DE102008062332A1 - Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten - Google Patents
Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten Download PDFInfo
- Publication number
- DE102008062332A1 DE102008062332A1 DE102008062332A DE102008062332A DE102008062332A1 DE 102008062332 A1 DE102008062332 A1 DE 102008062332A1 DE 102008062332 A DE102008062332 A DE 102008062332A DE 102008062332 A DE102008062332 A DE 102008062332A DE 102008062332 A1 DE102008062332 A1 DE 102008062332A1
- Authority
- DE
- Germany
- Prior art keywords
- coating
- treatment
- substrate
- deposition
- substrate components
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 118
- 239000011248 coating agent Substances 0.000 title claims abstract description 115
- 239000000758 substrate Substances 0.000 title claims abstract description 100
- 238000004381 surface treatment Methods 0.000 title claims abstract description 17
- 238000011282 treatment Methods 0.000 claims abstract description 91
- 238000000034 method Methods 0.000 claims abstract description 56
- 238000005240 physical vapour deposition Methods 0.000 claims abstract description 35
- 238000000151 deposition Methods 0.000 claims abstract description 26
- 230000008021 deposition Effects 0.000 claims abstract description 26
- 239000000969 carrier Substances 0.000 claims abstract description 19
- 238000005530 etching Methods 0.000 claims abstract description 16
- 238000010438 heat treatment Methods 0.000 claims description 10
- 230000033001 locomotion Effects 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 238000005192 partition Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 15
- 239000007789 gas Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- 238000010276 construction Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- 238000005553 drilling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000000429 assembly Methods 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005289 physical deposition Methods 0.000 description 2
- 238000004886 process control Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- 229910010038 TiAl Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000541 cathodic arc deposition Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002052 molecular layer Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000002347 wear-protection layer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (14)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008062332A DE102008062332A1 (de) | 2008-12-15 | 2008-12-15 | Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten |
| AU2009328788A AU2009328788B2 (en) | 2008-12-15 | 2009-12-04 | Apparatus for treating and/or coating the surface of a substrate component |
| CN200980150003.0A CN102245799B (zh) | 2008-12-15 | 2009-12-04 | 用于基片组件的表面处理和/或表面涂敷的设备 |
| MX2011006238A MX2011006238A (es) | 2008-12-15 | 2009-12-04 | Aparato para tratar y/o recubrir la superficie de un componente de sustrato. |
| KR1020117014943A KR20110098764A (ko) | 2008-12-15 | 2009-12-04 | 기판 구성요소의 표면 처리 및/또는 코팅 장치 |
| CA2748893A CA2748893A1 (en) | 2008-12-15 | 2009-12-04 | Device for surface treatment and/or coating of substrate components |
| PCT/DE2009/001712 WO2010069289A1 (de) | 2008-12-15 | 2009-12-04 | Vorrichtung zur oberflächenbehandlung und/oder -beschichtung von substratkomponenten |
| EA201170814A EA023891B1 (ru) | 2008-12-15 | 2009-12-04 | Устройство и способ для обработки и/или нанесения покрытия на поверхности подложек методом вакуумного напыления |
| BRPI0923092-0A BRPI0923092B1 (pt) | 2008-12-15 | 2009-12-04 | Dispositivo e método para tratamento e/ou revestimento de superfícies de componentes de substrato por deposição a partir da fase gasosa |
| SG2011043791A SG172178A1 (en) | 2008-12-15 | 2009-12-04 | Device for surface treatment and/ or coating of substrate components |
| EP09807664.9A EP2373828B1 (de) | 2008-12-15 | 2009-12-04 | Vorrichtung zur oberflächenbehandlung und/oder -beschichtung von substratkomponenten |
| JP2011539893A JP5700454B2 (ja) | 2008-12-15 | 2009-12-04 | 基材コンポーネントの表面処理及び／又はコーティング用の装置 |
| US13/104,394 US20110305833A1 (en) | 2008-12-15 | 2011-05-10 | Apparatus for treating and/or coating the surface of a substrate component |
| US13/854,311 US10711349B2 (en) | 2008-12-15 | 2013-04-01 | Apparatus for treating and/or coating the surface of a substrate component |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008062332A DE102008062332A1 (de) | 2008-12-15 | 2008-12-15 | Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102008062332A1 true DE102008062332A1 (de) | 2010-06-17 |
Family
ID=41818515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102008062332A Withdrawn DE102008062332A1 (de) | 2008-12-15 | 2008-12-15 | Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten |
Country Status (13)
| Country | Link |
|---|---|
| US (2) | US20110305833A1 (https=) |
| EP (1) | EP2373828B1 (https=) |
| JP (1) | JP5700454B2 (https=) |
| KR (1) | KR20110098764A (https=) |
| CN (1) | CN102245799B (https=) |
| AU (1) | AU2009328788B2 (https=) |
| BR (1) | BRPI0923092B1 (https=) |
| CA (1) | CA2748893A1 (https=) |
| DE (1) | DE102008062332A1 (https=) |
| EA (1) | EA023891B1 (https=) |
| MX (1) | MX2011006238A (https=) |
| SG (1) | SG172178A1 (https=) |
| WO (1) | WO2010069289A1 (https=) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2664690A1 (en) * | 2012-05-15 | 2013-11-20 | Beijing Zhongao Huicheng Biology-tech Material Co. | A magnetron sputtering coating device, a nano-multilayer film and the preparation method thereof |
| CN112166208A (zh) * | 2017-07-19 | 2021-01-01 | 因特瓦克公司 | 用于形成纳米层合光学涂层的系统 |
| CN115896747A (zh) * | 2021-09-30 | 2023-04-04 | 馗鼎奈米科技(深圳)有限公司 | 表面处理设备 |
| US12331400B2 (en) | 2022-11-07 | 2025-06-17 | Creating Nano Technologies, Inc. | Surface treatment apparatus |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010032591A1 (de) | 2010-07-23 | 2012-01-26 | Leybold Optics Gmbh | Vorrichtung und Verfahren zur Vakuumbeschichtung |
| CN102560373B (zh) * | 2010-12-16 | 2014-12-17 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 基片加热腔室、使用基片加热腔室的方法及基片处理设备 |
| CN102560381A (zh) * | 2010-12-29 | 2012-07-11 | 鸿富锦精密工业（深圳）有限公司 | 溅镀装置 |
| EP2868768B1 (en) * | 2013-10-29 | 2021-06-16 | Oerlikon Surface Solutions AG, Pfäffikon | Shutter system |
| CN103643205B (zh) * | 2013-12-04 | 2015-11-18 | 王普 | 一种真空镀膜机 |
| WO2015161469A1 (zh) * | 2014-04-23 | 2015-10-29 | 中奥汇成科技股份有限公司 | 一种人工关节臼杯、磁控溅射镀膜装置及其制备方法 |
| CN104120389B (zh) * | 2014-08-04 | 2016-08-24 | 上海和辉光电有限公司 | 镀膜设备 |
| JP6823392B2 (ja) * | 2016-07-05 | 2021-02-03 | 東京エレクトロン株式会社 | 絶縁膜を形成する方法 |
| CN107130213B (zh) * | 2017-05-03 | 2019-04-09 | 成都真锐科技涂层技术有限公司 | 多元合金复合薄膜制备设备和制备方法 |
| KR102022927B1 (ko) * | 2017-10-19 | 2019-09-19 | 재단법인 오송첨단의료산업진흥재단 | 의료용 peek 소재 표면의 마이크로 기공 구조의 타이타늄 코팅 방법 |
| CN109023288B (zh) * | 2017-12-08 | 2020-10-13 | 寰采星科技(宁波)有限公司 | 一种具有高效蒸镀工作装置的oled蒸镀设备 |
| US20220242672A1 (en) * | 2019-02-20 | 2022-08-04 | Oerlikon Surface Solutions Ag, Pfäffikon | Optimized System and Method for Transporting and Moving Substrates in a Modular Coating Facility |
| CN109898062A (zh) * | 2019-03-07 | 2019-06-18 | 厦门阿匹斯智能制造系统有限公司 | 一种磁控溅射镀膜设备及镀膜方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6051113A (en) | 1998-04-27 | 2000-04-18 | Cvc Products, Inc. | Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure using target indexing |
| DE102005050358A1 (de) | 2004-11-12 | 2006-08-17 | Unaxis Balzers Aktiengesellschaft | Vakuumbehandlungsanlage |
| DE102006020004A1 (de) | 2006-04-26 | 2008-01-17 | Systec System- Und Anlagentechnik Gmbh & Co.Kg | Vorrichtung und Verfahren zur homogenen PVD-Beschichtung |
Family Cites Families (18)
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| US4485759A (en) * | 1983-01-19 | 1984-12-04 | Multi-Arc Vacuum Systems Inc. | Planetary substrate support apparatus for vapor vacuum deposition coating |
| JPS59157281A (ja) * | 1983-02-24 | 1984-09-06 | Tokuda Seisakusho Ltd | スパツタリング装置 |
| US5328583A (en) * | 1991-11-05 | 1994-07-12 | Canon Kabushiki Kaisha | Sputtering apparatus and process for forming lamination film employing the apparatus |
| GB9405442D0 (en) * | 1994-03-19 | 1994-05-04 | Applied Vision Ltd | Apparatus for coating substrates |
| GB9514773D0 (en) * | 1995-07-19 | 1995-09-20 | Teer Coatings Ltd | Methods for improving the sputter deposition of metal-sulphur coatings e.g.molybdenum disulphide(MoS2) coatings |
| US6054029A (en) * | 1996-02-23 | 2000-04-25 | Singulus Technologies Gmbh | Device for gripping, holdings and/or transporting substrates |
| DE29615190U1 (de) * | 1996-03-11 | 1996-11-28 | Balzers Verschleissschutz GmbH, 55411 Bingen | Anlage zur Beschichtung von Werkstücken |
| US6174377B1 (en) * | 1997-03-03 | 2001-01-16 | Genus, Inc. | Processing chamber for atomic layer deposition processes |
| DE19738234C1 (de) * | 1997-09-02 | 1998-10-22 | Fraunhofer Ges Forschung | Einrichtung zum Aufstäuben von Hartstoffschichten |
| US6576062B2 (en) * | 2000-01-06 | 2003-06-10 | Tokyo Electron Limited | Film forming apparatus and film forming method |
| US6630053B2 (en) * | 2000-08-22 | 2003-10-07 | Asm Japan K.K. | Semiconductor processing module and apparatus |
| JP2006051594A (ja) * | 2004-07-14 | 2006-02-23 | Mitsubishi Materials Corp | 耐熱合金の高速重切削で硬質被覆層がすぐれた耐チッピング性を発揮する表面被覆超硬合金製切削工具 |
| US9997338B2 (en) * | 2005-03-24 | 2018-06-12 | Oerlikon Surface Solutions Ag, Pfäffikon | Method for operating a pulsed arc source |
| US20070218702A1 (en) * | 2006-03-15 | 2007-09-20 | Asm Japan K.K. | Semiconductor-processing apparatus with rotating susceptor |
| EP2050837B1 (de) * | 2006-07-26 | 2011-12-14 | Naco Technologies, SIA | Verfahren zur ionenplasmaapplikation von filmbeschichtungen und vorrichtung zur durchführung des verfahrens |
| CN100575540C (zh) * | 2006-08-28 | 2009-12-30 | 北京有色金属研究总院 | 批量化制备双面高温超导薄膜装置 |
| WO2008050384A1 (en) * | 2006-10-23 | 2008-05-02 | Osg Corporation | Hard laminated coating, tool covered with hard laminated coating, and method of forming coating |
| JP4768699B2 (ja) * | 2006-11-30 | 2011-09-07 | キヤノンアネルバ株式会社 | 電力導入装置及び成膜方法 |
-
2008
- 2008-12-15 DE DE102008062332A patent/DE102008062332A1/de not_active Withdrawn
-
2009
- 2009-12-04 BR BRPI0923092-0A patent/BRPI0923092B1/pt not_active IP Right Cessation
- 2009-12-04 JP JP2011539893A patent/JP5700454B2/ja active Active
- 2009-12-04 CA CA2748893A patent/CA2748893A1/en not_active Abandoned
- 2009-12-04 EP EP09807664.9A patent/EP2373828B1/de active Active
- 2009-12-04 CN CN200980150003.0A patent/CN102245799B/zh not_active Expired - Fee Related
- 2009-12-04 WO PCT/DE2009/001712 patent/WO2010069289A1/de not_active Ceased
- 2009-12-04 KR KR1020117014943A patent/KR20110098764A/ko not_active Ceased
- 2009-12-04 SG SG2011043791A patent/SG172178A1/en unknown
- 2009-12-04 EA EA201170814A patent/EA023891B1/ru not_active IP Right Cessation
- 2009-12-04 MX MX2011006238A patent/MX2011006238A/es active IP Right Grant
- 2009-12-04 AU AU2009328788A patent/AU2009328788B2/en not_active Ceased
-
2011
- 2011-05-10 US US13/104,394 patent/US20110305833A1/en not_active Abandoned
-
2013
- 2013-04-01 US US13/854,311 patent/US10711349B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6051113A (en) | 1998-04-27 | 2000-04-18 | Cvc Products, Inc. | Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure using target indexing |
| DE102005050358A1 (de) | 2004-11-12 | 2006-08-17 | Unaxis Balzers Aktiengesellschaft | Vakuumbehandlungsanlage |
| DE102006020004A1 (de) | 2006-04-26 | 2008-01-17 | Systec System- Und Anlagentechnik Gmbh & Co.Kg | Vorrichtung und Verfahren zur homogenen PVD-Beschichtung |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2664690A1 (en) * | 2012-05-15 | 2013-11-20 | Beijing Zhongao Huicheng Biology-tech Material Co. | A magnetron sputtering coating device, a nano-multilayer film and the preparation method thereof |
| EP2924142A1 (en) | 2012-05-15 | 2015-09-30 | ZhongAo HuiCheng Technology Co. Ltd. | A nano-multilayer film |
| CN112166208A (zh) * | 2017-07-19 | 2021-01-01 | 因特瓦克公司 | 用于形成纳米层合光学涂层的系统 |
| CN112166208B (zh) * | 2017-07-19 | 2023-12-12 | 因特瓦克公司 | 用于形成纳米层合光学涂层的系统 |
| CN115896747A (zh) * | 2021-09-30 | 2023-04-04 | 馗鼎奈米科技(深圳)有限公司 | 表面处理设备 |
| US12331400B2 (en) | 2022-11-07 | 2025-06-17 | Creating Nano Technologies, Inc. | Surface treatment apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20110098764A (ko) | 2011-09-01 |
| AU2009328788A1 (en) | 2011-07-28 |
| MX2011006238A (es) | 2011-06-28 |
| JP2012512321A (ja) | 2012-05-31 |
| EP2373828A1 (de) | 2011-10-12 |
| BRPI0923092A2 (pt) | 2016-07-26 |
| WO2010069289A1 (de) | 2010-06-24 |
| BRPI0923092B1 (pt) | 2020-02-11 |
| EA201170814A1 (ru) | 2011-12-30 |
| EA023891B1 (ru) | 2016-07-29 |
| CA2748893A1 (en) | 2010-06-24 |
| SG172178A1 (en) | 2011-07-28 |
| US10711349B2 (en) | 2020-07-14 |
| US20110305833A1 (en) | 2011-12-15 |
| US20130216711A1 (en) | 2013-08-22 |
| CN102245799B (zh) | 2014-02-12 |
| JP5700454B2 (ja) | 2015-04-15 |
| EP2373828B1 (de) | 2014-11-12 |
| CN102245799A (zh) | 2011-11-16 |
| AU2009328788B2 (en) | 2015-10-29 |
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