CS212355B1 - A method of determining the measurement site for the measurement of the integrated solid phase circuit design profile by a touch profilograph - Google Patents

Abstract

The invention relates to the electrical engineering industry. The purpose of the invention is to enable precise determination of the location of the profile measurement of solid-state integrated circuit motifs by a touch profilograph. The stated purpose is achieved by using an auxiliary attachment plate with a soft surface for precise determination of the path of the scanning tip. The path of the profilograph tip is first marked on the soft surface of the auxiliary attachment plate. Then the reticle of the microscope is identified with the trace of the scanning tip on the auxiliary attachment plate. By replacing the auxiliary attachment plate with the measured object, we can easily set the desired location of the profile measurement by identifying it with the reticle of the microscope. The invention can also be used in other branches of the national economy. And wherever touch profilographs are used.

Description

(54) Method of determining the measuring point when measuring the motif profile of solid-state integrated circuit motifs by a touch profilograph

The invention relates to the electrical industry.

The object of the invention is the possibility of accurately determining the location of the measurement profile profile of the solid-state integrated circuit motifs by the touch profile.

This is accomplished by using an auxiliary insert with a soft surface to accurately detect the path of the stylus. The path of the profile of the profilograph is first marked in the surface of the auxiliary insert plate. Then the deliberate cross of the microscope aligns with the tip of the stylus on the auxiliary insert plate. By replacing the auxiliary insert with the object to be measured, it is possible to pre-set the desired measuring point by identifying it with the deliberate cross of the microscope.

The invention can also be used in other fields of national economy. And wherever touch profilographs are used.

The present invention relates to a method for determining the site of measurement in the measurement of the motif profile of solid-state integrated circuit motifs by a touch profilograph.

Previously known methods of measurement consist mainly in the use of conventional microscopes, whose disadvantage is the limited resolution given by the lens apparatus, interference microscopes, with which it is possible to measure various light-sensitive layers, which create parasitic images and an ellipsometric way, 3 x 50 yum.

These disadvantages are overcome by the proposed profile measurement method. The method of determining the measuring point for measuring the motif profile of solid-state integrated circuit motifs by a touch profilograph is to first mark the path of the profilograph tip in the surface of the auxiliary insert plate and align with the deliberate microscope cross. Sets the desired measurement location of the solid state integrated circuit design profile. The soft surface of the auxiliary insert can be obtained, for example, by incorporating glass.

By using an auxiliary insert plate it is possible to very precisely set the required measuring point and the possibility of reading the profile of the selected place with resolution up to 0,01yum, while measuring both hard and macroscopic layers of light-sensitive solutions, which occur in IC technology solid phase. Another advantage is the virtually unlimited measuring range given by the choice of vertical magnification of the touch profilograph.

An example of the proposed method is shown in the attached drawing, where FIG. 1 touch screen profiler supplemented with a microscope; Fig. 2 shows a detail of the object to be measured, FIG. 3 is a cross-sectional view of the object to be measured; FIG. 4 is a plan view of the insert with the tip of the stylus indicated.

Referring to FIG. 1, the measured object 6 is placed on a micrometer measuring table 6, which is placed on the object table 6 of the touch screen 12. A conventional microscope 6 is mounted on a special tilting stand 6 with an adjustable stop 6.

The stylus 2 passes over the insert plate 8 (FIG. 3) and leaves a narrow trace 15 on its macro surface (FIG. 4). On this track created by the stylus 2, the crosshair 10 is set. After changing the measured object 8 from the auxiliary insert plate 8, using the micrometer table 6, the selected motif 8 on the object 6 is set into the crosshair 10 (Fig. 2).

At the start of the measuring cycle in which the stylus 2 moves at a uniform speed over the set point, the measured profile is shown in the graph 1 i.

The described method of setting the measuring point can also be used to measure the profile of other objects.

Claims (4)

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for determining a measurement site for the measurement of the motifs of integrated solid phase circuitry by a touchscreen profilograph. Heretofore known methods of measurement rely mainly on the use of conventional microscopes, the disadvantage of which is the limited resolution of the objective apparatus, the interference microscopes with which the light-sensitive layers can be measured, which create parasitic patterns and the ellipsometric pattern which only achieves the distinction of details in our region. x 50 yum. These drawbacks are eliminated by the proposed profile measurement. The method of determining the location of the profile of the integrated solid phase circuitry motifs by means of the touch screen is that the path of the profilograph tip is plotted in the poppy surface of the auxiliary plate and aligned with the intentional cross of the microscope into which, after changing the auxiliary plate, measured object, sets the desired point of measurement of the integrated solid phase circuit. The soft surface of the auxiliary attachment plate can be obtained, for example, by folding the glass. By using the auxiliary attachment plate, it is possible to very accurately set the desired measurements and the possibility of subtracting the profile of the selected location with resolution up to 0.0101, further in the possibility of measuring both hard and macular layers of, for example, light-emitting solutions occurring in the integrated circuit technology solid phase. Another advantage is the virtually unlimited measuring range given by the choice of vertical touchscreen profilograph. An example of the proposed embodiment is shown in the accompanying drawing, in which: FIG. FIG. 2 shows a detail of the object to be measured, FIG. 3 is a cross-sectional view of the object, FIG. Referring to FIG. 1, the object 2 is placed on a micrometer measuring table 4, which is located on the object table 2 of the profilograph 12. A special microscope is placed on a special tilting stand 6 with an adjustable stop 2. leaving a narrow track 15 on its dummy (FIG. 4). A cross-section 10 is set on this track formed by the pick-up tip 2. After changing the object to be measured 2 to the auxiliary insert 8, the selected motif 2 is set on the object 2 into the intentional cross 10 by means of a micrometer table 4 (FIG. 2). When the measuring cycle is started, where the stylus 2 moves at a constant speed over the set point, the measured profile is displayed on the graphical record 1 i. The measurement location setting described can also be used to measure the profile of other objects. OBJECTS OF THE INVENTION The determination of the measurement site for the measurement of the integrated circuit motif profile of a fixed phase touchscreen, characterized in that the path of the profilograph tip is scanned in the dummy surface of the auxiliary attachment plate and aligned with the intentional cross of the microscope into which, after interchange of the auxiliary attachment the plate behind the object to be measured, sets the desired point of measurement of the solid phase integrated circuit pattern profile. 1 sheet of drawings Severografia. n. p., race 7, Most