DE102005018604A1 - Auf offenen Löchern basierender Beugungslichtmodulator - Google Patents
Auf offenen Löchern basierender Beugungslichtmodulator Download PDFInfo
- Publication number
- DE102005018604A1 DE102005018604A1 DE102005018604A DE102005018604A DE102005018604A1 DE 102005018604 A1 DE102005018604 A1 DE 102005018604A1 DE 102005018604 A DE102005018604 A DE 102005018604A DE 102005018604 A DE102005018604 A DE 102005018604A DE 102005018604 A1 DE102005018604 A1 DE 102005018604A1
- Authority
- DE
- Germany
- Prior art keywords
- layer
- micromirror
- micromirror layer
- piezoelectric
- light modulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 230000003287 optical effect Effects 0.000 title description 7
- 230000015654 memory Effects 0.000 title description 2
- 239000000758 substrate Substances 0.000 claims description 66
- 239000000463 material Substances 0.000 claims description 37
- 239000010409 thin film Substances 0.000 claims description 10
- 230000001419 dependent effect Effects 0.000 claims description 2
- 230000000284 resting effect Effects 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 description 37
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 36
- 239000010703 silicon Substances 0.000 description 36
- 238000000034 method Methods 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000005662 electromechanics Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0808—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more diffracting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
- B81C1/00142—Bridges
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0858—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by piezoelectric means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2225/00—Active addressable light modulator
- G03H2225/20—Nature, e.g. e-beam addressed
- G03H2225/24—Having movable pixels, e.g. microelectromechanical systems [MEMS]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Micromachines (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2004-0030159 | 2004-04-29 | ||
| KR20040030159 | 2004-04-29 | ||
| KR1020050000907A KR20050118105A (ko) | 2004-04-29 | 2005-01-05 | 오픈홀 기반의 회절 광변조기 |
| KR10-2005-0000907 | 2005-01-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102005018604A1 true DE102005018604A1 (de) | 2005-11-24 |
Family
ID=34656347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102005018604A Ceased DE102005018604A1 (de) | 2004-04-29 | 2005-04-21 | Auf offenen Löchern basierender Beugungslichtmodulator |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR100832646B1 (fr) |
| DE (1) | DE102005018604A1 (fr) |
| FR (1) | FR2869696B1 (fr) |
| GB (2) | GB2433327B (fr) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2884932B1 (fr) * | 2005-04-26 | 2011-06-24 | Samsung Electro Mech | Modulateur de lumiere a diffraction base sur un trou ouvert |
| KR100883989B1 (ko) * | 2007-10-19 | 2009-02-17 | 삼성전기주식회사 | 광변조기 소자 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5311360A (en) * | 1992-04-28 | 1994-05-10 | The Board Of Trustees Of The Leland Stanford, Junior University | Method and apparatus for modulating a light beam |
| US5949570A (en) * | 1995-06-20 | 1999-09-07 | Matsushita Electric Industrial Co., Ltd. | Diffractive optical modulator and method for producing the same, infrared sensor including such a diffractive optical modulator and method for producing the same, and display device including such a diffractive optical modulator |
| US6141139A (en) * | 1998-11-30 | 2000-10-31 | Eastman Kodak Company | Method of making a bistable micromagnetic light modulator |
| KR100327367B1 (ko) * | 1999-05-26 | 2002-03-06 | 구자홍 | 마이크로-미러 소자 및 그를 이용한 광 픽업 장치 |
| US6466354B1 (en) * | 2000-09-19 | 2002-10-15 | Silicon Light Machines | Method and apparatus for interferometric modulation of light |
| JP4582380B2 (ja) | 2001-05-11 | 2010-11-17 | ソニー株式会社 | 光変調素子とそれを用いた光学装置、および光変調素子の製造方法 |
| US6639722B2 (en) | 2001-08-15 | 2003-10-28 | Silicon Light Machines | Stress tuned blazed grating light valve |
| US6829092B2 (en) | 2001-08-15 | 2004-12-07 | Silicon Light Machines, Inc. | Blazed grating light valve |
| US6791735B2 (en) * | 2002-01-09 | 2004-09-14 | The Regents Of The University Of California | Differentially-driven MEMS spatial light modulator |
| US7057819B1 (en) | 2002-12-17 | 2006-06-06 | Silicon Light Machines Corporation | High contrast tilting ribbon blazed grating |
| US20050057810A1 (en) * | 2003-09-15 | 2005-03-17 | Goodwill Patrick W. | Diffraction grating |
| US7027204B2 (en) * | 2003-09-26 | 2006-04-11 | Silicon Light Machines Corporation | High-density spatial light modulator |
| US7245285B2 (en) * | 2004-04-28 | 2007-07-17 | Hewlett-Packard Development Company, L.P. | Pixel device |
-
2005
- 2005-04-21 DE DE102005018604A patent/DE102005018604A1/de not_active Ceased
- 2005-04-26 GB GB0625065A patent/GB2433327B/en not_active Expired - Fee Related
- 2005-04-26 GB GB0508353A patent/GB2413647B/en not_active Expired - Fee Related
- 2005-04-26 KR KR1020050034685A patent/KR100832646B1/ko not_active IP Right Cessation
- 2005-04-28 FR FR0504316A patent/FR2869696B1/fr not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| FR2869696B1 (fr) | 2009-10-16 |
| FR2869696A1 (fr) | 2005-11-04 |
| GB2413647B (en) | 2007-05-16 |
| GB2413647A (en) | 2005-11-02 |
| GB0625065D0 (en) | 2007-01-24 |
| KR100832646B1 (ko) | 2008-05-27 |
| GB0508353D0 (en) | 2005-06-01 |
| KR20060047478A (ko) | 2006-05-18 |
| GB2433327A (en) | 2007-06-20 |
| GB2433327B (en) | 2008-03-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE60121838T2 (de) | Raumlichtmodulator mit konformer gittervorrichtung | |
| DE10228946B4 (de) | Optischer Modulator, Display, Verwendung eines optischen Modulators und Verfahren zur Herstellung eines optischen Modulators | |
| DE69919496T2 (de) | Mechanische Rastervorrichtung | |
| DE10213579B4 (de) | Deformierbare Spiegelvorrichtung | |
| DE69634241T2 (de) | Vorrichtung zur kontrolle der ausgangsleistung, projektionsanzeigevorrichtung | |
| DE102005051274A1 (de) | Beugender Lichtmodulator auf der Basis offener Löcher | |
| DE60125296T2 (de) | Elektromechanisches gitter-displaysystem mit räumlich getrennten lichtstrahlen | |
| DE69908325T2 (de) | Integrierte mikrooptische systeme | |
| DE19533591A1 (de) | Optisches Beugungselement | |
| DE60013544T2 (de) | Verfahren zur Dämpfung von Bandelementen in einer mikromechanischen Gittervorrichtung durch Wahl der Betätigungswellenform | |
| EP0906586B1 (fr) | Microstructures de modulation en phase pour modulateurs de lumiere en surface hautement integres | |
| EP2028525A1 (fr) | Dispositif de micro-miroir | |
| DE102006018121A1 (de) | Spiegel von variabler Form und dazugehörige optische Abnehmervorrichtung | |
| DE112019002367T5 (de) | Metaflächen-Struktur und Verfahren zum Herstellen einer Metaflächen-Struktur | |
| DE102005018604A1 (de) | Auf offenen Löchern basierender Beugungslichtmodulator | |
| DE102007010334A1 (de) | Spiegel von variabler Form und diesen aufweisende optische Abnehmervorrichtung | |
| DE69632611T2 (de) | Mikroabtastelemente für optisches System | |
| DE102019210026A1 (de) | MEMS-Aktuator und MEMS-Aktuator-Array mit einer Mehrzahl von MEMS-Aktuatoren | |
| DE102018207783B4 (de) | MEMS-Array aus MEMS mit jeweils einem beweglichen Strukturelement | |
| DE602004010156T2 (de) | Elektrisch drehbarer mikrospiegel oder mikrolinse | |
| DE102011082065A1 (de) | Spiegel-Array | |
| DE60221764T2 (de) | Elektromechanische gittervorrichtung mit einem kontinuierlich steuerbaren beugungswirkungsgrad | |
| DE60211993T2 (de) | Elektromechanische, konforme gittervorrichtung mit verbesserter optischer leistung und verbessertem kontrast | |
| DE102008001663B4 (de) | Mikromechanisches Bauteil und Herstellungsverfahren für ein mikromechanisches Bauteil | |
| DE102012101555B4 (de) | Beugungsgitter und Verfahren zu dessen Herstellung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| R002 | Refusal decision in examination/registration proceedings | ||
| R003 | Refusal decision now final | ||
| R003 | Refusal decision now final |
Effective date: 20140627 |