DE102009010496A8 - Sputtertarget - Google Patents

Sputtertarget Download PDF

Info

Publication number
DE102009010496A8
DE102009010496A8 DE102009010496A DE102009010496A DE102009010496A8 DE 102009010496 A8 DE102009010496 A8 DE 102009010496A8 DE 102009010496 A DE102009010496 A DE 102009010496A DE 102009010496 A DE102009010496 A DE 102009010496A DE 102009010496 A8 DE102009010496 A8 DE 102009010496A8
Authority
DE
Germany
Prior art keywords
sputtering target
sputtering
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102009010496A
Other languages
English (en)
Other versions
DE102009010496A1 (de
Inventor
Hideo Fujii
Hitoshi Matsuzaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Kobelco Research Institute Inc
Original Assignee
Kobe Steel Ltd
Kobelco Research Institute Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd, Kobelco Research Institute Inc filed Critical Kobe Steel Ltd
Publication of DE102009010496A1 publication Critical patent/DE102009010496A1/de
Publication of DE102009010496A8 publication Critical patent/DE102009010496A8/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C28/00—Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0483—Alloys based on the low melting point metals Zn, Pb, Sn, Cd, In or Ga
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10—Processes characterised by the sequence of their steps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Powder Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
DE102009010496A 2008-02-25 2009-02-25 Sputtertarget Withdrawn DE102009010496A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008-043218 2008-02-25
JP2008043218A JP2009197310A (ja) 2008-02-25 2008-02-25 スパッタリングターゲット

Publications (2)

Publication Number Publication Date
DE102009010496A1 DE102009010496A1 (de) 2009-08-27
DE102009010496A8 true DE102009010496A8 (de) 2009-12-03

Family

ID=40896955

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102009010496A Withdrawn DE102009010496A1 (de) 2008-02-25 2009-02-25 Sputtertarget

Country Status (4)

Country Link
US (1) US20090211902A1 (de)
JP (1) JP2009197310A (de)
DE (1) DE102009010496A1 (de)
TW (1) TW200948996A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104126026B (zh) * 2012-02-23 2016-03-23 吉坤日矿日石金属株式会社 含有铬氧化物的强磁性材料溅射靶
KR102152586B1 (ko) * 2015-03-04 2020-09-07 제이엑스금속주식회사 자성재 스퍼터링 타깃 및 그 제조 방법
KR20180129769A (ko) * 2016-03-28 2018-12-05 미쓰이금속광업주식회사 스퍼터링 타깃재 및 그의 제조 방법, 및 스퍼터링 타깃
CN111230129B (zh) * 2020-03-18 2022-08-16 宁波江丰电子材料股份有限公司 一种钨钛混粉方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5736657A (en) * 1995-03-31 1998-04-07 Ricoh Company, Ltd. Sputtering target
DE10017414A1 (de) * 2000-04-07 2001-10-11 Unaxis Materials Deutschland G Sputtertarget auf der Basis eines Metalls oder einer Metalllegierung und Verfahren zu dessen Herstellung
WO2005005683A1 (ja) 2003-07-15 2005-01-20 Nikko Materials Co., Ltd. スパッタリングターゲット及び光記録媒体
JP4351212B2 (ja) * 2003-08-05 2009-10-28 日鉱金属株式会社 スパッタリングターゲット及びその製造方法
US20060078457A1 (en) 2004-10-12 2006-04-13 Heraeus, Inc. Low oxygen content alloy compositions
JP2007062108A (ja) * 2005-08-30 2007-03-15 Kobe Steel Ltd 光情報記録媒体用の記録層およびスパッタリングターゲット、並びに光情報記録媒体
US20090046566A1 (en) * 2005-10-18 2009-02-19 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel Ltd.) Recording layer for optical information recording medium, optical information recording medium, and sputtering target for optical information recording medium
JP2007293983A (ja) * 2006-04-24 2007-11-08 Kobe Steel Ltd 光情報記録媒体
JP4348354B2 (ja) 2006-08-11 2009-10-21 株式会社湯本製作所 麺線巻入装置

Also Published As

Publication number Publication date
US20090211902A1 (en) 2009-08-27
JP2009197310A (ja) 2009-09-03
TW200948996A (en) 2009-12-01
DE102009010496A1 (de) 2009-08-27

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8196 Reprint of faulty title page (publication) german patentblatt: part 1a6
OP8 Request for examination as to paragraph 44 patent law
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee
R002 Refusal decision in examination/registration proceedings
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20120901