CN2657802Y - Packaged cleaning device for image sensor - Google Patents
Packaged cleaning device for image sensor Download PDFInfo
- Publication number
- CN2657802Y CN2657802Y CN 200320101296 CN200320101296U CN2657802Y CN 2657802 Y CN2657802 Y CN 2657802Y CN 200320101296 CN200320101296 CN 200320101296 CN 200320101296 U CN200320101296 U CN 200320101296U CN 2657802 Y CN2657802 Y CN 2657802Y
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- seal
- rotating mechanism
- cleaning
- cleaning device
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Abstract
A cleaning device used for image sensor packaging is disclosed. The utility model provides an image sensor manufacturing device which can effectively clear away impurities, improve cleaning effect and raise image sensor packaging quality and comprises a sealing body for forming a cleaning room, a rotating mechanism and a spray washing mechanism, wherein the rotating mechanism is arranged in the cleaning room of the sealing body and can rotate therein; basal plates, which are provided with convex margin layers and form an allowing room, are fixed on the rotating mechanism and make the allowing room face the centrifugal direction of the rotating mechanism; the spray washing mechanism is arranged in the cleaning room of the sealing body and on the side edge of the sealing body so that cleaning objects can be sprinkled into the allowing house of the basal plates.
Description
Technical field
The utility model belongs to the CIS manufacturing installation, particularly a kind of cleaning device that is used for the CIS encapsulation.
Background technology
As shown in Figure 1, known CIS comprises substrate 10, flange layer 18, image sensing wafer 26, several wires 28 and photic zone 34.
Image sensing wafer 26 is located in substrate 10 and the flange layer 18 formed accommodation chambers 24, and is fixed on the first surface 12 of substrate 10.
Several wires 28 has first end points 30 that is electrically connected to image sensing wafer 26 and is electrically connected to second end points 32 of substrate 10 signal input ends 15.
The photic zone 34 glutinous upper surfaces 20 of being located at flange layer 18.
In the CIS encapsulation process,, reduce the residual of impurity in order to improve the cleanliness factor of product, after flange layer 18 is sticked together the first surface 12 that is fixed in substrate 10, must be cleaned in the accommodation chamber 24, reduce impurity and residue in the accommodation chamber 24, to improve the encapsulation quality.
As shown in Figure 2, the known cleaning device that is used for the CIS encapsulation comprises seal 40, rotating mechanism 42 and the hydro-peening mechanism 44 that is provided with purge chamber 46.
Hydro-peening mechanism 44 is arranged at seal 40 tops.
So, in encapsulation process, the substrate 10 that flange layer 18 is set is fixed on the rotating mechanism 42, and make its accommodation chamber 24 towards hydro-peening mechanism 44, at this moment, hydro-peening mechanism 44 can spray water column and cleans towards accommodation chamber 24 directions, and the impurity after will cleaning by the centrifugal force of rotating mechanism 42 gets rid of, to improve the interior cleanliness factor of accommodation chamber 24.
Only, there is following shortcoming in above-mentioned known cleaning device:
1, substrate 10 is the right angle with flange layer 18 position contacting in the accommodation chamber 24, and when impurity was concealed on the right angle, water spray also can't wash impurity effectively.
When 2, rotating mechanism 42 was with the centrifugation removal of contamination, impurity was blocked by flange layer 18 easily, can't effectively impurity be removed in accommodation chamber 24.
Summary of the invention
The purpose of this utility model provides a kind of effective removal of contamination, improves the cleaning device that is used for the CIS encapsulation of cleaning performance and CIS encapsulation quality.
The utility model comprises seal, rotating mechanism and the hydro-peening mechanism that forms the purge chamber; Rotating mechanism system is arranged in the purge chamber of seal, and can rotate in the purge chamber; The substrate that is provided with flange layer and forms accommodation chamber is fixed on the rotating mechanism, and makes the centrifugal direction of accommodation chamber towards rotating mechanism; System of hydro-peening mechanism is arranged in the purge chamber of seal, and is positioned at the seal side can spray the cleaning thing to the accommodation chamber of substrate.
Wherein:
Seal is provided with so as to forming base, perisporium and the loam cake of purge chamber.
Rotating mechanism system is arranged on the base of seal.
System of hydro-peening mechanism is arranged on the perisporium of seal.
The cleaning thing of hydro-peening mechanism ejection is a clean water.
The cleaning thing of hydro-peening mechanism ejection is nitrogen or carbon dioxide.
Because the utility model comprises seal, rotating mechanism and the hydro-peening mechanism that forms the purge chamber; Rotating mechanism system is arranged in the purge chamber of seal, and can rotate in the purge chamber; The substrate that is provided with flange layer and forms accommodation chamber is fixed on the rotating mechanism, and makes the centrifugal direction of accommodation chamber towards rotating mechanism; System of hydro-peening mechanism is arranged in the purge chamber of seal, and is positioned at the seal side can spray the cleaning thing to the accommodation chamber of substrate.During washing and cleaning operation, the substrate that flange layer is set is placed in the purge chamber of seal, and be fixed on the rotating mechanism to be rotated mechanism's driven rotary, the centrifugal direction of the accommodation chamber rotating mechanism that flange layer and substrate form, at this moment, the cleaning thing that is sprayed by hydro-peening mechanism will spray to accommodation chamber, and by the centrifugal effect of rotating mechanism, impurity in the accommodation chamber is cleaned up, and effectively removal of contamination, raising cleaning performance and CIS encapsulate quality, thereby reach the purpose of this utility model.
Description of drawings
Fig. 1, be known image sensor structure schematic sectional view.
Fig. 2, be the known cleaning device structural representation cutaway view that is used for the CIS encapsulation.
Fig. 3, be the utility model structural representation cutaway view.
Fig. 4, be the utility model user mode schematic diagram.
The specific embodiment
As shown in Figure 3, the utility model comprises seal 50, rotating mechanism 52 and hydro-peening mechanism 54.
Hydro-peening mechanism 54 is the purge chamber 62 that is positioned at seal 50, and is arranged on the perisporium 58, and can spray clean water or nitrogen (N
2) or carbon dioxide (CO
2) wait the cleaning thing.
As shown in Figure 4, on the substrate 64 of encapsulation CIS, flange layer 66 is set, and makes flange layer 66 and substrate 64 form accommodation chamber 68.The substrate 64 that flange layer 66 is set is placed in the purge chamber 62 of seal 50, and be fixed on the rotating mechanism 52 to be rotated mechanism's 52 driven rotary, 68 perisporiums 58 of accommodation chamber that flange layer 66 and substrate 64 form towards seal 50, at this moment, cleaning thing by 54 ejections of hydro-peening mechanism will spray to accommodation chamber 68, and, the impurity in the accommodation chamber 68 are cleaned up by the centrifugal effect of rotating mechanism 52.
So, the impurity in the accommodation chamber 68 that can effectively flange layer 66 and substrate 64 be formed cleans up, and to improve the cleaning performance of CIS, reaches the encapsulation quality that improves CIS.
Claims (6)
1, a kind of cleaning device that is used for the CIS encapsulation, it comprises seal, rotating mechanism and the hydro-peening mechanism that forms the purge chamber; Rotating mechanism system is arranged in the purge chamber of seal, and can rotate in the purge chamber; The substrate that is provided with flange layer and forms accommodation chamber is fixed on the rotating mechanism; System of hydro-peening mechanism is arranged in the purge chamber of seal, can spray the cleaning thing to the accommodation chamber of substrate; It is characterized in that the centrifugal direction of the accommodation chamber of described flange layer and substrate formation towards rotating mechanism; The spraying mechanism that is arranged in the seal purge chamber is positioned at the seal side.
2, the cleaning device that is used for the CIS encapsulation according to claim 1 is characterized in that described seal is provided with so as to forming base, perisporium and the loam cake of purge chamber.
3, the cleaning device that is used for the CIS encapsulation according to claim 2 is characterized in that described rotating mechanism is to be arranged on the base of seal.
4, the cleaning device that is used for CIS encapsulation according to claim 2 is characterized in that system of described hydro-peening mechanism is arranged on the perisporium of seal.
5, the cleaning device that is used for CIS encapsulation according to claim 1 is characterized in that the cleaning thing of described hydro-peening mechanism ejection is a clean water.
6, the cleaning device that is used for CIS encapsulation according to claim 1 is characterized in that the cleaning thing of described hydro-peening mechanism ejection is nitrogen or carbon dioxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200320101296 CN2657802Y (en) | 2003-10-17 | 2003-10-17 | Packaged cleaning device for image sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200320101296 CN2657802Y (en) | 2003-10-17 | 2003-10-17 | Packaged cleaning device for image sensor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2657802Y true CN2657802Y (en) | 2004-11-24 |
Family
ID=34339594
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200320101296 Expired - Fee Related CN2657802Y (en) | 2003-10-17 | 2003-10-17 | Packaged cleaning device for image sensor |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2657802Y (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108889697A (en) * | 2018-09-18 | 2018-11-27 | 江西省长益光电有限公司 | Optical mirror slip centrifugal cleaning machine |
| CN108889698A (en) * | 2018-09-18 | 2018-11-27 | 江西省长益光电有限公司 | A kind of optical mirror slip eccentric cleaning equipment |
| CN108889699A (en) * | 2018-09-18 | 2018-11-27 | 江西省长益光电有限公司 | A kind of optical mirror slip centrifugal cleaning machine |
-
2003
- 2003-10-17 CN CN 200320101296 patent/CN2657802Y/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108889697A (en) * | 2018-09-18 | 2018-11-27 | 江西省长益光电有限公司 | Optical mirror slip centrifugal cleaning machine |
| CN108889698A (en) * | 2018-09-18 | 2018-11-27 | 江西省长益光电有限公司 | A kind of optical mirror slip eccentric cleaning equipment |
| CN108889699A (en) * | 2018-09-18 | 2018-11-27 | 江西省长益光电有限公司 | A kind of optical mirror slip centrifugal cleaning machine |
| CN108889698B (en) * | 2018-09-18 | 2021-06-18 | 江西省长益光电有限公司 | Optical lens piece centrifugal cleaning equipment |
| CN108889699B (en) * | 2018-09-18 | 2021-06-22 | 江西省长益光电有限公司 | Optical lens piece centrifugal cleaning machine |
| CN108889697B (en) * | 2018-09-18 | 2021-07-27 | 江西省长益光电有限公司 | Centrifugal cleaning machine for optical lens |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20041124 Termination date: 20091117 |