CN221344694U - Device for rapidly inflating and breaking vacuum chamber - Google Patents

Abstract

The utility model discloses a device for rapidly inflating and breaking a vacuum chamber, which comprises: the vacuum chamber is characterized in that a plurality of groups of transmission rollers formed by magnetic fluid sealing shafts are arranged on vertical plates on two sides of the vacuum chamber, an upper chamber flange is connected above the vacuum chamber through a sealing ring, two air inlets are arranged on the upper chamber flange and are respectively connected with two branch pipelines of a Y-shaped gas distribution pipeline, the Y-shaped gas distribution pipeline consists of two branch pipelines and a central pipeline, the two branch pipelines are symmetrically distributed in the central pipeline and are in a horn mouth shape, and the caliber of a horn mouth is gradually reduced from the outer side to the convergence position of the central pipeline; and a gas homogenizing device is arranged below the upper chamber flange. The utility model has the advantages that: the continuity and stability of substrate transmission are ensured, the internal stress of a substrate film is reduced, and a guarantee is provided for preparing a high-quality film layer in a photovoltaic production line.

Description

Device for rapidly inflating and breaking vacuum chamber

Technical Field

The utility model relates to the technical field of photovoltaics, in particular to a device for rapidly inflating and breaking a vacuum chamber.

Background

In recent years, the rapid development of photovoltaic technology and the increasing demand of market for photovoltaic cells are increasing, in order to meet the market demand, photovoltaic production line equipment is more pursuing the large size and flaking of silicon wafers, which can reach about tens of micrometers, large productivity and increasing stacking quantity. Thus presenting a greater challenge to the beat of the photovoltaic production line.

The vacuum chamber is filled with dry gas to make the pressure in the chamber in vacuum state equal to the atmospheric pressure, and the chamber can be opened to perform the next operation flow; the time of inflation and emptying directly influences the beat of the production line; when the film feeding chamber is inflated and broken, the substrate carrier plate is conveyed to the next process chamber, the substrate carrier plate is not arranged in the film feeding chamber, and at the moment, the film feeding chamber is inflated and broken to open the chamber, so that the substrate to be coated is conveyed to the film feeding chamber, and factors such as impact of inflation on the substrate carrier plate are not required to be considered; when the film discharging chamber is inflated and broken, the substrate carrier plate is completely coated and is conveyed to the film discharging chamber to wait for discharging the film, and at the moment, the film discharging chamber is required to be inflated and broken rapidly, and the substrate carrier plate is conveyed out; when in inflation, not only the requirement of the beat is met, but also the substrate carrier plate is ensured to be safely and stably conveyed out of the wafer discharging chamber; therefore, the inflation and the emptying of the tablet outlet chamber are important; the rapid inflation and the breaking of the existing vacuum chamber are usually realized by increasing the number of inflation valves or increasing the caliber of the inflation valves, and meanwhile, in order to consider that the gas can generate overlarge impact on a substrate during inflation, a 4.1 gas barrier device is arranged at a gas inlet; the methods can not meet the requirements of the film plating process of the photovoltaic production line while increasing the cost; the method comprises the following steps: an inflation valve is arranged in the middle of the upper part of the vacuum chamber or beside the upper part of the vacuum chamber, the inflation valve can comprise a slow inflation valve and a main inflation valve which are connected in parallel through a vacuum pipeline, the lower end of the valve is connected with an air inlet of a flange on the chamber, the lower end (vacuum side) of the air inlet is provided with an air isolation plate, the air isolation plate is fixed below the flange on the chamber through screws, when a substrate carrier plate subjected to process deposition is conveyed into a wafer outlet chamber through a conveying roller, the chamber is inflated through the slow inflation valve, then the slow inflation valve is closed, the main inflation valve is opened, the chamber is inflated and broken, and after the chamber is in an atmospheric state rapidly, the substrate carrier plate subjected to film plating is conveyed out of the wafer outlet chamber to enter the next working cycle.

The significant disadvantages of the prior art are: before inflation, the vacuum chamber is in a vacuum state, the pressures of the upper side and the lower side of the carrier plate are the same, when inflation is started, gas firstly enters the vacuum chamber through the gas-isolation plate of the gas inlet and diffuses to the periphery along the upper layer of the carrier plate, the gas in the area around the gas inlet is denser, and the gas in the area far from the gas inlet is sparser; meanwhile, the gas density of the upper layer of the carrier plate is larger than that of the lower layer of the carrier plate, so that the number of gas molecules is large, the gas pressure is high, the number of gas molecules is small, the gas pressure is low, and the gas molecules are unevenly distributed on the upper layer and the upper and lower layers of the carrier plate, so that an uneven airflow layer and gas layers with different pressures can be formed; in the whole inflation process, the upper layer and the lower layer of the carrier plate are always in gas pressure with different pressures, and meanwhile, the upper layer of the carrier plate has uneven distribution. The pressure difference can generate certain impact on the carrier plate, and the carrier plate is large in size and thin, so that the positioning groove for stacking the substrates on the carrier plate is shallow and can reach a few tenths of millimeters, the carrier plate is deformed, the substrates are displaced, certain internal stress can be generated on the substrates, the substrates can drop from the carrier plate when serious, the phenomenon of transmission clamping stagnation occurs, and the requirements of the photovoltaic production line cannot be met.

Disclosure of Invention

The utility model provides a device for rapidly inflating and breaking a vacuum chamber, which solves the technical problems in the prior art.

According to one aspect of the present utility model, there is provided a device for rapid inflation and deflation of a vacuum chamber, comprising: the vacuum chamber is characterized in that a plurality of groups of transmission rollers formed by magnetic fluid sealing shafts are arranged on vertical plates on two sides of the vacuum chamber, an upper chamber flange is connected above the vacuum chamber through a sealing ring, two air inlets are arranged on the upper chamber flange and are respectively connected with two branch pipelines of a Y-shaped gas distribution pipeline, the Y-shaped gas distribution pipeline consists of two branch pipelines and a central pipeline, the two branch pipelines are symmetrically distributed in the central pipeline and are in a horn mouth shape, and the caliber of a horn mouth is gradually reduced from the outer side to the convergence position of the central pipeline; the utility model discloses a gas-distributing device, including the room flange, be provided with even gas device below the room flange through screw fixed connection, even gas device includes the hypoplastron, curb plate and hypoplastron intermediate position all around and be on a parallel with both sides board and be provided with a riser that highly equals with the curb plate, be provided with two breach on the riser on the same position with two air inlets, be provided with even intensive aperture on the hypoplastron, evenly distributed has even aperture on the curb plate all around, and even gas device top leads to the screw to fix it below in the room flange.

Further, the central pipeline is connected with an inflation valve capable of bearing 0.1-0.6 MPa pressure.

Further, the riser and two notches on the riser divide the gas homogenizing device into a region I and a region II.

Further, the shape of the air homogenizing device is rectangular box-shaped or polygonal.

According to the technical scheme provided by the utility model, the upper layer and the lower layer of the carrier plate are always in a uniform and stable air flow due to the arrangement of the air homogenizing device in the whole process of inflating and breaking, the pressure intensity above and below the carrier plate is kept consistent, the impact of air on the substrate and the carrier plate and the deformation of the carrier plate caused by the impact are avoided, the requirement of the beat of a photovoltaic production line can be met, a stable and uniform air distribution structure is provided for the photovoltaic production line, the continuity and the stability of substrate transmission are ensured, the internal stress of a substrate film is reduced, and the guarantee is provided for the photovoltaic production line to prepare a high-quality film layer.

The foregoing description is only an overview of the technology of the present utility model, and it is to be understood that the present utility model may be embodied in the form of specific details for the purpose of providing a more thorough understanding of the present utility model, and is to be understood as being a more complete description of the present utility model, as embodied in the following specific examples.

Drawings

Various other advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The drawings are only for purposes of illustrating the preferred embodiments and are not to be construed as limiting the utility model. Also, like reference numerals are used to designate like parts throughout the figures.

Fig. 1 is a schematic structural view of a device for rapid inflation and emptying of a vacuum chamber according to the present utility model.

Fig. 2 is a schematic top view of the device of fig. 1.

Fig. 3 is a schematic view of a substrate carrier plate of the apparatus of fig. 1.

Fig. 4 is a schematic view of a peripheral side plate of the gas distribution plate according to the present utility model.

In the drawing, a 1-vacuum chamber, a 2-sealing ring, a 3-chamber upper flange, a 4-gas homogenizing device, a 5-Y-shaped gas distribution pipeline, a 6-charging valve, a 7-substrate, an 8-carrier plate, a 9-transmission roller, a 10-exhaust valve and an 11-exhaust pump set are arranged.

Detailed Description

Exemplary embodiments of the present utility model will be described in more detail below with reference to the accompanying drawings. While exemplary embodiments of the present utility model are shown in the drawings, it should be understood that the present utility model may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the utility model to those skilled in the art.

The following describes in detail a device for rapid inflation and deflation of a vacuum chamber provided by the present utility model. What is not described in detail in the embodiments of the present utility model belongs to the prior art known to those skilled in the art. The specific conditions are not noted in the examples of the present utility model and are carried out according to the conditions conventional in the art or suggested by the manufacturer.

Referring to fig. 1 to 4, an apparatus for rapid inflation and deflation of a vacuum chamber according to the present utility model comprises: the vacuum chamber 1, be provided with the transmission gyro wheel 9 that the multiunit is formed by magnetic fluid seal shaft on the riser of vacuum chamber 1 both sides, be connected with room upper flange 3 through the sealing washer above the vacuum chamber 1, be provided with two air inlets on the room upper flange 3, link to each other with two bleeder lines of Y type gas distribution pipeline 5 respectively, Y type gas distribution pipeline 5 comprises two bleeder lines and a central pipeline, and two bleeder lines symmetric distribution is in the central pipeline, and take the horn mouth shape, and the bore of horn mouth is reduced gradually from the outside to central pipeline collection department; the utility model discloses a gas-distributing device, including room flange 3, room flange 3 below is provided with even gas device 4, through screw fixed connection in room flange below, even gas device includes the hypoplastron, curb plate and hypoplastron intermediate position all around and be on a parallel with both sides board and be provided with a riser that highly equals with the curb plate, be provided with two breach on the riser on the same position with two air inlets, be provided with even intensive aperture on the hypoplastron, evenly distributed has even aperture on the curb plate all around, even gas device top leads to the screw to fix it below in the room flange.

The utility model relates to a method for depositing a thin layer material different from a matrix material on the surface of a solid by utilizing a certain method under vacuum condition, and also can utilize the solid to generate a thin layer material different from the matrix.

Whether PVD technology or CVD technology, the method is completed in a dynamic air supply and exhaust in a vacuum environment, wherein the air supply comprises the supply of process gas and the inflation and the emptying of a vacuum chamber; the high-quality film layer with uniform film thickness, compact structure and small internal stress is deposited on the surface of the substrate, and the air supply and exhaust structure of the vacuum chamber is reasonably designed, so that the substrate is always in a stable gas environment in the vacuum chamber.

As a specific embodiment, the vacuum chamber is a large-size chamber, a plurality of groups of transmission rollers formed by magnetic fluid sealing shafts are arranged on vertical plates on two sides of the chamber, and an upper chamber flange is connected above the vacuum chamber through a sealing ring; the flange on the chamber is provided with two air inlets which are respectively connected with two branch pipelines of a Y-shaped gas distribution pipeline, the Y-shaped gas distribution pipeline consists of two branch pipelines and a central pipeline, the two branch pipelines are symmetrically distributed on the central pipeline and are in a horn mouth shape, the caliber of the horn mouth is gradually reduced from the outer side to the converging position of the central pipeline, and the central pipeline is connected with an inflation valve capable of bearing the pressure of 0.1-0.6 MPa; the lower part of the upper flange of the chamber is provided with a gas homogenizing device which is fixedly connected below the upper flange of the chamber through screws, the gas homogenizing device is in a rectangular box shape, a vertical plate with the same height as the side plates is arranged at the middle positions of the peripheral side plates and the lower plate and parallel to the two side plates, two notches are arranged on the vertical plate at the same positions as the two air inlets, the lower plate is provided with uniform and dense small holes, the uniform small holes are distributed on the peripheral side plates, and the upper part of the gas homogenizing device is fixed below the upper flange of the chamber through screws; after connection, the riser and two notches on the riser divide the gas homogenizing device into a region I and a region II; the substrates are stacked on the carrier plates, so that in order to pursue productivity, the carrier plates are often processed to be large and thin, the working beats are faster and faster, and the inflation and emptying time of the vacuum chamber is shorter and shorter; after the substrate on the carrier plate is coated, the substrate is conveyed to the film outlet chamber by the conveying roller mechanisms at two sides, the chamber is required to be rapidly inflated and broken, so that the pressure in the chamber is the same as the atmospheric pressure, in the inflation process, the Y-shaped pipeline is in a horn mouth shape, when the inflated dry and higher pressure gas reaches the flange air inlet on the chamber through the inflation valve and the Y-shaped gas distribution pipeline, the pressure of the gas can be reduced to be basically the same as the pressure in the vacuum chamber, the inflated gas can be quickly diffused and spread to uniformly dense small holes arranged on the lower plate of the uniform gas distribution device and uniformly distributed on the peripheral side plates, the surface of the substrate carrier plate and the whole chamber are uniformly and orderly distributed, in the whole inflation and breaking process, the upper layer and the lower layer of the carrier plate are always in uniform and stable gas flow due to the arrangement of the uniform gas distribution device, the pressure above and below the carrier plate keeps consistent, the impact of the gas on the carrier plate and the deformation and the clamping displacement of the carrier plate caused by the carrier plate are avoided, the substrate fall off, the uniform thickness of the film is met, the film is ensured, the film deposition demand of the film on the substrate is met, the film is ensured, the film deposition film is uniform and film is ensured, and the film deposition film is stable, and film quality is ensured, and film deposition film quality is stable.

According to the utility model, the charging valve 6 capable of bearing 0.1 MPa-0.6 MPa is arranged above the upper chamber flange 3, the air inlet end of the charging valve is connected with the dry air source, the charging valve can bear high-pressure air, the air pressure and the flow are in a direct proportion relationship, and the high-pressure air is charged, so that the rapid charging and emptying of the vacuum chamber are facilitated, and the production beat requirement is met.

The Y-shaped gas distribution pipeline 5 with variable diameter is arranged between the flange gas inlet and the gas charging valve on the chamber; the two branch pipelines in the Y-shaped gas distribution pipeline are in a horn mouth shape, the caliber of the horn mouth is gradually reduced from the outer side to the collecting position of the central pipeline, namely, the caliber of the horn mouth is gradually increased from the charging valve to the direction of the flange gas inlet on the chamber, and the diameter of the pipeline is in direct proportion to the volume according to the theory of Boyle's law P1V1=P2V2, namely, for ideal gas with certain mass and unchanged temperature, the product of the pressure and the volume is constant; when the high-pressure gas is filled from the small-caliber end of the bell-mouth-shaped pipeline, the gas pressure can be reduced along with the gradual increase of the diameter of the bell-mouth-shaped pipeline, and when the gas reaches the gas inlet of the upper flange of the chamber, the gas pressure can be basically consistent with the pressure in the vacuum chamber, so that the rapid filling and emptying are realized, and the impact of the filled gas on the substrate carrier plate is avoided.

One or more groups of air homogenizing devices 4 are arranged between the flange air inlet and the carrier plate on the chamber; the air homogenizing plate is rectangular box-shaped, a vertical plate with the same height as the side plates is arranged at the middle position of the peripheral side plates and the lower plate and parallel to the two side plates, two notches are arranged on the vertical plate at the same position as the two air inlets, uniform and dense small holes are arranged on the lower plate, uniform small holes are distributed on the peripheral side plates, and the upper part of the air homogenizing device is fixed below the inner part of the upper flange of the chamber through screws; after connection, the riser and two notches on the riser divide the gas homogenizing device into a region I and a region II; the gas filled in the gas inlet is quickly diffused and spread to the uniform and dense small holes arranged on the lower plate of the gas homogenizing device and the small holes uniformly and orderly distributed on the surface of the substrate carrier plate and the whole cavity, in the whole process of inflating and breaking, the upper layer and the lower layer of the carrier plate are always in a uniform and stable gas flow due to the arrangement of the gas homogenizing device, the pressure above and below the carrier plate is kept consistent, the impact of the gas on the substrate and the carrier plate is avoided, the carrier plate is deformed, the substrate is displaced and falls off, and the phenomenon of transmission clamping stagnation is avoided, the requirements of the photovoltaic production line on the operation stability and the film coating process are met, the uniformity of the thickness of a deposited film layer on the substrate is ensured, the compactness of the film layer tissue is also reduced, the internal stress of a film is ensured, and the film quality is ensured.

As a specific example, the shape and specification of the variable-diameter Y-shaped gas distribution pipeline may be changed according to the specific conditions such as vacuum chamber and tact time.

As a specific embodiment, the shape and number of the air homogenizing devices may be changed according to the specific conditions of the vacuum chamber and the carrier plate, and may be rectangular, circular, polygonal, or the like.

As a specific embodiment, the lower plate and the peripheral side plates of the air homogenizing device can be formed by combining one or more pieces according to various factors such as processing, manufacturing, transportation and the like.

As a specific embodiment, the sizes, the number, the distribution and the shapes of the small holes processed on the lower plate and the peripheral side plates of the air homogenizing device can be changed according to the specific structure inside the vacuum chamber.

It should be understood that the utility model is not limited to the particular arrangements and instrumentality described above and shown in the drawings. For the sake of brevity, a detailed description of known methods is omitted here. In the above embodiments, several specific steps are described and shown as examples. The method processes of the present utility model are not limited to the specific steps described and shown, but various changes, modifications and additions, or the order between steps may be made by those skilled in the art after appreciating the spirit of the present utility model.

Claims (4)

1. A device for rapid inflation and deflation of a vacuum chamber, comprising: the vacuum chamber is characterized in that a plurality of groups of transmission rollers formed by magnetic fluid sealing shafts are arranged on vertical plates on two sides of the vacuum chamber, an upper chamber flange is connected above the vacuum chamber through a sealing ring, two air inlets are arranged on the upper chamber flange and are respectively connected with two branch pipelines of a Y-shaped gas distribution pipeline, the Y-shaped gas distribution pipeline consists of two branch pipelines and a central pipeline, the two branch pipelines are symmetrically distributed in the central pipeline and are in a horn mouth shape, and the caliber of a horn mouth is gradually reduced from the outer side to the convergence position of the central pipeline; the utility model discloses a gas-distributing device, including the room flange, be provided with even gas device below the room flange through screw fixed connection, even gas device includes the hypoplastron, curb plate and hypoplastron intermediate position all around and be on a parallel with both sides board and be provided with a riser that highly equals with the curb plate, be provided with two breach on the riser on the same position with two air inlets, be provided with even intensive aperture on the hypoplastron, evenly distributed has even aperture on the curb plate all around, and even gas device top leads to the screw to fix it below in the room flange.

2. The device for rapid inflation and deflation of a vacuum chamber according to claim 1, wherein the central pipeline is connected with an inflation valve capable of bearing a pressure of 0.1-0.6 MPa.

3. The apparatus for rapid inflation and deflation of a vacuum chamber of claim 1, wherein the riser and the two notches in the riser divide the gas distribution means into zones i, ii.

4. The apparatus for rapid inflation and deflation of a vacuum chamber of claim 1, wherein the shape of the gas homogenizing means is rectangular box-like or polygonal.