DE102009042103A8 - Verfahren zur Behandlung einer Oberfläche - Google Patents

Verfahren zur Behandlung einer Oberfläche Download PDF

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Publication number
DE102009042103A8
DE102009042103A8 DE200910042103 DE102009042103A DE102009042103A8 DE 102009042103 A8 DE102009042103 A8 DE 102009042103A8 DE 200910042103 DE200910042103 DE 200910042103 DE 102009042103 A DE102009042103 A DE 102009042103A DE 102009042103 A8 DE102009042103 A8 DE 102009042103A8
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DE
Germany
Prior art keywords
treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE200910042103
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English (en)
Other versions
DE102009042103A1 (de
DE102009042103B4 (de
Inventor
Kerstin Dr. 07749 Horn
Thomas Dr. 86438 Schütte
Christian Dipl.-Kfm. 07749 Tiller
Bernd Dr. 07937 Grünler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PLASUS INGENIEURBUERO DR THOMAS SCHUETTE
SURA INSTRUMENTS GmbH
PLASUS INGENIEURBUERO DR THOMAS SCHUETTE
Plasus Ingenieurbuero Dr Thomas Schuette 86438
SURA INSTR GmbH
Sura Instruments 07745 GmbH
Innovent eV Technologieentwicklung
Original Assignee
PLASUS INGENIEURBUERO DR THOMAS SCHUETTE
SURA INSTRUMENTS GmbH
PLASUS INGENIEURBUERO DR THOMAS SCHUETTE
Plasus Ingenieurbuero Dr Thomas Schuette 86438
SURA INSTR GmbH
Sura Instruments 07745 GmbH
Innovent eV Technologieentwicklung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PLASUS INGENIEURBUERO DR THOMAS SCHUETTE, SURA INSTRUMENTS GmbH, PLASUS INGENIEURBUERO DR THOMAS SCHUETTE, Plasus Ingenieurbuero Dr Thomas Schuette 86438, SURA INSTR GmbH, Sura Instruments 07745 GmbH, Innovent eV Technologieentwicklung filed Critical PLASUS INGENIEURBUERO DR THOMAS SCHUETTE
Priority to DE200910042103 priority Critical patent/DE102009042103B4/de
Publication of DE102009042103A1 publication Critical patent/DE102009042103A1/de
Publication of DE102009042103A8 publication Critical patent/DE102009042103A8/de
Application granted granted Critical
Publication of DE102009042103B4 publication Critical patent/DE102009042103B4/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
DE200910042103 2009-09-21 2009-09-21 Verfahren zur Behandlung einer Oberfläche Expired - Fee Related DE102009042103B4 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE200910042103 DE102009042103B4 (de) 2009-09-21 2009-09-21 Verfahren zur Behandlung einer Oberfläche

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE200910042103 DE102009042103B4 (de) 2009-09-21 2009-09-21 Verfahren zur Behandlung einer Oberfläche

Publications (3)

Publication Number Publication Date
DE102009042103A1 DE102009042103A1 (de) 2011-03-24
DE102009042103A8 true DE102009042103A8 (de) 2011-08-11
DE102009042103B4 DE102009042103B4 (de) 2013-01-31

Family

ID=43603454

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200910042103 Expired - Fee Related DE102009042103B4 (de) 2009-09-21 2009-09-21 Verfahren zur Behandlung einer Oberfläche

Country Status (1)

Country Link
DE (1) DE102009042103B4 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011005834A1 (de) * 2011-03-21 2012-06-14 Innovent E.V. Verfahren zur Überwachung eines Plasmas oder einer Flamme
DE102011051226A1 (de) * 2011-06-21 2012-12-27 Q-Cells Se Plasma-unterstütztes Abscheideverfahren und Vorrichtung zu dessen Durchführung
DE102011082775B4 (de) * 2011-09-15 2016-09-01 Von Ardenne Gmbh Verfahren zur gleichzeitigen Optimierung verschiedener Schichteigenschaften
DE102013201388A1 (de) 2013-01-29 2014-07-31 Evonik Industries Ag Verfahren zur Herstellung eines Metall-Kunststoff-Hybridbauteils
DE102013213582A1 (de) 2013-07-11 2015-01-29 Evonik Industries Ag Sportschuh umfassend stollen oder stollenaufnahmen
DE102013213579A1 (de) 2013-07-11 2014-09-04 Evonik Industries Ag Sehhilfe
DE102014206022A1 (de) 2014-03-31 2015-10-01 Evonik Degussa Gmbh Metall-Kunststoff-Hybridbauteil
CA2967024C (en) * 2014-11-10 2023-09-26 Superior Industries International, Inc. Method of coating alloy wheels
CN106370606B (zh) * 2016-10-21 2019-03-01 吉林大学 一种用于混合价态氧化钨反射式电致变色性能检测的实验仪

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050068519A1 (en) * 2003-09-30 2005-03-31 Tokyo Electron Limited Method for monitoring status of system components

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050068519A1 (en) * 2003-09-30 2005-03-31 Tokyo Electron Limited Method for monitoring status of system components

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
E.Schmachtenberg, A. Hegenbart, "Überwachung von Plasmaprozessen durch OES", Vakuum in Forschung und Praxis 17 (2005), Nr. 6, 318-323. *

Also Published As

Publication number Publication date
DE102009042103A1 (de) 2011-03-24
DE102009042103B4 (de) 2013-01-31

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R018 Grant decision by examination section/examining division
R020 Patent grant now final

Effective date: 20130501

R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee