CN220977127U - Cathode target structure and coating equipment - Google Patents

Abstract

The utility model discloses a cathode target structure and coating equipment, and relates to the technical field of coating equipment, wherein the cathode target structure comprises: a base; a cathode target body mounted to the base; the target cover is arranged on one side of the cathode target body and can rotate around the circumferential direction of the cathode target body; and the rotary driving mechanism is used for driving the target cover to rotate. When the target is washed, the target cover rotates to the sputtering area of the cathode target body, and the target cover is used for shielding the sputtering area, so that all sputtered particles sputtered during the target washing are sputtered onto the target cover, thereby reducing the sputtering of the sputtered particles onto the lining plate in the coating cavity, effectively reducing the deposition of the sputtered particles on the film layer on the lining plate, being beneficial to prolonging the service cycle of the lining plate and reducing the replacement frequency of the lining plate. The replacement frequency of the lining plate is reduced, so that the atmosphere of the process chamber is kept relatively stable during PVD coating, and the stability of the coating process is ensured.

Description

Cathode target structure and coating equipment

Technical Field

The utility model relates to the technical field of coating equipment, in particular to a cathode target structure and coating equipment.

Background

In PVD coating processes, the cathode target generates a large number of sputtered particles, most of which deposit to form a film on the substrate. After coating is completed, it is often necessary to wash the cathode target, which also generates a large amount of sputtered particles during the washing process. In the process of coating or washing a target, sputtering particles can be scattered and sputtered on an inner lining plate of a coating cavity, and a film layer is deposited on the inner lining plate to form, and the film layer is thicker and thicker along with time accumulation, so that film breakage can be caused due to release of thermal expansion and cold contraction stress, and finally the coating quality is influenced.

Disclosure of utility model

The present utility model aims to solve at least one of the technical problems existing in the prior art. Therefore, the utility model provides a cathode target structure, wherein the target cover can rotate to a sputtering area of the cathode target during target washing, and sputtering particles are intercepted by the target cover, so that the sputtering particles sputtered on the inner lining plate can be reduced.

The utility model also provides a coating device with the cathode target structure.

According to an embodiment of the present utility model, a cathode target structure includes: a base; a cathode target body mounted to the base; the target cover is arranged on one side of the cathode target body and can rotate around the circumferential direction of the cathode target body; and the rotary driving mechanism is used for driving the target cover to rotate.

According to the cathode target structure of the embodiment of the aspect of the utility model, the target cover comprises the baffle, the cross section outline of the baffle is in an arc shape, and the axial direction of the baffle is parallel to the length direction of the cathode target body.

According to the cathode target structure of the embodiment of the utility model, the cross section profile of the baffle plate is semicircular.

According to the cathode target structure provided by the embodiment of the aspect of the utility model, the base comprises a mounting part, the target cover further comprises a rotating shaft and a connecting plate, the rotating shaft is rotatably mounted on the mounting part, the connecting plate is arranged on two sides of the baffle, and the rotating shaft is connected with the connecting plate.

According to the cathode target structure of the embodiment of the aspect of the utility model, the rotary driving mechanism comprises a driving piece, and the output end of the driving piece is connected with the rotating shaft.

According to the cathode target structure of the embodiment of the aspect of the utility model, the rotary driving mechanism further comprises a first driving wheel and a second driving wheel, the first driving wheel is connected with the output end of the driving piece, the second driving wheel is connected with the rotating shaft, and the first driving wheel is used for driving the second driving wheel to rotate.

According to the cathode target structure provided by the embodiment of the aspect of the utility model, the installation part is provided with the in-place detection sensor, and the in-place detection sensor judges whether the target cover rotates in place or not by detecting the position of the target cover.

According to the cathode target structure of the embodiment of the utility model, the in-place detection sensor is a laser correlation sensor, the laser correlation sensor comprises a sensor body and an induction component, the sensor body is arranged on one side of the rotation axis of the baffle, the induction component is arranged on the other side of the rotation axis of the baffle, the baffle is positioned between the sensor body and the induction component, and when the target cover rotates in place, the induction component can receive laser emitted by the sensor body.

According to the cathode target structure of the embodiment of the utility model, the cathode target body is cylindrical.

In another aspect, the coating apparatus of the embodiment of the present utility model includes the cathode target structure as described above.

The cathode target structure provided by the embodiment of the utility model has at least the following beneficial effects: when the target is washed, the target cover rotates to a sputtering area of the cathode target body, and the target cover can be used for shielding the sputtering area, so that most or even all sputtering particles sputtered by the cathode target body are sputtered on the target cover, sputtering particles are reduced to be sputtered on a lining plate in a coating cavity, thereby effectively reducing the deposition of a film layer on the lining plate, being beneficial to prolonging the service cycle of the lining plate and reducing the replacement frequency of the lining plate. Because the replacement frequency of the lining plate is reduced, the atmosphere of the process chamber is kept relatively stable during PVD coating, and the stability of the coating process is improved.

Additional aspects and advantages of the utility model will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the utility model.

Drawings

The utility model is further described with reference to the accompanying drawings and examples, in which:

FIG. 1 is a schematic view of a prior art cathode target installation;

FIG. 2 is a schematic diagram of another view of FIG. 1;

fig. 3 is a schematic structural diagram of one of the cathode target structures according to an embodiment of the present utility model.

Reference numerals:

1. A cathode target; 2. a fixed ear;

100. a base; 110. a mounting part; 120. a bearing assembly;

200. A cathode target body;

300. a target cover; 310. a baffle; 320. a connecting plate; 330. a rotating shaft;

410. a driving member; 420. a first drive wheel; 430. a second drive wheel;

510. and (5) laser.

Detailed Description

Embodiments of the present utility model are described in detail below, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to like or similar elements or elements having like or similar functions throughout. The embodiments described below by referring to the drawings are illustrative only and are not to be construed as limiting the utility model.

In the description of the present utility model, it should be understood that references to orientation descriptions such as upper, lower, front, rear, left, right, etc. are based on the orientation or positional relationship shown in the drawings, are merely for convenience of description of the present utility model and to simplify the description, and do not indicate or imply that the apparatus or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the present utility model.

In the description of the present utility model, the meaning of a number is one or more, the meaning of a number is two or more, and greater than, less than, exceeding, etc. are understood to exclude the present number, and the meaning of a number is understood to include the present number. The description of the first and second is for the purpose of distinguishing between technical features only and should not be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.

In the description of the present utility model, unless explicitly defined otherwise, terms such as arrangement, installation, connection, etc. should be construed broadly and the specific meaning of the terms in the present utility model can be reasonably determined by a person skilled in the art in combination with the specific contents of the technical scheme.

In the description of the present utility model, the descriptions of the terms "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present utility model. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

In the PVD coating process, the cathode target 1 generates a large amount of sputtered particles, which are deposited on the substrate to form a film. After the coating is completed, the cathode target 1 needs to be washed, and a large amount of sputtering particles are generated by the cathode target 1 during the washing process. Referring to fig. 1 and 2, the conventional cathode target 1 is generally mounted on a fixed lug 2, the sputtering area of the cathode target 1 is not shielded, and sputtered particles of the cathode target are continuously sputtered onto a lining plate of a coating cavity, and a film layer is deposited on the lining plate. In both the coating and the target cleaning process, the sputtered particles are scattered and sputtered onto the inner lining plate of the coating cavity, and a film layer is deposited on the inner lining plate. Over time, the film layer becomes thicker and thicker, and the film can be broken due to the release of thermal expansion and cold contraction stress, so that the film coating quality is affected.

In view of this, the present utility model proposes a one year old cathode target structure, in which sputtering particles sputtered from the cathode target body 200 are shielded by the target cover 300 during target cleaning, so that sputtering of the sputtering particles onto the inner lining plate can be effectively reduced.

In one aspect, as shown in fig. 3, a cathode target structure is disclosed, which includes a base 100, a cathode target body 200, a target cover 300, and a rotation driving mechanism. Specifically, the cathode target body 200 is mounted to the pedestal 100; the target cover 300 is mounted on the base 100 and located at one side of the cathode target body 200, and the target cover 300 can rotate around the circumferential direction of the cathode target body 200; the rotation driving mechanism is used for driving the target cover 300 to rotate.

When the target is washed, the target cover 300 rotates to the sputtering area of the cathode target body 200, and the sputtering area is shielded by the target cover 300, so that most or all of sputtering particles sputtered during the target washing are sputtered on the target cover 300, sputtering particles are reduced to be sputtered on the lining plate in the coating cavity, the deposition of the sputtering particles on the lining plate and the formation of a film layer can be effectively reduced, the service cycle of the lining plate is prolonged, and the replacement frequency of the lining plate is reduced. Because the replacement frequency of the lining plate is reduced, the atmosphere of the process chamber can be kept relatively stable during PVD coating, and the stability of the coating process is guaranteed.

It should be noted that the sputtering region of the cathode target body 200 is a region of the side of the cathode target body 200 remote from the pedestal 100; the inner liner is disposed in the sputtering direction of the cathode target body 200.

In some embodiments of the present utility model, please refer to fig. 3, fig. 3 shows a schematic structural diagram of a cathode target structure. In the illustrated embodiment, the target cover 300 includes a baffle plate 310, and the cross-sectional profile of the baffle plate 310 is in an arc shape, and the axial direction of the baffle plate 310 is parallel to the length direction of the cathode target body 200. The length direction of the cathode target body 200 is the X direction in the drawing. Specifically, the cathode target body 200 is in a column shape, the rotation axis of the baffle 310 is parallel to the length direction of the cathode target body 200, and the length of the baffle 310 in the X direction is greater than the length of the cathode target body 200, so as to shield the whole cathode target body 200. The cross-sectional profile of the baffle plate 310 is in the form of an arc, that is, the baffle plate 310 is an arc-shaped plate whose arc-shaped surface can rotate around the cathode target body 200 and can shield the sputtering region of the cathode target body 200. The baffle plate 310 is arranged as an arc plate, so that the baffle plate 310 can better shield the sputtering area of the cathode target body 200, and the volume of the baffle plate 310 is reduced.

As some of these embodiments, the baffle 310 has a semicircular cross-sectional profile. Further, the cathode target body 200 has a cylindrical shape. The arc of the baffle plate 310 is matched with the outer circumference of the cathode target body 200, which is beneficial to further reducing the volume of the baffle plate 310 while shielding the sputtering region of the cathode target body 200. It should be noted that there is a gap between the baffle 310 and the cathode target body 200 to facilitate washing of the target.

In some embodiments of the present utility model, the base 100 includes the mounting part 110, the target cover 300 further includes a rotation shaft 330 and a connection plate 320, the rotation shaft 330 is rotatably mounted to the mounting part 110, the connection plate 320 is provided at both sides of the barrier 310, and the rotation shaft 330 is connected to the connection plate 320. Specifically, the connection plate 320 is disposed perpendicular to the baffle plate 310, and the connection plate 320 is disposed parallel to the end surface of the cathode target body 200. Thus, the shield 310 and the webs 320 on both sides of the shield 310 can define a semi-enclosed containment chamber that can enclose the sputtering or non-sputtering region of the cathode target body 200. When the target is required to be washed, the target cover 300 is rotated to the lower side of the cathode target body 200, i.e., to one side of the sputtering region of the cathode target body 200, to shield the sputtering region of the cathode target body 200; when the film plating is required, the target cover 300 is rotated to the upper side of the cathode target body 200, i.e., the target cover 300 is positioned at the non-sputtering area side of the cathode target body 200 to avoid the sputtering area, so that the cathode target body 200 can work normally.

Specifically, in this embodiment, one end of the rotation shaft 330 is fixedly connected to the upper end of the baffle plate 310, the axis of the rotation shaft 330 coincides with the axis of the cathode target body 200, and the rotation driving mechanism drives the rotation shaft 330 to rotate so as to drive the connection plate 320 and the baffle plate 310 to rotate, so that the target cover 300 is switched between the sputtering region and the non-sputtering region of the cathode target body 200.

In some embodiments of the present utility model, referring to fig. 3, the baffle plate 310 is provided with a connection plate 320 at both ends in the length direction (i.e., X direction) of the cathode target body 200, the connection plate 320 is detachably connected to the baffle plate 310, and the rotation shaft 330 is fixedly connected to the connection plate 320. Therefore, when the target cover 300 needs to be replaced, the baffle plate 310 is detached and replaced, the connecting plate 320 does not need to be detached and replaced, and convenience in updating and maintenance of the target cover 300 is improved.

In other embodiments, the baffle 310 may be fixedly connected to the connection plate 320, and the connection plate 320 is detachably connected to the rotation shaft 330.

In some embodiments of the present utility model, as shown in fig. 3, the rotation driving mechanism includes a driving member 410, and an output end of the driving member 410 is connected to the rotation shaft 330. Specifically, the driving member 410 is located at an extended side of the cathode target body 200, and an output end of the driving member 410 is connected to the rotation shaft 330 to drive the rotation shaft 330 to rotate, and the rotation shaft 330 drives the connection plate 320 and the baffle 310 to rotate around the rotation shaft 330.

In some embodiments of the present utility model, referring to fig. 3, the rotary driving mechanism further includes a first driving wheel 420 and a second driving wheel 430, the first driving wheel 420 is connected to an output end of the driving member 410, the second driving wheel 430 is connected to the rotation shaft 330, and the first driving wheel 420 is used for driving the second driving wheel 430 to rotate. Specifically, the output end of the driving member 410 is fixedly connected to the first driving wheel 420, the second driving wheel 430 is fixedly connected to the rotating shaft 330, and the first driving wheel 420 and the second driving wheel 430 are engaged. The driving member 410 drives the first driving wheel 420 to rotate, so as to drive the second driving wheel 430 and the rotating shaft 330 to rotate, and further drive the baffle 310 to rotate around the outer circumference of the cathode target body 200.

In this embodiment, referring to fig. 3, the base 100 further includes a bearing assembly 120, and the rotation shaft 330 is mounted on the mounting portion 110 of the base 100 through the bearing assembly 120. The rotation shaft 330 is cooperatively connected with the bearing assembly 120, which is beneficial to reducing the rotation friction of the rotation shaft 330 and simultaneously enabling the baffle 310 to rotate more stably.

It should be appreciated that the rotation axis of the baffle 310 is the central axis of the rotation shaft 330, and the baffle 310 rotates around the central axis of the rotation shaft 330.

In some embodiments of the present utility model, the mounting portion 110 is provided with an in-place detection sensor, and the position of the target cover 300 is detected by the in-place detection sensor to determine whether the target cover 300 is rotated in place. It should be appreciated that the target housing 300 has a first state position and a second state position. Wherein the first state position is the position of the target cover 300 when the cathode target body 200 washes the target, and at this time, the target cover 300 is positioned in the sputtering area of the cathode target body 200; the second state position is a position where the target cover 300 is located when the cathode target body 200 is used for coating, and at this time, the target cover 300 is located in a non-sputtering area, that is, a position where the target cover 300 is located between the cathode target body 200 and the pedestal 100. When the target is washed, the target cover 300 is detected to be positioned at the first state position by the in-place detection sensor, namely, the target cover 300 rotates in place, and at the moment, the target is washed, and the target cover 300 can shield sputtering particles sputtered from the cathode target body 200, so that the sputtering particles are effectively prevented from being sputtered onto the inner lining plate.

As one example, referring to fig. 3, the in-place detection sensor is a laser correlation sensor, where the laser correlation sensor includes a sensor body and a sensing member, the sensor body is disposed on one side of a rotation axis of the baffle 310, the sensing member is disposed on the other side of the rotation axis of the baffle 310, and the baffle 310 is disposed between the sensor body and the sensing member, and when the target cover 300 rotates in place, the sensing member can receive the laser light 510 emitted by the sensor body. Specifically, the sensor body and the sensing component are respectively disposed on two sides of the baffle 310, and the laser 510 emitted by the sensor body can just pass through one side of the end face of the connecting plate 320 and be received by the sensing component. When the target cover 300 rotates or is not rotated in place, the baffle 310 can block the laser 510, that is, the sensing component cannot receive the laser 510 emitted by the sensor body at this time; when the target cover 300 is rotated into place, the shutter 310 just does not block the laser light 510, and the sensing component can receive the laser light 510 emitted from the sensor body. That is, when the sensing member is changed from the receiving state to the cutting-off state, it means that the target cover 300 is in a rotated and not-in-place state; when the sensing element transitions from the off state to the receive state, it is indicative that the target cover 300 is rotated into place.

In another aspect, the utility model discloses a coating apparatus comprising a cathode target structure as described above. When the target is washed, the target cover 300 rotates to the sputtering area of the cathode target body 200, and the sputtering area is shielded by the target cover 300, so that all particles sputtered during the target washing are sputtered onto the target cover 300, thereby reducing the sputtering of the sputtered particles onto the lining plate in the coating cavity, effectively reducing the deposition of the sputtered particles on the coating layer on the lining plate, being beneficial to prolonging the service cycle of the lining plate and reducing the replacement frequency of the lining plate. The replacement frequency of the lining plate is reduced, so that the atmosphere of the process chamber is kept relatively stable during PVD coating, and the stability of the coating process is ensured.

The embodiments of the present utility model have been described in detail with reference to the accompanying drawings, but the present utility model is not limited to the above embodiments, and various changes can be made within the knowledge of one of ordinary skill in the art without departing from the spirit of the present utility model. Furthermore, embodiments of the utility model and features of the embodiments may be combined with each other without conflict.

Claims (8)

1. A cathode target structure, comprising:

A base;

A cathode target body mounted to the base;

The target cover is arranged on one side of the cathode target body and can rotate around the circumferential direction of the cathode target body;

The rotary driving mechanism is used for driving the target cover to rotate; the target cover comprises a baffle, the cross section outline of the baffle presents an arc shape, and the axial direction of the baffle is parallel to the length direction of the cathode target body;

The base includes the installation department, the target cover still includes axis of rotation and connecting plate, the axis of rotation rotate install in the installation department, the both sides of baffle all are provided with the connecting plate, the axis of rotation with the connecting plate is connected.

2. The cathode target structure of claim 1, wherein the baffle has a semicircular cross-sectional profile.

3. The cathode target structure according to claim 2, wherein the rotary drive mechanism includes a drive member, an output end of the drive member being connected to the rotary shaft.

4. The cathode target structure according to claim 3, wherein the rotary driving mechanism further comprises a first driving wheel and a second driving wheel, the first driving wheel is connected to the output end of the driving member, the second driving wheel is connected to the rotation shaft, and the first driving wheel is used for driving the second driving wheel to rotate.

5. The cathode target structure according to claim 1, wherein the mounting portion is provided with an in-place detection sensor, and the position of the target housing is detected by the in-place detection sensor to determine whether the target housing is rotated in place.

6. The cathode target structure of claim 5, wherein the in-place detection sensor is a laser correlation sensor, the laser correlation sensor comprises a sensor body and a sensing component, the sensor body is arranged on one side of a rotation axis of the baffle, the sensing component is arranged on the other side of the rotation axis of the baffle, the baffle is positioned between the sensor body and the sensing component, and the sensing component can receive laser emitted by the sensor body when the target cover rotates in place.

7. The cathode target structure of claim 1, wherein the cathode target body is cylindrical.

8. A coating apparatus comprising a cathode target structure according to any one of claims 1 to 7.