EP0321925A3 - Apparatus for analysis employing electron - Google Patents

Apparatus for analysis employing electron Download PDF

Info

Publication number
EP0321925A3
EP0321925A3 EP88121303A EP88121303A EP0321925A3 EP 0321925 A3 EP0321925 A3 EP 0321925A3 EP 88121303 A EP88121303 A EP 88121303A EP 88121303 A EP88121303 A EP 88121303A EP 0321925 A3 EP0321925 A3 EP 0321925A3
Authority
EP
European Patent Office
Prior art keywords
purge gas
pump
evacuated
oil
air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP88121303A
Other languages
German (de)
French (fr)
Other versions
EP0321925B1 (en
EP0321925A2 (en
Inventor
Yoshitsugu Tsutsumi
Shinjiro Ueda
Tadashi Otaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of EP0321925A2 publication Critical patent/EP0321925A2/en
Publication of EP0321925A3 publication Critical patent/EP0321925A3/en
Application granted granted Critical
Publication of EP0321925B1 publication Critical patent/EP0321925B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)

Abstract

An analysis system in which air in a specimen exchange chamber is evacuated by an oil-sealed rotary vacu­ um pump and which employs electron incorporates a purge gas supply means at the inlet side of the oil-sealed rotary vacuum pump. The purge gas supply means supplies a small quantity of purge gas when the air in the specimen exchange chamber is evacuated to the almost ultimate pressure of the pump.
EP88121303A 1987-12-23 1988-12-20 Apparatus for analysis employing electron Expired - Lifetime EP0321925B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP324009/87 1987-12-23
JP62324009A JP2607572B2 (en) 1987-12-23 1987-12-23 Analysis device and method using charged particles

Publications (3)

Publication Number Publication Date
EP0321925A2 EP0321925A2 (en) 1989-06-28
EP0321925A3 true EP0321925A3 (en) 1990-04-11
EP0321925B1 EP0321925B1 (en) 1997-03-26

Family

ID=18161110

Family Applications (1)

Application Number Title Priority Date Filing Date
EP88121303A Expired - Lifetime EP0321925B1 (en) 1987-12-23 1988-12-20 Apparatus for analysis employing electron

Country Status (4)

Country Link
US (1) US4889995A (en)
EP (1) EP0321925B1 (en)
JP (1) JP2607572B2 (en)
DE (1) DE3855843T2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0348759A (en) * 1989-07-18 1991-03-01 Nec Corp Fluorescent x-ray analysis apparatus
DE4136950A1 (en) * 1991-11-11 1993-05-13 Pfeiffer Vakuumtechnik MULTI-STAGE VACUUM PUMP SYSTEM
DE10032607B4 (en) * 2000-07-07 2004-08-12 Leo Elektronenmikroskopie Gmbh Particle beam device with a particle source to be operated in ultra-high vacuum and a cascade-shaped pump arrangement for such a particle beam device
EP1515359A1 (en) * 2003-09-12 2005-03-16 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Chamber with low electron stimulated desorption
GB0322889D0 (en) * 2003-09-30 2003-10-29 Boc Group Plc Vacuum pump
US7112803B2 (en) * 2004-07-23 2006-09-26 Applied Materials, Israel, Ltd. Beam directing system and method for use in a charged particle beam column
JP5016988B2 (en) * 2007-06-19 2012-09-05 株式会社日立ハイテクノロジーズ Charged particle beam apparatus and vacuum startup method thereof
US8987664B2 (en) * 2013-02-07 2015-03-24 Shimadzu Corporation Mass spectrometry device
JP6207344B2 (en) * 2013-10-30 2017-10-04 日本電子株式会社 Charged particle beam equipment
WO2016056096A1 (en) * 2014-10-09 2016-04-14 株式会社日立ハイテクノロジーズ Charged particle beam device, electron microscope and sample observation method
DE112015006315B4 (en) 2015-04-15 2021-09-23 Hitachi High-Tech Corporation Charged particle beam device and evacuation method therefor
DE102016114983A1 (en) * 2016-08-12 2018-02-15 Pfeiffer Vacuum Gmbh vacuum system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63285924A (en) * 1987-05-19 1988-11-22 Hitachi Ltd Device for manufacturing semiconductor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3385102A (en) * 1966-04-21 1968-05-28 Nat Res Corp Rapid cycle leak detection of plural test pieces
NL7010108A (en) * 1969-09-30 1971-04-01

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63285924A (en) * 1987-05-19 1988-11-22 Hitachi Ltd Device for manufacturing semiconductor

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JAPANESE JOURNAL OF APPLIED PHYSICS, Suppl. 2, pt. 1, 1974, pages 249-252, Tokyo, JP; N. YOSHIMURA et al.: "A new vacuum system for an electron microscope" *
THE JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY, vol. 8, no. 1, 1971, pages 299-307, American Institute of Physics, New York, US; D.J. SANTELER: "The use of diffusion pumps for obtaining ultraclean vacuum environments" *

Also Published As

Publication number Publication date
JPH01166457A (en) 1989-06-30
DE3855843D1 (en) 1997-04-30
US4889995A (en) 1989-12-26
DE3855843T2 (en) 1997-11-06
EP0321925B1 (en) 1997-03-26
EP0321925A2 (en) 1989-06-28
JP2607572B2 (en) 1997-05-07

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