CN214333693U - Standard device for calibrating horizontal indicating value error of three-dimensional microscope - Google Patents
Standard device for calibrating horizontal indicating value error of three-dimensional microscope Download PDFInfo
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- CN214333693U CN214333693U CN202023126234.0U CN202023126234U CN214333693U CN 214333693 U CN214333693 U CN 214333693U CN 202023126234 U CN202023126234 U CN 202023126234U CN 214333693 U CN214333693 U CN 214333693U
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Abstract
The utility model relates to a etalon for three-dimensional microscope horizontal indicating value error calibration, including tracking structure and work area, the tracking structure is located work area's the outside, work area includes a plurality of subregions, the subregion includes matrix two-dimensional grid structure, and is a plurality of the measurement size of two at least matrix two-dimensional grids in the subregion is different, the tracking structure includes the tracking sign, the tracking sign is located the work area outside, the tracking sign is used for the supplementary guide operator location matrix two-dimensional grid structure position. By providing a matrix two-dimensional grid structure with different metering sizes, the range of the instrument models applicable to the standard instrument is expanded; the problem of need change the etalon many times when calibrating different multiplying power lenses among the prior art, measurement inefficiency influences the measuring result accuracy is solved.
Description
Technical Field
The utility model relates to a three-dimensional microscope calibration technical field especially relates to a etalon that is used for three-dimensional microscope horizontal indicating value error calibration.
Background
A three-dimensional microscope based on a reconstruction method is a non-contact measuring device for measuring the three-dimensional surface topography of a workpiece, and the basic principle is that a large number of two-dimensional tomographic images are collected and are reconstructed by software to obtain a three-dimensional image of the surface of the workpiece. The conventional three-dimensional microscope based on a reconstruction method mainly comprises a white light interferometer, a confocal microscope, an optical three-dimensional scanning measuring instrument and the like, has the characteristics of rapid and non-contact measurement for obtaining material roughness, two-dimensional/three-dimensional surface analysis and high-resolution imaging, and is widely applied to various fields of semiconductor circuits, LEDs, solar cells, thin-film materials, MEMS, precise mechanical parts, friction and abrasion and the like.
At present, the national standard related to the calibration of the three-dimensional microscope products is in a blank state, the standard device for the calibration is still not complete, and as a three-dimensional image test device, the longitudinal calibration can be realized by using a step height standard device, but the standard device for the transverse calibration is not complete. Considering the three-dimensional reconstruction characteristics of the instrument, the standard is required to have high transverse and longitudinal verticality in the three-dimensional line morphology, the traditional standards such as a line ruler are not applicable any more, and a one-dimensional grid or a two-dimensional grid for micro-nano dimension length calibration can be considered. In order to simultaneously measure the linear effect and the magnification of the instrument in a planar lateral scan, it is recommended to perform a lateral calibration using a two-dimensional grid. However, because the three-dimensional microscope products have a large measurement range span due to lenses with different magnifications, the existing two-dimensional grids in the market at present are single in size, and need to be equipped with various size standards to carry out calibration work, so that the purchase and maintenance costs of the standard device can be greatly increased.
Therefore, a standard device which can be applied to various instruments and can improve the measurement efficiency and accuracy is needed to solve the above technical problems.
Disclosure of Invention
In order to solve the technical problem, the utility model provides a etalon for three-dimensional microscope horizontal indicating value error calibration. The problem of need change the etalon many times when calibrating different multiplying power lenses among the prior art, measurement inefficiency influences the measuring result accuracy is solved.
The technical effects of the utility model are through following realization:
a calibrator for calibrating lateral registration errors of a three-dimensional microscope comprises a tracking structure and a working area, wherein the tracking structure is located on the outer side of the working area, the working area comprises a plurality of sub-areas, the sub-areas comprise a matrix two-dimensional grid structure, the measuring sizes of at least two matrix two-dimensional grids in the sub-areas are different, the tracking structure comprises a tracking mark, the tracking mark is located on the outer side of the working area, and the tracking mark is used for assisting in guiding an operator to position the matrix two-dimensional grid structure. The working area provides various matrix two-dimensional grid structures with different metering sizes for the calibration of the transverse length measurement indicating value error and the graphic distortion of the three-dimensional optical microscope, the range of the instrument models applicable to the standard instrument is improved, the process of replacing the standard instrument when calibrating lenses with different multiplying powers is omitted, the measuring efficiency and accuracy are improved, and the consistency of measuring results is guaranteed. The tracking mark can quickly position the grid position of the standard measuring size before measurement, so that the tracking, quick and repeated measurement of the standard template in the measuring process is realized.
Further, the tracking structure is square.
Further, the tracking marks are located on the inner sides of the four sides of the square.
Further, the tracking is identified as a triangle, with one vertex of the triangle pointing to the work area.
Further, the grid sizes in the corresponding matrix two-dimensional grid structures in the same sub-region are the same.
Further, the pitch of each row and each column of the grid in the matrix two-dimensional grid structure corresponding to the same sub-region is the same.
Further, the sub-regions are marked with the pitch of the matrix two-dimensional grid structure.
Further, the height of the grids in the matrix two-dimensional grid structure is the same.
Further, a plurality of the sub-regions are combined to form a square.
Further, the tracking structure and the working area are integrated.
As described above, the utility model discloses following beneficial effect has:
1) through setting up the matrix two-dimensional lattice structure of multiple different measurement size, improved the applicable instrument model scope of etalon, saved the process of changing the etalon when the different multiplying power camera lenses of calibration, improved measuring efficiency and accuracy, help guaranteeing the uniformity of measuring result.
2) Through setting up the tracking sign for can fix a position standard measurement size grid position before measuring fast, thereby realize the measurement of can tracking, quick and the repeatability of standard template in the measurement process.
Drawings
In order to more clearly illustrate the technical solution of the present invention, the drawings used in the description of the embodiment or the prior art will be briefly described below. It is obvious that the drawings in the following description are only some embodiments of the invention, and that for a person skilled in the art, other drawings can be derived from them without inventive effort.
FIG. 1 is a schematic diagram of a etalon structure according to an embodiment of the present application;
wherein the reference numerals in the figures correspond to:
the tracking structure 1, the tracking mark 11, the working area 2, the sub-area 21, the first sub-area 211, the second sub-area 212, the third sub-area 213, the fourth sub-area 214, the fifth sub-area 215, the sixth sub-area 216, the two-dimensional grid 22, the first two-dimensional grid 221, the second two-dimensional grid 222, the third two-dimensional grid 223, the fourth two-dimensional grid 224, the fifth two-dimensional grid 225, and the sixth two-dimensional grid 226.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
Example 1:
the utility model provides a etalon for three-dimensional microscope transversely shows value error calibration, the whole appearance of etalon be the square, including the tracking structure 1 that is located outer region and the work area 2 that is located inner region, tracking structure 1 and work area 2 be the integral structure, tracking structure 1 is located the outer region of etalon, work area 2 is located the inner region of etalon, work area 2 is equipped with 6 different measurement size's matrix two-dimensional grid 22, is first matrix two-dimensional grid 221, second matrix two-dimensional grid 222, third matrix two-dimensional grid 223, fourth matrix two-dimensional grid 224, fifth matrix two-dimensional grid 225 and sixth matrix two-dimensional grid 226 respectively, and the grid size is the same in every matrix two-dimensional grid 22, every row and every row of grid are the same, the pitch is the distance between the grids, and the grid heights of the 6 matrix two-dimensional grids 22 are the same.
In this embodiment, the tracking structure includes 8 tracking signs 11 of the same size, and tracking sign 11 is the protruding structure of triangle-shaped, and tracking sign 11 evenly distributed is the inboard on four limits of outer layer square, and outer layer square length of side is 20mm, and a summit of every triangle all points to work area 2. The position of the standard measuring size grid can be quickly positioned before measurement through the tracking identification, so that the tracking, quick and repeated measurement of the standard template in the measuring process is realized.
In this embodiment, the working area 2 is a square with a side length of 15mm, and is divided into 6 rectangular sub-areas 21 by a frame line, which are respectively a first sub-area 211, a second sub-area 212, a third sub-area 213, a fourth sub-area 214, a fifth sub-area 215, and a sixth sub-area 216, where a first matrix two-dimensional grid 221, a second matrix two-dimensional grid 222, a third matrix two-dimensional grid 223, a fourth matrix two-dimensional grid 224, a fifth matrix two-dimensional grid 225, and a sixth matrix two-dimensional grid 226 are respectively located in the first sub-area 211, the second sub-area 212, the third sub-area 213, the fourth sub-area 214, the fifth sub-area 215, and the sixth sub-area 216, the 6 matrix two-dimensional grids 22 are all marked with respective pitch size text marks, and the frame of the working area 2 and the height of the matrix two-dimensional grids 22 in the 6 sub-areas 21 are both 100 nm.
In this embodiment, the pitch of each row of the first two-dimensional matrix grid 221 in the first sub-region 211 is 100 μm, the pitch of each column is 100 μm, and the text label "100 μm" is provided below the first two-dimensional matrix grid 221; the pitch of each row of the second matrix two-dimensional grid 222 in the second sub-region 212 is 50 μm, the pitch of each column is 50 μm, and a character mark '50 μm' is arranged below the second matrix two-dimensional grid 222; the pitch of each row of the third matrix two-dimensional grid 223 in the third subregion 213 is 20 μm, the pitch of each column is 20 μm, and a character mark '20 μm' is arranged below the third matrix two-dimensional grid 223; the pitch of each row of the fourth matrix two-dimensional grid 224 in the fourth sub-region 214 is 10 μm, the pitch of each column is 10 μm, and the character mark "10 μm" is arranged below the fourth matrix two-dimensional grid 224; the pitch of each row of the fifth matrix two-dimensional grid 225 in the fifth sub-region 214 is 5 μm, the pitch of each column is 5 μm, and a character mark '5 μm' is arranged below the fifth matrix two-dimensional grid 225; the pitch of each row of the sixth matrix two-dimensional grid 226 in the sixth sub-area 216 is 2 μm, the pitch of each column is 2 μm, and the text label "2 μm" is placed under the sixth matrix two-dimensional grid 226. The working area provides 6 matrixes two-dimensional grids with different metering sizes for the calibration of the transverse length measurement indicating value error and the graphic distortion of the three-dimensional optical microscope, the range of the types of instruments applicable to the standard is widened, the process of replacing the standard when lenses with different multiplying powers are calibrated is omitted, the measuring efficiency and accuracy are improved, and the consistency of measuring results is guaranteed.
Specifically, the etalon may be moved left and right at the time of measurement calibration to select one sub-region from a plurality of sub-regions thereof as a calibration region to be placed in the field of view of the objective lens, the number of grids appearing in the field of view of the objective lens of the selected calibration region being within a predetermined range, avoiding a situation where the number of grids appearing in the field of view of the objective lens is too large or too small, which might otherwise cause insufficient calculation accuracy when the magnification is large, or a situation where the number of grids in the field of view of the objective lens is too large when the magnification is small, which would cause large calculation amount and time consumption, and when calibration is performed by switching to another objective lens having a larger or smaller magnification, the etalon may be moved accordingly again to select another calibration region having a smaller or larger grid.
As described above, the utility model discloses following beneficial effect has:
1) through setting up the matrix two-dimensional lattice structure of multiple different measurement size, improved the applicable instrument model scope of etalon, saved the process of changing the etalon when the different multiplying power camera lenses of calibration, improved measuring efficiency and accuracy, help guaranteeing the uniformity of measuring result.
2) Through setting up the tracking sign for can fix a position standard measurement size grid position before measuring fast, thereby realize the measurement of can tracking, quick and the repeatability of standard template in the measurement process.
In this document, the terms front, back, up, down, and the like are used for the sake of clarity and convenience only in describing the technical solutions in which the devices are located in the drawings and the devices are located relative to each other. It is to be understood that the use of the directional terms should not be taken to limit the scope of the claims.
The embodiments and features of the embodiments described herein above can be combined with each other without conflict.
The above disclosure is only a preferred embodiment of the present invention, and certainly should not be taken as limiting the scope of the invention, which is defined by the claims and their equivalents.
Claims (10)
1. A calibrator for lateral registration error calibration of a three-dimensional microscope, comprising a tracking structure (1) and a working area (2), wherein the tracking structure (1) is located outside the working area (2), the working area (2) comprises a plurality of sub-areas (21), the sub-areas (21) comprise a matrix two-dimensional grid (22) structure, the measuring sizes of at least two matrix two-dimensional grids (22) in the plurality of sub-areas (21) are different, the tracking structure (1) comprises a tracking identifier (11), the tracking identifier (11) is located outside the working area (2), and the tracking identifier (11) is used for assisting in guiding an operator to position the matrix two-dimensional grid (22) structure.
2. The etalon of claim 1 wherein the tracking structure (1) is square.
3. The standard according to claim 2, wherein the tracking marks (11) are located inside the four sides of the square.
4. A standard according to claim 3, wherein the tracking indicator (11) is a triangle, one vertex of which is directed towards the working area (2).
5. The etalon of claim 1 wherein the grid sizes in corresponding matrix two-dimensional grid (22) structures in the same sub-region (21) are the same.
6. Etalon according to claim 5, wherein the pitch of each row and each column of the grid in the corresponding matrix two-dimensional grid (22) structure in the same sub-region (21) is the same.
7. The etalon of claim 6 wherein the sub-regions (21) have the pitch of the matrix two-dimensional grid (22) structure defined therein.
8. The etalon of claim 7 wherein the height of the cells in the matrix two dimensional cell (22) structure is the same.
9. A etalon according to claim 1 wherein a plurality of the sub-regions (21) are combined to form a square.
10. The etalon of claim 1 wherein the tracking structure (1) and the working area (2) are of unitary construction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202023126234.0U CN214333693U (en) | 2020-12-22 | 2020-12-22 | Standard device for calibrating horizontal indicating value error of three-dimensional microscope |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202023126234.0U CN214333693U (en) | 2020-12-22 | 2020-12-22 | Standard device for calibrating horizontal indicating value error of three-dimensional microscope |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114909994A (en) * | 2022-04-29 | 2022-08-16 | 深圳市中图仪器股份有限公司 | Calibration method of image measuring instrument |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114909994A (en) * | 2022-04-29 | 2022-08-16 | 深圳市中图仪器股份有限公司 | Calibration method of image measuring instrument |
| CN114909994B (en) * | 2022-04-29 | 2023-10-20 | 深圳市中图仪器股份有限公司 | Calibration method of image measuring instrument |
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