CN221200233U - Exposure system and exposure device - Google Patents

Abstract

The utility model discloses an exposure system and an exposure device, which realize multi-channel subareas for exposure through a light splitting module, in particular to divide the light path by using an optical fiber array, divide the emergent end of the optical fiber array into a plurality of subareas based on processing requirements, realize the receiving of the light path by matching a first micro lens array in a light guide module with the light splitting module so as to enable a processing light shadow generated by the light emitting module to enter the optical fiber array, and further focus processing light beams emergent from the optical fiber array by using a second micro lens array in the light guide module so as to enable the exposure area to form a smaller lattice, thereby improving the power density and the exposure efficiency of the exposure area and greatly improving the flexibility and the working efficiency of the exposure system.

Description

Exposure system and exposure device

Technical Field

The present utility model relates to the field of projection exposure, and in particular, to an exposure system and an exposure apparatus.

Background

Photolithography and laser direct writing systems are key tools in the field of micro-nano manufacturing, which realize high-precision processing through different working principles, and the photolithography system transmits precise patterns to photosensitive materials by utilizing ultraviolet light and masks so as to realize applications such as semiconductor manufacturing, optical element production and the like. The laser direct writing system adopts laser beams to focus on micro light spots, and directly processes the micro light spots, so that the laser direct writing system is suitable for high-precision manufacturing requirements, such as microelectronic elements and optical devices. These two systems play an important role in modern manufacturing, supporting the continual innovation and advancement of the micro-nano manufacturing field.

The laser direct writing system adopts a high-precision optical system to focus laser beams on the surface of the working material, so that direct customized processing is realized. Such a system has the ability to precisely control the laser beam position and intensity, enabling high precision manufacturing. Because of its excellent control properties, laser direct writing systems are widely used in a variety of fields including microelectronics, micromechanical systems, optical waveguide devices, biochips, medical instruments, nanofabrication, materials science research, and the like. In addition, the laser direct writing system has rich diversity, and can adapt to the processing requirements of various materials and shapes, including rapid prototyping, micromachining, engraving and the like. The diversity of the system is also embodied on different types of lasers which can be used, such as argon ion lasers, laser diodes and femtosecond lasers, which can cope with various processing types, and the application field of the laser direct writing system is further widened.

In a laser direct writing system, an optical system is a key component for realizing accurate laser beam positioning and focusing, and is critical to the performance and processing quality of the system. The optical system comprises a laser light source, laser beam transmission, beam shaping and modulation, beam focusing and the like. The laser direct writing system allows the laser beam to be accurately focused on the working material to realize high-precision customized processing, however, in the existing photoetching or laser direct writing system, a group of projection objectives are generally adopted to directly project an image on a working surface for exposure processing, and a single projection objective can not meet the requirement of high-flexibility processing of the system and has lower working efficiency.

Disclosure of utility model

In order to solve the above technical problems, it is desirable in the embodiments of the present utility model to provide an exposure system and an exposure apparatus, where the exposure system converts a surface exposure area into multiple sub-areas for exposure, so as to greatly improve flexibility and working efficiency of the exposure system.

The technical scheme of the utility model is realized as follows:

In a first aspect, an embodiment of the present utility model provides an exposure system, where the exposure system is used for multi-path light exposure, and the exposure system includes a light emitting module, a beam splitting module and a light guiding module, where the light emitting module includes a laser light source, an image generating unit and a projection objective, the light emitting module is used for projecting a light shadow onto a first plane to form a first light shadow array, the beam splitting module includes an optical fiber array with a minimum subunit being a single or multiple optical fibers, the optical fiber array has a receiving end and an emitting end, the receiving end of the optical fiber array is used for the first light shadow array to enter the optical fiber array, and the emitting end of the optical fiber array is configured to be divided into multi-path subareas according to requirements; the light guide module comprises a first micro-lens array and a second micro-lens array, wherein the first micro-lens array is arranged between the optical fiber array and the light emitting module, the first light shadow array is coupled into the optical fiber array, and the second micro-lens array is used for receiving light shadows emitted by the optical fiber array and focusing the light shadows into a second light shadow array, and an exposure area is formed on a second plane.

Preferably, the receiving end of the optical fiber array is configured in the same manner as the arrangement of the light shadow units of the first light shadow array. The first light shadow array is allowed to enter the integrity of the optical fiber array through the configuration.

Preferably, the arrangement mode of the lens subunits of the second micro lens array is the same as the outline dimension of the emergent end of the optical fiber array. By the configuration, the second micro lens array can be ensured to completely receive the light shadow emitted by the optical fiber array.

Preferably, the lens subunit size of the second microlens array is the same as the lens subunit size of the first microlens array. By sizing the lens sub-units it is ensured that the light shadows optically processed by the first microlens array can be received entirely by the second microlens unit array.

Preferably, the first micro lens array is arranged at the first plane, and the first micro lens array is arranged at the first plane to ensure that the energy of the first light shadow array entering the optical fiber array is not lost.

Preferably, the lens sub-units of the first microlens array are configured to be the same as the size and arrangement of the light shadow units of the first light shadow array, and by the configuration, the first microlens array can be ensured to fully receive the first light shadow array, so that energy loss is prevented.

Preferably, the first microlens array and the second microlens array are closely arranged in a square arrangement mode, and the duty ratio can be improved and the energy loss can be reduced through the square arrangement mode.

Preferably, the first microlens array and the second microlens array are manufactured by means of nanoimprint or ion reaction etching.

Preferably, the optical fiber arrays are closely arranged in a hexagonal arrangement.

In a second aspect, an embodiment of the present utility model further provides an exposure apparatus, where the exposure apparatus includes the exposure system described in any one of the above.

The embodiment of the utility model provides an exposure system and an exposure device, wherein the exposure system is used for realizing exposure of multichannel subareas through a light splitting module, particularly, an optical fiber array is used for carrying out light path division, the emergent end of the optical fiber array is divided into a plurality of subareas based on processing requirements, the first micro lens array in a light guide module is matched with the light splitting module to realize light path receiving so as to enable a processing light shadow generated by the light emitting module to enter the optical fiber array, and the second micro lens array in the light guide module is also used for further focusing processing light beams emergent from the optical fiber array, so that the exposure area can form a smaller lattice, the power density and the exposure efficiency of the exposure area are improved, and the flexibility and the working efficiency of the exposure system are greatly improved.

Drawings

FIG. 1 is a schematic diagram of a mapping system in the prior art;

fig. 2 is a schematic diagram of an exposure system according to an embodiment of the utility model.

Reference numerals in the specific embodiments are as follows:

200. A mapping system; 10. a light emitting module; 11. an image generation unit; 12. a projection objective;

A. A first plane; B. a second plane;

100. an exposure system; 20. a light splitting module; 21. an optical fiber array; 30. a light guide module; 31. a first microlens array; 32. and a second microlens array.

Detailed Description

In order to more clearly illustrate the embodiments of the present utility model or the technical solutions in the prior art, the technical solutions in the embodiments of the present utility model will be clearly and completely described below with reference to the drawings in the embodiments of the present utility model, and it is apparent that the described embodiments are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

In the existing lithography or laser direct writing system, referring to fig. 1, a part of a structure of a mapping system 200 used for exposure processing in the prior art is shown, the mapping system 200 includes a light emitting module 10, the light emitting module 10 includes a light source, an image generating unit 11 and a projection objective 12, in fig. 1, an arrow from left to right indicates a direction of light path transmission, and a light source (not shown) used for emitting laser is disposed at the leftmost end of the mapping system 200, and the light source may include a diode laser array, or a fiber laser, or other laser capable of delivering laser with power meeting the process requirement to achieve the process processing purpose, such as melting or exposure. The light source emits laser along the light path transmission direction, a homogenizing component for homogenizing the laser is arranged at the light outlet of the light source, and the laser continuously advances along the light path after leaving the homogenizing component.

The laser continues to advance to illuminate the image generating unit 11, an exposure pattern for processing is disposed on the image generating unit 11, a first light spot is formed after the exposure pattern is illuminated by the laser, the first light spot continues to advance along a light path, referring to fig. 1, the first light spot continues to advance into the projection objective 12 along a light path transmission direction, the projection objective 12 is configured into a pair of opposite single-sided convex lenses, the first light spot forms a first light-shadow array on a first plane a through focusing treatment of the projection objective 12, namely, forms a first light-shadow array in a focal plane of the projection objective 12, and the first light-shadow array irradiates a workpiece in the first plane a to perform exposure processing on the workpiece.

The first light and shadow array is enabled to expose a workpiece at a working plane (first plane a) by adjusting the position of the mapping system 200 or changing the focal plane of the projection objective 12 such that the focal plane of the projection objective 12 coincides with the working plane. By the above mapping system 200, the image generated by the image generating unit 11 can be projected onto a working plane, the workpiece is exposed, and the first light spot is exposed by the projection objective 12 under the above configuration, so that the first light spot is converted into a state capable of exposure processing to form a first light shadow array, but the processing effective area of the first light shadow array is the whole focal plane of the projection objective 12, the area of the processing light beam is large, the flexibility is low, and the shape and size of the first light shadow array cannot be changed based on the process requirement.

Based on this, the disclosed embodiment of the present utility model provides an exposure system 100, where the exposure system 100 further includes a light splitting module 20 and a light guiding module 30 based on the mapping system 200, the light guiding module 30 is configured to guide the first shadow array generated by the light emitting module 10 into the light splitting module 20, the light splitting module 20 divides the first shadow array into a plurality of shadow areas in the form of multiplexing output ends based on the exposure process requirement, and the sizes and shapes of the plurality of shadow areas may be different. The light guide module 30 is further configured to aggregate the plurality of light shadow areas obtained by dividing by the light splitting module 20, so that the plurality of light shadow areas form an exposure area on a second plane B, and a technical effect of multiple paths of exposure is achieved, where the second plane B is a new processing plane.

Specifically, referring to fig. 2, a schematic structural diagram of an exposure system 100 in an embodiment of the present utility model is shown, where the optical fiber array 20 includes an optical fiber array 21, the optical fiber array 21 has a receiving end and an emitting end, the receiving end of the optical fiber array 21 is configured to enter the entrance of the optical fiber array 20, and the emitting end of the optical fiber array 21 is configured to exit the exit of the optical fiber array 20. The optical fiber array 21 is configured to be composed of a plurality of optical fiber subunits, each of which thus also includes a receiving end and an emitting end, wherein the optical fiber subunits include a single or a plurality of optical fibers.

In this embodiment, the optical fiber subunits comprise a single optical fiber, and the receiving end of each optical fiber subunit is configured to receive a single light shadow unit of the first light shadow array, where the light shadow unit is the smallest unit that comprises the first light shadow array. And the light shadow unit enters the optical fiber subunit from the receiving end of the optical fiber subunit, and then leaves the optical fiber subunit from the emergent end of the optical fiber subunit.

The outgoing end portion of the optical fiber array 21 can arrange the outgoing ends of any number of optical fiber subunits into a plurality of sub-areas according to the process requirement, and in the above configuration, the output result of the optical fiber array 21 is a plurality of sub-areas with the same shape, size or different shapes, so as to realize the division of the exposure areas. Preferably, in order to ensure the quality of the division of the exposure area, the receiving ends of the optical fiber subunits are configured to be identical to the distribution of the light shadow units in the first light shadow array, i.e. the receiving ends of the optical fiber array 21 are configured to be arranged in the manner of the first light shadow array, thereby ensuring the integrity of the light shadow entering the optical fiber. Preferably, in order to increase the duty ratio, the optical fiber arrays 21 are closely combined in a hexagonal arrangement, and in this configuration, the efficiency of receiving light and shadow by the optical fibers can be improved.

The composition of the optical fiber subunits and the composition of the optical fiber array 21 can be bonded by bonding, and the hexagonal structure can be obtained by fusing the heated fibers. Illustratively, the receiving ends of the optical fiber array 21 are integrally formed by bonding, and the emitting ends of the optical fiber array 21 are divided into a plurality of sub-areas, each sub-area including one or more optical fiber sub-units, each sub-area being integrally formed by bonding.

The exposure system 100 further comprises a light guide module 30, the light guide module 30 comprising a first microlens array 31 and a second microlens array 32. The first microlens array 31 is arranged between the receiving end of the fiber array 21 and the projection objective 12, the first microlens array 31 being used for coupling the first light shadow array into the receiving end of the fiber array 21. The second microlens array 32 is disposed at the exit end of the optical fiber array 21, and is configured to receive the light and shadow divided by the optical fiber array 21 and focus the light and shadow on the second plane B to form an exposure surface.

In the above configuration, the first light-shadow array is converted into a second light-shadow array after sequentially passing through the first microlens array 31, the optical fiber array 21 and the second microlens array 32, and a plurality of exposure areas satisfying the process requirements are formed on the second plane B.

The first micro lens array 31 can ensure that the first light shadow array is completely coupled into the receiving end of the optical fiber array 21, and the first micro lens array 31 has the functions of receiving and emitting for the first light shadow array, so that in order to ensure that the first micro lens array 31 can completely receive the first light shadow array to prevent laser energy loss, the lens subunit size of the first micro lens array 31 is the same as the size of the light shadow unit, based on the fact that the first micro lens array 31 can completely couple the first light shadow array into the optical fiber array 21. The energy of the first light shadow array is most concentrated at the focal plane of the projection objective 12, i.e. at the first plane a, and therefore, preferably the first microlens array 31 is arranged at the first plane a, which increases the efficiency of the first microlens array 31 for coupling the first light shadow array into the fiber array 21.

When the first light shadow array leaves the optical fiber array 21, the second micro lens array 32 receives the first light shadow array and focuses it to form a second light shadow array, and forms an exposure surface on a new processing plane, i.e. a second plane B. Similarly to the first microlens array 31, in order to be able to fully receive the first light shadow array to prevent energy loss, the lens subunit size of the second microlens array 32 is the same as the size of the light shadow unit, but it should be noted that at this time, the first light shadow array has been optically processed by the first microlens array 31, and in order to receive the light shadow more accurately, the lens subunit size of the second microlens array 32 is configured to be the same as the lens subunit size of the first microlens array 31. Preferably, the first microlens array 31 and the second microlens array 32 are closely arranged in a square arrangement manner, so as to improve the duty ratio and ensure the quality and efficiency of the light guide. On the other hand, the second microlens array 32 is configured to directly receive the light and shadow divided by the optical fiber array 21, and in order to be able to completely receive the light and shadow, the external dimensions of the lens sub-units of the second microlens array 32 are the same as the external dimensions of the emitting ends of the optical fiber array 21.

In addition, after the first light shadow array passes through the second micro lens array 32 after being divided by the optical fiber array 21, the first light shadow array is converted into the second light shadow array, and compared with the first light shadow array, the second micro lens array 32 can focus the light energy of each light shadow unit of the second light shadow array into smaller light spots, and smaller lattice is formed in the exposure area, so that the power density of the exposure area is improved, and the exposure efficiency of the system is improved.

In another embodiment of the present utility model, the first microlens array 31 and the second microlens array 32 are fabricated by nanoimprint or ion reaction etching, and the microlens array has a size ranging from 15um to 200um and a sagittal height ranging from 3um to 100um, and the device can be manufactured by micro-nano fabrication.

Another aspect of the present utility model also discloses an exposure apparatus including the exposure system 100 disclosed in any one of the above embodiments.

The foregoing is merely illustrative of the present utility model, and the present utility model is not limited thereto, and any changes or substitutions easily contemplated by those skilled in the art within the scope of the present utility model should be included in the present utility model. Therefore, the protection scope of the present utility model shall be subject to the protection scope of the claims.

Claims (10)

1. The utility model provides an exposure system, exposure system is used for multichannel shadow exposure, includes light emitting module, beam split module and photoconductive module, light emitting module includes laser source, image generation unit and projection objective, light emitting module is used for forming first shadow array with the shadow projection to first plane, its characterized in that:

The light splitting module comprises an optical fiber array with a single or multiple optical fibers as a minimum subunit, the optical fiber array is provided with a receiving end and an emitting end, the receiving end of the optical fiber array is used for enabling the first light shadow array to enter the optical fiber array, and the emitting end of the optical fiber array is configured to be divided into multiple sub-areas according to requirements;

The light guide module comprises a first micro-lens array and a second micro-lens array, wherein the first micro-lens array is arranged between the optical fiber array and the light emitting module, the first light shadow array is coupled into the optical fiber array, and the second micro-lens array is used for receiving light shadows emitted by the optical fiber array and focusing the light shadows into a second light shadow array, and an exposure area is formed on a second plane.

2. The exposure system of claim 1, wherein the receiving end of the fiber array is configured in the same manner as the arrangement of the light shadow units of the first light shadow array.

3. The exposure system of claim 1, wherein the lens subunits of the second microlens array are configured to have the same physical dimensions as the exit ends of the fiber optic array.

4. The exposure system of claim 1, wherein a lens subunit size of the second microlens array is the same as a lens subunit size of the first microlens array.

5. The exposure system of claim 1, wherein the first microlens array is disposed at the first plane.

6. The exposure system of claim 1, wherein the lens subunits of the first microlens array are configured to be the same size and arrangement as the light shadow units of the first light shadow array.

7. The exposure system according to claim 1, wherein the first microlens array and the second microlens array are closely arranged in a square arrangement.

8. The exposure system according to claim 1, wherein the first microlens array and the second microlens array are fabricated by nanoimprint or ion reactive etching.

9. The exposure system of claim 1, wherein the fiber array is closely arranged in a hexagonal arrangement.

10. An exposure apparatus, characterized in that the exposure apparatus comprises the exposure system according to any one of claims 1 to 9.