DE112015006775B4 - Elektroneninterferenzvorrichtung und Elektroneninterferenzverfahren - Google Patents

Elektroneninterferenzvorrichtung und Elektroneninterferenzverfahren Download PDF

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Publication number
DE112015006775B4
DE112015006775B4 DE112015006775.2T DE112015006775T DE112015006775B4 DE 112015006775 B4 DE112015006775 B4 DE 112015006775B4 DE 112015006775 T DE112015006775 T DE 112015006775T DE 112015006775 B4 DE112015006775 B4 DE 112015006775B4
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Germany
Prior art keywords
electron
hologram
sample
electron beam
image
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Expired - Fee Related
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DE112015006775.2T
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German (de)
English (en)
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DE112015006775T5 (de
Inventor
Ken Harada
Yusuke Asari
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Hitachi Ltd
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Hitachi Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/295—Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/266—Measurement of magnetic- or electric fields in the object; Lorentzmicroscopy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24564—Measurements of electric or magnetic variables, e.g. voltage, current, frequency
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2614—Holography or phase contrast, phase related imaging in general, e.g. phase plates

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Holo Graphy (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE112015006775.2T 2015-08-05 2015-08-05 Elektroneninterferenzvorrichtung und Elektroneninterferenzverfahren Expired - Fee Related DE112015006775B4 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2015/072161 WO2017022093A1 (ja) 2015-08-05 2015-08-05 電子線干渉装置および電子線干渉方法

Publications (2)

Publication Number Publication Date
DE112015006775T5 DE112015006775T5 (de) 2018-05-24
DE112015006775B4 true DE112015006775B4 (de) 2022-03-31

Family

ID=57942664

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112015006775.2T Expired - Fee Related DE112015006775B4 (de) 2015-08-05 2015-08-05 Elektroneninterferenzvorrichtung und Elektroneninterferenzverfahren

Country Status (3)

Country Link
JP (1) JP6487556B2 (ja)
DE (1) DE112015006775B4 (ja)
WO (1) WO2017022093A1 (ja)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130163076A1 (en) 2010-05-28 2013-06-27 Isao Nagaoki Transmission interference microscope
WO2013114464A1 (ja) 2012-02-03 2013-08-08 株式会社日立製作所 電子線干渉装置および電子線干渉法
US20130284925A1 (en) 2012-04-26 2013-10-31 Hitachi, Ltd. Electron beam device
JP2013246911A (ja) 2012-05-24 2013-12-09 Institute Of Physical & Chemical Research 干渉電子顕微鏡

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5405937B2 (ja) * 2009-08-07 2014-02-05 株式会社日立製作所 透過型電子顕微鏡およびそれを用いた試料像の観察方法
JP5736461B2 (ja) * 2011-09-30 2015-06-17 株式会社日立製作所 電子顕微鏡および試料観察方法
JP5970648B2 (ja) * 2012-04-26 2016-08-17 国立研究開発法人物質・材料研究機構 透過型電子顕微鏡及び電子線干渉法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130163076A1 (en) 2010-05-28 2013-06-27 Isao Nagaoki Transmission interference microscope
WO2013114464A1 (ja) 2012-02-03 2013-08-08 株式会社日立製作所 電子線干渉装置および電子線干渉法
US20130284925A1 (en) 2012-04-26 2013-10-31 Hitachi, Ltd. Electron beam device
JP2013229190A (ja) 2012-04-26 2013-11-07 Institute Of Physical & Chemical Research 電子線装置
JP2013246911A (ja) 2012-05-24 2013-12-09 Institute Of Physical & Chemical Research 干渉電子顕微鏡

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
H. Lichte et al., Electron holography—basics and applications, Reports on Progress in Physics 71 (2007), S. 016102
K. Harada et al., Double-biprism electron interferometry, Applied Physics Letters 84 (2004), S. 3229 - 3231

Also Published As

Publication number Publication date
JPWO2017022093A1 (ja) 2018-05-10
WO2017022093A1 (ja) 2017-02-09
JP6487556B2 (ja) 2019-03-20
DE112015006775T5 (de) 2018-05-24

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