DE10206364A1 - Lichtempfindliche Zusammensetzung und lichtempfindliche Lithografiedruckplatte - Google Patents

Lichtempfindliche Zusammensetzung und lichtempfindliche Lithografiedruckplatte

Info

Publication number
DE10206364A1
DE10206364A1 DE10206364A DE10206364A DE10206364A1 DE 10206364 A1 DE10206364 A1 DE 10206364A1 DE 10206364 A DE10206364 A DE 10206364A DE 10206364 A DE10206364 A DE 10206364A DE 10206364 A1 DE10206364 A1 DE 10206364A1
Authority
DE
Germany
Prior art keywords
group
compound
photosensitive composition
composition according
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE10206364A
Other languages
German (de)
English (en)
Inventor
Akira Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Paper Mills Ltd
Original Assignee
Mitsubishi Paper Mills Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Paper Mills Ltd filed Critical Mitsubishi Paper Mills Ltd
Publication of DE10206364A1 publication Critical patent/DE10206364A1/de
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
DE10206364A 2001-02-16 2002-02-15 Lichtempfindliche Zusammensetzung und lichtempfindliche Lithografiedruckplatte Ceased DE10206364A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001040740A JP4152597B2 (ja) 2001-02-16 2001-02-16 感光性組成物

Publications (1)

Publication Number Publication Date
DE10206364A1 true DE10206364A1 (de) 2002-09-26

Family

ID=18903289

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10206364A Ceased DE10206364A1 (de) 2001-02-16 2002-02-15 Lichtempfindliche Zusammensetzung und lichtempfindliche Lithografiedruckplatte

Country Status (3)

Country Link
US (1) US6746820B2 (https=)
JP (1) JP4152597B2 (https=)
DE (1) DE10206364A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1520695A3 (en) * 2003-10-01 2005-12-14 Fuji Photo Film Co., Ltd. Photosensitive composition and image recording material using the same
EP2023203A1 (en) * 2007-07-26 2009-02-11 FUJIFILM Corporation Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI242103B (en) * 2001-08-23 2005-10-21 Nippon Kayaku Kk Negative type colored photosensitive composition
KR101001936B1 (ko) * 2002-06-07 2010-12-17 후지필름 가부시키가이샤 염료 함유 경화성 조성물, 컬러필터 및 그 제조방법
KR20050047088A (ko) * 2002-08-07 2005-05-19 미쓰비시 가가꾸 가부시키가이샤 청자색 레이저 감광성 레지스트재층을 갖는 화상 형성재및 그 레지스트 화상 형성 방법
DE10338406A1 (de) * 2003-08-18 2005-03-24 Novaled Gmbh Dotierte organische Halbleitermaterialien sowie Verfahren zu deren Herstellung
JP2005195860A (ja) * 2004-01-07 2005-07-21 Konica Minolta Medical & Graphic Inc 感光性組成物、感光性平版印刷版及び平版印刷版の作製方法
JP2005221715A (ja) * 2004-02-05 2005-08-18 Konica Minolta Medical & Graphic Inc 平版印刷版原版および平版印刷版の製版方法
JPWO2005116766A1 (ja) * 2004-05-25 2008-04-03 コダックグラフィックコミュニケーションズ株式会社 ネガ型感光性組成物およびネガ型感光性平版印刷版
US20060001849A1 (en) * 2004-07-01 2006-01-05 Ray Kevin B Imaging a violet sensitive printing plate using multiple low power light sources
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
US20060063110A1 (en) * 2004-09-20 2006-03-23 Mitsubishi Paper Mills Limited Process for preparing light-sensitive lithographic printing plate and method for processing the same
WO2007040794A1 (en) * 2005-09-21 2007-04-12 Dow Corning Corporation Ambient lithographic method using organoborane amine complexes
KR101306153B1 (ko) * 2006-08-25 2013-09-10 주식회사 동진쎄미켐 감광성 수지 조성물
JP5117790B2 (ja) * 2007-07-11 2013-01-16 株式会社シンク・ラボラトリー ネガ型感光性組成物
FR2948216B1 (fr) 2009-07-17 2011-11-25 Arjowiggins Security Element de securite a effet de parallaxe
FR2948217B1 (fr) * 2009-07-17 2011-11-11 Arjowiggins Security Element de securite a effet de parallaxe

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS532403A (en) * 1976-06-30 1978-01-11 Tokyo Kasei Kougiyou Kk Process for entrapping protonic acids
JP3431782B2 (ja) * 1996-03-08 2003-07-28 昭和高分子株式会社 硬化性複合材料組成物及びその硬化方法
TW452575B (en) * 1996-12-06 2001-09-01 Ciba Sc Holding Ag New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1520695A3 (en) * 2003-10-01 2005-12-14 Fuji Photo Film Co., Ltd. Photosensitive composition and image recording material using the same
US7244547B2 (en) 2003-10-01 2007-07-17 Fujifilm Corporation Photosensitive composition and image recording material using the same
EP2023203A1 (en) * 2007-07-26 2009-02-11 FUJIFILM Corporation Photosensitive composition, photosensitive resin transfer film, and method for producing a photospacer, and substrate for a liquid crystal display device and liquid display device

Also Published As

Publication number Publication date
JP4152597B2 (ja) 2008-09-17
US20020182537A1 (en) 2002-12-05
JP2002244288A (ja) 2002-08-30
US6746820B2 (en) 2004-06-08

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8125 Change of the main classification

Ipc: G03F 7/038 AFI20051017BHDE

R002 Refusal decision in examination/registration proceedings
R003 Refusal decision now final
R003 Refusal decision now final

Effective date: 20140805