CN2938143Y - Reflection membrane - Google Patents

Reflection membrane Download PDF

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Publication number
CN2938143Y
CN2938143Y CNU2006200142291U CN200620014229U CN2938143Y CN 2938143 Y CN2938143 Y CN 2938143Y CN U2006200142291 U CNU2006200142291 U CN U2006200142291U CN 200620014229 U CN200620014229 U CN 200620014229U CN 2938143 Y CN2938143 Y CN 2938143Y
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CN
China
Prior art keywords
layer
film
new type
type reflection
reflection film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNU2006200142291U
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Chinese (zh)
Inventor
许生
胡云慧
高涵达
梁锐生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Haowei Vacuum Photoelectron Holding Co Ltd
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Shenzhen Haowei Vacuum Photoelectron Holding Co Ltd
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Priority to CNU2006200142291U priority Critical patent/CN2938143Y/en
Application granted granted Critical
Publication of CN2938143Y publication Critical patent/CN2938143Y/en
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Abstract

The utility model relates to a novel reflective film, which consists of a substrate layer, a N1 layer, a N2 layer, a second N1 layer, an Ag layer and an Al layer, wherein the dielectric layer N1 is higher in reflective index than the dielectric layer N2 and the reflector is an anterior surface structure. The substrate is made of the PET film or glass. The material layer N1 is made of the TiO2, Si3, N 4, Ta2, O5, ZrO2, ZAO or ITO film. And the material layer N2 is made of SiO2 or MgF2 film. The utility model provides a reflective film that can make the energy distribution of the reflective spectrum approximate to the energy distribution of the light source.

Description

A kind of new type reflection film
Technical field
The utility model relates to a kind of optical reflection film.
Background technology
In LCD backlight film group and other flat-panel display device, for the utilization factor that increases energy of light source or because the needs of optical property all will be used reflective film.Existing reflective film usually with glass or PET film etc. as base material, and adopt vacuum evaporation technique and magnetron sputtering technique to deposit aluminium (Al) or silver (Ag) film of about 100 nanometers-2000 nanometer in base material one side, utilize the optical reflection characteristic of Al and Ag metallic film to make reflectance coating.
The deficiency that above-mentioned prior art exists is: the spectral characteristic of (1) Al reflective film is more on the low side at whole visible light wave range.(2) although the Ag reflective film is better than the Al film at the reflectivity of visible light wave range, some is on the low side again in 400 nanometers-450 nanometer section for the spectral characteristic of Ag reflective film.(3) above two kinds of reflective film curves of spectrum all have bigger undulatory property in visible light wave range, cause the reflected light cross-color.Particularly the reflectivity of Ag reflective film between 400 nanometers-450 nanometer with the reflectivity of visible light is had than big-difference, cause reflectance spectrum energy distribution and light source spectral distribution to exist than big-difference, this design to subsequent optical brings difficulty.
Summary of the invention
The purpose of this utility model is intended to overcome above-mentioned the deficiencies in the prior art, provides a kind of energy distribution that can make reflectance spectrum more to approach the new type reflection film of the energy distribution of light source.
Realize the technical scheme of above-mentioned purpose:
A kind of new type reflection film, its film structure is: PET/Al/Ag/N1/N2/N1, wherein dielectric layer N1 has higher refractive index with respect to dielectric layer N2, and reflecting surface is the rear surface structure.
Described substrate layer is PET film or glass.
Described material layer N1 is TiO2, Si3N4, Ta2O5, ZrO2, ZAO or ITO.
Described material layer N2 is SIO2 or MgF2.
Non-reflection aspect at described base material has the nontransparent overlay of one deck.
The thickness of described Ag layer is 30-50nm, and the thickness of Al is 80-200nm.
The thickness of described material layer N1 is 50-80nm.
The thickness of described material layer N2 is 90nm.
Adopt technique scheme, the utility model beneficial technical effects is: owing to adopt argent and metallic aluminium jointly as metallic reflector, utilize argent that the characteristic of high reflectance is arranged at the visible light short-wave band, and metallic aluminium does not have dispersion phenomenon substantially at visible light wave range, is well to replenish the argent reflectance coating at short-wave band, reduce the dispersion phenomenon of ground reflectance spectrum so effectively, add N1, the N2 dielectric layer, utilize the multilayer optical film theory, can improve the reflectivity that whole film is, make the reflectivity curve of visible light (400nm-800nm) become quite mild (referring to Fig. 2), and keep quite high reflectivity, thereby make the energy distribution of reflectance spectrum more approach the energy distribution of light source.
Description of drawings
Fig. 1 is a kind of film structure figure of new type reflection film.
Fig. 2 is the reflectivity curve of Fig. 1 new type reflection film.
Embodiment
A kind of new type reflection film, as shown in Figure 1, its film structure is: PET/Al/Ag/N1/N2/N1, reflecting surface are the rear surface structure.Wherein base material is PET film or glass, and wherein dielectric layer N1 has higher refractive index with respect to dielectric layer N2, the preferred TiO2 of N1, Si3N4, Ta2O5, ZrO2, ZAO, ITO etc., the thickness of N1 is 50-80nm, the preferred SIO2 of N2, MgF2 etc., and the thickness of N2 is about 90nm, the thickness of Ag is 30-50nm, and the thickness of Al is 80-200nm.In the structure, the Al layer improves the adhesion of base material and Ag simultaneously.N1, N2 adopt electron beam evaporation usually or adopt direct current and intermediate frequency magnetic control sputtering plating deposition techniques.
Fig. 2 has provided the reflectivity curve of present embodiment reflectance coating.As seen from Figure 2, between 90-95%, demonstrate quite high reflectivity Characteristics, and reflectivity curve is quite mild at the reflectivity of visible light (400nm-800nm) section.Show that the energy distribution of reflectance spectrum of the present utility model more approaches the energy distribution of light source.

Claims (8)

1, a kind of new type reflection film is characterized in that film structure is: PET/A1/Ag/N1/N2/N1, and wherein dielectric layer N1 has higher refractive index with respect to dielectric layer N2, and reflecting surface is the rear surface structure.
2, new type reflection film according to claim 1 is characterized in that: described base material is PET film or glass.
3, new type reflection film according to claim 1 is characterized in that: described material layer N1 is TiO2, Si3N4, Ta2O5, ZrO2, ZAO or ito thin film.
4, new type reflection film according to claim 1 is characterized in that: described material layer N2 is SIO2 or MgF2 film.
5, new type reflection film according to claim 1 is characterized in that: the non-reflection aspect at described base material has the nontransparent overlay of one deck.
6, according to any described new type reflection film of claim 1-5, it is characterized in that: the thickness of described Ag layer is 30-50nm, and the thickness of A1 is 80-200nm.
7, new type reflection film according to claim 6 is characterized in that: the thickness of described material layer N1 is 50-80nm.
8, new type reflection film according to claim 7 is characterized in that: the thickness of described material layer N2 is 90nm.
CNU2006200142291U 2006-06-12 2006-06-12 Reflection membrane Expired - Fee Related CN2938143Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNU2006200142291U CN2938143Y (en) 2006-06-12 2006-06-12 Reflection membrane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNU2006200142291U CN2938143Y (en) 2006-06-12 2006-06-12 Reflection membrane

Publications (1)

Publication Number Publication Date
CN2938143Y true CN2938143Y (en) 2007-08-22

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CNU2006200142291U Expired - Fee Related CN2938143Y (en) 2006-06-12 2006-06-12 Reflection membrane

Country Status (1)

Country Link
CN (1) CN2938143Y (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102653455A (en) * 2011-03-01 2012-09-05 苏州大学 Low-emissivity, low-emissivity coated glass and preparation method thereof
CN105278158A (en) * 2014-07-21 2016-01-27 三星显示有限公司 Liquid crystal display and manufacturing method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102653455A (en) * 2011-03-01 2012-09-05 苏州大学 Low-emissivity, low-emissivity coated glass and preparation method thereof
WO2012116518A1 (en) * 2011-03-01 2012-09-07 苏州大学 Low emissivity thin film, low emissivity coated glass and producing method thereof
CN102653455B (en) * 2011-03-01 2015-05-13 苏州大学 Low-emissivity, low-emissivity coated glass and preparation method thereof
CN105278158A (en) * 2014-07-21 2016-01-27 三星显示有限公司 Liquid crystal display and manufacturing method thereof

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20070822

Termination date: 20150612

EXPY Termination of patent right or utility model