CS259290B1 - Sublimer for vacuum device for layers preparation - Google Patents
Sublimer for vacuum device for layers preparation Download PDFInfo
- Publication number
- CS259290B1 CS259290B1 CS8610314A CS1031486A CS259290B1 CS 259290 B1 CS259290 B1 CS 259290B1 CS 8610314 A CS8610314 A CS 8610314A CS 1031486 A CS1031486 A CS 1031486A CS 259290 B1 CS259290 B1 CS 259290B1
- Authority
- CS
- Czechoslovakia
- Prior art keywords
- vacuum
- chamber
- layers
- sublimer
- vacuum device
- Prior art date
Links
- 238000002360 preparation method Methods 0.000 title claims description 7
- 238000000859 sublimation Methods 0.000 claims description 5
- 230000008022 sublimation Effects 0.000 claims description 5
- 239000000126 substance Substances 0.000 description 10
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
Vynález sa týká sublimátoru pre vákuové zariadenie na přípravu vrstiev. a pre vákuové zariadenie na úpravu povrchov tónovými zvázkami. V súčasnom období je poměrně málo rozšířené. použitie prchavých a sublimujúcich látok pri priamom nanášaní vrstiev vo vakuu a pri úpravách povrchu pevných látok tónovými zvázkami. V případe použitia prchavých látok pre nanášanie vrstiev vo vákuu sú realizované ‘ zariadenia, kde zo zásobníka prchávej, alebo sublimujúcej látky je látka unášaná tzv. nosným plynom a do vákuovej komory je· napúštaná napúšťacím ventilom.
Nevýhoda týchto princípov spočívá v tom, že do priestoru vákuovej komory sa spolu s prchavou, alebo sublimujúcou látkou dostává aj nosný plyn, ktorý vo váčšíne prípadov z htadiska přípravy vrstiev nie je potřebný a v mnohých prípadoch znečišťuje připravované vrstvy a vákuovú komoru. V prípadoch, kde sú použité pre přípravu vrstiev látky, ktoré majú už pri nízkých teplotách vysoký tlak nasýtených pár, jedná sa predovšetkým o organokovové látky a karbonyly kovov, tieto sú zvyčajne do odparovačav vo vakuových komorách vkládané priamo. V takýchto “pfípaďoCh‘ffófcháffzá k ich odparovaniu už počas čerpania vákuovej komory, čím sa znovu znečisťuje povrch podložieik a vakuová komora, a to před začiatkom technologického^ procesu.
Uvedené nedostatky odstraňuje zariadenie podta vynálezu, ktorého podstata spočívá v tom, že na komoru 1 vákuového zariadenia na přípravu vrstiev sa připojí sublimačná komora 3 cez vákuový škrtiaci ventil 4 pomocou příruby 2, pričom v spodnej časti sublimačnej komory 3 je umiestnený ohrievač 5 so zdrojom sublimátu, pričom sublimačná komora 3 je spojená s vákuovým čerpacím systémom 7 cez vákuový ventil 6. Činnost zariadenia podta vynálezu je následovně: Nezávisle na vákúovom systéme s vákuovou komorou 1 pre přípravu'vrstiev s uzatvoreným škrtiacim vákuovým ventilom 4, je možné doplnenie, alebo záměna látky v zdroji sublimátu. Komora sublimátora 3 je potom odčerpaná vákuovým čerpacím systémom 7 cez ventil 6 na tlak totožný, alebo váčší ako je vo vákuovej komoře 1 pre přípravu vrstiev. Pri samotnom nanášaní vrstiev v komoře 1, například metodou reaktívneho naparovania, igónovéh0‘ plátovania, alebo plazmovými metodami CVD, je podta potřeby otvorený vákuový škrtiaci ventil dav závislosti na použitej látke je uvedený do činnosti a regulovaný ohrievač so zdrojom látky 5.
Zariadenie podta vynálezu rozšiřuje možnosti přípravy vrstiev metodami reaktívneho naparovania, tónového plátovania plazmatických metod CVD, ako aj možnosti pri vnášaní látky do iónových zdrojov pri úpravách povrchu tónovými zvázkami.
Claims (1)
- PREDMET Sublimátor pre vákuové zariadenie na přípravu vrstiev, ktorý je připojený na vákuovú komoru vyznačený tým, že sublimačná komora (3) je cez vákuový škrtiaci ventil (4) pomocou příruby (2J připojená na komoru (lj vákuového zariadenia, pričom v spodnej časti sublimačnej komory (3) je umiestnený ohrievač (5) so zdrojom sublimátu, pričom sublimačná komora (3) je spojená s vákuovým čerpadlom (7) cez vákuový ventil (6). 1 list výkresov 259290 13 , Γ 5 > 7 Obil 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS8610314A CS259290B1 (en) | 1986-12-31 | 1986-12-31 | Sublimer for vacuum device for layers preparation |
| DD31076887A DD289656A7 (de) | 1986-12-31 | 1987-12-18 | Sublimieranlage fuer eine vakuumanlage zur herstellung von schichten |
| DE19873743342 DE3743342A1 (de) | 1986-12-31 | 1987-12-21 | Sublimator einer vakuumanlage |
| CH502187A CH674809A5 (cs) | 1986-12-31 | 1987-12-23 | |
| HU608587A HUT48826A (en) | 1986-12-31 | 1987-12-29 | Sublimating device for vacuum apparatus preparing layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS8610314A CS259290B1 (en) | 1986-12-31 | 1986-12-31 | Sublimer for vacuum device for layers preparation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CS1031486A1 CS1031486A1 (en) | 1988-02-15 |
| CS259290B1 true CS259290B1 (en) | 1988-10-14 |
Family
ID=5448609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS8610314A CS259290B1 (en) | 1986-12-31 | 1986-12-31 | Sublimer for vacuum device for layers preparation |
Country Status (5)
| Country | Link |
|---|---|
| CH (1) | CH674809A5 (cs) |
| CS (1) | CS259290B1 (cs) |
| DD (1) | DD289656A7 (cs) |
| DE (1) | DE3743342A1 (cs) |
| HU (1) | HUT48826A (cs) |
-
1986
- 1986-12-31 CS CS8610314A patent/CS259290B1/cs unknown
-
1987
- 1987-12-18 DD DD31076887A patent/DD289656A7/de not_active IP Right Cessation
- 1987-12-21 DE DE19873743342 patent/DE3743342A1/de not_active Withdrawn
- 1987-12-23 CH CH502187A patent/CH674809A5/de not_active IP Right Cessation
- 1987-12-29 HU HU608587A patent/HUT48826A/hu unknown
Also Published As
| Publication number | Publication date |
|---|---|
| HUT48826A (en) | 1989-07-28 |
| CH674809A5 (cs) | 1990-07-31 |
| CS1031486A1 (en) | 1988-02-15 |
| DD289656A7 (de) | 1991-05-08 |
| DE3743342A1 (de) | 1988-07-14 |
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