CN110665879A - Cleaning device and gluing and developing system - Google Patents
Cleaning device and gluing and developing system Download PDFInfo
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- CN110665879A CN110665879A CN201910941018.4A CN201910941018A CN110665879A CN 110665879 A CN110665879 A CN 110665879A CN 201910941018 A CN201910941018 A CN 201910941018A CN 110665879 A CN110665879 A CN 110665879A
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- 238000004140 cleaning Methods 0.000 title claims abstract description 309
- 238000004026 adhesive bonding Methods 0.000 title claims abstract description 8
- 239000007788 liquid Substances 0.000 claims abstract description 266
- 238000001802 infusion Methods 0.000 claims abstract description 71
- 239000012530 fluid Substances 0.000 claims abstract description 30
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 26
- 230000007246 mechanism Effects 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
- 239000008367 deionised water Substances 0.000 claims description 9
- 229910021641 deionized water Inorganic materials 0.000 claims description 9
- 238000010926 purge Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 18
- 230000008569 process Effects 0.000 abstract description 18
- 238000013461 design Methods 0.000 abstract description 16
- 239000003814 drug Substances 0.000 abstract description 11
- 230000007547 defect Effects 0.000 abstract description 7
- 238000005406 washing Methods 0.000 description 14
- 238000011161 development Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 239000003292 glue Substances 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000003892 spreading Methods 0.000 description 5
- 230000007480 spreading Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000012546 transfer Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000007792 addition Methods 0.000 description 2
- 238000012217 deletion Methods 0.000 description 2
- 230000037430 deletion Effects 0.000 description 2
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- 239000010408 film Substances 0.000 description 2
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- 238000009825 accumulation Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 231100000481 chemical toxicant Toxicity 0.000 description 1
- 238000010073 coating (rubber) Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000010808 liquid waste Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
- B08B2203/0217—Use of a detergent in high pressure cleaners; arrangements for supplying the same
Abstract
The disclosure provides a cleaning device and a gluing and developing system. The cleaning device comprises a liquid supply system, a cleaning system and a control system. The liquid supply system comprises a cleaning liquid source and a liquid supply pipeline. The cleaning fluid source is configured to store a cleaning fluid. The liquid supply pipeline is communicated with a cleaning liquid source, and a liquid supply valve is arranged on the liquid supply pipeline. The cleaning system comprises a cleaning tank, a cleaning liquid nozzle and a liquid conveying pipeline. The cleaning tank is communicated with a cleaning liquid source through a liquid supply pipeline and is provided with a first liquid discharge valve. The cleaning liquid nozzle is arranged in a cleaning chamber of the gumming developing machine. The infusion pipeline is communicated between the cleaning fluid nozzle and the cleaning tank, and an infusion pump is arranged on the infusion pipeline. The control system is configured to control the supply valve, the infusion pump, the first drain valve, and the second drain valve. Through the design, the cleaning device provided by the disclosure can realize automatic supply of cleaning liquid medicine and automatic switching of all the valve members, and reduces the potential safety hazard and the potential process defect hazard of the cleaning device.
Description
Technical Field
The disclosure relates to the field of display panel manufacturing, in particular to a cleaning device and a gluing and developing system.
Background
In the manufacturing process of a display panel of a Thin film transistor liquid crystal display (TFT-LCD), a photoresist developing process of a photoresist developing machine (Track) is used for realizing the coating of Photoresist (PR) and the development after exposure, cleaning mechanisms are provided before and after the coating of the photoresist, particles (particles) brought by a film layer and the photoresist after the development cause pollution to the cleaning mechanism, long-term pollution accumulation easily causes process defects such as Open line disconnection (Open) and flocculent residue (remaining) to a product, and the occurrence of the process defects can be effectively improved by regularly cleaning the cleaning mechanism.
At present, in the process of cleaning a glue spreading developing machine, a TMAH (Tetramethylammonium hydroxide) liquid medicine is generally used as a cleaning solution, a technician needs to detach a pipeline of a developing solution circulating system (DCS) in advance to take the TMAH liquid medicine, then open a Cover plate (Cover) of a cleaning mechanism to pour the liquid medicine into equipment, and manually switch a valve and clean (for example, Spray cleaning) for more than 2 hours. After the cleaning is completed, the cleaning Tank (Tank) is replaced and the valve is restored.
The existing cleaning mechanism adopts pure manual operation in the operation process and has great defects. TMAH liquor is a potential safety hazard of strongly alkaline highly toxic chemicals, and is easy to contact with a human body to cause huge damage when being manually taken, poured and poured. When the TMAH liquor is taken, the pipeline of the developing solution circulating system needs to be disassembled, and repeated disassembly easily causes chemical leakage and even breakdown. Moreover, the control accuracy of manual switching of the valve is extremely low, and downtime and even poor process are easily caused. In addition, during the cleaning process, the TMAH chemical solution is repeatedly used, which is easy to cause pipeline blockage and poor transverse line uniformity (Mura).
Disclosure of Invention
It is a primary object of the present disclosure to overcome at least one of the above-mentioned drawbacks of the prior art and to provide a cleaning apparatus that realizes automatic supply of a cleaning solution, automatic cleaning, and avoids reuse of the cleaning solution.
Another primary object of the present disclosure is to overcome at least one of the above-mentioned drawbacks of the prior art and to provide a glue spreading and developing system having a cleaning device proposed by the present disclosure.
In order to achieve the purpose, the following technical scheme is adopted in the disclosure:
according to an aspect of the present disclosure, there is provided a cleaning apparatus configured to clean a cleaning chamber of a paste developing machine. The cleaning device comprises a liquid supply system, a cleaning system and a control system. The liquid supply system comprises a cleaning liquid source and a liquid supply pipeline. The cleaning fluid source is configured to store a cleaning fluid. The liquid supply pipeline is communicated with the cleaning liquid source, and a liquid supply valve is arranged on the liquid supply pipeline. The cleaning system comprises a cleaning tank, a cleaning liquid nozzle and a liquid conveying pipeline. The cleaning tank is communicated with the cleaning liquid source through the liquid supply pipeline, and the cleaning tank is provided with a first liquid discharge valve. The cleaning liquid spout is arranged in the cleaning chamber. The infusion pipeline is communicated between the cleaning liquid nozzle and the cleaning tank, and an infusion pump is arranged on the infusion pipeline. The control system is configured to control the supply valve, the infusion pump, the first drain valve, and the second drain valve.
According to one embodiment of the present disclosure, the liquid supply system includes a plurality of the cleaning liquid sources and a plurality of the liquid supply pipes, the plurality of the cleaning liquid sources are respectively configured to store a plurality of cleaning liquids, the plurality of the liquid supply pipes are respectively communicated between the plurality of the cleaning liquid sources and the cleaning tank, and the liquid supply valve is disposed on each of the liquid supply pipes. Wherein the control system is configured to adjust the ratio of the plurality of cleaning liquids by controlling the plurality of supply valves.
According to one embodiment of the present disclosure, each of the liquid supply pipelines is provided with a flow meter, the flow meters are electrically connected to the control system, and the flow meters are configured to measure flow information of the liquid supply pipeline where the flow meters are located. Wherein the control system is configured to control the plurality of supply valves according to flow information collected by the plurality of flow meters.
According to one embodiment of the present disclosure, the plurality of cleaning liquid sources includes at least a first liquid source and a second liquid source. Wherein the first liquid source is configured to store TMAH medical liquid and the second liquid source is configured to store deionized water.
According to one embodiment of the present disclosure, a liquid level sensor is disposed in the cleaning tank, the liquid level sensor is electrically connected to the control system, and the liquid level sensor is configured to measure liquid level information in the cleaning tank. Wherein the control system is configured to control the supply valve, the first drain valve, and the infusion pump according to liquid level information.
According to one embodiment of the present disclosure, the paste developer includes a plurality of the cleaning chambers. Wherein, cleaning system includes many the infusion pipeline, every wash the cavity and all be equipped with the washing liquid spout with the second flowing back valve, many the infusion pipeline communicates respectively in a plurality of wash the cavity the washing liquid spout with wash between the jar, every all be equipped with on the infusion pipeline the transfer pump. Wherein the control system is configured to control the plurality of infusion pumps and the plurality of second drain valves.
According to one of the embodiments of the present disclosure, the cleaning tank has a plurality of tank cavities, each of the tank cavities is provided with a first drain valve, and the plurality of the infusion pipelines are respectively communicated between the plurality of tank cavities and the plurality of cleaning liquid nozzles of the cleaning chamber. Wherein the control system is configured to control a plurality of the first purge valves.
According to one embodiment of the disclosure, a filter is disposed on the infusion pipeline, and the filter is configured to filter the cleaning liquid flowing through the infusion pipeline.
According to one embodiment of the present disclosure, each infusion pipeline is provided with a plurality of filters, and the filters provided on the same infusion pipeline are connected in parallel.
According to another aspect of the present disclosure, there is provided a paste application developing system including a paste application developing machine and a cleaning mechanism. Wherein the cleaning mechanism is the cleaning device proposed by the present disclosure and described in the above embodiments.
According to the technical scheme, the cleaning device and the gluing and developing system have the advantages and positive effects that:
the cleaning device provided by the disclosure comprises a liquid supply system, a cleaning system and a control system. The liquid supply system comprises a cleaning liquid source and a liquid supply pipeline. The liquid supply pipeline is communicated with the cleaning liquid source and is provided with a liquid supply valve. The cleaning system comprises a cleaning tank, a cleaning chamber and a transfusion pipeline. The cleaning tank is communicated with a cleaning liquid source through a liquid supply pipeline and is provided with a first liquid discharge valve. The cleaning cavity is provided with a cleaning liquid nozzle and a second drain valve. The infusion pipeline is communicated between the cleaning chamber and the cleaning tank and is provided with an infusion pump. The control system can control the liquid supply valve, the infusion pump, the first liquid discharge valve and the second liquid discharge valve. Through the design, the cleaning device provided by the disclosure can realize automatic supply of cleaning liquid medicine and automatic switching of all the valve members, and reduces the potential safety hazard and the potential process defect hazard of the cleaning device.
Drawings
Various objects, features and advantages of the present disclosure will become more apparent from the following detailed description of preferred embodiments thereof, when considered in conjunction with the accompanying drawings. The drawings are merely exemplary illustrations of the disclosure and are not necessarily drawn to scale. In the drawings, like reference characters designate the same or similar parts throughout the different views. Wherein:
FIG. 1 is a system diagram illustrating a cleaning device according to an exemplary embodiment.
The reference numerals are explained below:
100. a liquid supply system;
111. a first liquid source;
112. a second liquid source;
121. a first liquid supply line;
1211. a first liquid supply valve;
1212. a first flow meter;
122. a second liquid supply line;
1221. a second liquid supply valve;
1222. a second flow meter;
200. cleaning the system;
210. cleaning the tank;
2101. a first tank cavity;
2102. a second tank cavity;
211. a first drain valve;
212. a liquid level sensor;
220. a cleaning fluid spout;
231. a first infusion line;
2311. a first infusion pump;
2312. a first filter;
232. a second infusion pipeline;
2321. a second infusion pump;
2322. a second filter;
320. cleaning the chamber;
3201. a first chamber;
3202. a second chamber;
321. and a second drain valve.
Detailed Description
Exemplary embodiments that embody features and advantages of the present disclosure are described in detail below in the specification. It is to be understood that the disclosure is capable of various modifications in various embodiments without departing from the scope of the disclosure, and that the description and drawings are to be regarded as illustrative in nature, and not as restrictive.
In the following description of various exemplary embodiments of the disclosure, reference is made to the accompanying drawings, which form a part hereof, and in which are shown by way of illustration various exemplary structures, systems, and steps in which aspects of the disclosure may be practiced. It is to be understood that other specific arrangements of parts, structures, example devices, systems, and steps may be utilized, and structural and functional modifications may be made without departing from the scope of the present disclosure. Moreover, although the terms "over," "between," "within," and the like may be used in this specification to describe various example features and elements of the disclosure, these terms are used herein for convenience only, e.g., in accordance with the orientation of the examples described in the figures. Nothing in this specification should be construed as requiring a specific three dimensional orientation of structures in order to fall within the scope of this disclosure.
Referring to fig. 1, a system diagram of a cleaning apparatus proposed by the present disclosure is representatively illustrated. In this exemplary embodiment, the cleaning apparatus proposed by the present disclosure is explained by taking an example of application to a gumming development system. Those skilled in the art will readily appreciate that many modifications, additions, substitutions, deletions, or other changes may be made to the specific embodiments described below in order to apply the relevant designs of the present disclosure to other types of display panel manufacturing equipment or equipment in other fields, and such changes are within the scope of the principles of the cleaning apparatus as set forth in the present disclosure.
As shown in fig. 1, in the present embodiment, the cleaning device proposed by the present disclosure can be mounted on a gumming developing machine. The cleaning device comprises a liquid supply system 100, a cleaning system 200 and a control system. The structure, connection mode and functional relationship of the main components proposed in the present disclosure will be described in detail below with reference to the drawings.
As shown in fig. 1, in the present embodiment, the liquid supply system 100 includes at least a cleaning liquid source and a liquid supply pipeline. Wherein the cleaning fluid source is capable of storing a cleaning fluid. The cleaning liquid source may be understood as having a physical structure for storing cleaning liquid, such as a tank, or may be understood as an upstream unit or device of cleaning liquid supplied by a factory in a display panel manufacturing plant. One end of the liquid supply pipeline is communicated with the cleaning liquid source and used for conveying the cleaning liquid. And a liquid supply valve is arranged on the liquid supply pipeline and used for controlling the opening and closing, the flow and the like of the liquid supply pipeline. The cleaning system 200 includes at least a cleaning tank 210, a cleaning solution nozzle 220, and an infusion line. Wherein, the liquid inlet of the cleaning tank 210 is connected to the other end of the liquid supply pipeline, that is, the liquid supply pipeline is connected between the cleaning liquid source and the cleaning tank 210. The wash tank 210 is provided with a first drain valve 211 for adjustably draining the wash liquid in the wash tank 210. The cleaning liquid nozzle 220 is arranged in a cleaning chamber 320 of the gumming developing machine. The cleaning liquid nozzle 220 is communicated with the cleaning tank 210 through a liquid conveying pipeline. The infusion pump is arranged on the infusion pipeline and used for pumping the cleaning liquid in the cleaning tank 210 to the cleaning liquid nozzle 220, and the cleaning liquid nozzle 220 can spray the cleaning liquid to a mechanism or a device to be cleaned in the cleaning chamber 320 so as to achieve the cleaning effect on the cleaning chamber 320 and the internal mechanism or the device thereof. The washing chamber 320 is also provided with a second drain valve 321 for adjustably draining the washing liquid in the washing chamber 320. On the bearing, the liquid supply valve and each liquid discharge valve can be valve members which can be automatically switched, such as electromagnetic valves and the like. The control system can control the liquid supply valve, the liquid transfer pump, the first liquid discharge valve 211 and the second liquid discharge valve 321, and the whole cleaning device is automatically controlled. Through the design, the cleaning device provided by the disclosure can realize automatic supply of cleaning liquid medicine and automatic switching of all the valve members, and reduces the potential safety hazard and the potential process defect hazard of the cleaning device.
Preferably, as shown in FIG. 1, in the present embodiment, the liquid supply system 100 may preferably include two cleaning liquid sources and two liquid supply lines. Specifically, the two cleaning liquid sources are a first liquid source 111 and a second liquid source 112, respectively, for storing or supplying two different kinds of cleaning liquids. The two liquid supply pipelines are respectively a first liquid supply pipeline 121 and a second liquid supply pipeline 122, and the two liquid supply pipelines are respectively communicated between the two cleaning liquid sources and the cleaning tank 210, that is, the first liquid supply pipeline 121 is communicated between the first liquid source 111 and the cleaning tank 210, and the second liquid supply pipeline 122 is communicated between the second liquid source 112 and the cleaning tank 210. Each liquid supply pipeline is provided with a liquid supply valve, that is, the first liquid supply pipeline 121 is provided with a first liquid supply valve 1211, and the second liquid supply pipeline 122 is provided with a second liquid supply valve 1221. Bearing on, the control system can adjust the ratio of two kinds of washing liquids through controlling two liquid supply valves. In other embodiments, the liquid supply system 100 may also include three or more cleaning liquid sources and three or more liquid supply lines. The plurality of liquid supply lines are connected between the plurality of cleaning liquid sources and the cleaning tank 210. In addition, the liquid supply system 100 may further include only one cleaning liquid source and one liquid supply pipeline, which are not limited to the embodiment.
Further, as shown in fig. 1, based on the design that the liquid supply system 100 includes a plurality of cleaning liquid sources and a plurality of liquid supply pipelines, in the present embodiment, each liquid supply pipeline is provided with a flow meter, that is, the first liquid supply pipeline 121 is provided with a first flow meter 1212, and the second liquid supply pipeline 122 is provided with a second flow meter 1222. The two flowmeters are respectively and electrically connected to the control system, and the flowmeters can measure the flow information of the liquid supply pipelines where the flowmeters are located. Bearing, two liquid supply valves on two liquid supply pipelines can be controlled according to the flow information that two flowmeters gathered to control system to realize automatic control, real-time control's control function.
Further, as shown in fig. 1, based on the design that the liquid supply system 100 includes a plurality of cleaning liquid sources, in the present embodiment, the plurality of cleaning liquid sources includes at least a first liquid source 111 and a second liquid source 112. The first liquid source 111 may be configured to store TMAH chemical, and the second liquid source 112 may be configured to store deionized water (DIW). In other embodiments, the types of the cleaning liquids stored in the plurality of cleaning liquid sources may be selected from other combinations, and are not limited to the embodiment.
Preferably, as shown in fig. 1, in the present embodiment, a liquid level sensor 212 may be preferably disposed inside the wash tank 210. The level sensor 212 is electrically connected to the control system and is capable of measuring the level information of the mixed cleaning solution in the cleaning tank 210. Accordingly, the control system can control the liquid supply valve, the first liquid discharge valve 211 and the infusion pump according to the liquid level information measured by the liquid level sensor 212.
Preferably, as shown in fig. 1, in the present embodiment, the gumming developing machine is described by including two cleaning chambers 320. The two cleaning chambers 320 are a first chamber 3201 and a second chamber 3202, respectively, wherein the first chamber 3201 may be a Direct water washing chamber (Direct Rinse), and the second chamber 3202 may be a circulating water washing chamber (SUB Rinse) in the cleaning process. Based on the above-mentioned design of the gumming developing machine, each cleaning chamber 320 is provided with a cleaning liquid spout 220 and a second drain valve 321. The washing system 200 may preferably include two washing chambers 320 and two infusion lines. The two infusion pipelines are respectively a first infusion pipeline 231 and a second infusion pipeline 232. The two fluid lines are respectively connected between the cleaning solution nozzles 220 of the two cleaning chambers 320 and the cleaning tank 210, that is, the first fluid line 231 is connected between the cleaning solution nozzle 220 of the first chamber 3201 and the cleaning tank 210, and the second fluid line 232 is connected between the cleaning solution nozzle 220 of the second chamber 3202 and the cleaning tank 210. Each infusion pipeline is provided with an infusion pump, that is, the first infusion pipeline 231 is provided with a first infusion pump 2311, and the second infusion pipeline 232 is provided with a second infusion pump 2321. The control system is then able to control the two infusion pumps and the two second drain valves 321. In other embodiments, when the coater/developer includes three or more cleaning chambers 320, the cleaning system 200 may also include three or more cleaning solution nozzles 220 and a fluid line. The plurality of fluid lines are connected between the cleaning fluid nozzles 220 (a plurality of groups) of the plurality of cleaning chambers 320 and the cleaning tank 210, respectively. In addition, when the coater/developer includes a cleaning chamber 320, the cleaning system 200 may also include a fluid pipeline and a set of cleaning fluid nozzles 220, which are not limited to the embodiment.
Further, as shown in FIG. 1, the purge tank 210 may preferably have two tank chambers in this embodiment, based on the design that the purge system 200 includes two infusion lines. Specifically, the two tank cavities are a first tank cavity 2101 and a second tank cavity 2102, respectively, and each tank cavity is provided with a first drain valve 211. Two fluid lines are respectively connected between the two canister cavities and the cleaning solution nozzles 220 of the two cleaning chambers 320, i.e., the first fluid line 231 is connected between the first canister cavity 2101 and the cleaning solution nozzle 220 of the first chamber 3201, and the second fluid line 232 is connected between the second canister cavity 2102 and the cleaning solution nozzle 220 of the second chamber 3202. Accordingly, the control system can control the two first drain valves 211. In other embodiments, when the cleaning system 200 includes one, three or more fluid lines, the cleaning tank 210 may also include one, three or more tank cavities, and each tank cavity is connected to each cleaning chamber 320 through each fluid line. Wherein, the number of the tank cavities is preferably the same as that of the cleaning chambers 320, and the tank cavities are communicated with the cleaning chambers one by one through the infusion pipelines. Of course, the number of the tank cavities may be different from that of the cleaning chamber 320, which is not limited in this embodiment.
Further, as shown in fig. 1, based on the design that the cleaning tank 210 has two tank cavities, and based on the design that the liquid supply system 100 includes two liquid supply pipelines, in this embodiment, each liquid supply pipeline may be respectively communicated with the two tank cavities through parallel branches, that is, the first liquid supply pipeline 121 is respectively communicated with the first tank cavity 2101 through its own two branches, and the second liquid supply pipeline 122 is respectively communicated with the second tank cavity 2102 through its own two branches. In other embodiments, when the cleaning tank 210 has one, three or more tank cavities, each liquid supply pipeline may be directly connected or connected to each tank cavity through its own three or more branches connected in parallel.
Further, based on the design in which the wash tank 210 has two tank chambers, while based on the design in which the wash tank 210 is provided with the level sensor 212, in the present embodiment, it may be preferable to provide the level sensor 212 in each tank chamber. For example, four sets of level sensors 212 may be provided in each chamber of the wash tank 210, which may detect or alarm the start/stop of fluid replenishment and the upper/lower level limits, respectively, for that chamber.
Preferably, as shown in fig. 1, in the present embodiment, the infusion line may be preferably provided with a filter capable of filtering the cleaning solution flowing through the infusion line. That is, the first fluid transfer line 231 is provided with a first filter 2312, and the second fluid transfer line 232 is provided with a second filter 2322.
Further, as shown in fig. 1, based on the design of the infusion line with filters, in the present embodiment, two filters may be preferably provided on each infusion line, that is, two first filters 2312 are provided on the first infusion line 231, and two second filters 2322 are provided on the second infusion line 232. And the two filters arranged on the same infusion pipeline can adopt an arrangement mode of being connected in parallel. In other embodiments, one, three or more than three filters may be disposed on the infusion line, and when there are a plurality of filters disposed on the same infusion line, the plurality of filters may also be disposed in other arrangements, such as in series, without being limited to this embodiment.
Based on the above description, in the present embodiment, each valve element can be selected from an automatically switchable valve group such as an electromagnetic valve, and the control system can automatically control each valve element and the pump group. Therefore, the process logic of the cleaning process of the whole cleaning device is written into the control software of the control system, and the automatic cleaning function of one-key cleaning can be realized.
In summary, the cleaning process of the cleaning device and the main control process logic of the control system provided by the present disclosure are as follows:
an operator inputs control instructions to the control system, such as starting a 'one-key cleaning' button, stopping feeding the film by the gluing and developing system and related equipment, emptying the unit and closing all valve groups and pump groups (comprising all liquid supply valves, all liquid discharge valves and all liquid delivery pumps) of the cleaning device;
the control system controls each first liquid discharge valve 211 of the cleaning tank 210 to be opened, the liquid level sensor 212 senses the cleaning liquid to be discharged and then feeds the cleaning liquid back to the control system, and the control system controls each first liquid discharge valve 211 to be closed;
the control system controls the opening of each liquid supply valve to start the delivery of the cleaning liquid from the cleaning liquid source through the liquid supply pipeline. Meanwhile, the control system feeds back the flow information of each liquid supply pipeline according to each flowmeter, controls the opening of each liquid supply valve and realizes the concentration ratio adjustment of the cleaning liquid with different instructions. The liquid level sensor 212 senses that the cleaning tank 210 is filled, and then feeds back the full liquid to the control system, and the control system controls each liquid supply valve to be closed;
the control system controls the liquid delivery pumps to be started, and the cleaning liquid in the cleaning tank 210 flows through the filter in parallel via the liquid delivery pipeline and is delivered to the cleaning liquid nozzle 220 of the cleaning chamber 320 to be sprayed out, so that the cleaning function of the mechanism or device to be cleaned in the cleaning chamber 320 is realized. Meanwhile, the control system controls the second drain valve 321 of the cleaning chamber 320 to open, so as to drain the waste cleaning solution;
after the cleaning is finished (the finished state can be automatically determined by the control system according to parameters in the cleaning process such as cleaning time, the waste liquid discharge amount of the cleaning liquid and the like, or preset in the control system by an operator or software before use), the control system controls each first liquid discharge valve 211 of the cleaning tank 210 to be opened so as to discharge the residual cleaning liquid in the cleaning tank 210, the liquid level sensor 212 senses that the cleaning liquid is discharged and then feeds back the cleaning liquid to the control system, and the control system controls each first liquid discharge valve 211 to be closed;
in addition, based on the preferred design in the present embodiment, when the cleaning solution includes TMAH chemical solution and deionized water, the control system may further control the first liquid supply valve 1211 corresponding to the TMAH chemical solution to be closed and control the second liquid supply valve 1221 corresponding to the deionized water to be opened. The liquid level sensor 212 senses that the cleaning tank 210 is filled, and then feeds back the full cleaning tank to the control system, and the control system controls the second liquid supply valve 1221 to be closed;
then, the control system controls each infusion pump to be started, deionized water in the cleaning tank 210 is filtered by the filter and then is conveyed to the cleaning liquid nozzle 220 of the cleaning chamber 320 to be sprayed out, so that the cleaning of the infusion pipeline and the cleaning chamber 320 is realized, and meanwhile, residual TMAH liquid medicine can be cleaned up. The control system controls the second liquid discharge valve 321 to be opened to discharge the cleaning liquid waste liquid, and then controls each infusion pump and each second liquid discharge valve 321 to be closed;
so far, based on the completion of this belt cleaning device's "a key washing", control system control each valves and each pump package resume the original state, rubber coating development system and relevant equipment resume production.
Based on the above detailed description, the control flow of the "one-touch washing" of the washing apparatus proposed by the present disclosure is roughly: the equipment is emptied, the valve group pump group is closed → the cleaning tank is emptied → the cleaning liquid is supplied → the cleaning liquid is cleaned → the cleaning tank is emptied → the cleaning is finished → the deionized water is supplied → the deionized water is cleaned, and the valve group pump group is restored.
Bearing in the foregoing, compared with the existing cleaning device adopting manual operation, the cleaning device provided by the present disclosure at least has the following advantages and effects:
the potential safety hazard is zero, the supply of the cleaning liquid medicine is automatic, and the TMAH liquid medicine does not need to be manually taken and poured;
the efficiency is improved, the time consumption for washing is shortened, and the time is shortened from the existing 5 hours to 2.5 hours;
one-key operation is adopted, the cleaning process is full-automatic, and the operation is simple and convenient;
the lifting and cleaning actions can be decomposed for many times, and the operation is carried out in the Idle period of the equipment without machine borrowing;
the yield is improved, the cleaning liquid medicine is not reused, and the cleaning effect is better.
It should be noted herein that the cleaning devices illustrated in the drawings and described in the present specification are but a few examples of the wide variety of cleaning devices that can employ the principles of the present disclosure. It should be clearly understood that the principles of this disclosure are in no way limited to any of the details of the cleaning device or any of the components of the cleaning device shown in the drawings or described in this specification.
Based on the above detailed description of the cleaning device proposed by the present disclosure, the glue spreading and developing system proposed by the present disclosure will be exemplarily described below. In an exemplary embodiment of the paste developing system, the paste developing system is described as being applied to a TFT-LCD panel manufacturing process as an example. Those skilled in the art will readily appreciate that many modifications, additions, substitutions, deletions, or other changes may be made to the specific embodiments described below in order to apply the relevant designs of the present disclosure to other types of manufacturing processes, and such changes are within the scope of the principles of the gumming development system as set forth in the present disclosure.
In the present embodiment, the glue spreading and developing system proposed by the present disclosure includes at least a glue spreading and developing machine and a cleaning mechanism. Wherein the cleaning mechanism is selected from the cleaning devices proposed by the present disclosure and exemplified in the above embodiments.
It should be noted herein that the gumming development systems illustrated in the figures and described in the present specification are only a few examples of the many types of gumming development systems that can employ the principles of the present disclosure. It should be clearly understood that the principles of this disclosure are in no way limited to any of the details or any of the components of the gumming development system shown in the drawings or described in this specification.
In summary, the cleaning device provided by the present disclosure includes a liquid supply system, a cleaning system and a control system. The liquid supply system comprises a cleaning liquid source and a liquid supply pipeline. The liquid supply pipeline is communicated with the cleaning liquid source and is provided with a liquid supply valve. The cleaning system comprises a cleaning tank, a cleaning liquid nozzle and a liquid conveying pipeline. The cleaning tank is communicated with a cleaning liquid source through a liquid supply pipeline and is provided with a first liquid discharge valve. The cleaning cavity is provided with a cleaning liquid nozzle and a second drain valve. The infusion pipeline is communicated between the cleaning chamber and the cleaning tank and is provided with an infusion pump. The control system can control the liquid supply valve, the infusion pump, the first liquid discharge valve and the second liquid discharge valve. Through the design, the cleaning device provided by the disclosure can realize automatic supply of cleaning liquid medicine and automatic switching of all the valve members, and reduces the potential safety hazard and the potential process defect hazard of the cleaning device.
Exemplary embodiments of the cleaning device and the paste developing system proposed by the present disclosure are described and/or illustrated in detail above. Embodiments of the disclosure are not limited to the specific embodiments described herein, but rather, components and/or steps of each embodiment may be utilized independently and separately from other components and/or steps described herein. Each component and/or step of one embodiment can also be used in combination with other components and/or steps of other embodiments. When introducing elements/components/etc. described and/or illustrated herein, the articles "a," "an," and "the" are intended to mean that there are one or more of the elements/components/etc. The terms "comprising," "including," and "having" are intended to be inclusive and mean that there may be additional elements/components/etc. other than the listed elements/components/etc. Furthermore, the terms "first" and "second" and the like in the claims and the description are used merely as labels, and are not numerical limitations of their objects.
While the cleaning device and the flood development system of the present disclosure have been described in terms of various specific embodiments, those skilled in the art will recognize that the invention can be practiced with modification within the spirit and scope of the claims.
Claims (10)
1. A cleaning apparatus configured to clean a cleaning chamber of an adhesive coating developing machine, characterized by comprising:
a liquid supply system, comprising:
a cleaning fluid source configured to store a cleaning fluid; and
the liquid supply pipeline is communicated with the cleaning liquid source and is provided with a liquid supply valve;
a cleaning system, comprising:
the cleaning tank is communicated with the cleaning liquid source through the liquid supply pipeline and is provided with a first liquid discharge valve;
the cleaning liquid nozzle is arranged in the cleaning chamber; and
the infusion pipeline is communicated between the cleaning liquid nozzle and the cleaning tank, and an infusion pump is arranged on the infusion pipeline; and
a control system configured to control the supply valve, the infusion pump, the first drain valve, and the second drain valve.
2. The cleaning apparatus as claimed in claim 1, wherein the liquid supply system comprises a plurality of cleaning liquid sources and a plurality of liquid supply lines, the plurality of cleaning liquid sources are respectively configured to store a plurality of cleaning liquids, the plurality of liquid supply lines are respectively connected between the plurality of cleaning liquid sources and the cleaning tank, and the liquid supply valve is disposed on each liquid supply line; wherein the control system is configured to adjust the ratio of the plurality of cleaning liquids by controlling the plurality of supply valves.
3. The cleaning device according to claim 2, wherein each of the liquid supply pipelines is provided with a flow meter, the flow meters are respectively electrically connected to the control system, and the flow meters are configured to measure flow information of the liquid supply pipelines in which the flow meters are located; wherein the control system is configured to control the plurality of supply valves according to flow information collected by the plurality of flow meters.
4. The cleaning device of claim 2, wherein the plurality of sources of cleaning fluid includes at least a first source and a second source; wherein the first liquid source is configured to store TMAH medical liquid and the second liquid source is configured to store deionized water.
5. The cleaning device of claim 1, wherein a level sensor is disposed within the cleaning tank, the level sensor being electrically connected to the control system, the level sensor being configured to measure level information within the cleaning tank; wherein the control system is configured to control the supply valve, the first drain valve, and the infusion pump according to liquid level information.
6. The cleaning apparatus according to claim 1, wherein the paste developer includes a plurality of the cleaning chambers; the cleaning device comprises a plurality of infusion pipelines, each cleaning chamber is provided with a cleaning liquid nozzle, the infusion pipelines are respectively communicated between the cleaning liquid nozzles of the cleaning chambers and the cleaning tank, and each infusion pipeline is provided with an infusion pump; wherein the control system is configured to control the plurality of infusion pumps and the plurality of second drain valves.
7. The cleaning device of claim 6, wherein the cleaning tank has a plurality of tanks, each of the tanks having a first drain valve, and a plurality of the fluid lines respectively communicating between the plurality of tanks and the cleaning fluid nozzles of the plurality of cleaning chambers; wherein the control system is configured to control a plurality of the first purge valves.
8. The cleaning apparatus defined in claim 1, wherein a filter is disposed on the infusion line, the filter being configured to filter cleaning fluid flowing through the infusion line.
9. The cleaning device according to claim 8, wherein a plurality of said filters are provided on each of said infusion lines, and a plurality of said filters provided on the same infusion line are connected in parallel with each other.
10. A gluing developing system comprises a gluing developing machine and a cleaning mechanism; the cleaning device is characterized in that the cleaning mechanism is the cleaning device as claimed in any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910941018.4A CN110665879A (en) | 2019-09-30 | 2019-09-30 | Cleaning device and gluing and developing system |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910941018.4A CN110665879A (en) | 2019-09-30 | 2019-09-30 | Cleaning device and gluing and developing system |
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| CN110665879A true CN110665879A (en) | 2020-01-10 |
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| CN201910941018.4A Pending CN110665879A (en) | 2019-09-30 | 2019-09-30 | Cleaning device and gluing and developing system |
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Application publication date: 20200110 |