CN220986183U - Cleaning fluid infusion system - Google Patents
Cleaning fluid infusion system Download PDFInfo
- Publication number
- CN220986183U CN220986183U CN202322832648.2U CN202322832648U CN220986183U CN 220986183 U CN220986183 U CN 220986183U CN 202322832648 U CN202322832648 U CN 202322832648U CN 220986183 U CN220986183 U CN 220986183U
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- Prior art keywords
- cleaning
- pipeline
- tank
- liquid
- cleaning tank
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- 238000004140 cleaning Methods 0.000 title claims abstract description 209
- 239000012530 fluid Substances 0.000 title claims abstract description 27
- 238000001802 infusion Methods 0.000 title description 11
- 239000007788 liquid Substances 0.000 claims abstract description 125
- 238000002637 fluid replacement therapy Methods 0.000 claims abstract description 30
- 239000007789 gas Substances 0.000 claims description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 16
- 238000001514 detection method Methods 0.000 claims description 15
- 230000001502 supplementing effect Effects 0.000 claims description 15
- 238000010926 purge Methods 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 238000004891 communication Methods 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 abstract description 4
- 239000013589 supplement Substances 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000013022 venting Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model discloses a cleaning and fluid replacement system, which comprises a first cleaning tank, a second cleaning tank and a fluid replacement tank, wherein the first cleaning tank is provided with a first liquid inlet joint and a first liquid outlet joint, the first liquid outlet joint is communicated with a first pipeline, the first pipeline is configured to be communicated with cleaning equipment, the first pipeline is provided with a first control valve, the second cleaning tank is provided with a second liquid inlet joint and a second liquid outlet joint, the second liquid outlet joint is communicated with the second pipeline, the second pipeline is configured to be communicated with the cleaning equipment, the second pipeline is provided with a second control valve, the fluid replacement tank is provided with a third liquid outlet joint, the third liquid outlet joint is communicated with the first liquid inlet joint through a third pipeline, the third liquid outlet joint is communicated with the second liquid inlet joint through a fourth pipeline, the fourth pipeline is provided with a fourth control valve, the cleaning and fluid replacement system can continuously provide cleaning fluid for the cleaning equipment, so that the cleaning equipment can continuously clean wafers without manual fluid replacement, and labor cost can be saved.
Description
Technical Field
The utility model relates to the technical field of semiconductor manufacturing, in particular to a cleaning and fluid replacement system.
Background
In semiconductor devices, silicon wafers are used more severely and must be cleaned severely. Trace contamination can also lead to device failure. The cleaning aims at removing surface contamination impurities including organic and inorganic substances, which may cause various defects.
The conventional equipment cleaning system is supplemented with liquid by adopting a manual liquid supplementing method, and the whole production equipment is required to be stopped when the liquid is supplemented, and then the liquid is supplemented manually. And after the manual fluid infusion is completed, the equipment is started, so that the production is restored. The whole cleaning and fluid infusion process is time-consuming and labor-consuming, and labor cost is wasted.
Disclosure of utility model
The present utility model aims to solve at least one of the technical problems existing in the prior art. Therefore, the cleaning and fluid supplementing system is time-saving and labor-saving, and can reduce labor cost.
The cleaning and fluid replacement system comprises a first cleaning tank, a second cleaning tank and a fluid replacement tank, wherein the first cleaning tank is provided with a first liquid inlet joint and a first liquid outlet joint, the first liquid outlet joint is communicated with a first pipeline, the first pipeline is configured to be communicated with cleaning equipment, and the first pipeline is provided with a first control valve for controlling the on-off of the first pipeline; the second cleaning tank is provided with a second liquid inlet joint and a second liquid outlet joint, the second liquid outlet joint is communicated with a second pipeline, the second pipeline is configured to be communicated with cleaning equipment, and the second pipeline is provided with a second control valve for controlling the on-off of the second pipeline; the liquid supplementing tank is provided with a third liquid outlet joint, the third liquid outlet joint is communicated with the first liquid inlet joint through a third pipeline, the third pipeline is provided with a third control valve, the third liquid outlet joint is communicated with the second liquid inlet joint through a fourth pipeline, and the fourth pipeline is provided with a fourth control valve.
The cleaning and fluid replacement system provided by the embodiment of the utility model has at least the following beneficial effects:
When the first cleaning tank supplies cleaning liquid to the cleaning equipment, the first control valve is opened, and the second control valve, the third control valve and the fourth control valve are closed; when the cleaning liquid in the first cleaning tank is used up, the first control valve is closed, the second control valve is opened, the third control valve is opened, the fourth control valve is closed, the cleaning and liquid supplementing system is switched to the second cleaning tank to provide the cleaning liquid for the cleaning equipment, and at the moment, the liquid supplementing tank supplements the cleaning liquid for the first cleaning tank through the third pipeline; when the cleaning solution in the second cleaning tank is used up, the liquid supplementing tank supplements enough cleaning solution for the first cleaning tank, the first control valve is opened, the second control valve is closed, the third control valve is closed, the fourth control valve is closed, the cleaning and liquid supplementing system is switched to the first cleaning tank to provide the cleaning solution for the cleaning equipment, at the moment, the liquid supplementing tank supplements the cleaning solution for the second cleaning tank through the fourth pipeline, and the circulation is performed, so that the cleaning and liquid supplementing system can continuously provide the cleaning solution for the cleaning equipment, the cleaning equipment can continuously clean the wafer without manual liquid supplementing, time and labor are saved, and labor cost can be saved.
According to some embodiments of the utility model, the third liquid outlet joint is communicated with a fifth pipeline, the third pipeline and the fourth pipeline are both communicated with the fifth pipeline, the fifth pipeline is provided with a liquid supplementing pump, and the liquid supplementing pump is used for conveying the cleaning liquid in the liquid supplementing tank to the first cleaning tank or the second cleaning tank.
According to some embodiments of the utility model, the fluid infusion pump is a diaphragm pump.
According to some embodiments of the utility model, the fifth pipeline is respectively communicated with the third pipeline and the fourth pipeline through a three-way joint, and a fifth control valve is arranged on the fifth pipeline between the liquid supplementing pump and the three-way joint.
According to some embodiments of the utility model, the first wash tank is provided with a first liquid level detection assembly for detecting a liquid level in the first wash tank.
According to some embodiments of the utility model, the second wash tank is provided with a second liquid level detection assembly for detecting the liquid level in the second wash tank.
According to some embodiments of the utility model, the first purge tank is provided with a first connection, which is in communication with a sixth line, which is provided with a first pressurization valve for increasing the gas pressure inside the first purge tank.
According to some embodiments of the utility model, the sixth pipeline is provided with a first vent valve for venting nitrogen from the first purge tank.
According to some embodiments of the utility model, the second purge tank is provided with a second connection, which is in communication with a seventh line, which is provided with a second pressurization valve for increasing the gas pressure inside the second purge tank.
According to some embodiments of the utility model, the seventh line is provided with a second vent valve for venting nitrogen from the second purge tank.
Additional aspects and advantages of the utility model will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the utility model.
Drawings
The foregoing and/or additional aspects and advantages of the utility model will become apparent and may be better understood from the following description of embodiments taken in conjunction with the accompanying drawings in which:
FIG. 1 is a schematic diagram of a cleaning and fluid replacement system according to an embodiment of the present utility model.
Reference numerals:
The first wash tank 100, the first liquid inlet joint 110, the first liquid outlet joint 120, the first pipeline 130, the first control valve 140, the first joint 150, the sixth pipeline 160, the first pressurization valve 170, the first vent valve 180, the second wash tank 200, the second liquid inlet joint 210, the second liquid outlet joint 220, the second pipeline 230, the second control valve 240, the second joint 250, the seventh pipeline 260, the second pressurization valve 270, the second vent valve 280, the make-up tank 300, the third pipeline 310, the third control valve 320, the fourth pipeline 330, the fourth control valve 340, the fifth pipeline 350, the make-up pump 360, the fifth control valve 370, the three-way joint 380, the first liquid level detection assembly 400, and the second liquid level detection assembly 500.
Detailed Description
Embodiments of the present utility model are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative only and are not to be construed as limiting the utility model.
In the description of the present utility model, it should be understood that references to orientation descriptions such as upper, lower, front, rear, left, right, etc. are based on the orientation or positional relationship shown in the drawings, are merely for convenience of description of the present utility model and to simplify the description, and do not indicate or imply that the apparatus or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the present utility model.
In the description of the present utility model, a number means one or more, a number means two or more, and greater than, less than, exceeding, etc. are understood to not include the present number, and above, below, within, etc. are understood to include the present number. The description of the first and second is for the purpose of distinguishing between technical features only and should not be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present utility model, unless explicitly defined otherwise, terms such as arrangement, installation, connection, etc. should be construed broadly and the specific meaning of the terms in the present utility model can be reasonably determined by a person skilled in the art in combination with the specific contents of the technical scheme.
Referring to fig. 1, a cleaning and fluid-replenishing system according to an embodiment of the present utility model includes a first cleaning tank 100, a second cleaning tank 200, and a fluid-replenishing tank 300, where the first cleaning tank 100 is provided with a first liquid inlet joint 110 and a first liquid outlet joint 120, the first liquid outlet joint 120 is connected with a first pipeline 130, the first pipeline 130 is configured to be connected with a cleaning device, the first pipeline 130 is provided with a first control valve 140 for controlling on-off of the first pipeline 130, the second cleaning tank 200 is provided with a second liquid inlet joint 210 and a second liquid outlet joint 220, the second liquid outlet joint 220 is connected with a second pipeline 230, the second pipeline 230 is configured to be connected with the cleaning device, the second pipeline 230 is provided with a second control valve 240 for controlling on-off of the second pipeline 230, the fluid-replenishing tank 300 is provided with a third liquid outlet joint, the third liquid outlet joint is connected with the first liquid inlet joint 110 through a third pipeline 310, the third pipeline 310 is provided with a third control valve 320, the third liquid outlet joint is connected with the second liquid inlet joint 210 through a fourth pipeline 330, the fourth pipeline 330 is provided with a fourth control valve 340, and when the first control valve 320 is opened for cleaning device 100, and the second control valve 320 is opened. At this time, when the second cleaning tank 200 has sufficient cleaning liquid, the fourth control valve 340 is closed, and if the second cleaning tank 200 has insufficient cleaning liquid, the fourth control valve 340 is opened to replenish the second cleaning tank 200; when the cleaning solution in the first cleaning tank 100 is used up, the first control valve 140 is closed, the second control valve 240 is opened, the third control valve 320 is opened, the fourth control valve 340 is closed, the cleaning and replenishing system is switched to the second cleaning tank 200 to supply the cleaning solution to the cleaning device, and at this time, the replenishing tank 300 replenishes the cleaning solution for the first cleaning tank 100 through the third pipeline 310; when the cleaning solution in the second cleaning tank 200 is used up, the fluid infusion tank 300 fills the second cleaning tank 200 with sufficient cleaning solution, the first control valve 140 is opened, the second control valve 240 is closed, the third control valve 320 is closed, the fourth control valve 340 is opened, the cleaning and fluid infusion system is switched to the first cleaning tank 100 to provide the cleaning solution for the cleaning device, at this time, the fluid infusion tank 300 supplements the cleaning solution for the second cleaning tank 200 through the fourth pipeline 330, and the circulation is performed in such a way that the cleaning and fluid infusion system can continuously provide the cleaning solution for the cleaning device, so that the cleaning device can continuously clean the wafer without manually infusing, time and labor are saved, and labor cost can be saved.
In some embodiments of the present utility model, the third liquid outlet connector is communicated with a fifth pipeline 350, the third pipeline 310 and the fourth pipeline 330 are both communicated with the fifth pipeline 350, the fifth pipeline 350 is provided with a liquid replenishing pump 360, and the liquid replenishing pump 360 is used for conveying the cleaning liquid in the liquid replenishing tank 300 into the first cleaning tank 100 or the second cleaning tank 200, so that the liquid replenishing tank 300 can rapidly replenish the cleaning liquid for the first cleaning tank 100 or the second cleaning tank 200.
Specifically, by providing the liquid replenishing pump 360, the cleaning solution in the third pipeline 310 can be powered, so that the cleaning solution in the third pipeline 310 can overcome the gas pressure in the first cleaning tank 100, and the cleaning solution in the first cleaning tank 100 can be replenished, and by the same token, the liquid replenishing pump 360 can provide the cleaning solution in the fourth pipeline 330, so that the cleaning solution in the fourth pipeline 330 can overcome the gas pressure in the second cleaning tank 200, and the cleaning solution can be replenished for the second cleaning tank 200, so that the liquid replenishing tank 300 can quickly replenish the cleaning solution for the first cleaning tank 100 or the second cleaning tank 200.
It should be noted that, the fluid replacement tank 300 may be located above the first cleaning tank 100 and the second cleaning tank 200, the cleaning fluid in the third pipeline 310 may flow into the first cleaning tank 100 under the action of gravity, the cleaning fluid in the fourth pipeline 330 may flow into the second cleaning tank 200 under the action of gravity, and the fluid replacement tank 300 may supplement the cleaning fluid to the first cleaning tank 100 or the second cleaning tank 200 without using the fluid replacement pump 360, which is not limited herein.
In some embodiments of the present utility model, the fluid replacement pump 360 is a diaphragm pump that can isolate the cleaning fluid from the plunger and cylinder by means of a membrane, thereby protecting the plunger and cylinder from corrosion by the cleaning fluid and improving the service life of the cleaning fluid replacement system.
Of course, in some embodiments, the fluid infusion pump 360 may also be a piston pump or a centrifugal pump, which is not limited herein.
In some embodiments of the present utility model, the fifth pipeline 350 is respectively communicated with the third pipeline 310 and the fourth pipeline 330 through the three-way joint 380, the fifth pipeline 350 between the fluid infusion pump 360 and the three-way joint 380 is provided with the fifth control valve 370, when the third control valve 320 or the fourth control valve 340 is damaged, a maintainer can close the fifth control valve 370 and close the fifth pipeline 350 in time, so that the condition of cleaning fluid loss can be avoided, and the maintainer can conveniently replace the third control valve 320 or the fourth control valve 340.
Specifically, the third pipeline 310 and the fourth pipeline 330 are arranged in parallel, the fifth control valve 370 is located between the three-way joint 380 and the fluid replacement pump 360, and when the third control valve 320 or the fourth control valve 340 is damaged, a maintainer can close the fifth control valve 370 and close the fifth pipeline 350 in time, so that the condition of cleaning fluid loss can be avoided, and the maintainer can replace the third control valve 320 or the fourth control valve 340 conveniently.
In some embodiments of the present utility model, the first cleaning tank 100 is provided with a first liquid level detection assembly 400, and the first liquid level detection assembly 400 is used for detecting the liquid level in the first cleaning tank 100, so that the liquid level in the first cleaning tank 100 can be detected in real time, and the cleaning liquid can be timely replenished.
It should be noted that, the first liquid level detection assembly 400 may be a float type liquid level sensor, a static pressure type liquid level sensor, or the like, which is not limited herein.
In some embodiments of the present utility model, the second cleaning tank 200 is provided with a second liquid level detection assembly 500, the second liquid level detection assembly 500 is used for detecting the liquid level in the second cleaning tank 200, and the second liquid level detection assembly 500 is used for detecting the liquid level in the second cleaning tank 200, so that the liquid level in the second cleaning tank 200 can be detected in real time, and the cleaning liquid can be timely replenished.
It should be noted that, the second liquid level detection assembly 500 may be a float type liquid level sensor, a static pressure type liquid level sensor, or the like, which is not limited herein.
In some embodiments of the present utility model, the first cleaning tank 100 is provided with a first joint 150, the first joint 150 is communicated with a sixth pipeline 160, the sixth pipeline 160 is provided with a first pressurizing valve 170, and the first pressurizing valve 170 is used for increasing the gas pressure in the first cleaning tank 100 so that the gas pressure in the first cleaning tank 100 can be greater than the external pressure, and the cleaning liquid in the first cleaning tank 100 is discharged from the first liquid outlet joint 120 to the first pipeline 130, so as to provide the cleaning liquid for the cleaning device.
Specifically, the first connector 150 is located at the top of the first cleaning tank 100, the first pressurization valve 170 is configured to communicate with a gas source, and when the first pressurization valve 170 is opened, the gas source delivers nitrogen gas into the first cleaning tank 100 through the sixth pipeline 160 to increase the gas pressure in the first cleaning tank 100, so that the gas pressure in the first cleaning tank 100 can be greater than the external pressure to discharge the cleaning liquid in the first cleaning tank 100 from the first liquid outlet connector 120 to the first pipeline 130, thereby providing the cleaning liquid to the cleaning apparatus.
In some embodiments of the present utility model, the sixth pipeline 160 is provided with a first vent valve 180, and the first vent valve 180 is used to vent nitrogen in the first cleaning tank 100, so as to reduce the gas pressure in the first cleaning tank 100, and facilitate the cleaning solution in the third pipeline 310 to flow into the first cleaning tank 100, so that the liquid replenishing tank 300 is convenient for replenishing the cleaning solution for the first cleaning tank 100.
Specifically, when the fluid replacement tank 300 is used for replacing the cleaning fluid in the first cleaning tank 100, the first pressurization valve 170 is closed, and the first exhaust valve 180 is opened to exhaust the nitrogen gas in the first cleaning tank 100, so that the gas pressure in the first cleaning tank 100 can be reduced, and the cleaning fluid in the third pipeline 310 can flow into the first cleaning tank 100 conveniently.
In some embodiments of the present utility model, the second cleaning tank 200 is provided with a second joint 250, the second joint 250 is communicated with a seventh pipe 260, the seventh pipe 260 is provided with a second pressurizing valve 270, and the second pressurizing valve 270 is used for increasing the gas pressure in the second cleaning tank 200 so that the gas pressure in the second cleaning tank 200 can be greater than the external pressure to discharge the cleaning liquid in the second cleaning tank 200 from the second liquid outlet joint 220 to the second pipe 230, thereby providing the cleaning liquid for the cleaning apparatus.
Specifically, the second connector 250 is located at the top of the second cleaning tank 200, the second pressurization valve 270 is configured to communicate with a gas source, and when the second pressurization valve 270 is opened, the gas source delivers nitrogen gas into the second cleaning tank 200 through the seventh pipeline 260 to increase the gas pressure in the second cleaning tank 200 so that the gas pressure in the second cleaning tank 200 can be greater than the external pressure to discharge the cleaning liquid in the second cleaning tank 200 from the second liquid outlet connector 220 to the second pipeline 230, thereby providing the cleaning liquid to the cleaning apparatus.
In some embodiments of the present utility model, the seventh pipeline 260 is provided with a second exhaust valve 280, and the second exhaust valve 280 is used for exhausting nitrogen in the second cleaning tank 200, so as to reduce the gas pressure in the second cleaning tank 200, and enable the cleaning solution in the third pipeline 310 to flow into the second cleaning tank 200 conveniently, so that the liquid replenishing tank 300 is convenient for replenishing the cleaning solution for the second cleaning tank 200.
Specifically, when the liquid replenishing tank 300 replenishes the cleaning liquid in the second cleaning tank 200, the second pressurizing valve 270 is closed, and the second vent valve 280 is opened to vent the nitrogen gas in the second cleaning tank 200, so that the gas pressure in the second cleaning tank 200 can be reduced, and the cleaning liquid in the third pipeline 310 can flow into the first cleaning tank 100 conveniently.
The first control valve 140, the second control valve 240, the third control valve 320, the fourth control valve 340, and the fifth control valve 370 may be a pneumatic control valve structure or an electric control valve structure, and are not limited herein.
The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.
The present embodiment has been described in detail with reference to the drawings, but the present utility model is not limited to the above embodiment, and various changes can be made within the knowledge of those skilled in the art without departing from the spirit.
Claims (10)
1. A cleaning and fluid replacement system, comprising:
The first cleaning tank (100) is provided with a first liquid inlet joint (110) and a first liquid outlet joint (120), the first liquid outlet joint (120) is communicated with a first pipeline (130), the first pipeline (130) is configured to be communicated with cleaning equipment, and the first pipeline (130) is provided with a first control valve (140) for controlling the on-off of the first pipeline (130);
The second cleaning tank (200) is provided with a second liquid inlet joint (210) and a second liquid outlet joint (220), the second liquid outlet joint (220) is communicated with a second pipeline (230), the second pipeline (230) is configured to be communicated with cleaning equipment, and the second pipeline (230) is provided with a second control valve (240) for controlling the on-off of the second pipeline (230);
The liquid supplementing tank (300) is provided with a third liquid outlet joint, the third liquid outlet joint is communicated with the first liquid inlet joint (110) through a third pipeline (310), the third pipeline (310) is provided with a third control valve (320), the third liquid outlet joint is communicated with the second liquid inlet joint (210) through a fourth pipeline (330), and the fourth pipeline (330) is provided with a fourth control valve (340).
2. The cleaning and fluid replacement system according to claim 1, wherein a fifth pipeline (350) is communicated with the third liquid outlet joint, the third pipeline (310) and the fourth pipeline (330) are both communicated with the fifth pipeline (350), the fifth pipeline (350) is provided with a fluid replacement pump (360), and the fluid replacement pump (360) is used for conveying cleaning fluid in the fluid replacement tank (300) into the first cleaning tank (100) or the second cleaning tank (200).
3. The cleaning and fluid replacement system of claim 2, wherein the fluid replacement pump (360) is a diaphragm pump.
4. The cleaning and fluid replacement system according to claim 2, wherein the fifth line (350) is in communication with the third line (310) and the fourth line (330), respectively, via a three-way connection (380), the fifth line (350) between the fluid replacement pump (360) and the three-way connection (380) being provided with a fifth control valve (370).
5. The cleaning and fluid replacement system according to claim 1, wherein the first cleaning tank (100) is provided with a first fluid level detection assembly (400), the first fluid level detection assembly (400) being adapted to detect the fluid level in the first cleaning tank (100).
6. The cleaning and fluid replacement system according to claim 1, wherein the second cleaning tank (200) is provided with a second fluid level detection assembly (500), the second fluid level detection assembly (500) being adapted to detect the fluid level in the second cleaning tank (200).
7. The cleaning and fluid replacement system according to claim 1, wherein the first cleaning tank (100) is provided with a first joint (150), the first joint (150) is communicated with a sixth pipeline (160), the sixth pipeline (160) is provided with a first pressurization valve (170), and the first pressurization valve (170) is used for increasing the gas pressure in the first cleaning tank (100).
8. The purge and make-up system according to claim 7, wherein the sixth conduit (160) is provided with a first vent valve (180), the first vent valve (180) being adapted to vent nitrogen from the first purge tank (100).
9. The cleaning and fluid replacement system according to claim 1, wherein the second cleaning tank (200) is provided with a second joint (250), the second joint (250) is communicated with a seventh pipeline (260), the seventh pipeline (260) is provided with a second pressurization valve (270), and the second pressurization valve (270) is used for increasing the gas pressure in the second cleaning tank (200).
10. The purge and make-up system according to claim 9, wherein the seventh conduit (260) is provided with a second vent valve (280), the second vent valve (280) being adapted to vent nitrogen from the second purge tank (200).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322832648.2U CN220986183U (en) | 2023-10-23 | 2023-10-23 | Cleaning fluid infusion system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322832648.2U CN220986183U (en) | 2023-10-23 | 2023-10-23 | Cleaning fluid infusion system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220986183U true CN220986183U (en) | 2024-05-21 |
Family
ID=91069776
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202322832648.2U Active CN220986183U (en) | 2023-10-23 | 2023-10-23 | Cleaning fluid infusion system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220986183U (en) |
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2023
- 2023-10-23 CN CN202322832648.2U patent/CN220986183U/en active Active
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