to the layer structure by using electron barrier layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/305Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
    • H01S5/3054Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure p-doping
    • H01S5/3063Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure p-doping using Mg

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Led Devices (AREA)
DE112018004818.7T 2017-08-30 2018-08-10 Optoelektronisches Halbleiterbauelement Pending DE112018004818A5 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102017119931.4A DE102017119931A1 (de) 2017-08-30 2017-08-30 Optoelektronisches Halbleiterbauelement
DE102017119931.4 2017-08-30
PCT/EP2018/071786 WO2019042746A1 (de) 2017-08-30 2018-08-10 Optoelektronisches halbleiterbauelement

Publications (1)

Publication Number Publication Date
DE112018004818A5 true DE112018004818A5 (de) 2020-06-04

Family

ID=63350515

Family Applications (2)

Application Number Title Priority Date Filing Date
DE102017119931.4A Withdrawn DE102017119931A1 (de) 2017-08-30 2017-08-30 Optoelektronisches Halbleiterbauelement
DE112018004818.7T Pending DE112018004818A5 (de) 2017-08-30 2018-08-10 Optoelektronisches Halbleiterbauelement

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE102017119931.4A Withdrawn DE102017119931A1 (de) 2017-08-30 2017-08-30 Optoelektronisches Halbleiterbauelement

Country Status (3)

Country Link
US (1) US11527865B2 (de)
DE (2) DE102017119931A1 (de)
WO (1) WO2019042746A1 (de)

Family Cites Families (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5740192A (en) * 1994-12-19 1998-04-14 Kabushiki Kaisha Toshiba Semiconductor laser
US5679965A (en) * 1995-03-29 1997-10-21 North Carolina State University Integrated heterostructures of Group III-V nitride semiconductor materials including epitaxial ohmic contact, non-nitride buffer layer and methods of fabricating same
JP3688843B2 (ja) * 1996-09-06 2005-08-31 株式会社東芝 窒化物系半導体素子の製造方法
GB2327145A (en) * 1997-07-10 1999-01-13 Sharp Kk Graded layers in an optoelectronic semiconductor device
US6657300B2 (en) * 1998-06-05 2003-12-02 Lumileds Lighting U.S., Llc Formation of ohmic contacts in III-nitride light emitting devices
US6515313B1 (en) * 1999-12-02 2003-02-04 Cree Lighting Company High efficiency light emitters with reduced polarization-induced charges
JP3453558B2 (ja) * 2000-12-25 2003-10-06 松下電器産業株式会社 窒化物半導体素子
JP2002289955A (ja) * 2001-03-23 2002-10-04 Sharp Corp 半導体レーザ素子とその製造方法および光学式情報再生装置
US6744075B2 (en) * 2001-09-17 2004-06-01 Sanyo Electric Co., Ltd. Nitride-based semiconductor light-emitting device and method of forming the same
US6618413B2 (en) * 2001-12-21 2003-09-09 Xerox Corporation Graded semiconductor layers for reducing threshold voltage for a nitride-based laser diode structure
TW561637B (en) * 2002-10-16 2003-11-11 Epistar Corp LED having contact layer with dual dopant state
KR101386192B1 (ko) * 2004-01-26 2014-04-17 오스람 옵토 세미컨덕터스 게엠베하 전류 분산 구조물을 갖는 박막 led
US7737453B2 (en) * 2004-05-29 2010-06-15 Huga Optotech Inc. Light emitting diode structure
US7122839B2 (en) * 2004-10-29 2006-10-17 Philips Lumileds Lighting Company, Llc Semiconductor light emitting devices with graded composition light emitting layers
KR100662191B1 (ko) * 2004-12-23 2006-12-27 엘지이노텍 주식회사 질화물 반도체 발광소자 및 그 제조방법
WO2006112167A1 (ja) * 2005-04-01 2006-10-26 Sharp Kabushiki Kaisha p型窒化物半導体の製造方法及びその方法を用いて作製された半導体装置
JP2007019399A (ja) * 2005-07-11 2007-01-25 Toshiba Corp 半導体レーザ装置
JP2007080996A (ja) * 2005-09-13 2007-03-29 Sony Corp GaN系半導体発光素子及びその製造方法
EP1883141B1 (de) * 2006-07-27 2017-05-24 OSRAM Opto Semiconductors GmbH LD oder LED mit Übergitter-Mantelschicht
DE102006046227A1 (de) * 2006-07-27 2008-01-31 Osram Opto Semiconductors Gmbh Halbleiter-Schichtstruktur mit Übergitter
US7769066B2 (en) * 2006-11-15 2010-08-03 Cree, Inc. Laser diode and method for fabricating same
DE102008052405A1 (de) 2008-10-21 2010-04-22 Osram Opto Semiconductors Gmbh Optoelektronisches Halbleiterbauelement
JP5352248B2 (ja) 2009-01-09 2013-11-27 Dowaエレクトロニクス株式会社 窒化物半導体発光素子およびその製造方法
US8294179B1 (en) * 2009-04-17 2012-10-23 Soraa, Inc. Optical device structure using GaN substrates and growth structures for laser applications
JP4905514B2 (ja) * 2009-07-15 2012-03-28 住友電気工業株式会社 窒化物系半導体発光素子
US8536615B1 (en) * 2009-12-16 2013-09-17 Cree, Inc. Semiconductor device structures with modulated and delta doping and related methods
TWI649895B (zh) * 2010-04-30 2019-02-01 美國波士頓大學信託會 具能帶結構位變動之高效率紫外光發光二極體
KR101201641B1 (ko) * 2011-11-02 2012-11-14 주식회사 퀀텀디바이스 투명 박막, 이를 포함하는 발광 소자와 이들의 제조 방법
JP5988568B2 (ja) * 2011-11-14 2016-09-07 Dowaエレクトロニクス株式会社 半導体発光素子およびその製造方法
JP5874593B2 (ja) * 2011-12-23 2016-03-02 豊田合成株式会社 Iii族窒化物半導体発光素子とその製造方法
US10164150B2 (en) * 2012-03-29 2018-12-25 Seoul Viosys Co., Ltd. Near UV light emitting device
US9362719B2 (en) * 2012-03-30 2016-06-07 The Regents Of The University Of Michigan GaN-based quantum dot visible laser
JP5699983B2 (ja) * 2012-04-27 2015-04-15 住友電気工業株式会社 窒化ガリウム系半導体を作製する方法、iii族窒化物半導体デバイスを作製する方法、及びiii族窒化物半導体デバイス
CN103050595A (zh) * 2012-12-28 2013-04-17 厦门市三安光电科技有限公司 氮化物发光二极管
KR102140274B1 (ko) * 2014-02-19 2020-07-31 엘지이노텍 주식회사 발광소자
TW201545372A (zh) * 2014-05-30 2015-12-01 Mitsubishi Chem Corp 磊晶晶圓、半導體發光元件、發光裝置及磊晶晶圓之製造方法
CN104064644B (zh) * 2014-06-30 2016-08-31 湘能华磊光电股份有限公司 Led的量子阱结构、其制作方法及包括其的led外延片
DE102015113670A1 (de) * 2014-08-19 2016-02-25 Seoul Viosys Co., Ltd Leuchtvorrichtung und Verfahren zu deren Herstellung
KR102264671B1 (ko) 2014-09-30 2021-06-15 서울바이오시스 주식회사 자외선 발광소자
CN104409587B (zh) * 2014-10-22 2016-12-28 太原理工大学 一种InGaN基蓝绿光发光二极管外延结构及生长方法
CN105185885A (zh) * 2015-06-24 2015-12-23 聚灿光电科技股份有限公司 Led芯片及其制备方法
CN105023978A (zh) * 2015-07-20 2015-11-04 聚灿光电科技股份有限公司 低吸收led外延结构及其制备方法
CN105161586A (zh) * 2015-09-29 2015-12-16 山东浪潮华光光电子股份有限公司 具有组合势垒多量子阱的led外延结构及其制备方法
CN105470357B (zh) * 2015-12-31 2018-05-22 华灿光电(苏州)有限公司 AlN模板、AlN模板的制备方法及AlN模板上的半导体器件
CN105720150A (zh) * 2016-01-11 2016-06-29 中山大学 一种氧化锌基透明电极结构GaN基LED芯片及其制作方法
CN106784184A (zh) * 2016-12-21 2017-05-31 湘能华磊光电股份有限公司 复合P型GaN层的LED外延结构及其制备方法
US10276746B1 (en) * 2017-10-18 2019-04-30 Bolb Inc. Polarization electric field assisted hole supplier and p-type contact structure, light emitting device and photodetector using the same
US20230006426A1 (en) * 2020-02-28 2023-01-05 The Regents Of The University Of California Group iii-n light emitter electrically injected by hot carriers from auger recombination

Also Published As

Publication number Publication date
US11527865B2 (en) 2022-12-13
DE102017119931A1 (de) 2019-02-28
WO2019042746A1 (de) 2019-03-07
US20200220325A1 (en) 2020-07-09

Similar Documents

Publication Publication Date Title
DE112016001960A5 (de) Strahlungsemittierendes optoelektronisches Bauelement
DE112017003576A5 (de) Halbleiterlaserdiode
DE112018000940A5 (de) Strahlungsemittierendes optoelektronisches bauelement
DE112017007068T8 (de) Halbleitervorrichtung
DE112015000703A5 (de) Optoelektronisches Halbleiterbauelement
DE112015004474A5 (de) Optoelektronisches Bauelement
DE102018212047A8 (de) Halbleitermodul
DE112019001354A5 (de) Optoelektronischer halbleiterchip
DE112015002796A5 (de) Optoelektronischer Halbleiterchip
DE112018000553A5 (de) Optoelektronischer Halbleiterchip
DE112015005885A5 (de) Optoelektronisches Bauelement
DE112015002763A5 (de) Optoelektronisches Halbleiterbauteil
DE112017006349A5 (de) Optoelektronisches bauelement
DE112017006351A5 (de) Optoelektronisches bauelement
DE112016000316A5 (de) Optoelektronisches Bauelement
DE112017004053A5 (de) Optoelektronischer Halbleiterchip
DE112017002987A5 (de) Optoelektronisches halbleiterbauelement
IT201700108243A1 (it) Confezione
DE102017110821A8 (de) Halbleitervorrichtung
DE112016005129A5 (de) Halbleiterlaserdiode
DE112016001422A8 (de) Optoelektronischer Halbleiterchip
DE112018002080A5 (de) Halbleiterlaser
DE112015004123A5 (de) Optoelektronisches Bauteil
DE112015002642A5 (de) Optoelektronisches Bauelement
DE112020001972A5 (de) Optoelektronisches Halbleiterbauelement

Legal Events

Date Code Title Description
R012 Request for examination validly filed
R016 Response to examination communication