CN2411494Y - Automatic air pressure compensation device for photoetching objective lens - Google Patents
Automatic air pressure compensation device for photoetching objective lens Download PDFInfo
- Publication number
- CN2411494Y CN2411494Y CN 99232422 CN99232422U CN2411494Y CN 2411494 Y CN2411494 Y CN 2411494Y CN 99232422 CN99232422 CN 99232422 CN 99232422 U CN99232422 U CN 99232422U CN 2411494 Y CN2411494 Y CN 2411494Y
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- pressure
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- air pressure
- pipeline
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- 238000001259 photo etching Methods 0.000 title abstract description 6
- 239000003990 capacitor Substances 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 claims description 4
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 238000004891 communication Methods 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims description 2
- 230000003321 amplification Effects 0.000 claims 1
- 238000003199 nucleic acid amplification method Methods 0.000 claims 1
- 238000001514 detection method Methods 0.000 abstract description 2
- 230000007613 environmental effect Effects 0.000 abstract 2
- 230000007547 defect Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 2
- 238000007605 air drying Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The utility model discloses an automatic atmospheric pressure compensation arrangement of photoetching objective, it has overcome prior art and can only carry out the defect that the focal plane drift compensation that environmental pressure arouses to the little objective of numerical aperture. The device is characterized in that an internal channel is communicated with each lens in the photoetching objective lens to form an inner cavity isolated from the external atmosphere, and the pressure in the inner cavity is controlled by adopting a pressure sensor for detection and a singlechip control circuit to enable the pressure to reach a set value or a zero deviation value, so that the device can be used for controlling the focal plane, the multiplying power and the distortion drift of the photoetching objective lens with larger numerical aperture and shorter working wavelength caused by the influence of the environmental pressure.
Description
The utility model is a kind of lithographic objective automatic air pressure compensation system, belongs to high resolution light projection photoetching objective lens picture element Stability Control technology.
The raising of the photolithography resolution of IC manufacturing equipment projection mask aligner depends on the increase of lithographic objective numerical aperture NA and reducing of operation wavelength λ, the increase of NA and λ reduce, and make the variation of ambient pressure become very outstanding to lithographic objective position of focal plane, imaging multiplying power and the influence of drifting about that distorts.The litho machine that abroad has is taked the measurement environment air pressure change in order to catch the focal plane drift, and correction-compensation is carried out in the position of focal plane.The defective of this technology is can only the logarithm value aperture not to be that the object lens of very big (NA＜0.5) compensate the position of focal plane roughly, nor can the compensating image multiplying power and the drift of distortion.
The purpose of this utility model is to overcome the deficiency of above-mentioned prior art, and a kind of lithographic objective inner chamber air pressure change of controlling automatically is provided, the position of focal plane, multiplying power and the distortion that overcome object lens therefrom are subjected to air pressure change to produce the lithographic objective automatic air pressure compensation system of drift.
The purpose of this utility model can realize by following technical measures: by lithographic objective, the air-capacitor cylinder, pressure transducer, single-chip microcomputer and solenoid valve and source of the gas are formed the automatic air pressure compensation system, space in the lithographic objective between each optical lens is communicated with by the inner passage and constitutes and the tight isolated inner chamber of ambient atmosphere, link to each other with the left chamber of pressure transducer and air-capacitor cylinder respectively by pipeline, the left chamber and the right chamber of air-capacitor cylinder are separated by dividing plate and diaphragm, right chamber one road pipeline of air-capacitor cylinder connects gas admittance valve, pressure limiting valve, compressed gas source connects air release through another road pipeline, pressure limiting valve, vacuum source.The sensor of detected air pressure signal is through signal Processing amplifying circuit be connected in series A/D conversion and single-chip microcomputer, is connected to gas admittance valve and air release according to the output of the single-chip microcomputer of detection signal control air inlet, venting.
The utility model also can be realized by following technical measures: in the air-capacitor cylinder of lithographic objective automatic air pressure compensation system, can left and right sides telescopic moving with chamber, balance air-capacitor cylinder left and right sides air pressure, and the diaphragm seal that circulation takes place two chamber gases about can stoping is fixed on the dividing plate.
The utility model also can be realized by following technical measures: can be connected to single-chip microcomputer according to the main frame that the operator requires lithographic objective automatic air pressure compensation system air pressure control setting value is set.
The utility model is compared prior art and is had the following advantages: owing to lithographic objective inner chamber and the external world tightly separated and control object lens inner chamber air pressure automatically, and in 1 atmospheric pressure ± 0.2 barometric pressure range, control accuracy reaches ± 0.005 atmospheric pressure, therefore the focal plane, multiplying power and the distortion that have overcome the high resolution lithographic objective are changed and the drift of generation by ambient pressure, improved ultra micro figure photoetching quality, litho machine graphic making yield rate also is improved.In addition, lithographic objective automatic air pressure compensation system uses source of the gas separately and is isolated from the outside, and therefore, the air drying cleaning has protected the optical lens surface unaffected in the object lens chamber.The controlling value of lithographic objective air pressure autocompensation installation can require to set in advance according to the operator, so easy to use.
Below in conjunction with drawings and Examples the utility model is described further.
Fig. 1 is the structural drawing of the utility model lithographic objective atmospheric pressure compensated equipment embodiment.
Fig. 2 is the utility model electric control theory figure.
As shown in Figure 1, the space between each optical lens in the lithographic objective 1 is communicated with and is constituted and inner chamber that ambient atmosphere is tightly isolated by inner passage 2, and inner chamber links to each other with pressure transducer 3 by pipeline 20, and passes through pipeline 21 and link to each other with the left chamber 22 of air-capacitor cylinder 4; The left chamber 22 and the right chamber 23 of air-capacitor cylinder 4 are separated by central dividing plate 5, but diaphragm 6 left and right sides telescopic movings of sealing and fixing on dividing plate 5 can allow the air pressure in air-capacitor cylinder about 4 two chambeies reach balance, and between the prevention chamber, the left and right sides gas communication take place.Right chamber 23 connects air inlet solenoid valve 7, pressure limiting valve 9 and compressed gas source 11 by pipeline 24, and connects pressure-releasing electromagnetic valve 8, pressure limiting valve 10 and vacuum source 12 by pipeline 25.When object lens inner chamber air pressure departs from the value of setting in advance, pressure transducer 3 output signals are sent into single-chip microcomputer 16, the operator by main frame 15 required atmospheric pressure value sent into single-chip microcomputer 16 when perhaps need change atmospheric pressure value, opened by air inlet solenoid valve 7 or pressure-releasing electromagnetic valve 8 that single-chip microcomputer 16 is controlled, gas flows into the right chamber 23 of air-capacitor cylinder by compressed gas source 11 through pressure limiting valve 9 and pipeline 24, or flow out to vacuum source 12 through pipeline 25 and pressure limiting valve 10, along with atmospheric pressure in the right chamber 23 of air-capacitor cylinder raises or reduction, promoting diaphragm 6 moves to left or moves to right, the air pressure of chamber, an air-capacitor cylinder left side 22 and object lens inner chamber is risen simultaneously or reduce, air pressure progressively reaches the desirable value of zero-deviation value or requirement, thereby guarantees that air pressure is constant.
As shown in Figure 2: the pressure transducer 3 that the barometric error value is converted to magnitude of voltage is connected to processing amplifying circuit 13, connect single-chip microcomputer 16 through A/D conversion 14 again, the main frame 15 that can import the control setting value is connected to single-chip microcomputer 16, and single-chip microcomputer is according to the atmospheric pressure value control air inlet solenoid valve 7 or the pressure-releasing electromagnetic valve 8 of barometric error value or requirement.
Claims (3)
1, a kind of lithographic objective automatic air pressure compensation system, by lithographic objective (1), pressure transducer (3), single-chip microcomputer (16) and air inlet solenoid valve (7), pressure-releasing electromagnetic valve (8) and source of the gas (11) are formed, it is characterized in that: be communicated with the space between each optical lens in the lithographic objectives (1) and constitute and inner chamber that ambient atmosphere is tightly isolated by inner passage (2), link to each other with the left chamber (22) of pressure transducer (3) and air-capacitor cylinder (4) respectively with pipeline (21) by pipeline (20), separated by dividing plate (5) and diaphragm (6) between the left chamber (22) of air-capacitor cylinder (4) and right chamber (23), right chamber (23) are connected air inlet solenoid valve (7) through pipeline (24) respectively with pipeline (25), pressure limiting valve (9), compressed gas source (11) and pressure-releasing electromagnetic valve (8), pressure limiting valve (10), vacuum source (12); The pressure transducer (3) that air pressure signal is converted to electric signal is connected to air inlet solenoid valve (7) and pressure-releasing electromagnetic valve (8) through the be connected in series output of A/D conversion (14) and single-chip microcomputer (16) of amplification treatment circuit (13).
2, lithographic objective automatic air pressure compensation system according to claim 1, it is characterized in that: air-capacitor cylinder (4) but in left and right sides telescopic moving with chamber (22), a balance air-capacitor cylinder left side and right chamber (23) air pressure, and about can stoping diaphragm (6) sealing and fixing of two chamber gas communication on dividing plate (5).
3, according to claim 1 and 2 described lithographic objective automatic air pressure compensation systems, it is characterized in that: can be connected with single-chip microcomputer (16) according to the main frame (15) that the operator requires the air pressure controlling value is set.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 99232422 CN2411494Y (en) | 1999-08-24 | 1999-08-24 | Automatic air pressure compensation device for photoetching objective lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 99232422 CN2411494Y (en) | 1999-08-24 | 1999-08-24 | Automatic air pressure compensation device for photoetching objective lens |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2411494Y true CN2411494Y (en) | 2000-12-20 |
Family
ID=34021109
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 99232422 Expired - Fee Related CN2411494Y (en) | 1999-08-24 | 1999-08-24 | Automatic air pressure compensation device for photoetching objective lens |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2411494Y (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104316104A (en) * | 2014-09-28 | 2015-01-28 | 中国科学院长春光学精密机械与物理研究所 | Photolithography projection objective lens internal chamber high-precision gas measuring device |
| CN104713502A (en) * | 2008-02-20 | 2015-06-17 | Asml控股股份有限公司 | Gas gauge, lithography equipment, and method for setting focus on lithography equipment tool |
| CN109883600A (en) * | 2019-02-25 | 2019-06-14 | 吴芳福 | A kind of inducing method based on minute-pressure sensing device |
| CN114384762A (en) * | 2020-10-19 | 2022-04-22 | 上海微电子装备（集团）股份有限公司 | Projection objective |
-
1999
- 1999-08-24 CN CN 99232422 patent/CN2411494Y/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104713502A (en) * | 2008-02-20 | 2015-06-17 | Asml控股股份有限公司 | Gas gauge, lithography equipment, and method for setting focus on lithography equipment tool |
| CN104713502B (en) * | 2008-02-20 | 2018-11-30 | Asml控股股份有限公司 | Gas gauge, lithographic equipment and the method that focus is set on photolithographic exposure tool |
| CN104316104A (en) * | 2014-09-28 | 2015-01-28 | 中国科学院长春光学精密机械与物理研究所 | Photolithography projection objective lens internal chamber high-precision gas measuring device |
| CN109883600A (en) * | 2019-02-25 | 2019-06-14 | 吴芳福 | A kind of inducing method based on minute-pressure sensing device |
| CN114384762A (en) * | 2020-10-19 | 2022-04-22 | 上海微电子装备（集团）股份有限公司 | Projection objective |
| CN114384762B (en) * | 2020-10-19 | 2023-06-30 | 上海微电子装备（集团）股份有限公司 | Projection objective |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |