DE10343148A1 - Verfahren und Vorrichtung zur Inspektion eines Wafers - Google Patents

Verfahren und Vorrichtung zur Inspektion eines Wafers Download PDF

Info

Publication number
DE10343148A1
DE10343148A1 DE10343148A DE10343148A DE10343148A1 DE 10343148 A1 DE10343148 A1 DE 10343148A1 DE 10343148 A DE10343148 A DE 10343148A DE 10343148 A DE10343148 A DE 10343148A DE 10343148 A1 DE10343148 A1 DE 10343148A1
Authority
DE
Germany
Prior art keywords
image
dollar
wafer
size
inspecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE10343148A
Other languages
German (de)
English (en)
Inventor
Albert Kreh
Henning Backhauss
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Tencor MIE GmbH
Original Assignee
Leica Microsystems CMS GmbH
Vistec Semiconductor Systems GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leica Microsystems CMS GmbH, Vistec Semiconductor Systems GmbH filed Critical Leica Microsystems CMS GmbH
Priority to DE10343148A priority Critical patent/DE10343148A1/de
Priority to PCT/EP2004/051946 priority patent/WO2005029052A1/de
Priority to JP2006526625A priority patent/JP2007506081A/ja
Priority to US10/571,207 priority patent/US20070064224A1/en
Priority to CNA2004800239479A priority patent/CN1839308A/zh
Publication of DE10343148A1 publication Critical patent/DE10343148A1/de
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Multimedia (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
DE10343148A 2003-09-18 2003-09-18 Verfahren und Vorrichtung zur Inspektion eines Wafers Ceased DE10343148A1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE10343148A DE10343148A1 (de) 2003-09-18 2003-09-18 Verfahren und Vorrichtung zur Inspektion eines Wafers
PCT/EP2004/051946 WO2005029052A1 (de) 2003-09-18 2004-08-27 Verfahren und vorrichtung zur inspektion eines wafers
JP2006526625A JP2007506081A (ja) 2003-09-18 2004-08-27 ウェハの検査方法及び装置
US10/571,207 US20070064224A1 (en) 2003-09-18 2004-08-27 Method and device for inspecting a wafer
CNA2004800239479A CN1839308A (zh) 2003-09-18 2004-08-27 晶圆检测用的方法和装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10343148A DE10343148A1 (de) 2003-09-18 2003-09-18 Verfahren und Vorrichtung zur Inspektion eines Wafers

Publications (1)

Publication Number Publication Date
DE10343148A1 true DE10343148A1 (de) 2005-04-21

Family

ID=34352925

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10343148A Ceased DE10343148A1 (de) 2003-09-18 2003-09-18 Verfahren und Vorrichtung zur Inspektion eines Wafers

Country Status (5)

Country Link
US (1) US20070064224A1 (https=)
JP (1) JP2007506081A (https=)
CN (1) CN1839308A (https=)
DE (1) DE10343148A1 (https=)
WO (1) WO2005029052A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007060355A1 (de) 2007-12-12 2009-06-25 Vistec Semiconductor Systems Gmbh Verfahren und Vorrichtung zur Verarbeitung der von mindestens einer Kamera aufgenommenen Bilddaten der Oberfläche eines Wafers
DE102011051355A1 (de) * 2011-06-27 2012-12-27 Hseb Dresden Gmbh Inspektionsvorrichtung

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005017642B4 (de) * 2005-04-15 2010-04-08 Vistec Semiconductor Systems Jena Gmbh Verfahren zur Inspektion eines Wafers
JP5099848B2 (ja) * 2006-08-10 2012-12-19 芝浦メカトロニクス株式会社 円盤状基板の検査装置及び検査方法
US8401272B2 (en) * 2007-08-02 2013-03-19 Asti Holdings Limited Patterned wafer defect inspection system and method
SG164292A1 (en) 2009-01-13 2010-09-29 Semiconductor Technologies & Instruments Pte System and method for inspecting a wafer
CN101964316B (zh) * 2009-07-24 2012-05-23 中芯国际集成电路制造(上海)有限公司 晶圆测试方法
CN102759334A (zh) * 2011-04-25 2012-10-31 范玉兰 一种测量晶体管尺寸的装置
US9546862B2 (en) * 2012-10-19 2017-01-17 Kla-Tencor Corporation Systems, methods and metrics for wafer high order shape characterization and wafer classification using wafer dimensional geometry tool
CN102980897A (zh) * 2012-12-10 2013-03-20 深圳市华星光电技术有限公司 检测方法及检测装置
US9164043B2 (en) 2012-12-10 2015-10-20 Shenzhen China Star Optoelectronics Technology Co., Ltd. Detecting method and detecting device
WO2017171651A1 (en) * 2016-03-30 2017-10-05 Agency For Science, Technology And Research System and method for imaging a surface defect on an object
KR102371894B1 (ko) * 2016-10-13 2022-03-10 라이프 테크놀로지스 홀딩스 프리베이트 리미티드 시야 최적화를 위한 시스템, 방법 및 장치
US11600504B2 (en) * 2020-06-29 2023-03-07 Taiwan Semiconductor Manufacturing Company, Ltd. Detecting damaged semiconductor wafers utilizing a semiconductor wafer sorter tool of an automated materials handling system
JP7431694B2 (ja) * 2020-07-28 2024-02-15 キヤノン株式会社 情報処理装置、膜形成装置、物品の製造方法、およびプログラム
US12462375B2 (en) * 2022-08-05 2025-11-04 Tokyo Electron Limited Methods to automatically adjust one or more parameters of a camera system for optimal 3D reconstruction of features formed within/on a semiconductor substrate

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6273716A (ja) * 1985-09-27 1987-04-04 Fujitsu Ltd 検査装置
WO1991018313A1 (en) * 1990-05-21 1991-11-28 Interactive Video Systems, Inc. Projected image focus system and method of use
US5529623A (en) * 1994-09-28 1996-06-25 Ciba-Geigy Corporation Pigmentary solid solutions of pyrrolo[3,4-c]pyrroles and quinacridones
JP3744966B2 (ja) * 1994-10-07 2006-02-15 株式会社ルネサステクノロジ 半導体基板の製造方法
US5774222A (en) * 1994-10-07 1998-06-30 Hitachi, Ltd. Manufacturing method of semiconductor substrative and method and apparatus for inspecting defects of patterns on an object to be inspected
JP3683298B2 (ja) * 1995-02-02 2005-08-17 オリンパス株式会社 欠陥検出用顕微鏡装置
US6895109B1 (en) * 1997-09-04 2005-05-17 Texas Instruments Incorporated Apparatus and method for automatically detecting defects on silicon dies on silicon wafers
JP2001144148A (ja) * 2001-05-12 2001-05-25 Advantest Corp 半導体試験装置のウエハマップ表示装置
JP2003098112A (ja) * 2001-09-25 2003-04-03 Hitachi Ltd 薄膜デバイスの表面画像の検出・出力方法及びその装置並びにそれを用いた薄膜デバイスの製造方法及びその製造装置
US7558419B1 (en) * 2003-08-14 2009-07-07 Brion Technologies, Inc. System and method for detecting integrated circuit pattern defects

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007060355A1 (de) 2007-12-12 2009-06-25 Vistec Semiconductor Systems Gmbh Verfahren und Vorrichtung zur Verarbeitung der von mindestens einer Kamera aufgenommenen Bilddaten der Oberfläche eines Wafers
US8264534B2 (en) 2007-12-12 2012-09-11 Vistec Semiconductor Systems Gmbh Method and apparatus for processing the image data of the surface of a wafer recorded by at least one camera
DE102011051355A1 (de) * 2011-06-27 2012-12-27 Hseb Dresden Gmbh Inspektionsvorrichtung

Also Published As

Publication number Publication date
JP2007506081A (ja) 2007-03-15
US20070064224A1 (en) 2007-03-22
WO2005029052A1 (de) 2005-03-31
CN1839308A (zh) 2006-09-27

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Legal Events

Date Code Title Description
8127 New person/name/address of the applicant

Owner name: VISTEC SEMICONDUCTOR SYSTEMS GMBH, 35781 WEILB, DE

8110 Request for examination paragraph 44
8131 Rejection