CN220513653U - Independent infiltration system for photoresistance filter element - Google Patents
Independent infiltration system for photoresistance filter element Download PDFInfo
- Publication number
- CN220513653U CN220513653U CN202321827658.0U CN202321827658U CN220513653U CN 220513653 U CN220513653 U CN 220513653U CN 202321827658 U CN202321827658 U CN 202321827658U CN 220513653 U CN220513653 U CN 220513653U
- Authority
- CN
- China
- Prior art keywords
- filter element
- liquid
- liquid supply
- infiltration system
- liquid outlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 230000008595 infiltration Effects 0.000 title claims abstract description 88
- 238000001764 infiltration Methods 0.000 title claims abstract description 88
- 239000007788 liquid Substances 0.000 claims abstract description 164
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 abstract description 25
- 238000011010 flushing procedure Methods 0.000 abstract description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 10
- 229910052710 silicon Inorganic materials 0.000 abstract description 10
- 239000010703 silicon Substances 0.000 abstract description 10
- 238000004026 adhesive bonding Methods 0.000 abstract description 7
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 238000004140 cleaning Methods 0.000 description 5
- 238000007599 discharging Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000002699 waste material Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000004297 night vision Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000011895 specific detection Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Abstract
The utility model relates to the field of manufacturing semiconductor chips and silicon-based OLED; in particular to an independent infiltration system for a photoresistance filter element, which comprises a liquid supply mechanism and a liquid outlet mechanism; the liquid supply mechanism comprises a liquid supply pipeline; the liquid supply pipeline is connected with a liquid supply part; the liquid outlet mechanism comprises a liquid outlet pipeline, and the liquid outlet pipeline is connected with a liquid pump; the infiltration system disclosed by the utility model is independent of an original pipeline infiltration system in traditional gluing equipment; the infiltration system disclosed by the utility model can independently realize the infiltration operation of the photoresist filter element, and avoid the problem that the traditional gluing equipment needs to be stopped to realize the flushing of the filter element; production efficiency can be guaranteed to a certain extent, and the man-hour for flushing the filter element is avoided.
Description
Technical Field
The utility model relates to the field of manufacturing semiconductor chips and silicon-based OLED; in particular to an independent infiltration system for a photoresistance filter element.
Background
The silicon-based OLED (Organic Light Emitting Diode ) micro-display is a novel display technology for manufacturing an active light emitting device OLED on a silicon-based CMOS driving circuit substrate, has been widely applied to military markets such as helmets, gun aiming, night vision devices and the like, and has extremely wide application prospects in AR/VR markets, and is called a black horse of a next-generation display technology.
In the conventional preparation process of the silicon-based OLED micro-display, the semiconductor manufacturing technology is combined with the OLED manufacturing technology, wherein photoresist, DEV (developing) solution solvent and the like are indispensable materials, and in order to keep the cleanliness of the materials, a liquid filtering filter element is arranged.
In the process of replacing the filter element, particularly when the photoresist filter element is replaced, the original pipeline photoresist is required to be emptied, then the solvent is filled into the gallon bottle, the filter element is washed by a set program, the machine table stops production in the whole washing process, meanwhile, a large amount of photoresist is consumed for washing after the filter element is immersed, so that the pipeline rinse solution can be emptied, and the production cost is increased.
In order to ameliorate at least one of the above problems, there is a need for an improved or improved design of the prior art.
Disclosure of Invention
The utility model aims to provide an infiltration flushing system which does not interfere with the operation of the original production equipment and can realize infiltration flushing of a photoresist filter element.
In order to achieve the above purpose, the technical scheme adopted by the utility model is as follows:
an independent infiltration system for a photoresist filter element comprises a liquid supply mechanism and a liquid outlet mechanism;
the liquid supply mechanism comprises a liquid supply pipeline; the liquid supply pipeline is connected with a liquid supply part;
the liquid outlet mechanism comprises a liquid outlet pipeline, and the liquid outlet pipeline is connected with a liquid pump.
The independent infiltration system for the photoresist filter element further comprises a filter element placement mechanism; the filter element placing mechanism is respectively connected with the liquid supply mechanism and the liquid outlet mechanism; the filter element placement mechanism includes a filter element placement member; each of the cartridge placement members includes a cartridge holder.
Each of the cartridge placement members further comprises an infiltration tank; the filter element support is arranged on the infiltration box.
And the liquid supply pipeline is provided with a control valve and a first pressure gauge.
And a second pressure gauge is arranged on the liquid outlet pipeline.
The liquid outlet pipeline is connected with the filter element to be infiltrated through two branch pipelines.
The cartridge placement mechanism includes a plurality of the cartridge placement members; the filter element placing components are connected with the liquid supply mechanism and the liquid outlet mechanism.
The filter element placing components are arranged in series or in parallel.
The liquid supply part is a factory constant pressure rinse liquid supply part.
The liquid outlet pipeline is connected with a liquid discharging part; the liquid draining part is a factory liquid draining system.
The utility model has the advantages that:
the utility model discloses an independent infiltration system for a photoresist filter element, which is independent of an original pipeline infiltration system in traditional gluing equipment; the infiltration system disclosed by the utility model can independently realize the infiltration operation of the photoresist filter element, and avoid the problem that the traditional gluing equipment needs to be stopped to realize the flushing of the filter element; production efficiency can be guaranteed to a certain extent, and the man-hour for flushing the filter element is avoided.
In addition, the infiltration system disclosed by the utility model can flush the filter element through different liquids and different flow rates according to the requirements, and can better ensure the use effect of the filter element.
Drawings
The contents of the drawings and the marks in the drawings of the present specification are briefly described as follows:
FIG. 1 is a schematic view of the structure of the present utility model when starting to start.
FIG. 2 is a schematic view of the structure of the utility model when it is standing.
FIG. 3 is a schematic diagram of the structure of the pump of the present utility model when the pump is turned on and the rinse liquid in the tubing is emptied.
Fig. 4 is a schematic view of the structure of the present utility model with a plurality of filter insert placement members connected in series.
Fig. 5 is a schematic view of the structure of the present utility model with a plurality of filter insert placement members connected in parallel.
The labels in the above figures are:
1. the constant-pressure rinsing liquid supply component for the factory is characterized by comprising a factory constant-pressure rinsing liquid supply component, 2, a control valve, 3, a first pressure gauge, 4, a filter element, 5, a filter element support, 6, a second pressure gauge, 7, a liquid discharge pump, 8 and a factory liquid discharge system.
Detailed Description
The following detailed description of the utility model refers to the accompanying drawings, which illustrate preferred embodiments of the utility model in further detail.
An independent infiltration system for a photoresistance filter element comprises a liquid supply mechanism 1-4 and a liquid outlet mechanism 1-3; the utility model discloses an independent infiltration system for a photoresist filter element, which is independent of an original pipeline infiltration system in traditional gluing equipment; the infiltration system disclosed by the utility model can independently realize the infiltration operation of the photoresistance filter element 4, so that the problem that the filter element 4 is washed by stopping a traditional gluing device is avoided; production efficiency can be guaranteed to a certain extent, and the man-hour wasted in flushing the filter element 4 is avoided.
Based on the above, it can be found that the essence of the utility model is to add an infiltration system independent of the existing silicon-based OLED micro-display production equipment, and mainly to implement the infiltration operation of the photoresist filter element 4in the photoresist filter.
The infiltration system disclosed by the utility model is independent of an original infiltration pipeline in the production equipment; the utility model is independent of the infiltration of the filter element 4 and the normal production operation of the silicon-based OLED micro-display, in other words, the infiltration system disclosed by the utility model does not influence the normal production of the silicon-based OLED micro-display, the original production equipment can normally realize the production operation of the silicon-based OLED micro-display, when the filter element 4 needs to be replaced, the corresponding filter element 4 is taken out from the infiltration system and is arranged on the corresponding base, so that the design can greatly reduce the infiltration working time of the filter element 4, be beneficial to improving the production procedure, reduce the flushing of the subsequent photoresist liquid to the lubricating liquid, and reduce the production cost to a certain extent.
Specifically, the independent infiltration system disclosed by the utility model mainly comprises a liquid supply mechanism 1-4 and a liquid outlet mechanism 1-3; in actual use, the liquid supply mechanism 1-4 is mainly connected with an inlet on the filter element 4 to be infiltrated, the liquid outlet mechanism 1-3 is connected with an outlet on the filter element 4 to be infiltrated, and finally the rinse liquid is transferred to the liquid outlet mechanism 1-3 through the liquid supply mechanism 1-4, so that the infiltration operation of the filter element 4 is realized.
In addition, the independent infiltration system for the photoresistance filter element further comprises a filter element 4 placement mechanism; the filter element 4 placing mechanism is respectively connected with the liquid supply mechanism 1-4 and the liquid outlet mechanism 1-3; the filter element 4 placing mechanism comprises a filter element placing component 1-2; each of the cartridge placement elements 1-2 includes a cartridge holder 5; the filter element placing mechanism 1-1 is mainly used for placing the filter element 4 to be infiltrated, so that the placement stability of the filter element 4 to be infiltrated is conveniently ensured, and the subsequent infiltration operation of the filter element 4 is conveniently carried out; meanwhile, the liquid supply mechanism 1-4 is mainly used for supplying rinse liquid to the filter element placing mechanism 1-1, so that the filter element 4 to be infiltrated in the filter element placing mechanism 1-1 is convenient to clean; meanwhile, in the present utility model, the liquid discharging mechanism 1-3 is used for discharging the used rinse liquid.
Meanwhile, in the utility model, the filter element placing mechanism 1-1 is respectively connected with the liquid supply mechanism 1-4 and the liquid outlet mechanism 1-3; through the design, the flowing operation of the rinse solution in the whole infiltration system can be realized.
In the actual connection, the filter element 4 to be infiltrated is an assembly piece and is provided with an inlet and an outlet; the filter element 4 to be immersed is directly connected with the liquid supply mechanism 1-4 and the liquid outlet mechanism 1-3, so that the rinse liquid can pass through the filter element 4 to be immersed conveniently; and then the actual infiltration flushing operation is realized.
Meanwhile, each of the cartridge housing parts 1-2 further includes an infiltration tank 51 in the present utility model; the arrangement of the infiltration box 51 in the utility model facilitates the placement of the filter element 4 to be infiltrated; providing a place for the filter element 4 to be infiltrated; meanwhile, when the liquid supply mechanism 1-4 and the liquid outlet mechanism 1-3 leak from the connection part of the filter element 4, the overflowing rinse liquid can be limited in the infiltration tank 51, so that the leaked rinse liquid is prevented from flowing randomly to pollute the environment of a factory.
Meanwhile, in the present utility model, the cartridge holder 5 is provided on the infiltration tank 51; in the utility model, the filter element bracket 5 is arranged, and the essential function is to limit the positions of the liquid supply pipeline 9, the liquid outlet pipeline 10 and the branch pipeline and ensure the stability of the connection part of the corresponding pipeline and the filter element 4.
The utility model requires that the filter element bracket 5 is arranged on the infiltration box 51; the arrangement facilitates the arrangement of the filter element bracket 5; the filter element support can be fixedly connected to the infiltration box, can be equivalent to being sleeved on the infiltration box, and the specific connection mode can be selected according to the needs.
Meanwhile, the liquid supply mechanism 1-4 is mainly used for supplying the rinse liquid to the filter element 4, so that the filter element 4 to be soaked is convenient to carry out cleaning operation subsequently; meanwhile, the liquid outlet mechanism 1-3 is mainly used for discharging the rinse liquid after the filter element 4 is soaked.
Meanwhile, in the utility model, the filter element placing mechanism 1-1 is respectively connected with the liquid supply mechanism 1-4 and the liquid outlet mechanism 1-3; through the design, the flowing operation of the rinse solution in the whole infiltration system can be realized.
In addition, the filter element placing mechanism 1-1 in the present utility model includes a filter element placing member 1-2; in the utility model, each filter element placing component 1-2 can be used for placing one or more filter elements 4 to be rinsed, and meanwhile, each filter element placing component 1-2 comprises an infiltration box 51 and a filter element bracket 5; the arrangement of the infiltration tank 51 facilitates the placement of the filter element 4 to be washed, and in addition, the liquid supply mechanism 1-4 comprises a liquid supply pipeline 9 in the utility model; the liquid supply pipeline 9 is connected with a liquid supply part; the liquid supply part is convenient to set, mainly for supplying the rinse liquid to the liquid supply pipeline 9, and the fundamental purpose is to supply the rinse liquid to the filter element 4 to be infiltrated; the liquid outlet mechanism 1-3 comprises a liquid outlet pipeline 10, the liquid outlet pipeline 10 is arranged, so that the discharge of the rinse liquid in the filter element 4 after use is facilitated, and meanwhile, the liquid outlet pipeline 10 is connected with a liquid pump 7; the arrangement of the liquid pump 7 facilitates the discharge of lubricating liquid in the pipeline structures such as the filter element 4, the liquid outlet pipeline 10 and the like.
That is, in actual use, when the cleaned filter element 4 is needed, the liquid pump 7 pumps out the pipeline and the rinse liquid in the filter element 4 so as to take out the filter element 4, thereby avoiding pollution caused by residual liquid leakage.
Meanwhile, in actual use of the utility model, the infiltration box 51 is not required to be arranged, and in subsequent use, the filter element bracket 5 is directly pressed on the corresponding filter element 4, so that the limitation of the position of the corresponding pipeline can be realized; the use of parts can be reduced, and the input cost of the system is reduced; and meanwhile, the filter element 4 is convenient to take and place.
Specifically, the independent infiltration system disclosed by the utility model mainly comprises a filter element placement mechanism 1-1, a liquid supply mechanism 1-4 and a liquid outlet mechanism 1-3; the filter element placing mechanism 1-1 is mainly used for placing the filter element 4 to be infiltrated, and facilitates the infiltration operation of the subsequent filter element 4.
Further, in the present utility model, the liquid supply pipe 9 is provided with a control valve 2 and a first pressure gauge 3; the utility model controls the setting of the valve 2, is convenient to control the opening of the liquid supply pipeline 9, controls the supply quantity and the flow rate of the rinse liquid at the same time, and is provided with the first pressure gauge 3 on the liquid supply pipeline 9, and the first pressure gauge 3 is used for detecting the liquid inlet pressure of the liquid supply pipeline 9; the filter element 4 is prevented from being damaged by excessive feed liquid pressure.
Meanwhile, the liquid outlet pipeline 10 is provided with a second pressure gauge 6; the second pressure gauge 6 is used for detecting the liquid outlet pressure; meanwhile, in the utility model, the filter element 4 can be judged whether to fail or not by matching the first pressure gauge 3 with the second pressure gauge 6; the specific detection steps are as follows: through control valve 2 and first manometer 3, can judge whether filter core 4 became invalid, specifically can verify under the same control valve 2 on-off angle, through under the infiltration filter core 4 of same batch, if F1 filter core 4 is when infiltration first manometer 3 pressure is less than other filter core 4 pressure, then judge to become invalid, avoid the board of going up, influence productivity.
Further, in the present utility model, a cartridge holder 5 is provided on the infiltration tank 51 in each of the cartridge-placing elements 1-2; the filter element bracket 5 is arranged, so that the arrangement and placement of the liquid supply pipeline 9, the liquid outlet pipeline 10 and the branch pipeline 101 are facilitated; the stability of the arrangement of the liquid supply pipe 9, the liquid outlet pipe 10 and the branch pipe 101 is ensured.
Further, in the present utility model, the liquid outlet pipe 10 is connected to the filter element 4 to be infiltrated through two branch pipes 101; the arrangement of the branch pipelines 101 facilitates the communication between the liquid outlet pipeline 10 and the filter element 4 to be infiltrated, and simultaneously, the arrangement of the two branch pipelines 101 facilitates the realization of accelerating the liquid outlet operation of the filter element 4 to be infiltrated and the rapid realization of the discharging operation of the rinse liquid; two branch pipelines 101 are arranged at the same time, so that the serial-parallel operation among a plurality of filter elements 4 to be infiltrated is convenient.
Further, in the present utility model, the cartridge placement mechanism 1-1 includes a plurality of the cartridge placement members 1-2; the filter element placing components 1-2 are connected with the liquid supply mechanism 1-4 and the liquid outlet mechanism 1-3; the plurality of filter element placing components 1-2 are arranged, so that the infiltration system disclosed by the utility model can realize the infiltration operation of a plurality of filter elements 4 for a plurality of times at one side, thereby being beneficial to ensuring the infiltration quantity of the filter elements 4 and further avoiding the shortage of the filter elements 4; meanwhile, in the present utility model, each cartridge housing part 1-2 corresponds to at least one cartridge 4.
Further, in the utility model, a plurality of filter element placing components 1-2 are arranged in series or in parallel; by the arrangement, the infiltration system disclosed by the utility model can realize simultaneous infiltration operation of a plurality of filter elements 4, and the cleaning efficiency and quality of the filter elements 4 can be controlled according to the requirements.
In the utility model, when a plurality of filter element placement members 1-2 are distributed in series;
the filter element placing components 1-2 are sequentially connected, the filter element placing components 1-2 can be connected through components such as a connecting pipeline, each filter element placing component 1-2 is internally provided with a filter element 4 to be infiltrated, and when the filter element placing components are actually arranged, the filter elements 4 to be infiltrated are connected through the connecting pipeline; in practice, the inlet of the previous filter element 4 is connected with the liquid supply pipeline 9, and the outlet of the filter element 4 is communicated with the inlet of the next filter element 4; the outlet of the next filter element 4 is connected with the inlet of the other filter element 4 until the outlet of the next filter element 4 is connected with the last filter element 4, and the outlet of the last filter element 4 is required to be connected with a liquid outlet pipeline 10; based on such arrangement, serial connection among a plurality of filter element placement members 1-2 is realized; namely, the serial connection operation of the filter element 4 is realized; it is possible to realize a single rinse to sequentially wet and rinse the filter elements 4in the respective filter element placement members 1-2.
In the utility model, when a plurality of filter element placing components 1-2 are distributed in parallel; mainly, the inlet and the outlet of the filter element 4in the filter element placing components 1-2 are sequentially connected through connecting pipelines.
Specifically, in the present utility model, the liquid supply pipe 9 is connected to the inlet of each filter element 4 through the connecting pipe, and the outlet of each filter element 4 is connected to the liquid outlet pipe 10, so that the rinse liquid enters each filter element placing member 1-2 to perform the soaking and washing operation on the filter element 4.
The two modes have corresponding technical effects respectively, and can be selected according to the needs in actual use.
Further, in the present utility model, the liquid supply part is a factory constant pressure rinse liquid supply part 1; the liquid supply part of the utility model uses the existing equipment, because the original production equipment needs to be connected with the factory constant pressure rinse liquid supply part 1; as an independent infiltration system, the infiltration system disclosed by the utility model is equivalent to directly connecting the infiltration system to the original factory constant-pressure rinse solution supply part 1, so that the infiltration system disclosed by the utility model does not need to be additionally provided with a rinse solution supply mechanism, and the investment of a production line can be reduced to a certain extent.
Meanwhile, in the utility model, the liquid outlet pipe 10 is connected with a liquid outlet part 8; the liquid draining part 8 is mainly used for collecting the rinse liquid after the front end is used; in the present utility model, the liquid draining part 8 may be a storage box, a waste liquid treatment device, or a circulation device, mainly used for collecting the externally discharged rinse liquid; in practical implementation, the liquid draining part 8 is a factory liquid draining system in the utility model; by such arrangement, the cost input of the external liquid discharge portion 8 of the infiltration system can be reduced.
The specific implementation cases are as follows:
the utility model discloses an independent infiltration system for a photoresist filter element, and mainly relates to the field of manufacturing of semiconductor chips and silicon-based OLED (organic light emitting diode).
The infiltration system mainly comprises a complete solution cleaning passage, a source can be connected with a constant-pressure conveying rinse solution of a plant, the rinse solution is controlled to be subjected to flushing pressure through a control valve 2 and a first pressure gauge 3, the filter element 4 is arranged on a filter element support 5 in advance, the rinse solution flows in from the filter element 4in (inlet), vent (outlet) and out (outlet), and finally flows into a Drain PUMP 7 (PUMP) through a second pressure gauge 6 and finally flows into a Drain pipe of the plant Drain.
After the flushing is finished, the residual waste liquid in the pipeline is pumped out through a pump, so that the pollution caused by residual liquid leakage is avoided when the filter element 4 is taken out.
Meanwhile, the device controls the valve 2 and the second pressure gauge 6, so that whether the filter element 4 fails or not can be judged, and particularly whether the filter element 4 fails or not can be verified under the same valve opening and closing angle, if the pressure of the second pressure gauge 6 is smaller than the pressure of other filter elements 4 when the F1 filter elements 4 infiltrate under the condition that the filter elements 4 of the same batch are infiltrated, the failure is judged, and the machine is avoided, so that the productivity is influenced.
The infiltration system disclosed by the utility model changes the current situation that the filter element 4 can only infiltrate in the original pipeline of the gluing equipment, and can be used for flushing the filter element 4 by setting different liquid flow rates by adjusting the size of the liquid inlet valve so as to achieve the optimal use effect of the filter element 4.
Meanwhile, the infiltration system is suitable for parallel connection and serial connection infiltration of a plurality of filter elements 4; the infiltration system disclosed by the utility model can realize infiltration operation of a plurality of filter elements 4 at one time.
The infiltration system disclosed by the utility model can independently realize the infiltration operation of the filter element 4, the whole operation is simple, and the infiltration time is not limited by the capacity of a machine; after the filter element 4 is installed after being immersed, the filtering effect is better, the defect generated in the manufacturing process of the product is reduced, meanwhile, the use amount of the photoresistance purge after the filter element 4 is installed is reduced, the production cost is reduced, and in addition, the influence on the productivity is reduced due to independent immersion of the filter element 4.
Specifically:
the filter element 4 is installed, the control valve 2 is slowly opened, the service end of the rinse solution slowly flows in, the first pressure gauge 3 is checked, and the pressure is confirmed to be set to be less than 0.29Mpa (the maximum forward pressure of the filter element 4 is less than 0.29 Mpa); as shown in fig. 1, the infiltration system of the filter element 4 starts to be started, the rinse solution fills the pipeline, flows through the filter element 4 and flows into the factory waste liquid pipe, and the filter element 4 achieves the aim of cleaning in the rinsing of the rinse solution;
cleaning for a period of time, closing the control valve 2, slowly standing the filter element 4in the residual solvent of the pipeline, and enabling the filter membrane structure to reach the optimal use state, as shown in fig. 2;
after standing, starting a liquid PUMP 7PUMP D, evacuating the residual liquid in the pipeline, confirming that the number of the second pressure gauge 6 and the first pressure gauge 3 is zero, and removing the filter element 4 and mounting the filter element on a machine table as shown in fig. 3;
the soaked filter element 4 is arranged on a machine platform pipeline, the filter element 4 can be tested only by spending a small amount of photoresistors to remove bubbles, and production can be carried out after the test is completed.
Meanwhile, the system adopts a serial-parallel connection mode, so that the system can be compatible with simultaneous infiltration of a plurality of filter elements 4, as shown in fig. 4 and 5.
It is obvious that the specific implementation of the present utility model is not limited by the above-mentioned modes, and that it is within the scope of protection of the present utility model only to adopt various insubstantial modifications made by the method conception and technical scheme of the present utility model.
Claims (10)
1. An independent infiltration system for a photoresist filter element is characterized by comprising a liquid supply mechanism and a liquid outlet mechanism;
the liquid supply mechanism comprises a liquid supply pipeline; the liquid supply pipeline is connected with a liquid supply part;
the liquid outlet mechanism comprises a liquid outlet pipeline, and the liquid outlet pipeline is connected with a liquid pump.
2. The independent infiltration system for a photoresist filter element according to claim 1, further comprising a filter element placement mechanism; the filter element placing mechanism is respectively connected with the liquid supply mechanism and the liquid outlet mechanism; the filter element placement mechanism includes a filter element placement member; each of the cartridge placement members includes a cartridge holder.
3. The self-contained infiltration system for a photoresist filter cartridge of claim 2, wherein each of the filter cartridge placement members further comprises an infiltration tank; the filter element support is arranged on the infiltration box.
4. The independent infiltration system for a photoresist filter element according to claim 1, wherein the liquid supply pipeline is provided with a control valve and a first pressure gauge.
5. An independent infiltration system for a photoresist filter element according to any one of claims 1 to 4, in which the liquid outlet pipe is provided with a second pressure gauge.
6. The independent infiltration system for a photoresist filter element according to claim 1, wherein the liquid outlet pipe is connected with the filter element to be infiltrated through two branch pipes.
7. The self-contained infiltration system for a photoresist filter cartridge of claim 2, wherein the cartridge placement mechanism comprises a plurality of the cartridge placement members; the filter element placing components are connected with the liquid supply mechanism and the liquid outlet mechanism.
8. The independent infiltration system for a photoresist filter element according to claim 7, wherein a plurality of filter element placement members are arranged in series or parallel.
9. The independent infiltration system for a photoresist filter cartridge of claim 1, wherein the liquid supply is a factory-area constant-pressure rinse liquid supply unit.
10. The independent infiltration system for a photoresist filter element according to claim 1, wherein the liquid outlet pipe is connected with a liquid discharge part; the liquid draining part is a factory liquid draining system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321827658.0U CN220513653U (en) | 2023-07-12 | 2023-07-12 | Independent infiltration system for photoresistance filter element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321827658.0U CN220513653U (en) | 2023-07-12 | 2023-07-12 | Independent infiltration system for photoresistance filter element |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220513653U true CN220513653U (en) | 2024-02-23 |
Family
ID=89925004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321827658.0U Active CN220513653U (en) | 2023-07-12 | 2023-07-12 | Independent infiltration system for photoresistance filter element |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220513653U (en) |
-
2023
- 2023-07-12 CN CN202321827658.0U patent/CN220513653U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9278768B2 (en) | Process liquid changing method and substrate processing apparatus | |
| TWI614064B (en) | Filter wetting method, filter wetting apparatus and storage medium | |
| CN220513653U (en) | Independent infiltration system for photoresistance filter element | |
| CN110665879A (en) | Cleaning device and gluing and developing system | |
| CN212820559U (en) | Photoresist liquid spraying system capable of saving photoresist liquid | |
| CN101794089B (en) | Resist removing method of electron beam resist optical mask plate and device thereof | |
| CN110565076B (en) | Liquid supplementing method | |
| KR20100046785A (en) | Unit and method for providing chemical liquid, and substrate treating apparatus using the same | |
| CN213139925U (en) | Full-automatic liquid metering conveyor | |
| CN111090219A (en) | Photoresist discharge system and photoresist discharge method | |
| KR20100022922A (en) | Substrate processing apparatus, substrate processing method, and computer readable recording medium having substrate processing program therein | |
| CN219702785U (en) | Waterway system of cage washing machine | |
| CN219401308U (en) | Edge wrapping equipment | |
| CN202484599U (en) | Automatic metering delivery device of assistant | |
| CN218647303U (en) | External photoresist supply device | |
| KR20030021691A (en) | Bubble removing device for removing bubbles in chemicals and bubble removing method using the same | |
| CN218653894U (en) | Reverse osmosis multistage belt cleaning device | |
| CN219046293U (en) | Additive liquid supply system of wet chemical tank machine | |
| CN102284438A (en) | Semiautomatic gum removing machine of diode | |
| CN218048726U (en) | Stone paper coating system | |
| CN219744840U (en) | Alkaline washing device for regenerated active carbon | |
| CN213942335U (en) | Automatic bubble discharging system for chemical filter replacement | |
| CN111451061B (en) | Double-buffer type photoresist liquid spraying system | |
| CN216621634U (en) | Injection mold insert cooling water path sealing performance test equipment | |
| CN217726071U (en) | Circuit board photoresist discharge system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |