CN105865389A - Micro-nanometer standard sample plate and tracking method thereof - Google Patents
Micro-nanometer standard sample plate and tracking method thereof Download PDFInfo
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- CN105865389A CN105865389A CN201610401901.0A CN201610401901A CN105865389A CN 105865389 A CN105865389 A CN 105865389A CN 201610401901 A CN201610401901 A CN 201610401901A CN 105865389 A CN105865389 A CN 105865389A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
- G01B21/04—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
- G01B21/042—Calibration or calibration artifacts
Abstract
The invention relates to a micro-nanometer standard sample plate and a tracking method thereof. The micro-nanometer standard sample plate is characterized by comprising three work regions including a region A, a region B and a region C, wherein the region A is provided with an upward arrow-shaped tracking mark; the region B is provided with a first matrix array grating and a second matrix array grating with different metering dimensions; the region C is provided with a first transverse graduated scale, a second transverse graduated scale, a third transverse graduated scale and a fourth transverse graduated scale with different metering dimensions; the region C is provided with four tracking marks in a shape of an isosceles right triangle; the tracking mark in the upward arrow shape of the region A realizes the fast positioning of the micro-nanometer standard sample plate before the measurement, and the orthometric scanning direction of the sample plate is determined; the region B and the region C can be conveniently and fast positioned; the repeated measurement is realized through the coordinate relationship.
Description
Technical field
The present invention relates to a kind of micro-and nanoscale standard and tracking method thereof, particularly open a kind of integrated across yardstick metering
Size, the micro-and nanoscale standard of multi-parameter calibration function and tracking method thereof.
Background technology
Along with the fast development in micro-nano field, to the product of small and produce equipment, measuring instrument accordingly
Device proposes higher accuracy and required precision.Length Advisory Board CCL determined and measured field at geometry in September, 1997
The comparison of several key features, respectively line width standard model (Nano1), step height standard (Nano2), line scale
Standard jig (Nano3), one-dimensional grating standard jig (Nano4), two-dimensional grating standard jig (Nano5).In quality system,
In order to realize unification and the standardization of value, it is ensured that the accuracy of geometry transmission of quantity value and traceability, the most micro-nano
Standard jig is used in the calibration of measuring instrument and the work of traceability.
The standard jig research produced for metering institute of various countries or the company of association area, current micro-nano standard sample
Plate is owing to being limited by preparation technology or mode of operation, and each model yardstick is essentially confined to micron or nanometer, crucial
Feature is the most relatively easy, causes measuring function singleness.Standard jig lacks rational sign simultaneously, is unfavorable for operating personnel
When initial measurement, the standard of tested structural region is positioned accurately and rapidly, it is difficult to realize coordinate repetition measurement.
Summary of the invention
Present invention aim to address the defect of prior art, it is provided that one can tracking, integrated take dimensions across yardstick, many
The micro-and nanoscale standard of parametric calibration function and tracking method thereof.
The present invention is achieved in that a kind of micro-and nanoscale standard and tracking method thereof, it is characterised in that: described is micro-
Nm normal model includes a-quadrant, B region and working region, three, C region；Described a-quadrant is provided with arrowhead form upwards
Tracking mark；Described B region is provided with the first matrix array grating and the second matrix array grating that difference takes dimensions；Institute
The C region stated is provided with the first horizontal rule that difference takes dimensions, the second horizontal rule, the 3rd horizontal rule and the 4th
Laterally rule, described C region is additionally provided with the tracking mark of four isosceles right triangle shapes.
Described a-quadrant and the length in B region and width are all 3mm, and the border width of described three working regions is
Structure height in 0.125mm, the frame of three working regions and three working regions is 100nm.Described a-quadrant to
On the tracking mark of arrowhead form be made up of three feature structures, the live width of three feature structures is 10 μm, symmetrical angle
It it is 60 degree.The pitch (two-dimensional grid) that the first described matrix array grating is often gone be 1 μm, the pitch of each column be 1 μm, the first matrix
The length of array grating and wide be all 600 μm；The pitch that pitch is 1.5 μm, each column that the second described matrix array grating is often gone
It is 1.5 μm.The live width of the described first laterally each scale of rule is 200nm, and described second laterally rule is each
The live width of scale is 2 μm, and the live width of the horizontal each scale of rule of described the 3rd is 20 μm, and described the 4th laterally carves
The live width of the degree each scale of chi is 200 μm.
The tracking mark of the arrowhead form upwards of described a-quadrant achieves and quickly positions micro-nano standard sample before measuring
Plate also determines the orthogonal scanning direction of model, it is simple to quickly B region, location and C region, and by the coordinate of three working regions
Relation and the parallel of normal structure or orthogonality relation, it is achieved micro-and nanoscale standard can tracking, quickly and repetition measurement.Institute
The B region stated is the enlargement ratios of plane transversal scanning of micro-nano measuring instrument such as scanning probe microscopy, picture distortion
Calibration provides the matrix array grating that two kinds of differences take dimensions.Four isosceles right triangle shapes in described C region
Tracking mark achieves and is quickly and accurately positioned the initial point of measuring in measured zone, orthogonal measuring and location when measuring, described
The tracking mark isosceles right triangle summit pointing direction of four isosceles right triangle shapes for measuring direction.Described
C region is that the calibration of the horizontal checkout precision of the micro-nano measuring instruments such as scanning probe microscopy provides four kinds of different measuring rulers
Very little horizontal rule, eliminates and changes the length standard model that difference takes dimensions and the process again verified, improve survey
Amount efficiency and the degree of accuracy, and, the measurement under same state helps to ensure that the uniformity of measurement result.
The invention has the beneficial effects as follows: the present invention can calibrate micro-nano measuring instrument longitudinally height, length and times magnification
Rate etc..The tracking of the arrowhead form upwards of a-quadrant of the present invention realizes the confirmation in orthogonal scanning direction before being identified with beneficially measuring,
And when contributing to measuring, normal structure realized quickly, be accurately positioned, by coordinate relational implementation repetition measurement, significantly carry
High measurement efficiency and evaluation precision.The present invention is provided with the horizontal rule that four kinds of differences take dimensions in C region, it is possible to
Time meet multiple micro-nano measuring instrument across yardstick, the length metering calibration requirements of multi-parameter so that micro-nano measuring instrument
It is more efficient, convenient to calibrate, and measurement result is more accurate.
Accompanying drawing explanation
Fig. 1 is the structural representation of micro-and nanoscale standard of the present invention.
Fig. 2 is the structural representation of the a-quadrant of micro-and nanoscale standard of the present invention.
Fig. 3 is the planar structure schematic diagram in the B region of micro-and nanoscale standard of the present invention.
Fig. 4 is the planar structure schematic diagram in the C region of micro-and nanoscale standard of the present invention.
Fig. 5 is that the present invention is by asking for the scan mode of the average live width that the tracking of a-quadrant arrowhead form upwards identifies
Determine the enforcement schematic diagram in orthogonal scanning direction.
Fig. 6 is that the present invention determines the enforcement schematic diagram in orthogonal scanning direction by scanning A provincial characteristics structure.
In the drawings: 1, a-quadrant；2, B region；3, C region；4, the tracking mark of arrowhead form upwards；5, first
Matrix array grating；6, the second matrix array grating；7, the first horizontal rule；8, the second horizontal rule；9, the 3rd
Laterally rule；10, the 4th horizontal rule；11, the tracking mark of isosceles right triangle shape；12, the first scanning side
To；13, the second scanning direction；14, orthogonal scanning direction.
Detailed description of the invention
With reference to the accompanying drawings 1～4, the structure of micro-and nanoscale standard of the present invention includes a-quadrant 1,3 three, region, B region 2 and C
Working region；Described a-quadrant 1 is provided with the tracking mark 4 of arrowhead form upwards；Described B region 2 is provided with different measuring ruler
The first very little matrix array grating 5 and the second matrix array grating 6；Described C region 3 is provided with the first horizontal stroke that difference takes dimensions
To rule 7, the second horizontal rule of horizontal rule the 8, the 3rd 9 and the 4th horizontal rule 10, described C region 3 also sets
There is the tracking mark 11 of four isosceles right triangle shapes.
Length and the width in region 2, described a-quadrant 1 and B are all 3mm, and the border width of described three working regions is
Structure height in 0.125mm, the frame of three working regions and three working regions is 100nm.Described a-quadrant 1
The tracking mark 4 of arrowhead form upwards is made up of three feature structures, and the live width of three feature structures is 10 μm, symmetrical folder
Angle is 60 degree.The pitch (two-dimensional grid) that the first described matrix array grating 5 is often gone be 1 μm, the pitch of each column be 1 μm, first
The length of matrix array grating 5 and wide be all 600 μm；The pitch that the second described matrix array grating 6 is often gone is 1.5 μm, each column
Pitch be 1.5 μm.The live width of the described first laterally each scale of rule 7 is 200nm, described second laterally scale
The live width of each scale of chi 8 is 2 μm, and the live width of the horizontal each scale of rule 9 of described the 3rd is 20 μm, described
The live width of the four horizontal each scales of rule 10 is 200 μm.
The tracking mark 4 of the arrowhead form upwards of described a-quadrant 1 achieves the micro-nano standard that quickly positions before measuring
Model also determines the orthogonal scanning direction of model, it is simple to quickly region 3, B region 2 and C, location, and by three working regions
Coordinate relation and the parallel of normal structure or orthogonality relation, it is achieved micro-and nanoscale standard can tracking, quickly survey with repeatability
Amount.Described B region 2 is the micro-nano measuring instruments such as scanning probe microscopy at the enlargement ratio of plane transversal scanning, figure
The calibration of distortion provides the matrix array grating that two kinds of differences take dimensions.Four isosceles right triangles in described C region 3
The tracking mark 11 of shape achieves and is quickly and accurately positioned the initial measurement in measured zone, orthogonal measuring and location when measuring
Point, the tracking of four described isosceles right triangle shapes identifies 11 isosceles right triangle summit pointing directions for measurement side
To.The calibration of the described horizontal checkout precision that C region 3 is the micro-nano measuring instruments such as scanning probe microscopy provides four kinds
The horizontal rule that difference takes dimensions, eliminates and changes the standard jig that difference takes dimensions and the process again verified, carry
High measurement efficiency and the degree of accuracy, and, the measurement under same state helps to ensure that the uniformity of measurement result.
The present invention can determine orthogonal scanning direction by two ways, explains further below in conjunction with specific embodiment
State the present invention.
Embodiment 1:
With reference to the accompanying drawings 5, the present invention is by having non-orthogonal first scanning direction 12 and second scanning direction 13 of angle theta, logical
Cross average live width p1And p2, cosine relation based on twice drift angle, determine the orthogonal side that the tracking of arrowhead form upwards identifies
To, i.e. orthogonal scanning direction 14.
Embodiment 2:
With reference to the accompanying drawings 6, the present invention measures A by suitable sampling interval and the scan mode comprising five effective scanning outline lines
The profile pattern of the tracking mark of region arrowhead form upwards, in figure, the straight line of band arrow is effective measurement data, arrow
Direction is scanning direction, and the dotted line in figure has been the most mobile to during next stage starting point after certain stage scan line
Path；Use image processing techniques to process measurement data, obtain the average live width of five outline lines, according to minimum feature
Principle, determines orthogonal scanning direction.
The present invention can calibrate micro-nano measuring instrument longitudinally height, length and enlargement ratio etc..A-quadrant of the present invention to
On the tracking of arrowhead form be identified with beneficially measuring before realize the confirmation in orthogonal scanning direction, and to mark when contributing to measuring
Quasi-structure realizes quickly, is accurately positioned, and by coordinate relational implementation repetition measurement, substantially increases measurement efficiency and evaluates essence
Degree.The present invention is provided with the horizontal rule that four kinds of differences take dimensions in C region, it is possible to meet multiple micro-nano measurement simultaneously
Instrument is across yardstick, the length metering calibration requirements of multi-parameter so that the calibration of micro-nano measuring instrument is more efficient, convenient, measures
Result is more accurate.
Claims (4)
1. a micro-and nanoscale standard, it is characterised in that: described micro-and nanoscale standard includes a-quadrant, B region and C district
Working region, three, territory；Described a-quadrant is provided with the tracking mark of arrowhead form upwards；Described B region is provided with different meter
The the first matrix array grating taken measurements and the second matrix array grating；Described C region is provided with first that difference takes dimensions
Laterally rule, the second horizontal rule, the 3rd horizontal rule and the 4th horizontal rule, described C region is additionally provided with four
The tracking mark of individual isosceles right triangle shape.
2. a tracking method based on the micro-and nanoscale standard described in claim 1, it is characterised in that: described a-quadrant
The tracking mark of arrowhead form upwards achieve the most quickly location micro-and nanoscale standard determine that model is just
Hand over scanning direction, it is simple to quickly B region, location and C region, and by coordinate relational implementation repetition measurement.
3. according to the tracking method of a kind of micro-and nanoscale standard described in claim 2, it is characterised in that: described B district
Territory is that the calibration of the horizontal checkout precision parameter of micro-nano measuring instrument provides the matrix array light that two kinds of differences take dimensions
Grid.
4. according to the tracking method of a kind of micro-and nanoscale standard described in claim 2, it is characterised in that: described C region
Four isosceles right triangle shapes tracking mark achieve measure time be quickly and accurately positioned measured zone, location
Initial measurement point.
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| CN201610401901.0A CN105865389B (en) | 2016-06-08 | 2016-06-08 | A kind of micro-and nanoscale standard and its tracking method |
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| CN201610401901.0A CN105865389B (en) | 2016-06-08 | 2016-06-08 | A kind of micro-and nanoscale standard and its tracking method |
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Cited By (5)
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| CN106017383A (en) * | 2016-06-22 | 2016-10-12 | 中国电子科技集团公司第十三研究所 | Contact-type step gauge probe detection pattern sample block |
| CN107993956A (en) * | 2017-11-29 | 2018-05-04 | 中国电子科技集团公司第十三研究所 | The preparation method of line-spacing standard sample of photo |
| CN109444473A (en) * | 2018-12-24 | 2019-03-08 | 中国电子科技集团公司第十三研究所 | The tracking method of line width standard print and line width standard print Plays lines |
| CN110793433A (en) * | 2019-09-26 | 2020-02-14 | 西安交通大学 | On-line calibration wafer micro-nano step height standard template and tracking method thereof |
| CN110986846A (en) * | 2019-12-10 | 2020-04-10 | 中国计量科学研究院 | Multi-quantity metering standard device and preparation method thereof |
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| CN107993956B (en) * | 2017-11-29 | 2020-07-07 | 中国电子科技集团公司第十三研究所 | Preparation method of line spacing standard sample wafer |
| CN109444473A (en) * | 2018-12-24 | 2019-03-08 | 中国电子科技集团公司第十三研究所 | The tracking method of line width standard print and line width standard print Plays lines |
| CN109444473B (en) * | 2018-12-24 | 2021-06-15 | 中国电子科技集团公司第十三研究所 | Line width standard sample and tracking method of standard lines in line width standard sample |
| CN110793433A (en) * | 2019-09-26 | 2020-02-14 | 西安交通大学 | On-line calibration wafer micro-nano step height standard template and tracking method thereof |
| CN110986846A (en) * | 2019-12-10 | 2020-04-10 | 中国计量科学研究院 | Multi-quantity metering standard device and preparation method thereof |
| CN110986846B (en) * | 2019-12-10 | 2022-04-29 | 中国计量科学研究院 | Multi-quantity metering standard device and preparation method thereof |
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| CN105865389B (en) | 2018-11-02 |
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