CN105865389B - A kind of micro-and nanoscale standard and its tracking method - Google Patents
A kind of micro-and nanoscale standard and its tracking method Download PDFInfo
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- CN105865389B CN105865389B CN201610401901.0A CN201610401901A CN105865389B CN 105865389 B CN105865389 B CN 105865389B CN 201610401901 A CN201610401901 A CN 201610401901A CN 105865389 B CN105865389 B CN 105865389B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
- G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
- G01B21/04—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness by measuring coordinates of points
- G01B21/042—Calibration or calibration artifacts
Abstract
The present invention is a kind of micro-and nanoscale standard and its tracking method, it is characterised in that：The micro-and nanoscale standard includes a-quadrant, B area and three, the regions C working region；The tracking that the a-quadrant is equipped with upward arrowhead form identifies；The B area is equipped with different the first matrix array gratings and the second matrix array grating to take dimensions；The regions C are equipped with different the first transverse direction graduated scales to take dimensions, the second lateral graduated scale, third transverse direction graduated scale and the 4th lateral graduated scale, the regions C and are additionally provided with the tracking mark of four isosceles right triangle shapes.The tracking mark of the upward arrowhead form of the a-quadrant realizes before measuring quickly positioning micro-and nanoscale standard and determines the orthogonal scanning direction of model, convenient for quickly positioning B area and the regions C, and passes through coordinate relational implementation repetition measurement.
Description
Technical field
The present invention relates to a kind of micro-and nanoscale standard and its tracking methods, especially disclose a kind of integrated across scale metering
The micro-and nanoscale standard and its tracking method of size, multi-parameter calibration function.
Background technology
With the fast development in micro-nano field, the product to small and corresponding production equipment, measuring instrument
Device proposes higher accuracy and required precision.1997 Nian9Yue length Advisory Board CCL are determined measures field in geometry
Several key features comparison, respectively line width standard model（Nano1）, step height standard（Nano2）, line scale
Standard jig（Nano3）, one-dimensional grating standard jig（Nano4）, two-dimensional grating standard jig（Nano5）.In quality system,
In order to realize the unification and standardization of magnitude, the accuracy and traceability of guarantee geometry transmission of quantity value are more and more micro-nano
Standard jig is used in the calibration of measuring instrument and the work of traceability.
For the standard jig research that the company of metering institute of various countries or related field has produced, current micro-nano standard sample
For plate due to being limited by preparation process or mode of operation, each model scale is essentially confined to micron or nanometer, crucial
Feature is also relatively easy, and measurement is caused to have a single function.Standard jig lacks rational sign simultaneously, is unfavorable for operating personnel
The standard for being tested structural region is accurately and rapidly positioned in initial measurement, it is difficult to realize coordinate repetition measurement.
Invention content
Present invention aim to address the defect of the prior art, provide one kind can tracking, integrated take dimensions across scale, be more
The micro-and nanoscale standard and its tracking method of parametric calibration function.
The invention is realized in this way：A kind of micro-and nanoscale standard and its tracking method, it is characterised in that：Described is micro-
Nm normal model includes a-quadrant, B area and three, the regions C working region；The a-quadrant is equipped with upward arrowhead form
Tracking mark；The B area is equipped with different the first matrix array gratings and the second matrix array grating to take dimensions；Institute
The regions C stated are equipped with different the first transverse direction graduated scales to take dimensions, the second lateral graduated scale, third transverse direction graduated scale and the 4th
Lateral graduated scale, the regions C are additionally provided with the tracking mark of four isosceles right triangle shapes.
The length and width of the a-quadrant and B area are all 3mm, and the border width of three working regions is
0.125mm, the frame of three working regions and the structure height in three working regions are 100nm.The a-quadrant to
On arrowhead form tracking mark be made of three feature structures, the line width of three feature structures is 10 μm, symmetrical angle
It is 60 degree.The pitch that the first matrix array grating is often gone（Two-dimensional grid）Pitch for 1 μm, each column is 1 μm, the first matrix
The length of array grating and it is wide all be 600 μm；The pitch that the second matrix array grating is often gone is 1.5 μm, the pitch of each column
It is 1.5 μm.The line width of each scale of the lateral graduated scale of described first is 200nm, and the described second lateral graduated scale is each
The line width of scale is 2 μm, and the line width of each scale of third transverse direction graduated scale is 20 μm, and the described the 4th laterally carves
The line width for spending each scale of ruler is 200 μm.
The tracking mark of the upward arrowhead form of the a-quadrant realizes quickly positions micro-nano standard sample before measuring
Plate and the orthogonal scanning direction for determining model convenient for quickly positioning B area and the regions C, and pass through the coordinate of three working regions
Relationship is parallel with normal structure or orthogonality relation, and that realizes micro-and nanoscale standard can tracking, quickly and repetition measurement.Institute
The B area stated is the enlargement ratio of the plane transversal scanning of micro-nano measuring instrument such as scanning probe microscopy, picture distortion
Calibration provides the matrix array grating that two kinds of differences take dimensions.Four isosceles right triangle shapes in the regions C
Tracking mark realizes and is quickly and accurately positioned measured zone, orthogonal measuring and positioning starting measurement point when measuring, described
The tracking mark isosceles right triangle vertex pointing directions of four isosceles right triangle shapes be measurement direction.Described
The regions C provide four kinds of different measuring rulers for the calibration of the horizontal checkout precision of the micro-nano measuring instrument such as scanning probe microscopy
Very little lateral graduated scale eliminates the different length standard models to take dimensions of replacement and the process verified again, improves survey
Amount efficiency and accuracy, also, the measurement under same state helps to ensure that the consistency of measurement result.
The beneficial effects of the invention are as follows：The present invention can calibrate the longitudinal height of micro-nano measuring instrument, length and times magnification
Rate etc..The tracking of the upward arrowhead form of a-quadrant of the present invention is identified with to measure the preceding confirmation for realizing orthogonal scanning direction,
And quick, accurate positionin is realized to normal structure when helping to measure, by coordinate relational implementation repetition measurement, is carried significantly
High measurement efficiency and evaluation precision.The present invention is provided with the lateral graduated scale that four kinds of differences take dimensions, Neng Goutong in the regions C
When meet a variety of micro-nano measuring instruments across scale, the length metering calibration requirements of multi-parameter so that micro-nano measuring instrument
It is more efficient, convenient to calibrate, and measurement result is more acurrate.
Description of the drawings
Fig. 1 is the structural schematic diagram of micro-and nanoscale standard of the present invention.
Fig. 2 is the structural schematic diagram of the a-quadrant of micro-and nanoscale standard of the present invention.
Fig. 3 is the planar structure schematic diagram of the B area of micro-and nanoscale standard of the present invention.
Fig. 4 is the planar structure schematic diagram in the regions C of micro-and nanoscale standard of the present invention.
Fig. 5 is the scan mode for the average line width that the tracking of the invention by seeking the upward arrowhead form in a-quadrant identifies
To determine the implementation schematic diagram in orthogonal scanning direction.
Fig. 6 is that the present invention determines the implementation schematic diagram in orthogonal scanning direction by scanning A provincial characteristics structure.
In figure：1, a-quadrant；2, B area；3, the regions C；4, the tracking mark of upward arrowhead form；5, first
Matrix array grating；6, the second matrix array grating；7, the first lateral graduated scale；8, the second lateral graduated scale；9, third
Lateral graduated scale；10, the 4th lateral graduated scale；11, the tracking mark of isosceles right triangle shape；12, the first scanning side
To；13, the second scanning direction；14, orthogonal scanning direction.
Specific implementation mode
With reference to the accompanying drawings 1~4, the structure of micro-and nanoscale standard of the present invention includes a-quadrant 1, B area 2 and 3 three, the regions C
Working region；The a-quadrant 1 is equipped with the tracking mark 4 of upward arrowhead form；The B area 2 is equipped with different measuring rulers
Very little the first matrix array grating 5 and the second matrix array grating 6；It is horizontal that the regions C 3 are equipped with different first to take dimensions
To the lateral graduated scale 8 of graduated scale 7, second, third transverse direction graduated scale 9 and the 4th lateral graduated scale 10, the regions C 3 are also set
There are four the tracking of isosceles right triangle shape marks 11.
The length and width of the a-quadrant 1 and B area 2 are all 3mm, and the border width of three working regions is
0.125mm, the frame of three working regions and the structure height in three working regions are 100nm.The a-quadrant 1
The tracking mark 4 of upward arrowhead form is made of three feature structures, and the line width of three feature structures is 10 μm, symmetrical folder
Angle is 60 degree.The pitch that the first matrix array grating 5 is often gone（Two-dimensional grid）Pitch for 1 μm, each column is 1 μm, first
The length of matrix array grating 5 and it is wide all be 600 μm；The pitch that the second matrix array grating 6 is often gone is 1.5 μm, each column
Pitch be 1.5 μm.The line width of the 7 each scale of lateral graduated scale of described first is 200nm, the described second lateral scale
The line width of 8 each scale of ruler is 2 μm, and the line width of 9 each scale of third transverse direction graduated scale is 20 μm, and described
The line width of four 10 each scales of lateral graduated scale is 200 μm.
The tracking mark 4 of the upward arrowhead form of the a-quadrant 1 realizes quickly positions micro-nano standard before measuring
Model and the orthogonal scanning direction for determining model convenient for the quickly positioning B area 2 and regions C 3, and pass through three working regions
Coordinate relationship is parallel with normal structure or orthogonality relation, realize micro-and nanoscale standard can tracking, quickly survey with repeatability
Amount.The B area 2 is enlargement ratio, the figures of the micro-nano measuring instrument in plane transversal scanning such as scanning probe microscopy
The calibration of distortion provides the matrix array grating that two kinds of differences take dimensions.Four isosceles right triangles in the regions C 3
The tracking mark 11 of shape, which is realized, is quickly and accurately positioned measured zone, orthogonal measuring and positioning starting measurement when measuring
Point, it is measurement side that the tracking of described four isosceles right triangle shapes, which identifies 11 isosceles right triangle vertex pointing directions,
To.The regions C 3 provide four kinds for the calibration of the horizontal checkout precision of the micro-nano measuring instrument such as scanning probe microscopy
The lateral graduated scale that difference takes dimensions eliminates the different standard jigs to take dimensions of replacement and the process verified again, carries
High measurement efficiency and accuracy, also, the measurement under same state helps to ensure that the consistency of measurement result.
The present invention can determine orthogonal scanning direction by two ways, further be explained with reference to specific embodiment
State the present invention.
Embodiment 1：
With reference to the accompanying drawings 5, the present invention passes through with angleθ12 and second scanning direction of non-orthogonal first scanning direction
13, pass through average line widthp 1 Withp 2 , based on the cosine relation of drift angle twice, determining the tracking mark of upward arrowhead form just
Hand over direction, i.e. orthogonal scanning direction 14.
Embodiment 2：
With reference to the accompanying drawings 6, the present invention is by sampling interval appropriate and includes the scan modes of five effective scanning contour lines
The profile pattern of the tracking mark of the upward arrowhead form in a-quadrant is measured, straight line with the arrow is effective measurement data in figure,
Arrow direction is scanning direction, and the dotted line in figure is to be fast moved to next stage starting point after completing certain stage scan line
When path；Measurement data is handled using image processing techniques, the average line width of five contour lines is obtained, according to minimum
Line width principle determines orthogonal scanning direction.
The present invention can calibrate the longitudinal height of micro-nano measuring instrument, length and enlargement ratio etc..A-quadrant of the present invention to
On arrowhead form tracking be identified with conducive to when realizing the confirmation in orthogonal scanning direction before measuring, and helping to measure to mark
Quasi- structure realizes quick, accurate positionin, by coordinate relational implementation repetition measurement, substantially increases measurement efficiency and evaluation essence
Degree.The present invention is provided with the lateral graduated scale that four kinds of differences take dimensions in the regions C, can meet a variety of micro-nano measurements simultaneously
Instrument is across scale, the length metering calibration requirements of multi-parameter so that the calibration of micro-nano measuring instrument is more efficient, convenient, measures
As a result more acurrate.
Claims (3)
1. a kind of tracking method of micro-and nanoscale standard, it is characterised in that：The micro-and nanoscale standard includes a-quadrant, B
Region and three, the regions C working region；The tracking that the a-quadrant is equipped with upward arrowhead form identifies；The B area is set
There are different the first matrix array gratings and the second matrix array grating to take dimensions；The regions C are equipped with different measuring rulers
The lateral graduated scale of very little first, the second lateral graduated scale, third transverse direction graduated scale and the 4th lateral graduated scale, the regions C
It is additionally provided with the tracking mark of four isosceles right triangle shapes, the tracking mark of the upward arrowhead form of the a-quadrant is real
The orthogonal scanning direction for quickly positioning micro-and nanoscale standard before measuring and determining model is showed, convenient for quickly positioning B area
With the regions C, and pass through coordinate relational implementation repetition measurement.
2. according to a kind of tracking method of micro-and nanoscale standard described in claim 1, it is characterised in that：The areas B
Domain provides the matrix array light that two kinds of differences take dimensions for the calibration of the horizontal checkout precision parameter of micro-nano measuring instrument
Grid.
3. according to a kind of tracking method of micro-and nanoscale standard described in claim 1, it is characterised in that：The regions C
Four isosceles right triangle shapes tracking mark realize measure when be quickly and accurately positioned measured zone, positioning
Originate measurement point.
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| CN105865389B true CN105865389B (en) | 2018-11-02 |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106017383B (en) * | 2016-06-22 | 2018-10-19 | 中国电子科技集团公司第十三研究所 | Contact step instrument probe in detecting figure sample block |
| CN107993956B (en) * | 2017-11-29 | 2020-07-07 | 中国电子科技集团公司第十三研究所 | Preparation method of line spacing standard sample wafer |
| CN109444473B (en) * | 2018-12-24 | 2021-06-15 | 中国电子科技集团公司第十三研究所 | Line width standard sample and tracking method of standard lines in line width standard sample |
| CN110793433B (en) * | 2019-09-26 | 2021-11-19 | 西安交通大学 | On-line calibration wafer micro-nano step height standard template and tracking method thereof |
| CN110986846B (en) * | 2019-12-10 | 2022-04-29 | 中国计量科学研究院 | Multi-quantity metering standard device and preparation method thereof |
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