DE102015224742A1 - Plant and method for operating a plant - Google Patents

Abstract

A system (100) is proposed which has a radiation source (106A) for generating radiation, a plurality of optical components (110, 112, 114, 116, 118) for guiding the radiation in the installation (100), a number N1 of arrangements (210-260), with N1 ≥ 1, wherein each of the N1 devices (210-260) comprises at least one actuator / sensor device (311-31N; 321-32N, 331-33N; 341-34N; 351- 35N, 361-36N) associated with one of the optical components (110, 112, 114, 116, 118) comprises a plurality N2 of local drive units (410, 420, 430, 440, 450, 460) for driving the number N1 of arrangements (210-260), with N2 ≥ 2, and a number N3 of central drive units (510, 520) for driving the N2 local drive units (410, 420, 430, 440, 450, 460), with N3 ≥ 1 , having. As a result, heat spots are avoided, the heat distribution is harmonized and optimized. Furthermore, redundant control options for the actuator / sensor devices are created, which increase the availability of the system in the event of a fault.

Description

The present invention relates to a system, for example a lithography system or a multiple mirror system, and a method for operating a system. The system or lithography system comprises a radiation source for generating radiation, a plurality of optical components for guiding the radiation in the system, a plurality of actuator / sensor devices for the optical components and a drive device for controlling the actuator / sensor devices ,

Microlithography is used to fabricate microstructured devices such as integrated circuits. The microlithography process is performed with a lithography system having an illumination system and a projection system. The image of a mask (reticle) illuminated by means of the illumination system is projected by the projection system onto a substrate (eg a silicon wafer) coated with a photosensitive layer (photoresist) and arranged in the image plane of the projection system in order to apply the mask structure to the photosensitive layer Transfer coating of the substrate.

Driven by the quest for ever smaller structures in the manufacture of integrated circuits, EUV lithography systems are currently being developed which use light with a wavelength in the range of 0.1 nm to 30 nm, in particular 4 nm to 6 nm. In such EUV lithography equipment, because of the high absorption of most materials of light of this wavelength, reflective optics, that is, mirrors, must be used instead of - as before - refractive optics, that is, lenses. For the same reason, beamforming and beam projection should be performed in a vacuum.

The mirrors can z. B. on a support frame (English: force frame) and at least partially manipulated or tilted designed to allow movement of a respective mirror in up to six degrees of freedom and thus a highly accurate positioning of the mirror to each other, especially in the pm range , Thus, occurring during operation of the lithographic system changes in the optical properties, eg. B. as a result of thermal influences to be corrected.

For moving the mirrors, in particular in the six degrees of freedom, these actuators are assigned, which are controlled via a control loop. As part of the control loop, a device for monitoring the tilt angle of a respective mirror is provided.

For example, from the WO 2009/100856 A1 a facet mirror is known for a projection exposure apparatus of a lithography system, which has a plurality of individually displaceable individual mirrors. In order to ensure the optical quality of a projection exposure apparatus, a very precise positioning of the movable individual mirrors is necessary.

To position the displaceable individual mirror actuator devices for moving the individual mirrors and sensor devices are used to determine the positions of the individual mirror.

For controlling the actuator devices and the sensor devices, a drive device arranged in the vacuum housing of the lithography system is used.

This drive device is set up to control the multiplicity of actuator devices and sensor devices in the vacuum housing of the lithography system.

However, such a central control device in the vacuum housing of the lithography system is a large heat source, which in turn leads to high local cooling requirements and the energy consumption associated with the cooling. It should be noted that, for example, EUV lithography systems require a high positional stability of the mirrors. Any kind of vibration is therefore critical, for example caused by the flow of a coolant, for example water, for cooling the central control device. Furthermore, an active compensation of such vibrations requires a large control bandwidth, which in turn requires large computing capacities of the central control device. Such necessary large computing capacities, in turn, require an increased expenditure of energy and thus an increased amount of cooling.

Another disadvantage of the central control unit is that a failure of this one central control device causes an immediate failure of the system. Due to the necessary arrangement of the central control device in the vacuum housing of the lithography system and the repair time is very high in such a single error.

Against this background, an object of the present invention is to provide an improved system, for example an improved lithography system.

Accordingly, a system is proposed which comprises a radiation source for generating radiation, a plurality of optical components for guiding the radiation in the system, a number N1 of arrangements, with N1 ≥ 1, each of the N1 arrangements comprising at least one actuator / sensor unit. Means associated with one of the optical components, a plurality N2 of local drive units for driving the number N1 of arrangements, with N2 ≥ 2, and a number N3 of central drive units for driving the N2 local drive units, with N3 ≥ 1, comprises ,

The system is in particular a multi-mirror system or a multi-mirror array (MMA) or a lithography system.

The distributed control of the actuator / sensor devices by means of the local control units and the central control units, it is possible to distribute the heat generated by the control. As a result, heat spots, for example, in the vacuum housing of the lithography system, avoided and the heat distribution is harmonized and optimized.

Furthermore, the N2 local drive units and N3 central drive units provide redundant drive options for the actuator / sensor devices of the N1 arrangements. If a single fault then occurs in one of the control units, then the redundant control can be used so that a failure of the system is avoided and / or the service life of the system in the defective state is shortened.

The arrangement with a number of actuator / sensor devices may also be referred to as a group of actuator / sensor devices.

The optical component may be, for example, a mirror, in particular a micromirror, i. a mirror with a side of less than 1 mm, or a lens. The optical component is in particular displaceable. The mirror or micromirror may in particular be part of a multi-mirror array (MMA). The MMA can comprise more than 100, in particular more than 1,000, in particular more than 10,000, particularly preferably more than 100,000, of such levels. In particular, these may be mirrors for reflection of EUV radiation.

The optical component may in particular be part of a facet mirror, in particular a field facet mirror, a beam shaping and illumination system of the lithography system. In this case, the optical component is arranged in particular in an evacuable chamber or a vacuum housing. During operation of the lithography system, this evacuatable chamber can be evacuated to a pressure of less than 50 Pa, in particular less than 20 Pa, in particular less than 10 Pa, in particular less than 5 Pa. In particular, this pressure indicates the partial pressure of hydrogen in the evacuatable chamber.

The radiation source is in particular an EUV radiation source with an emitted useful radiation in the range between 0.1 nm and 30 nm, preferably between 4 and 6 nm. It can be a plasma source, for example a GDPP source (plasma generation by gas discharge, gas Discharge Produced Plasma) or an LPP source (plasma generation by laser, laser-produced plasma) act. Other EUV radiation sources, for example based on a synchronous tone or on a free electron laser (FEL), are also possible.

The radiation generated by the radiation source can comprise high-energy photons. In particular, high-energy photons from the radiation source, in particular EUV photons, can lead to the generation of a plasma, in particular a hydrogen plasma. Alternatively, argon (Ar) or helium (He) can be used as purge gas. In this case, for example, oxygen (O) and nitrogen (N) can be used as admixtures.

The respective unit, for example the local control unit or the central control unit, can be implemented in terms of hardware. In a hardware implementation, the respective unit can be designed as a device or as part of a device, for example as a computer or as a microprocessor or as a control computer or as an embedded system.

According to one embodiment, each of the N2 local drive units is coupled to each of the N3 central drive units such that each of the N2 local drive units is controllable by each of the N3 central drive units.

This results in redundant control options of the N2 local control units by each of the N3 central control units, in particular with N3 ≥ 2.

According to a further embodiment, each of the N2 local drive units is connected to at least two of the N1 arrangements, with 2 ≦ N2 <N1.

The connection or coupling of each of the N2 local drive units to at least two of the N1 devices results in redundant ones Control options for the N1 arrangements or their actuator / sensor devices.

According to another embodiment, each of the N2 local drive units, with N1 ≥ 2, is connected by means of a respective connection to each actuator / sensor device of a particular one of the N1 devices.

Each local drive unit is connected by a link to each actuator / sensor device of one of the devices or groups. This results in redundant control options. Furthermore, this gives an unambiguous assignment of local control unit to the actuator / sensor devices of a particular group or arrangement. The respective connection may be a data connection and / or a power supply connection.

According to a further embodiment, each of the N1 devices is connected by means of a primary connection to one of the N2 local drive units and by means of a secondary connection to a further one of the N2 local drive units or to one of the N3 central drive units, with N1 ≥ 1.

Each arrangement is connected by means of a primary connection to a local control unit and by means of a secondary connection to a further local control unit or to one of the central control units. As a result, redundant connections between the arrangements and the local control units or central control units are created.

Embodiments are possible in which, in a faultless case, only the primary connections are used and the secondary connections are shared only in the faulty case. However, as detailed below, embodiments are possible in which both the primary connections and the secondary connections are used in a faultless case, for example for error masking.

According to a further embodiment, the actuator / sensor device as an actuator means for moving the optical component, as a sensor device for determining a position of the optical component or as an actuator and sensor device for displacing the optical component and designed to determine a position of the optical component.

According to a further embodiment, the arrangement is a multi-mirror arrangement which comprises a plurality N4 of mirrors, wherein at least one actuator / sensor device is associated with each of the N4 mirrors (with N4 ≥ 2).

According to another embodiment, the central drive unit (with N3 = 1), the N2 local drive units and the N1 arrangements are connected in a tree structure.

In particular, the tree structure is based on a rooted tree in which the central drive unit forms the root, the local drive units the inner nodes, and the arrays or the actuator / sensor devices form the leaves.

Advantageously, the tree structure provides a direct connection and thus low latency times between the central drive units and the local drive units and between the local drive units and the arrangements with their actuator / sensor devices.

According to a further embodiment, the N3 central drive units and the N2 local drive units are connected in a ring structure.

The ring structure may also be referred to as a ring or a logical ring. The ring structure has particular advantages in terms of the complexity of the wiring in the connected units, here the N3 central control units and the N2 local control units.

In accordance with a further embodiment, the N2 local drive units are set up to jointly represent a functionality for the N1 arrangements within the system.

The functionality mapped in common by the N2 local drive units is designed, for example, as data processing of the data to and from the N2 devices. The functionality can also be designed as a voltage supply of the N1 arrangements.

In particular, the drive units, in particular the N2 local drive units, synchronize with one another. For example, a global clock or a hierarchical clock is used for clock distribution. Synchronization via synchronization messages is also possible.

According to another embodiment, the N1 devices, the N2 local drivers and the N3 central drivers are located in a vacuum housing of the plant. In this case, an external interface device for data exchange and / or power supply through the vacuum housing with a respective internal interface of the N3 central control units coupled so that the N2 local drive units are visible to the external interface device independent of the number N2 as a single drive unit.

Because the local control units are externally visible, that is to say in particular to the external interface device, as a single control unit, the external control of the local control units is significantly simplified. For example, more local control units can thereby be added in a simple manner. But it can also be removed control units. The external controllability via the external interface device in both cases advantageously does not change due to the visibility as a single drive unit.

According to a further embodiment, the N2 local drive units comprise a first subset of active local drive units and a second subset of inactive local drive units, which can be switched to an active state in the event of an error. In this case, the N3 central control units preferably comprise a first subset of active central control units and a second subset of inactive central control units, which can be switched to an active state in the event of an error.

This results in clear assignments for the control of the arrangements in a faultless case and in a faulty case. In particular, the first subsets and the second subsets are configurable, for example via the external interface device. For example, this can be used to set the number of active local drive units in the first subset. It is also possible to set the assignment of the local drive units to the first subset via the external interface device. The same applies to the configurability of the second subset.

According to a further embodiment, at least a subset of the N2 local drive units comprises both active resources and redundant, in a faultless case inactive, resources which can be switched to an active state in the event of an error. In this case, at least a subset of the N3 central control units comprises both active resources and redundant, in a faultless case inactive resources which can be switched to an active state in the event of an error.

The resources here are in particular computing resources, storage resources and / or energy provisioning resources, such as power resources meant.

According to a further embodiment, at least a subset of the N2 local drive units can be reconfigured in the event of an error.

According to a further embodiment, at least a subset of the N3 central drive units can be reconfigured in the event of an error.

In the present case, reconfigurability means in particular that an existing software version of the local control unit is newly parameterized. This includes, for example, changing certain parameters of the software of the local drive unit. In particular, the external interface device can be used for this change or reconfiguration, via which the user of the system can perform the reconfiguration.

The reconfiguration can in particular be automatic, for example in the case of automatic error detection. Alternatively, error detection may be automatic and reconfiguration is accomplished by user input. As a further alternative, the error detection may be done by a user interaction and then the downstream reconfiguration may be done by another user interaction.

According to a further embodiment, at least a subset of the N2 local drive units can be reprogrammed in the event of an error.

According to a further embodiment, at least a subset of the N3 central control units can be reprogrammed in the event of an error.

Reprogrammability here means that the software version of the drive unit is replaced or changed in parts. Consequently, an existing software of the drive unit is replaced by new software. The new software can be loaded in particular by means of the central interface device to the respective control unit. The reprogramming can in particular be automatic, for example in the event of an error detection. Alternatively, the error detection can be done automatically and the reprogramming is effected by a user input. As a further alternative, the error detection may be done by a user interaction and then the downstream reprogramming may be effected by another user interaction.

According to a further embodiment, the N2 local drive units comprise a first subset of active local drive units and a second subset of redundant local drive units, which are also active in a faultless case, so that the active ones are active local control units and the redundant local control units for error masking are set up.

In the case of error masking, for example, masking can be used by a majority vote. Furthermore, in error masking, error correction codes or checksums may advantageously be used.

According to a further embodiment, the lithography system is an EUV lithography system.

According to a further embodiment, the radiation source is an EUV radiation source, which is set up to generate an EUV radiation with a predetermined repetition frequency.

According to a further embodiment, the optical component is a mirror.

According to a further embodiment, the optical component is an individual mirror of a field facet mirror of a beam shaping and illumination system of the lithography system.

According to a further embodiment, the optical component is an individual mirror of a pupil facet mirror of a beam shaping and illumination system of the lithography system.

The individual mirrors are each displaceable, in particular positionable, by means of an actuator device or actuator device with a plurality of electromagnetically, in particular electrostatically operating, actuators. The actuators can be produced in a batch process as a micro-electro-mechanical system (MEMS). For details, see the document WO 2010/049 076 A1 whose content is referenced. To form the field facet mirror and to form the pupil facet mirror is on the DE 10 2013 209 442 A1 whose content is referenced.

In addition, a method for operating a plant, for example a lithography plant, is proposed. The system comprises a radiation source for generating a radiation, a plurality of optical components for guiding the radiation in the system and a number N1 of arrangements, with N1 ≥ 1, wherein each of the N1 arrangements comprises at least one actuator / sensor device, which associated with the optical components. The method comprises the following steps:
Driving the number N1 of arrangements by means of a plurality N2 of local drive units, with N2 ≥ 2, and
Activation of the N2 local control units by means of a number N3 of central control units, with N3 ≥ 1.

The embodiments and features described for the proposed system apply accordingly to the proposed method.

Furthermore, a computer program product is proposed, which causes the operation of a system of the method as explained above on a program-controlled device.

A computer program product, such as a computer program means may, for example, be used as a storage medium, e.g. Memory card, USB stick, CD-ROM, DVD, or even in the form of a downloadable file provided by a server in a network or delivered. This can be done, for example, in a wireless communication network by the transmission of a corresponding file with the computer program product or the computer program means.

Further possible implementations of the invention also include not explicitly mentioned combinations of features or embodiments described above or below with regard to the exemplary embodiments. The skilled person will also add individual aspects as improvements or additions to the respective basic form of the invention.

Further advantageous embodiments and aspects of the invention are the subject of the dependent claims and the embodiments of the invention described below. Furthermore, the invention will be explained in more detail by means of preferred embodiments with reference to the attached figures.

1 shows a schematic view of an EUV lithography system;

2 shows a schematic view of a first embodiment of a drive device for a lithography system;

3 shows a schematic view of a second embodiment of a drive device for a lithography system;

4 shows a schematic view of the second embodiment of the drive device for a lithography according to 3 in case of an error; and

5 shows an embodiment of a method for operating a plant.

In the figures, the same or functionally identical elements have been given the same reference numerals, unless stated otherwise. It should also be noted that the illustrations in the figures are not necessarily to scale.

1 shows a schematic view of an EUV lithography system 100 as an exemplary plant, which is a beam-forming and lighting system 102 and a projection system 104 includes. EUV stands for "extreme ultraviolet" (English: extreme ultraviolet, EUV) and refers to a working light wavelength between 0.1 and 30 nm. The beam-forming and illumination system 102 and the projection system 104 are each in a vacuum housing 137 provided, wherein each vacuum housing is evacuated by means of an evacuation device, not shown. The vacuum housings are surrounded by a machine room, not shown. In this engine room and electrical controls and the like can be provided.

The EUV lithography system 100 has an EUV radiation source or EUV light source 106A on. As an EUV light source 106A For example, a plasma source can be provided, which radiation 108A in the EUV range (extreme ultraviolet range), ie in the wavelength range from 0.1 nm to 30 nm, for example. In the beam-forming and lighting system 102 becomes the EUV radiation 108A bundled and the desired operating wavelength from the EUV radiation 108A filtered out. The from the EUV light source 106A generated EUV radiation 108A has a relatively low transmissivity by air, which is why the beam guiding spaces in the beam-forming and lighting system 102 and in the projection system 104 are evacuated.

This in 1 illustrated beam shaping and illumination system 102 has five mirrors 110 . 112 . 114 . 116 . 118 on. After passing through the beam shaping and lighting system 102 becomes the EUV radiation 108A on the photomask (English: reticle) 120 directed. The photomask 120 is also designed as a reflective optical element and can be outside the systems 102 . 104 be arranged. Next, the EUV radiation 108A by means of a mirror 136 on the photomask 120 be steered. The photomask 120 has a structure which, by means of the projection system 104 reduced to a wafer 122 or the like is mapped.

The projection system 104 has six mirrors M1-M6 for imaging the photomask 120 on the wafer 122 on. In this case, individual mirrors M1-M6 of the projection system 104 symmetrical to the optical axis 124 of the projection system 104 be arranged. It should be noted that the number of mirrors of the EUV lithography system 100 is not limited to the number shown. It can also be provided more or less mirror. Furthermore, the mirrors M1-M6 are usually curved at the front for beam shaping.

Furthermore, the EUV lithography system includes 100 of the 1 a drive device 10 , which for controlling the optical components 110 . 112 . 114 . 116 . 118 , M1-M6 is set up. The drive device may be in the beam forming and illumination system 102 and / or in the projection system 104 be arranged. In particular, the drive device 10 a number N1 of arrangements 210 - 260 , a plurality N2 of local drive units 410 . 420 . 430 . 440 . 450 . 460 and a number N3 of central drive units 510 . 520 on. Details of the drive device 10 be with reference to the 2 to 4 explained in detail below.

It shows the 2 a schematic view of a first embodiment of a drive device 10 and the 3 a schematic view of a second embodiment of a drive device 10 for a lithography system 100 , The two embodiments of the drive device 10 of the 2 and 3 have the following characteristics in common:
The drive device 10 comprises a number N1 of arrangements, with N1 ≥ 1, each of the N1 arrangements 210 - 260 at least one actuator / sensor device 311 - 31N ; 321 - 32N . 331 - 33N ; 341 - 34N ; 351 - 35N ; 361 - 36N comprising which one of the optical components 110 . 112 . 114 . 116 . 118 assigned. The actuator / sensor device 311 - 31N ; 321 - 32N . 331 - 33N ; 341 - 34N ; 351 - 35N ; 361 - 36N For example, an actuator device for moving the optical component 110 . 112 . 114 . 116 . 118 , a sensor device for determining a position of the optical component 110 . 112 . 114 . 116 . 118 or an actuator and sensor device for displacing the optical component 110 . 112 . 114 . 116 . 118 and for determining a position of the optical component 110 . 112 . 114 . 116 . 118 ,

Furthermore, each of the two embodiments comprises the drive device 10 a plurality N2 of local drive units 410 . 420 . 430 . 440 . 450 . 460 for driving the number N1 of arrangements 210 - 260 , with N2 ≥ 2. In addition, each of the embodiments includes the driving device 10 a number N3 of central control units 510 . 520 for controlling the N2 local control units 410 . 420 . 430 . 440 . 450 . 460 , with N3 ≥ 1. Here, N1, N2, N3 are in particular natural numbers.

Each of the N2 local control units 410 . 420 . 430 . 440 . 450 . 460 is like that with everyone the N3 central control units 510 . 520 coupled to each of the N2 local drive units 410 . 420 . 430 . 440 . 450 . 460 from each of the N3 central drive units 510 . 520 is controllable. Further, each is one of the N2 local drive units 410 . 420 . 430 . 440 . 450 . 460 with at least two of the N1 arrangements 210 - 260 connected, with 2 ≤ N2 <N1. In the following, attention is paid to the different details of the two embodiments of the drive device 10 of the 2 and 3 received.

According to 2 includes the drive device 10 a central control unit 510 (N3 = 1), six local control units 410 - 460 (N2 = 6) and 6 x N actuator / sensor devices 311 - 31N ; 321 - 32N . 331 - 33N ; 341 - 34N ; 351 - 35N ; 361 - 36N , Without limiting the generality are in the embodiment of the 2 N2 = 6 and N1 = 6 · N. The central control unit 510 , the six local actuators 410 . 420 . 430 . 440 . 450 . 460 and the 6 * N arrangements 210 - 260 of the 2 are arranged in a tree structure B. The tree structure B of 2 based on a rooted tree, in which the central drive unit 510 the root, the local drive units 410 - 460 the inner nodes and the arrangements 210 - 260 the leaves form.

Each of the N2 (N2 = 6) local drive units 410 . 420 . 430 . 440 . 450 . 460 of the 2 is by means of a respective connection 611 . 61N ; 661 . 66N with each actuator / sensor device 311 - 31N ; 321 - 32N . 331 - 33N ; 341 - 34N ; 351 - 35N ; 361 - 36N a particular one of the N1 arrangements 210 - 260 connected. For example, the local control unit 410 with all actuator / sensor devices 311 - 31N the first arrangement 210 by means of the connections 611 - 61N connected.

3 shows a schematic view of a second embodiment of a drive device 10 for a lithography system 100 ,

In the second embodiment of the drive device 10 of the 3 are two central control units 510 . 520 (N3 = 2), six local control units 410 - 460 (N2 = 6), six orders 210 - 260 (N1 = 6) and a plurality N4 of actuator / sensor devices 311 - 31N ; 321 - 32N . 331 - 33N ; 341 - 34N ; 351 - 35N ; 361 - 36N (N4 = N1 × N). In the example of 3 includes each of the arrangements 210 - 260 N actuator / sensor devices 311 - 31N ; 321 - 32N . 331 - 33N ; 341 - 34N ; 351 - 35N ; 361 - 36N , Without limitation of generality, N can be used for all arrangements 210 - 260 be the same or different.

The N3 central control units 510 . 520 and the N2 local drive units 410 . 420 . 430 . 440 . 450 . 460 of the 3 are interconnected in a ring structure R.

Each of the N1 arrangements 210 - 260 is by means of a primary compound 610 - 660 with one of the N2 local control units 410 . 420 . 430 . 440 . 450 . 460 and by means of a secondary connection 710 - 760 with another of the N2 local control units 410 . 420 . 430 . 440 . 450 . 460 or with one of the N3 central control units 510 . 520 connected. As a result, redundant connections between the arrangements 210 - 260 and the local control units 410 . 420 . 430 . 440 . 450 . 460 or the central control units 510 . 520 created.

Embodiments are possible in which, in a faultless case, only the primary connections 610 - 660 be used and the secondary connections 710 - 760 be used only in the faulty case. However, embodiments are also possible in which, in a faultless case, both the primary connections 610 - 660 as well as the secondary compounds 710 - 760 be used. Details can be found in the following:
For example, the N2 local drive units 410 . 420 . 430 . 440 . 450 . 460 a first subset of active local drive units and a second subset of inactive local drive units, which can be switched to an active state in the event of an error. The N2 central control units can also do this 510 . 520 a first subset of active central drive units and a second subset of inactive central drive units, which can be switched to an active state in the event of an error.

Alternatively or additionally, at least a subset of the N2 local drive units 410 . 420 . 430 . 440 . 450 . 460 Both active resources and redundant, in a faultless case inactive resources, which are switchable to an active state in an error case include. In this case, preferably, at least a subset of the N3 central control units 510 . 520 both active resources and redundant, in a faultless case inactive resources include, which are switchable to an active state in an error case.

Alternatively or additionally, at least a subset of the N2 local drive units 410 . 420 . 430 . 440 . 450 . 460 be reconfigurable or reprogrammable in case of an error. Accordingly, at least a subset of the N3 central drive units 510 . 520 be reconfigurable or reprogrammable in case of an error.

It is also possible that the N2 local control units 410 . 420 . 430 . 440 . 450 . 460 a first subset of active local drive units and a second subset of redundant local drive units, which are also active in a faultless case, so that the active local drive units and the redundant local drive units are set up for error masking.

In particular, the N1 arrangements 210 - 260 , the N2 local control units 410 . 420 . 430 . 440 . 450 . 460 and the N3 central drive units 510 . 520 in the vacuum housing 137 the plant 110 arranged. Furthermore, the central control units comprise 510 . 520 preferably in each case an internal interface device 511 . 521 , The internal interface devices 511 . 521 are with an external interface device 800 for data exchange and / or power supply through the vacuum housing 137 coupled such that the N2 local drive units 410 . 420 . 430 . 440 . 450 . 460 opposite the external interface device 800 are visible as a single drive unit. For clarity, the external interface device 800 in the 3 only with the data communication arrows from the internal interface devices 511 . 521 indicated externally. By doing that, the N2 local drive units 410 . 420 . 430 . 440 . 450 . 460 opposite the external interface device 800 are visible as a single drive unit, the external control of the local drive units 410 . 420 . 430 . 440 . 450 . 460 much easier. It can thereby also easily more local control units 410 . 420 . 430 . 440 . 450 . 460 be added or taken away. External controllability via the external interface device 800 therefore does not change due to the visibility as a single drive unit.

In 4 is a schematic view of the second embodiment of the drive device 10 according to 3 shown in case of an error. In the example of 4 it is assumed that the local drive unit 430 has failed. For this purpose, the reference symbol X1 shows this primary failure of the defective local drive unit 430 , Due to the initial failure of the local control unit 430 can the arrangement 230 no more about their primary connection 630 be controlled. This lack of control over the primary connection 630 is marked by a cross with the reference X2. To compensate for the failure of the drive unit 430 takes over the control unit 420 the control of the arrangement 230 over the secondary connection 730 , As a result, the arrangement 220 no more about their primary connection 620 be controlled. This lack of control over the primary connection 620 is again indicated by a cross with the reference X2. The drive unit takes over the same principle 410 the control of the arrangement 220 over the secondary connection 720 and the drive unit 510 the control of the arrangement 210 over the secondary connection 710 , The drive unit 510 can control the arrangement 210 in addition to their other tasks, as it has additional resources that are not needed in a flawed operational situation. The chain of accepting control units can be extended to more than 10 control units, in particular to more than 20 control units.

5 shows an embodiment of a method for operating a plant 100 , The attachment 100 is for example a like in the 1 illustrated EUV lithography system. The attachment 100 includes a radiation source 106A for generating a radiation, a plurality of optical components 110 . 112 . 114 . 116 . 118 for guiding the radiation in the system 100 and a number N1 of arrangements 210 - 260 , with N1 ≥ 1, where each of the N1 arrangements 210 - 260 at least one actuator / sensor device 311 - 31N ; 321 - 32N . 331 - 33N ; 341 - 34N ; 351 - 35N ; 361 - 36N , which is one of the optical components 110 . 112 . 114 . 116 . 118 is assigned has.

The procedure of 5 includes the following steps S1 and S2:
In step S1, the number N1 of arrangements 210 - 260 by means of a plurality N2 of local drive units 410 . 420 . 430 . 440 . 450 . 460 controlled, with N2 ≥ 2.

In step S2, the N2 local drive units 410 . 420 . 430 . 440 . 450 . 460 by means of a number N3 of central control units 510 . 520 controlled, with N3 ≥ 1.

Although the present invention has been described with reference to embodiments, it is variously modifiable.

LIST OF REFERENCE NUMBERS

10

 driving

100

 lithography system

102

 Beam shaping and lighting system

104

 projection system

106A

 Radiation source, EUV light source

108A

 EUV radiation

110

 mirror

112

 mirror

114

 mirror

116

 mirror

118

 mirror

120

 photomask

122

 wafer

124

 optical axis of the projection system

136

 mirror

137

 Vacuum housing

210-260

 arrangement

311-31N

 Actuator / sensor device

321-32N

 Actuator / sensor device

331-33N

 Actuator / sensor device

341-34N

 Actuator / sensor device

351-35N

 Actuator / sensor device

361-36N

 Actuator / sensor device

410-440

 local control unit

510, 520

 central control unit

511

 internal interface device

521

 internal interface device

610-660

 primary connection

710-760

 secondary connection

800

 external interface device

B

 Threaded

M1-M6

 mirror

R

 ring structure

S1, S2

 step

X1

 primary failure

X2

 secondary failure

QUOTES INCLUDE IN THE DESCRIPTION

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Cited patent literature

• WO 2009/100856 A1 [0006]
• WO 2010/049076 A1 [0062]
• DE 102013209442 A1 [0062]

Claims (15)

Investment ( 100 ), comprising: a radiation source ( 106A ) for generating a radiation, a plurality of optical components ( 110 . 112 . 114 . 116 . 118 ) for guiding the radiation in the plant ( 100 ), a number N1 of orders ( 210 - 260 ), with N1 ≥ 1, where each of the N1 arrangements ( 210 - 260 ) at least one actuator / sensor device ( 311 - 31N ; 321 - 32N . 331 - 33N ; 341 - 34N ; 351 - 35N ; 361 - 36N ), which is one of the optical components ( 110 . 112 . 114 . 116 . 118 ), a plurality N2 of local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) for driving the number N1 of arrangements ( 210 - 260 ), with N2 ≥ 2, and a number N3 of central control units ( 510 . 520 ) for controlling the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ), with N3 ≥ 1. A plant according to claim 1, wherein each of said N2 local drive units ( 410 . 420 . 430 . 440 . 450 . 460 ) with each of the N3 central drive units ( 510 . 520 ), that each of the N2 local drive units ( 410 . 420 . 430 . 440 . 450 . 460 ) from each of the N3 central control units ( 510 . 520 ) is controllable. Installation according to claim 1 or 2, wherein each of the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) with at least two of the N1 arrangements ( 210 - 260 ), with 2 ≤ N2 ≤ N1. Installation according to one of claims 1 to 3, wherein, with N1 ≥ 2, each of the N2 local drive units ( 410 . 420 . 430 . 440 . 450 . 460 ) by means of a respective connection ( 611 . 61N . 661 . 66N ) with each actuator / sensor device ( 311 - 31N ; 321 - 32N . 331 - 33N ; 341 - 34N ; 351 - 35N ; 361 - 36N ) of a particular one of the N1 arrangements ( 210 - 260 ) connected is. Plant according to claim 1 or 2, wherein each of the N1 devices ( 210 - 260 ) by means of a primary compound ( 610 - 660 ) with one of the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) and by means of a secondary connection ( 710 - 760 ) with another of the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) or with one of the N3 central control units ( 510 . 520 ), with N1 ≥ 1. Installation according to one of claims 1 to 5, wherein the actuator / sensor device ( 311 - 31N ; 321 - 32N . 331 - 33N ; 341 - 34N ; 351 - 35N ; 361 - 36N ) as an actuator device for displacing the optical component ( 110 . 112 . 114 . 116 . 118 ), as a sensor device for determining a position of the optical component ( 110 . 112 . 114 . 116 . 118 ) or as an actuator and sensor device for displacing the optical component ( 110 . 112 . 114 . 116 . 118 ) and for determining a position of the optical component ( 110 . 112 . 114 . 116 . 118 ) is trained. Plant according to one of claims 1 to 6, wherein the plant ( 100 ) is designed as a multiple mirror system or as a lithography system, in particular as an EUV lithography system. Installation according to one of Claims 1 to 7, in which, with N3 = 1, the central control unit ( 510 ), the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) and the N1 arrangements ( 210 - 260 ) are connected in a tree structure (B). Installation according to one of claims 1 to 8, wherein the N3 central control units ( 510 . 520 ) and the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) are connected in a ring structure (R). Installation according to one of claims 1 to 9, wherein the N1 arrangements ( 210 - 260 ), the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) and the N3 central control units ( 510 . 520 ) in a vacuum housing ( 137 ) the plant ( 100 ), wherein an external interface device ( 800 ) for data exchange and / or power supply through the vacuum housing ( 137 ) with a respective internal interface device ( 511 . 521 ) of the N3 central control units ( 510 . 520 ) is coupled in such a way that the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) to the external interface device ( 800 ) are visible as a single drive unit regardless of their number N2. Installation according to one of claims 1 to 10, wherein the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) comprise a first subset of active local drive units and a second subset of inactive local drive units, which can be switched to an active state in the event of an error, wherein the N3 central drive units ( 510 . 520 ) comprise a first subset of active central drive units and a second subset of inactive central drive units which are switchable to an active state in the event of an error. Installation according to one of claims 1 to 11, wherein at least a subset of the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) both active resources and redundant, in a faultless case inactive resources which can be switched to an active state in the event of an error, wherein at least a subset of the N3 central control units ( 510 . 520 ) comprise both active resources and redundant, in a faultless case inactive resources which can be switched to an active state in the event of an error. Installation according to one of claims 1 to 12, wherein at least a subset of the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) is reconfigurable or reprogrammable in an error case, and wherein at least a subset of the N3 central control units ( 510 . 520 ) is reconfigurable or reprogrammable in case of an error. Installation according to one of claims 1 to 13, wherein the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) comprise a first subset of active local drive units and a second subset of redundant local drive units which are also active in a faultless case, such that the active local drive units and the redundant local drive units are set up for error masking. Method for operating a system ( 100 ) comprising a radiation source ( 106A ) for generating a radiation, a plurality of optical components ( 110 . 112 . 114 . 116 . 118 ) for guiding the radiation in the plant ( 100 ), and a number N1 of arrangements ( 210 - 260 ), with N1 ≥ 1, where each of the N1 arrangements ( 210 - 260 ) at least one actuator / sensor device ( 311 - 31N ; 321 - 32N . 331 - 33N ; 341 - 34N ; 351 - 35N ; 361 - 36N ), which is one of the optical components ( 110 . 112 . 114 . 116 . 118 ), comprising: driving (S1) the number N1 of arrangements ( 210 - 260 ) by means of a plurality N2 of local control units ( 410 . 420 . 430 . 440 . 450 . 460 ), with N2 ≥ 2, and activation (S2) of the N2 local control units ( 410 . 420 . 430 . 440 . 450 . 460 ) by means of a number N3 of central control units ( 510 . 520 ), with N3 ≥ 1.

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