CY1107631T1 - Συσκευη και μεθοδος μετρησεως οπτικων επιφανειων ελευθερας μορφης - Google Patents

Συσκευη και μεθοδος μετρησεως οπτικων επιφανειων ελευθερας μορφης

Info

Publication number
CY1107631T1
CY1107631T1 CY20071100669T CY071100669T CY1107631T1 CY 1107631 T1 CY1107631 T1 CY 1107631T1 CY 20071100669 T CY20071100669 T CY 20071100669T CY 071100669 T CY071100669 T CY 071100669T CY 1107631 T1 CY1107631 T1 CY 1107631T1
Authority
CY
Cyprus
Prior art keywords
measurement
measuring
distance
predetermined measurement
rotatable
Prior art date
Application number
CY20071100669T
Other languages
English (en)
Inventor
Rens Henselmans
Petrus Carolus Johannes Nicolaas Rosielle
Original Assignee
Nederlandse Organisatie Voor Toegepast -Natuurwetenschappelijk Onderzoek Tno
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nederlandse Organisatie Voor Toegepast -Natuurwetenschappelijk Onderzoek Tno filed Critical Nederlandse Organisatie Voor Toegepast -Natuurwetenschappelijk Onderzoek Tno
Publication of CY1107631T1 publication Critical patent/CY1107631T1/el

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G01B21/04—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/20—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring contours or curvatures, e.g. determining profile
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G01B9/02028—Two or more reference or object arms in one interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062—Active error reduction, i.e. varying with time
    • G01B9/02067—Active error reduction, i.e. varying with time by electronic control systems, i.e. using feedback acting on optics or light
    • G01B9/02068—Auto-alignment of optical elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Abstract

Μία συσκευή καταμετρήσεως επιφανειών για την καταμέτρηση ενός επιφανειακού σχήματος ενός αντικειμένου η οποία περιλαμβάνει ένα πλαίσιο καταμετρήσεως (4), το οποίο φέρει μία βάση για την τοποθέτηση του αντικειμένου που πρόκειται να καταμετρηθεί, μία βάση (3) η οποία περιλαμβάνει μία περιστρεφόμενη συσκευή (2), με τη βάση αυτή να μπορεί να περιστρέφεται κατά μία τουλάχιστον αρχική διεύθυνση σε σχέση με το αναφερθέν πλαίσιο καταμετρήσεως, και μία συσκευή καταμετρήσεως (5, 6) αποστάσεως χωρίς άμεση επαφή για την καταμέτρηση μίας αποστάσεως, κατά την αναφερθείσα πρώτη διεύθυνση, μεταξύ του αναφερθέντος πλαισίου καταμετρήσεως και μίας προκαθορισμένης επιφανείας καταμετρήσεως (7) η οποία παρέχεται επί της αναφερθείσης περιστρεφόμενης συσκευής. Η συσκευή αυτή περιλαμβάνει περαιτέρω μία δεύτερη συσκευή καταμετρήσεως (2) αποστάσεως για την καταμέτρηση μίας δεύτερης αποστάσεως, κατά μία δεύτερη διεύθυνση, μεταξύ της αναφερθείσης συσκευής και μίας επιλεγμένης θέσεως επί μίας επιφανείας ενός αντικειμένου το οποίο έχει τοποθετηθεί κατάλληλα σε σχέση με το αναφερθέν πλαίσιο καταμετρήσεως και περιλαμβάνει επίσης μία περιστρεφόμενη συσκευή καταμετρήσεως (29) για την καταμέτρηση μίας γωνίας περιστροφής μεταξύ της αναφερθείσης πρώτης και δεύτερης διευθύνσεως καταμετρήσεως. Κατ' αυτό τον τρόπο, μη σφαιρικές ή ελεύθερης μορφής επιφάνειες διαφόρων οπτικών αντικειμένων μπορούν να καταμετρηθούν με ευκολία σε μία διαδικασία κλειστού βρόγχου χωρίς να χρησιμοποιηθούν καθ' όλου παραδοχές σφαλμάτων.
CY20071100669T 2003-09-29 2007-05-17 Συσκευη και μεθοδος μετρησεως οπτικων επιφανειων ελευθερας μορφης CY1107631T1 (el)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03078094A EP1519144A1 (en) 2003-09-29 2003-09-29 Free-form optical surface measuring apparatus and method
EP04788506A EP1668318B1 (en) 2003-09-29 2004-09-29 Free-form optical surface measuring apparatus and method

Publications (1)

Publication Number Publication Date
CY1107631T1 true CY1107631T1 (el) 2013-04-18

Family

ID=34178555

Family Applications (1)

Application Number Title Priority Date Filing Date
CY20071100669T CY1107631T1 (el) 2003-09-29 2007-05-17 Συσκευη και μεθοδος μετρησεως οπτικων επιφανειων ελευθερας μορφης

Country Status (11)

Country Link
US (1) US7492468B2 (el)
EP (2) EP1519144A1 (el)
AT (1) ATE354782T1 (el)
CY (1) CY1107631T1 (el)
DE (1) DE602004004916T2 (el)
DK (1) DK1668318T3 (el)
ES (1) ES2281838T3 (el)
PL (1) PL1668318T3 (el)
PT (1) PT1668318E (el)
SI (1) SI1668318T1 (el)
WO (1) WO2005031255A1 (el)

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US8243281B2 (en) * 2007-09-25 2012-08-14 Carl Zeiss Smt Gmbh Method and system for measuring a surface of an object
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DE102008018143A1 (de) * 2008-04-10 2009-10-15 Trioptics Gmbh Vorrichtung und Verfahren zur topographischen Vermessung von Oberflächen von Gegenständen
GB2464509C (en) * 2008-10-17 2014-05-21 Taylor Hobson Ltd Surface measurement instrument and method
US8004688B2 (en) 2008-11-26 2011-08-23 Zygo Corporation Scan error correction in low coherence scanning interferometry
EP2236978B8 (en) 2009-04-01 2013-12-04 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Optical measuring device and method to determine the shape of an object and a machine to shape the object.
DE102011011065B4 (de) 2011-02-11 2013-04-04 Luphos Gmbh Verfahren und Vorrichtung zur hochpräzisen Vermessung von Oberflächen
CN102252611B (zh) * 2011-05-09 2013-11-27 深圳市澎湃图像技术有限公司 几何定位方法
JP2013213802A (ja) * 2012-03-09 2013-10-17 Canon Inc 計測装置
DE102012017015B4 (de) 2012-08-20 2015-03-19 Luphos Gmbh Verfahren und Vorrichtung zur hochpräzisen Vermessung von Oberflächen
US9212901B2 (en) 2013-04-17 2015-12-15 Corning Incorporated Apparatus and methods for performing wavefront-based and profile-based measurements of an aspheric surface
JP2015052536A (ja) * 2013-09-06 2015-03-19 キヤノン株式会社 計測装置
DE102014007201B4 (de) 2014-05-19 2016-03-10 Luphos Gmbh Vorrichtung und Verfahren zur geometrischen Vermessung eines Objekts
DE102014007203A1 (de) * 2014-05-19 2015-11-19 Luphos Gmbh Vorrichtung und Verfahren zur geometrischen Vermessung eines Objekts
EP3608626A1 (de) * 2018-08-10 2020-02-12 Taylor Hobson Limited Vorrichtung und verfahren zur geometrischen vermessung eines objekts
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Also Published As

Publication number Publication date
EP1668318B1 (en) 2007-02-21
SI1668318T1 (sl) 2007-08-31
DE602004004916T2 (de) 2007-11-22
US7492468B2 (en) 2009-02-17
EP1668318A1 (en) 2006-06-14
DK1668318T3 (da) 2007-06-18
US20060290942A1 (en) 2006-12-28
DE602004004916D1 (de) 2007-04-05
ES2281838T3 (es) 2007-10-01
ATE354782T1 (de) 2007-03-15
PL1668318T3 (pl) 2007-07-31
PT1668318E (pt) 2007-05-31
WO2005031255A1 (en) 2005-04-07
EP1519144A1 (en) 2005-03-30

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