DE10293197D2 - Verzögerungselement aus kubischem Kristall und optische Systeme damit - Google Patents

Verzögerungselement aus kubischem Kristall und optische Systeme damit

Info

Publication number
DE10293197D2
DE10293197D2 DE10293197T DE10293197T DE10293197D2 DE 10293197 D2 DE10293197 D2 DE 10293197D2 DE 10293197 T DE10293197 T DE 10293197T DE 10293197 T DE10293197 T DE 10293197T DE 10293197 D2 DE10293197 D2 DE 10293197D2
Authority
DE
Germany
Prior art keywords
delay element
optical systems
cubic crystal
crystal delay
cubic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE10293197T
Other languages
English (en)
Inventor
Juergen Hartmaier
Damian Fiolka
Markus Zenzinger
Birgit Mecking
Olaf Dittmann
Toralf Gruner
Vladimir Kamenov
Martin Brunotte
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE10293197T priority Critical patent/DE10293197D2/de
Application granted granted Critical
Publication of DE10293197D2 publication Critical patent/DE10293197D2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G02B5/3091—Birefringent or phase retarding elements for use in the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE10293197T 2001-07-18 2002-06-25 Verzögerungselement aus kubischem Kristall und optische Systeme damit Expired - Fee Related DE10293197D2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE10293197T DE10293197D2 (de) 2001-07-18 2002-06-25 Verzögerungselement aus kubischem Kristall und optische Systeme damit

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2001133842 DE10133842A1 (de) 2001-07-18 2001-07-18 Verzögerungsplatte aus kubischem Kristall
DE10293197T DE10293197D2 (de) 2001-07-18 2002-06-25 Verzögerungselement aus kubischem Kristall und optische Systeme damit
PCT/DE2002/002392 WO2003009021A1 (de) 2001-07-18 2002-06-25 Verzögerungselement aus kubischem kristall und optische systeme damit

Publications (1)

Publication Number Publication Date
DE10293197D2 true DE10293197D2 (de) 2004-05-27

Family

ID=7691493

Family Applications (2)

Application Number Title Priority Date Filing Date
DE2001133842 Withdrawn DE10133842A1 (de) 2001-07-18 2001-07-18 Verzögerungsplatte aus kubischem Kristall
DE10293197T Expired - Fee Related DE10293197D2 (de) 2001-07-18 2002-06-25 Verzögerungselement aus kubischem Kristall und optische Systeme damit

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE2001133842 Withdrawn DE10133842A1 (de) 2001-07-18 2001-07-18 Verzögerungsplatte aus kubischem Kristall

Country Status (5)

Country Link
EP (1) EP1407299A1 (de)
JP (1) JP2005509184A (de)
CN (1) CN1555502A (de)
DE (2) DE10133842A1 (de)
WO (1) WO2003009021A1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100877022B1 (ko) 2000-10-10 2009-01-07 가부시키가이샤 니콘 결상성능의 평가방법
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US6831731B2 (en) 2001-06-28 2004-12-14 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system
US6788389B2 (en) 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system
US6775063B2 (en) 2001-07-10 2004-08-10 Nikon Corporation Optical system and exposure apparatus having the optical system
US6844915B2 (en) 2001-08-01 2005-01-18 Nikon Corporation Optical system and exposure apparatus provided with the optical system
US6995908B2 (en) 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
US6970232B2 (en) 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US7453641B2 (en) 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6844972B2 (en) 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
JP4333078B2 (ja) * 2002-04-26 2009-09-16 株式会社ニコン 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法
JP2004045692A (ja) * 2002-07-11 2004-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法
US7072102B2 (en) 2002-08-22 2006-07-04 Asml Netherlands B.V. Methods for reducing polarization aberration in optical systems
DE10344010A1 (de) * 2003-09-15 2005-04-07 Carl Zeiss Smt Ag Wabenkondensor und Beleuchtungssystem damit
DE102007043958B4 (de) 2007-09-14 2011-08-25 Carl Zeiss SMT GmbH, 73447 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
DE102007055567A1 (de) 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optisches System

Also Published As

Publication number Publication date
EP1407299A1 (de) 2004-04-14
CN1555502A (zh) 2004-12-15
DE10133842A1 (de) 2003-02-06
JP2005509184A (ja) 2005-04-07
WO2003009021A1 (de) 2003-01-30

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee