CN220774294U - Sample cleaning device and semiconductor device - Google Patents

Abstract

The application relates to a sample cleaning device and semiconductor equipment, wherein the sample cleaning device comprises a cleaning assembly and a cleaning table, the cleaning assembly comprises a loading disc and an operating rod, the operating rod is arranged above the loading disc, and the loading disc is used for loading samples; the cleaning platform comprises a box body and a cover body, wherein the box body is provided with a cleaning pool for containing cleaning liquid, and the cleaning liquid is used for cleaning the sample; the cleaning device comprises a cleaning tank, a cover body, a loading plate, a guide groove, a control rod, a loading plate and a loading plate, wherein the cover body is arranged above the cleaning tank in a covering mode, the lateral peripheral surface of the cover body is provided with the feeding groove, the top surface of the cover body is provided with the guide groove communicated with the feeding groove, the guide groove is used for the control rod to pass through, and the feeding groove is used for the loading plate to pass through. The cleaning solution in the cleaning tank can be prevented from splashing by the cover body, and the hands of a non-professional person can be prevented from extending into the tank due to misoperation, or the non-professional person is prevented from containing the cleaning solution in the cleaning tank due to misoperation, so that the safety factor of the sample cleaning device in use is improved.

Description

Sample cleaning device and semiconductor device

Technical Field

The application relates to the technical field of semiconductors, in particular to a sample cleaning device and semiconductor equipment.

Background

With the development of the semiconductor industry in China, related investment is carried out in various industries, various links of device manufacturing and processing are involved in disputes, and related semiconductor manufacturing and developing platforms are established in scientific research institutions and schools in various places.

Some conventional semiconductor devices use cleaning solutions such as strong acid or strong alkali to clean samples such as silicon wafers.

However, cleaning solutions such as strong acid or strong alkali in the cleaning tank of the conventional semiconductor device have risks of being easily touched by mistake or even splashed out, and have potential safety hazards.

The above information disclosed in the background of the present application is only for the purpose of understanding the background of the present application and may contain information that does not constitute prior art.

Disclosure of Invention

In view of the above, it is necessary to provide a sample cleaning apparatus and a semiconductor device.

A sample cleaning apparatus, comprising:

the cleaning assembly comprises a loading disc and an operating rod, wherein the operating rod is arranged above the loading disc, and the loading disc is used for loading samples; and

The cleaning platform comprises a box body and a cover body, wherein the box body is provided with a cleaning pool for containing cleaning liquid, and the cleaning liquid is used for cleaning the sample; the cleaning device comprises a cleaning tank, a cover body, a loading plate, a guide groove, a control rod, a loading plate and a loading plate, wherein the cover body is arranged above the cleaning tank in a covering mode, the lateral peripheral surface of the cover body is provided with the feeding groove, the top surface of the cover body is provided with the guide groove communicated with the feeding groove, the guide groove is used for the control rod to pass through, and the feeding groove is used for the loading plate to pass through.

The cleaning device for the sample can contain cleaning liquid for cleaning the sample in the cleaning tank. Wherein the cleaning fluid may include, but is not limited to, a strong acid or a strong base, and the sample may include, but is not limited to, a silicon wafer. When the sample is to be cleaned, a user can place the sample on the loading disc, the loading disc is driven by the operating rod, the loading disc enters from the feeding groove on the side face of the cleaning table, the operating rod slides into the guide groove, and when the loading disc moves to the position above the cleaning pool, the loading disc and the sample on the loading disc are immersed into the cleaning liquid in the cleaning pool, so that the sample is cleaned by the cleaning liquid. It can be understood that the cleaning solution such as strong acid or alkali all has strong corrosiveness, easily causes harm to personnel or other articles, needs to be properly deposited, so this application has add the lid in the washing pond top, and the cleaning solution in the washing pond is avoided splashing to the setting of lid, and the lid can also prevent that non-professional from misoperation and stretch into in the pond with the hand, or prevent that non-professional from flourishing the washing solution in the washing pond by mistake, this factor of safety when greatly having promoted this sample belt cleaning device and used.

In one embodiment, the case is detachably connected to the cover. In other words, the cover may be a separate component that is attached to the cleaning tank when needed, or may be removed if the cover needs to be repaired or replaced.

In one embodiment, the case is integrally formed with the cover.

In one embodiment, the tank body comprises a first tank body and a second tank body, the first tank body is provided with a first cleaning tank, the first cleaning tank is used for containing cleaning liquid, the second tank body is provided with a second cleaning tank, the second cleaning tank is used for containing deionized water, the cover body covers the first cleaning tank and the second cleaning tank at the same time, and the guide groove extends from the upper part of the first cleaning tank to the upper part of the second cleaning tank. After the sample is cleaned by the cleaning solution such as strong acid or strong alkali in the first cleaning pool, the surface of the sample may be adhered with the cleaning solution, so that the sample can be put into the second cleaning pool, and the sample is cleaned again by using deionized water, so that the residual cleaning solution on the sample is removed.

In one embodiment, the sample cleaning device further comprises a unidirectional limiting component, the unidirectional limiting component is arranged on the cover body and can move to a first position and a second position relative to the guide groove, when the unidirectional limiting component is positioned in the guide groove in the first position so as to intercept the operation rod, and when the unidirectional limiting component is positioned in the second position, the unidirectional limiting component exits the guide groove so as to allow the operation rod to pass through. Such a structural arrangement may be considered to be such that the unidirectional limiting assembly does not block movement of the lever in the guide slot when in the second position, the lever may be slid from above the first wash basin along the guide slot to above the second wash basin, and then the loading tray and sample thereon is immersed in the second wash basin. When the sample is washed in the second washing tank by using deionized water, in order to avoid the operation rod to drive the loading disc and the sample, the sample returns to the first washing tank along the guide groove from the second washing tank, and the unidirectional limiting component can move to the first position, so that the operation rod is intercepted, and the sample is prevented from returning to the first washing tank. In other words, the provision of the one-way stop assembly may be considered to limit the one-way movement of the lever from the first wash tank to the second wash tank, thereby avoiding that samples washed by the second wash tank return to the first wash tank.

In one embodiment, the unidirectional limiting assembly comprises a guide block and an elastic piece, wherein the elastic piece is elastically abutted against one side of the guide block, which is opposite to the guide groove, and the elastic piece is used for providing elastic force to enable the guide block to move to the first position, and when the first position is reached, the guide block is positioned in the guide groove to intercept the operation rod; one surface of the guide block, which is close to the first box body, is a guide inclined surface, the guide inclined surface is used for being abutted to the operation rod, so that the guide block extrudes the elastic piece and moves from the first position to the second position, and when the guide block is positioned at the second position, the guide block is positioned in the guide groove so as to allow the operation rod to pass through. Such a structural arrangement may be considered to be such that the lever may abut the guide block via the guide ramp and move the guide block in a direction against the spring force until the guide block is moved out of the guide slot to the second position, at which time the lever may pass. When the operating rod is not abutted with the guide block, the guide block can automatically reset to the first position from the second position under the action of the elastic force of the elastic piece.

In one embodiment, the loading tray is hollowed out. Taking the sample as an example when immersed in the cleaning solution, the sample is borne above the loading tray, and the loading tray is hollowed out, so that the cleaning solution can infiltrate from the hollowed-out part of the assembly tray to the lower part of the sample, thereby more comprehensively cleaning the sample and improving the cleaning effect.

In one embodiment, the number of the operating rods is set to be a plurality, and the operating rods are arranged at intervals; and/or the number of the guide grooves is multiple, the guide grooves are arranged in parallel, and the guide grooves are used for allowing at least one operation rod to pass through. The number of the operation rods is increased, so that the connection between the operation rods and the loading disc is firmer, more and larger samples are more reliably loaded, and the improvement of the working reliability and the working efficiency is facilitated.

In one embodiment, a plurality of the levers are spaced around the edge of the loading plate.

In one embodiment, the cross section of the loading disc is square, the number of the operating rods is four, and the four operating rods are respectively arranged above four corners of the loading disc; the number of the guide grooves is two, the two guide grooves are arranged in parallel, one guide groove is used for allowing two operation rods to pass through, and the other guide groove is used for allowing the other two operation rods to pass through.

The application also provides a semiconductor device comprising the sample cleaning apparatus according to any of the embodiments above.

The semiconductor device includes the sample cleaning apparatus according to any of the above embodiments, so the semiconductor device also includes at least the following advantages: the cleaning tank of the sample cleaning device can contain cleaning liquid for cleaning the sample. Wherein the cleaning fluid may include, but is not limited to, a strong acid or a strong base, and the sample may include, but is not limited to, a silicon wafer. When the sample is to be cleaned, a user can place the sample on the loading disc, the loading disc is driven by the operating rod, the loading disc enters from the feeding groove on the side face of the cleaning table, the operating rod slides into the guide groove, and when the loading disc moves to the position above the cleaning pool, the loading disc and the sample on the loading disc are immersed into the cleaning liquid in the cleaning pool, so that the sample is cleaned by the cleaning liquid. It can be understood that the cleaning solution such as strong acid or alkali all has strong corrosiveness, easily causes harm to personnel or other articles, needs to be properly deposited, so this application has add the lid in the washing pond top, and the cleaning solution in the washing pond is avoided splashing to the setting of lid, and the lid can also prevent that non-professional from misoperation and stretch into in the pond with the hand, or prevent that non-professional from flourishing the washing solution in the washing pond by mistake, this factor of safety when greatly having promoted this sample belt cleaning device and used.

Drawings

In order to more clearly illustrate the technical solutions of embodiments or conventional techniques of the present application, the drawings required for the descriptions of the embodiments or conventional techniques will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments of the present application, and other drawings may be obtained according to these drawings without inventive effort for a person of ordinary skill in the art.

Fig. 1 is a schematic structural diagram of a sample cleaning device according to an embodiment of the present application.

Fig. 2 is a schematic structural view of a sample cleaning device according to an embodiment of the present application.

Fig. 3 is a schematic diagram illustrating an internal structure of a sample cleaning apparatus according to an embodiment of the present application.

Fig. 4 is a schematic structural diagram of a sample cleaning device according to another embodiment of the present application.

Fig. 5 is a schematic structural diagram of a sample cleaning device according to another embodiment of the present application.

Fig. 6 is a schematic structural diagram of a unidirectional limiting assembly according to an embodiment of the present application.

Fig. 7 is a schematic structural diagram of a unidirectional limiting assembly according to an embodiment of the present application.

Fig. 8 is a schematic structural view of a unidirectional limiting assembly according to an embodiment of the present application.

Reference numerals:

10. a sample cleaning device;

100. cleaning the assembly; 110. loading a disc; 120. an operation lever;

200. a cleaning table; 210. a case; 211. a first case; 212. a second case; 220. a cleaning pool; 230. a cover body; 231. a feed chute; 232. a guide groove;

300. a one-way limit assembly; 310. a guide block; 311. a guide slope; 320. an elastic member.

Detailed Description

In order to make the above objects, features and advantages of the present application more comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. This application is, however, susceptible of embodiment in many other forms than those described herein and similar modifications can be made by those skilled in the art without departing from the spirit of the application, and therefore the application is not to be limited to the specific embodiments disclosed below.

Referring to fig. 1, 2, 3 and 4, in some embodiments, the present application provides a sample cleaning apparatus 10 comprising a cleaning assembly 100 and a cleaning station 200. As shown in fig. 1 and 4, the cleaning assembly 100 includes a loading tray 110 and a lever 120, wherein the lever 120 is disposed above the loading tray 110, and the loading tray 110 is used for loading a sample. As shown in fig. 1 and 2, the cleaning station 200 includes a case 210 and a cover 230, the case 210 is provided with a cleaning tank 220, the cleaning tank 220 is used for containing a cleaning solution, and the cleaning solution is used for cleaning the sample; the cover body 230 is covered and arranged above the cleaning tank 220, a feeding groove 231 is formed in the lateral peripheral surface of the cover body 230, a guide groove 232 communicated with the feeding groove 231 is formed in the top surface of the cover body 230, the guide groove 232 is used for allowing the operation rod 120 to pass through, and the feeding groove 231 is used for allowing the loading disc 110 to pass through.

The sample washing apparatus 10 may contain a washing liquid for washing a sample in the washing tank 220. Wherein the cleaning solution can include, but is not limited to, strong acids, which can include, but are not limited to, sulfuric acid, hydrochloric acid, hydrofluoric acid, or strong bases, which can include, but are not limited to, sodium hydroxide, potassium hydroxide, and the sample can include, but is not limited to, silicon wafer. When the sample is to be washed, as shown in fig. 1 and 2, a user can place the sample on the loading tray 110, drive the loading tray 110 by using the operation lever 120, make the loading tray 110 enter from the feeding slot 231 on the side of the washing table 200, slide the operation lever 120 into the guiding slot 232, and when the loading tray 110 moves above the washing tank 220, as shown in fig. 3, immerse the loading tray 110 together with the sample thereon in the washing liquid in the washing tank 220, so that the sample is washed by using the washing liquid. It can be appreciated that the cleaning solution such as strong acid or strong alkali has strong corrosiveness, and is easy to damage personnel or other objects, so that the cleaning solution needs to be properly stored, the cover 230 is additionally arranged above the cleaning tank 220, the cleaning solution in the cleaning tank 220 can be prevented from splashing out by the cover 230, and the cover 230 can prevent the non-professional from operating by mistake and extending hands into the tank, or prevent the non-professional from containing the cleaning solution in the cleaning tank 220 by mistake, so that the safety factor of the sample cleaning device 10 in use is greatly improved.

Further, in some embodiments, the case 210 is detachably connected to the cover 230. In other words, the cover 230 may be a separate component that is attached to the cleaning tank 220 when needed, and the cover 230 may be detached if the cover 230 needs to be repaired or replaced. In other embodiments, the case 210 and the cover 230 may be integrally formed.

Referring to fig. 5, in some embodiments, the tank 210 includes a first tank 211 and a second tank 212, the first tank 211 is provided with a first cleaning tank 220, the first cleaning tank 220 is used for containing the cleaning solution, the second tank 212 is provided with a second cleaning tank 220, the second cleaning tank 220 is used for containing deionized water, the cover 230 is simultaneously covered above the first cleaning tank 220 and above the second cleaning tank 220, and the guide groove 232 extends from above the first cleaning tank 220 to above the second cleaning tank 220. After the sample is cleaned by the cleaning solution such as strong acid or strong alkali in the first cleaning tank 220, the surface of the sample may be adhered with the cleaning solution, so that the sample can be put into the second cleaning tank 220, and the sample is cleaned again by deionized water, so as to remove the residual cleaning solution on the sample.

Further, as shown in fig. 6, 7 and 8, in some embodiments, the sample cleaning device 10 further includes a one-way stop assembly 300, where the one-way stop assembly 300 is disposed on the cover 230 and is capable of moving to a first position and a second position relative to the guide slot 232. In the first position, the one-way stop assembly 300 is positioned within the guide slot 232 to intercept the lever 120, as shown in fig. 8, and in the second position, the one-way stop assembly 300 is retracted out of the guide slot 232 to allow the lever 120 to pass, as shown in fig. 7. Such a structural arrangement may be considered to be such that the one-way stop assembly 300 does not block movement of the lever 120 in the guide slot 232 when in the second position, and the lever 120 may be slid along the guide slot 232 from above the first wash basin 220 to above the second wash basin 220, and then immersing the load plate 110 and samples thereon into the second wash basin 220. When the sample is washed in the second washing tank 220 by deionized water, in order to prevent the operation rod 120 from driving the loading tray 110 and the sample, the sample returns from the second washing tank 220 to the first washing tank 220 along the guiding groove 232, and the unidirectional limiting assembly 300 can move to the first position, thereby intercepting the operation rod 120 and preventing the sample from returning to the first washing tank 220. In other words, the arrangement of the one-way stop assembly 300 may be considered to limit the one-way movement of the lever 120 from the first wash tank 220 to the second wash tank 220, thereby preventing samples washed by the second wash tank 220 from returning to the first wash tank 220.

Further, as shown in fig. 6, 7 and 8, in some embodiments, the one-way limiting assembly 300 includes a guide block 310 and an elastic member 320, where the elastic member 320 is elastically abutted against a side of the guide block 310 facing away from the guide slot 232, and the elastic member 320 is configured to provide an elastic force to move the guide block 310 to the first position. As shown in fig. 8, in the first position, the guide block 310 is positioned within the guide groove 232 to intercept the lever 120. One surface of the guide block 310, which is close to the first housing 211, is a guide inclined surface 311, and the guide inclined surface 311 is used for abutting against the operation rod 120, so that the guide block 310 presses the elastic member 320 and moves from the first position to the second position, as shown in fig. 7, and in the second position, the guide block 310 is located in the guide groove 232 to allow the operation rod 120 to pass through. Such a structural arrangement may be considered that the lever 120 may abut the guide block 310 through the guide slope 311 and move the guide block 310 in a direction overcoming the elastic force until the guide block 310 is moved out of the guide groove 232 to the second position, at which time the lever 120 may pass. When the operating rod 120 does not abut against the guide block 310, the guide block 310 can be automatically reset from the second position to the first position under the elastic force of the elastic member 320.

Referring to fig. 1, in some embodiments, the loading tray 110 is hollowed out. Taking the sample as an example when immersed in the cleaning solution, the sample is carried above the loading tray 110, and the loading tray 110 is hollowed out, so that the cleaning solution can infiltrate from the hollowed-out part of the assembly tray to the lower part of the sample, thereby more comprehensively cleaning the sample and improving the cleaning effect.

Further, as shown in fig. 4, in some embodiments, the number of the operating levers 120 is plural, and plural operating levers 120 are spaced apart; the number of the guide grooves 232 is plural, a plurality of the guide grooves 232 are arranged in parallel, and the guide grooves 232 are used for at least one operation rod 120 to pass through. The number of the operation rods 120 is increased, so that the connection between the operation rods 120 and the loading plate 110 is more reliable, and more and larger samples are more reliably loaded, thereby being beneficial to improving the working reliability and the working efficiency.

Further, as shown in fig. 4, in some of these embodiments, a plurality of the levers 120 are spaced around the edge of the loading plate 110.

Further, as shown in fig. 4, in some embodiments, the cross section of the loading plate 110 is square, the number of the operating levers 120 is four, and the four operating levers 120 are respectively disposed above the four corners of the loading plate 110; the number of the guide grooves 232 is two, the two guide grooves 232 are arranged in parallel, one guide groove 232 is used for allowing two operation rods 120 to pass through, and the other guide groove 232 is used for allowing the other two operation rods 120 to pass through. The shape of the loading tray 110 is not limited herein, and in other embodiments, the loading tray 110 may be circular or irregular, and the loading tray 110 may pass through the feed chute 231 and be capable of carrying a sample such as a silicon wafer.

In addition, the application also provides a semiconductor device, which comprises the sample cleaning device 10 according to any one of the embodiments.

The semiconductor device includes the sample cleaning apparatus 10 according to any of the above embodiments, so the semiconductor device also includes at least the following advantages: the washing reservoir 220 of the sample washing apparatus 10 may contain a washing liquid for washing the sample. Wherein the cleaning fluid may include, but is not limited to, a strong acid or a strong base, and the sample may include, but is not limited to, a silicon wafer. When the sample is to be cleaned, a user can place the sample on the loading tray 110, drive the loading tray 110 by using the operating rod 120, enable the loading tray 110 to enter from the feeding groove 231 on the side surface of the cleaning table 200, enable the operating rod 120 to slide into the guide groove 232, and immerse the loading tray 110 together with the sample thereon in the cleaning liquid of the cleaning tank 220 when the loading tray 110 moves above the cleaning tank 220, so that the sample is cleaned by using the cleaning liquid. It can be appreciated that the cleaning solution such as strong acid or strong alkali has strong corrosiveness, and is easy to damage personnel or other objects, so that the cleaning solution needs to be properly stored, the cover 230 is additionally arranged above the cleaning tank 220, the cleaning solution in the cleaning tank 220 can be prevented from splashing out by the cover 230, and the cover 230 can prevent the non-professional from operating by mistake and extending hands into the tank, or prevent the non-professional from containing the cleaning solution in the cleaning tank 220 by mistake, so that the safety factor of the sample cleaning device 10 in use is greatly improved.

The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.

The above examples only represent a few embodiments of the present application, which are described in more detail and are not to be construed as limiting the scope of the claims. It should be noted that it would be apparent to those skilled in the art that various modifications and improvements could be made without departing from the spirit of the present application, which would be within the scope of the present application. Accordingly, the scope of protection of the present application is to be determined by the claims appended hereto.

In the description of the present application, it should be understood that, if there are terms such as "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., these terms refer to the orientation or positional relationship based on the drawings, which are merely for convenience of description and simplification of description, and do not indicate or imply that the apparatus or element referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present application.

Furthermore, the terms "first," "second," and the like, if any, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In the description of the present application, the terms "plurality" and "a plurality" if any, mean at least two, such as two, three, etc., unless specifically defined otherwise.

In this application, unless explicitly stated and limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly. For example, the two parts can be fixedly connected, detachably connected or integrated; can be mechanically or electrically connected; either directly or indirectly, through intermediaries, or both, may be in communication with each other or in interaction with each other, unless expressly defined otherwise. The specific meaning of the terms in this application will be understood by those of ordinary skill in the art as the case may be.

In this application, unless expressly stated or limited otherwise, the meaning of a first feature being "on" or "off" a second feature, and the like, is that the first and second features are either in direct contact or in indirect contact through an intervening medium. Moreover, a first feature being "above," "over" and "on" a second feature may be a first feature being directly above or obliquely above the second feature, or simply indicating that the first feature is level higher than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.

It will be understood that if an element is referred to as being "fixed" or "disposed" on another element, it can be directly on the other element or intervening elements may also be present. If an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like as used herein, if any, are for descriptive purposes only and do not represent a unique embodiment.

In the description of the present specification, the descriptions of the terms "one embodiment," "other embodiments," and the like, mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, schematic descriptions of the above terms do not necessarily refer to the same embodiment or example. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.

Claims (10)

1. A sample cleaning apparatus, comprising:

the cleaning assembly comprises a loading disc and an operating rod, wherein the operating rod is arranged above the loading disc, and the loading disc is used for loading samples; and

The cleaning platform comprises a box body and a cover body, wherein the box body is provided with a cleaning pool for containing cleaning liquid, and the cleaning liquid is used for cleaning the sample; the cleaning device comprises a cleaning tank, a cover body, a loading plate, a guide groove, a control rod, a loading plate and a loading plate, wherein the cover body is arranged above the cleaning tank in a covering mode, the lateral peripheral surface of the cover body is provided with the feeding groove, the top surface of the cover body is provided with the guide groove communicated with the feeding groove, the guide groove is used for the control rod to pass through, and the feeding groove is used for the loading plate to pass through.

2. The sample cleaning apparatus of claim 1, wherein the housing is integrally formed with or removably connected to the cover.

3. The sample cleaning apparatus of claim 1, wherein the housing comprises a first housing and a second housing, the first housing defines a first cleaning tank for containing the cleaning fluid, the second housing defines a second cleaning tank for containing deionized water, the cover covers the first cleaning tank and the second cleaning tank, and the guide slot extends from above the first cleaning tank to above the second cleaning tank.

4. The sample cleaning apparatus of claim 3, further comprising a one-way stop assembly disposed on the cover and movable relative to the guide slot to a first position in which the one-way stop assembly is disposed within the guide slot to intercept the lever and a second position in which the one-way stop assembly is withdrawn from the guide slot to allow the lever to pass.

5. The sample cleaning apparatus according to claim 4, wherein the one-way limiting assembly comprises a guide block and an elastic member, the elastic member is elastically abutted against one side of the guide block facing away from the guide groove, and the elastic member is used for providing elastic force to enable the guide block to move to the first position, and when in the first position, the guide block is positioned in the guide groove to intercept the operation rod; one surface of the guide block, which is close to the first box body, is a guide inclined surface, the guide inclined surface is used for being abutted to the operation rod, so that the guide block extrudes the elastic piece and moves from the first position to the second position, and when the guide block is positioned at the second position, the guide block is positioned in the guide groove so as to allow the operation rod to pass through.

6. The sample cleaning apparatus of claim 1, wherein the loading tray is hollowed out.

7. The sample washing apparatus according to claim 1, wherein the number of the operation levers is plural, and the plural operation levers are arranged at intervals; and/or the number of the guide grooves is multiple, the guide grooves are arranged in parallel, and the guide grooves are used for allowing at least one operation rod to pass through.

8. The sample cleaning apparatus of claim 7, wherein a plurality of the levers are spaced around an edge of the loading plate.

9. The sample washing apparatus according to claim 8, wherein the cross section of the loading plate is square, the number of the operation levers is four, and the four operation levers are respectively arranged above four corners of the loading plate; the number of the guide grooves is two, the two guide grooves are arranged in parallel, one guide groove is used for allowing two operation rods to pass through, and the other guide groove is used for allowing the other two operation rods to pass through.

10. A semiconductor device comprising the sample cleaning apparatus according to any one of claims 1 to 9.