CN220579374U - Vacuum coating system - Google Patents

Abstract

The utility model belongs to the field of magnetron sputtering, and particularly relates to a vacuum coating system which comprises a vacuum cavity, a substrate turnover frame and a plurality of target devices; the substrate turnover frame is rotatably arranged in the vacuum cavity and is driven to rotate by the rotary driving assembly; the target devices are arranged on the inner wall of the vacuum cavity, and the plurality of target devices are sequentially arranged along the rotation direction of the substrate revolving rack; the vacuum coating system provided by the utility model can realize multi-mode coating, and the baffle mechanism can independently and quickly control the opening and closing of the corresponding targets, so that the mutual interference in the coating process of the multiple targets is avoided, and the coating effect is ensured.

Description

Vacuum coating system

Technical Field

The utility model belongs to the field of magnetron sputtering, and particularly relates to a vacuum coating system.

Background

Magnetron sputtering is one type of physical vapor deposition (Physical Vapor Deposition, PVD). The general sputtering method can be used for preparing a plurality of materials such as metal, semiconductor, insulator and the like, and has the advantages of simple equipment, easy control, large coating area, strong adhesive force and the like, and the magnetron sputtering method developed in the last 70 th century realizes high speed, low temperature and low damage. Since high-speed sputtering is performed at a low gas pressure, the ionization rate of the gas must be effectively increased. Magnetron sputtering increases the sputtering rate by introducing a magnetic field at the target cathode surface, and increasing the plasma density by confining the charged particles by the magnetic field.

However, the current magnetron sputtering equipment has single mode, and can only coat the same target on the same substrate at a time, so that the target utilization rate is low, and the coating efficiency can be seriously influenced by the time of replacing the substrate and the target.

Disclosure of Invention

The utility model aims to solve the technical problem of providing a vacuum coating system with high target utilization rate and multiple coating modes.

The utility model provides a vacuum coating system, which comprises a vacuum cavity, a substrate turnover frame and a plurality of target devices;

the substrate turnover frame is rotatably arranged in the vacuum cavity and is driven to rotate by the rotary driving assembly;

the target devices are arranged on the inner wall of the vacuum cavity, and the target devices are sequentially arranged along the rotation direction of the substrate rotating frame;

the target device comprises a target and a baffle mechanism, wherein the baffle mechanism is rotatably arranged in the vacuum cavity by taking the target as an axis, and when the baffle rotates between the target and the substrate turnover frame, the target is blocked from coating the corresponding substrate on the substrate turnover frame.

Still further, baffle mechanism includes baffle and sets up the rotor plate at the baffle both ends, two the rotor plate rotates respectively and connects the roof and the diapire in the vacuum chamber, target both ends are connected with two rotor plates respectively, and connect on the rotation axis of rotor plate.

Furthermore, the rotating plates are in running fit with the vacuum cavity through rotating shafts, the rotating shaft of one rotating plate extends out of the vacuum cavity, and a driving device is arranged outside the vacuum cavity to drive the rotating shaft to rotate.

Furthermore, the inner side wall of the vacuum cavity is convexly provided with a plurality of rectangular cavities, and the target device is arranged in the rectangular cavities.

Still further, the axis of rotation of the target device is parallel to the axis of rotation of the substrate turnover frame.

Further, the vacuum cavity is a cylindrical cavity, the substrate turnover frame is a cylindrical frame body, and the vacuum cavity is coaxial with the substrate turnover frame.

Still further, the vacuum chamber includes cavity and chamber lid, the chamber lid articulates the setting at the cavity lateral wall, is cylindrical structure when chamber lid and cavity cooperation, the cross section of chamber lid is minor arc, the cross section of cavity is the major arc.

Still further, the device also comprises a plurality of substrate rack rotation mechanisms and a plurality of substrate mounting plates;

the substrate frame rotation mechanism comprises a fixed gear and a plurality of substrate frame fixing pieces, wherein the fixed gear is fixedly arranged in the vacuum cavity, the plurality of substrate frame fixing pieces are arranged on the outer side of the substrate turnover frame along the fixed gear in a ring-shaped array and are rotationally connected with the substrate turnover frame, and each substrate turnover frame is provided with a driven gear meshed with the fixed gear;

the substrate mounting plate is disposed on the substrate holder fixture.

Further, the substrate turnover frame comprises two mounting plates which are parallel to each other and an upright post which is connected with the two mounting plates, and the two mounting plates are respectively and rotatably connected with the top wall and the bottom wall of the vacuum cavity.

Furthermore, the two mounting plates are positioned outside the substrate frame rotation mechanism and are also provided with substrate frame fixing and mounting structures in an annular array.

The vacuum coating system provided by the utility model has the beneficial effects that the single-substrate multi-layer coating, the multi-substrate or the multi-target multi-layer coating of the multi-material substrate and the multi-target multi-layer coating of the multi-substrate or the multi-material substrate can be realized, the arrangement of the baffle mechanism is convenient and sufficient for various needs, the opening and closing of the corresponding targets can be independently and quickly controlled, the mutual interference in the multi-target coating process is avoided, the coating effect is ensured, in addition, the substrates are installed in a substrate circumferential rotating frame manner, the multi-substrate can be installed at one time, the multi-substrate and the target device relatively move and circularly contact, the coating efficiency can be improved on the premise of ensuring the space, and the high-efficiency, high-quality and multi-mode vacuum coating system is finally realized.

Drawings

FIG. 1 is a schematic view of a first angle structure (hidden cavity cover) of a vacuum coating system according to the present utility model;

FIG. 2 is a schematic view of a second angle structure of the vacuum coating system (hidden cavity cover) according to the present utility model;

FIG. 3 is an enlarged view of a portion of FIG. 2 at A;

FIG. 4 is an enlarged view of a portion of FIG. 2 at B;

FIG. 5 is a front view of a vacuum coating system (hidden chamber cover) according to the present utility model;

FIG. 6 is a cross-sectional view taken along line C-C of FIG. 5;

FIG. 7 is a schematic view of a third angle structure (hidden shelf) of the vacuum coating system of the present utility model;

FIG. 8 is a bottom view of the FIG. 7 condition;

FIG. 9 is a perspective view in section taken from D-D of FIG. 8;

FIG. 10 is an enlarged view of a portion of FIG. 9 at E;

FIG. 11 is a schematic view of the mating structure of the substrate turnover frame and the substrate mounting plate of the present utility model;

fig. 12 is a partial enlarged view of F in fig. 11.

In the figure, 1-vacuum chamber; 11-rectangular cavity; 2-a substrate turnover frame; 21-a mounting plate; 22-stand columns; 23-a rotary drive assembly; 231-a turntable; 232-driving a motor; 233-belt mechanism; 234-seal spindle mechanism; 235-gear set; 3-a substrate holder rotation mechanism; 31-fixed gear; 32-a substrate holder mount; 321-rotating shaft; 322-a substrate mounting plate snap groove; 33-driven gear; 34-mounting holes; 4-a substrate mounting plate; 41-plate body; 42-substrate mounting location; 43-a plug pin; 44-a substrate; 5-rolling wheels; 6-a pin hole; 7-a target device; 7-a target device; 71-target material; 72-a baffle mechanism; 721-baffle; 722-rotating plate; 723-drive means.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all embodiments of the utility model. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

It should be noted that all directional indicators (such as up, down, left, right, front, and rear … …) in the embodiments of the present utility model are merely used to explain the relative positional relationship, movement, etc. between the components in a particular posture (as shown in the drawings), and if the particular posture is changed, the directional indicator is changed accordingly.

Furthermore, descriptions such as those referred to as "first," "second," and the like, are provided for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implying an order of magnitude of the indicated technical features in the present disclosure. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In the description of the present utility model, the meaning of "plurality" means at least two, for example, two, three, etc., unless specifically defined otherwise.

In the present utility model, unless specifically stated and limited otherwise, the terms "connected," "affixed," and the like are to be construed broadly, and for example, "affixed" may be a fixed connection, a removable connection, or an integral body; the device can be mechanically connected, electrically connected, physically connected or wirelessly connected; either directly or indirectly, through intermediaries, or both, may be in communication with each other or in interaction with each other, unless expressly defined otherwise. The specific meaning of the above terms in the present utility model can be understood by those of ordinary skill in the art according to the specific circumstances.

In addition, the technical solutions of the embodiments of the present utility model may be combined with each other, but it is necessary to be based on the fact that those skilled in the art can implement the technical solutions, and when the technical solutions are contradictory or cannot be implemented, the combination of the technical solutions should be considered as not existing, and not falling within the scope of protection claimed by the present utility model.

As shown in fig. 1-12, the utility model provides a vacuum coating system, which comprises a rotary substrate frame device for vacuum coating and a plurality of target devices 7; the rotary substrate frame device for vacuum coating comprises a vacuum cavity 1 and a substrate turnover frame 2, wherein the vacuum cavity 1 provides a vacuum environment for coating the substrate, and simultaneously provides a mounting platform for the substrate turnover frame 2, the substrate turnover frame 2 is used for mounting the substrate 44 to be coated, the target devices 7 are used for providing coating materials, and a plurality of target devices 7 are arranged to perform coating of different materials or perform multilayer coating on the same substrate 44;

the substrate turnover frame 2 is rotatably arranged in the vacuum cavity 1 and is driven to rotate by the rotary driving assembly 23, so that the substrate 44 is turned around the axis of the substrate turnover frame 2, and further sequentially passes through the plurality of target devices 7 to realize sequentially and uniformly coating;

the target devices 7 are arranged on the inner wall of the vacuum cavity 1, the target devices 7 are sequentially arranged along the rotation direction of the substrate turnover frame 2, targets 71 in the target devices 7 can be made of the same material or different materials, the targets can be selected according to actual needs, when the targets are made of the same material, the substrates 44 can be coated with multiple layers, and when the targets are made of different materials, the substrates 44 can be coated with different materials;

the target device 7 comprises a target 71 and a baffle mechanism 72, the baffle mechanism 72 is rotatably arranged in the vacuum cavity 1 by taking the target as an axis, when the baffle 721 rotates between the target and the substrate rotating frame 2, the target is blocked from coating the corresponding substrate on the substrate rotating frame 2, by arranging the baffle mechanism 72, the target can be blocked from being sputtered onto the substrate 44 by the baffle 721 when the target device 7 is not needed, the target device 7 can be rapidly cut off, and when two adjacent target devices 7 perform magnetron sputtering of targets 71 with different materials, sputtering of the other target 71 is cut off by the baffle 721 in the sputtering process of one target 71, so that the coating films with different materials on the same substrate 44 can not be mutually interfered, and the coating effect is improved.

Namely, the vacuum coating system provided by the utility model can realize multi-layer coating of one target 71 of a single substrate 44, multi-layer coating of multiple targets 71 of the single substrate 44, multi-layer coating of one target 71 of multiple substrates 44 or multiple substrates 44, multi-layer coating of multiple targets 71 of the multiple substrates 44 or multiple substrates 44, is convenient and sufficient for various needs, can independently and quickly control the opening and closing of the corresponding targets 71, avoids mutual interference in the coating process of the multiple targets 71, ensures the coating effect, and can mount multiple substrates 44 at one time by adopting the substrate turnover frame 2, and enables the multiple substrates 44 to move relatively to the target device 7 in a circulating contact manner, thereby improving the coating efficiency on the premise of ensuring the space and finally realizing an efficient, high-quality and multi-mode vacuum coating system.

Referring to fig. 2-4, in one embodiment, the baffle mechanism 72 includes a baffle 721 and rotating plates 722 disposed at two ends of the baffle 721, the two rotating plates 722 are respectively rotatably connected to a top wall and a bottom wall of the vacuum chamber 1, two ends of the target 71 are respectively connected to the two rotating plates 722 and are connected to the rotating axes of the rotating plates 722, so that the baffle 721 rotates around the target 71 to separate the target 71 from the substrate 44, in this embodiment, the target 71 can rotate with the rotating plates 722, so that the target surface of the target 71 always deviates from one side of the baffle 721, and the sputtering effect during film plating is ensured.

Referring to fig. 4, in one embodiment, the rotating plate 722 is rotatably matched with the vacuum chamber 1 through a rotating shaft, the rotating shaft of one rotating plate 722 extends out of the vacuum chamber 1, a driving device 723 is arranged outside the vacuum chamber 1 to drive the rotating shaft to rotate, the driving device 723 can be a rotary driving device such as a motor, a hydraulic motor or a pneumatic motor, or can be a linear driving device such as an electric cylinder, a hydraulic cylinder or a cylinder combined with a rack-and-pinion pair, in one preferred embodiment, the driving device 723 adopts a combination of a cylinder and a rack-and-pinion pair, and two adjacent target devices 7 can share one cylinder for driving, thereby reducing the cost. In addition, the driving device 723 is arranged outside the vacuum chamber 1, so that the service life of the driving device 723 can be prevented from being influenced by plating films, and the space of plating films in the vacuum chamber 1 is prevented from being occupied.

In one embodiment, the inner side wall of the vacuum chamber 1 is convexly provided with a plurality of rectangular chambers 11, the target device 7 is disposed in the rectangular chambers 11, the rectangular chambers 11 are communicated with the vacuum chamber 1 to provide a convenient installation space for the target device 7, in the preferred embodiment, one or more groups of target devices 7 made of the same material can be installed in one rectangular chamber 11, so that the coating efficiency can be improved, at the moment, targets 71 made of different materials respectively correspond to the rectangular chambers 11, relatively independent spaces can be provided for sputtering different targets 71, and mutual interference is avoided.

In one embodiment, the rotation axis of the target device 7 is parallel to the rotation axis of the substrate turnover frame 2, and the axial length of the target 71 is consistent with the height of the substrate turnover frame 2, so that the substrate 44 in the whole height direction of the substrate turnover frame 2 can be coated at one time, and the coating efficiency and uniformity are ensured.

In one embodiment, the vacuum cavity is a cylindrical cavity, the substrate turnover frame 2 is a cylindrical frame body, and the vacuum cavity is coaxial with the substrate turnover frame 2, so that the structure is compact, a coating space is formed between the inner wall of the vacuum cavity and the outer wall of the substrate turnover frame 2, and the effect of coating can be prevented from being influenced by overlarge coating space.

Referring to fig. 1, in one embodiment, the vacuum chamber 1 includes a chamber body and a chamber cover, the chamber cover is hinged on a side wall of the chamber body, the chamber cover is in a cylindrical structure when being matched with the chamber body, the cross section of the chamber cover is in a minor arc, the cross section of the chamber body is in a major arc, so that the opening size of the chamber body can be reduced while the mounting difficulty of the substrate 44 is ensured, and the sealing difficulty is reduced.

The utility model relates to a rotary substrate frame device for vacuum coating, which comprises a vacuum cavity 1, a substrate turnover frame 2, a plurality of substrate frame autorotation mechanisms 3 and a plurality of substrate mounting plates 4, wherein the substrate frame autorotation mechanisms 3 are used for driving the substrate mounting plates 4 to rotate while turnover is carried out along the rotation axis of the substrate turnover frame 2, so that both sides of the substrate mounting plates 4 can be provided with substrates 44 for coating, the number of the substrates 44 is doubled, and the substrate mounting plates 4 are used for mounting the substrates 44 with coating;

wherein the substrate turnover frame 2 is rotatably arranged in the vacuum cavity 1 and is driven to rotate by a rotary driving assembly 23;

the substrate rack rotation mechanism 3 comprises a fixed gear 31 and a plurality of substrate rack fixing pieces 32, the fixed gear 31 is fixedly arranged in the vacuum cavity 1, the fixed gear 31 is kept static when the substrate rack fixing pieces 32 rotate, the plurality of substrate rack fixing pieces 32 are arranged on the substrate turnover rack 2 along the fixed gear 31 in a ring array and are in rotary connection with the substrate turnover rack 2, each substrate rack fixing piece 32 is provided with a driven gear 33 meshed with the fixed gear 31, the rotation of the substrate turnover rack 2 drives the driven gear 33 to rotate relative to the fixed gear 31, and the driven gear 33 rotates, so that the substrate rack fixing pieces 32 are driven to rotate, and the substrate mounting plate 4 rotates;

the substrate mounting plate 4 is disposed on the substrate holder mount 32, preferably removably disposed on the substrate holder mount 32, to facilitate assembly and disassembly of the substrate 44 on the substrate mounting plate 4.

According to the rotary substrate holder device for vacuum coating, provided by the utility model, through arranging the revolution and rotation structures, on one hand, the mounting quantity of the substrates 44 can be greatly increased, the coating efficiency can be improved, on the other hand, the uniformity of coating can be ensured, and the coating quality can be further improved, and the rotation mechanism adopts a meshing mode of the fixed gear 31 and the driven gears 33, so that a driving element is not required to be independently arranged, the structure can be simplified, the cost and the energy consumption can be reduced, and the synchronous rotation of the substrate mounting plates 4 can be ensured, and the coating uniformity can be further ensured.

In one embodiment, the substrate turnover frame 2 includes two mounting plates 21 parallel to each other and a column 22 connecting the two mounting plates 21, where the two mounting plates 21 are respectively rotatably connected with the top wall and the bottom wall of the vacuum chamber 1, so that the space between the two mounting plates 21 is used for mounting the substrate mounting plate 4, and the space is reasonably utilized, preferably, the column 22 is disposed on the inner side of the substrate mounting plate 4, so as to avoid affecting the rotation of the substrate mounting plate 4.

In one embodiment, the fixed gear 31 is fixedly disposed on the bottom wall of the vacuum chamber 1, the substrate holder fixing member 32 includes a rotating shaft 321, the rotating shaft 321 penetrates through two ends of the lower mounting plate 21, the rotating shaft 321 faces toward one end of the bottom wall of the vacuum chamber 1 to connect the driven gear 33, and the other end of the rotating shaft is provided with a substrate mounting plate clamping groove 322. The substrate mounting board engaging groove 322 is used for detachably engaging the bottom of the substrate mounting board 4, so as to drive the substrate mounting board 4 to rotate.

In one embodiment, the substrate turnover frame further comprises a plurality of mounting holes 34 arranged on the upper mounting plate 21, the plurality of mounting holes 34 are in one-to-one correspondence with the rotating shafts 321, a connecting shaft is arranged at the upper end of the substrate mounting plate 4, and the connecting shaft is rotatably arranged in the mounting holes 34, so that stable rotary connection between the substrate mounting plate 4 and the substrate turnover frame 2 is realized.

Referring to fig. 11 and 12, in one embodiment, two mounting plates 21 are disposed outside the substrate frame rotation mechanism 3 and are further provided with a substrate frame fixing and mounting structure in an annular array, and the substrate frame fixing and mounting structure is used for fixing and mounting the substrate mounting plate 4, so as to provide a mounting mode different from rotation, and further adapt to different coating requirements. In a preferred embodiment, the substrate holder is fixedly mounted in such a manner that the latch holes 6 are formed in the two mounting plates 21, and the upper and lower ends of the substrate mounting plate 4 are provided with the latches 43.

In one embodiment, the bottom of the substrate turnover frame 2 is provided with rollers 5 in an annular array, the rollers 5 are in rolling fit with the bottom of the vacuum cavity 1, and the rollers 5 are used for bearing weight and guaranteeing rotation smoothness of the substrate turnover frame 2.

Referring to fig. 10, in one embodiment, the rotary drive assembly 23 includes a turntable 231, a drive motor 232, a belt mechanism 233, a seal shaft mechanism 234, and a gear set 235;

the turntable 231 is rotatably arranged on the bottom wall of the vacuum chamber 1 and is connected with the substrate turnover frame 2, and the turntable 231 is connected with the bottom wall of the vacuum chamber 1 through a bearing;

the driving motor 232 is arranged outside the bottom wall cavity of the vacuum cavity 1, the sealing rotating shaft mechanism 234 penetrates through the bottom wall of the vacuum cavity 1, and the belt mechanism 233 is respectively connected with the outer end of the sealing rotating shaft mechanism 234 and the output shaft of the driving motor 232; the gear set 235 is respectively connected with the inner end of the sealing rotating shaft mechanism 234 and the turntable 231, namely, a driving wheel of the belt mechanism 233 is connected with an output shaft of the driving motor 232, a driven wheel of the belt mechanism 233 is connected with a driving gear in the gear set 235, and a driven gear in the gear set 235 is arranged outside the turntable 231. In this embodiment, the driving motor 232 is disposed outside the vacuum chamber 1, so as to avoid the influence of sputtering target on the service life of the driving motor 232.

In one embodiment, the substrate mounting board 4 includes a board 41 and at least one substrate mounting location 42 disposed on the board 41, and the substrate 44 is disposed on the substrate mounting location 42 in a jogged manner, so as to simplify the difficulty of mounting the substrate 44.

What is not described in detail in this specification is prior art known to those skilled in the art.

Claims (10)

1. The vacuum coating system is characterized by comprising a vacuum cavity (1), a substrate turnover frame (2) and a plurality of target devices (7);

the substrate turnover frame (2) is rotatably arranged in the vacuum cavity (1) and is driven to rotate by a rotary driving assembly (23);

the target devices (7) are arranged on the inner wall of the vacuum cavity (1), and the target devices (7) are sequentially arranged along the rotation direction of the substrate revolving rack (2);

the target device (7) comprises a target (71) and a baffle mechanism (72), the baffle mechanism (72) is rotatably arranged in the vacuum cavity (1) by taking the target as an axis, and when the baffle (721) rotates between the target and the substrate turnover frame (2), the target is blocked from coating a corresponding substrate on the substrate turnover frame (2).

2. The vacuum coating system according to claim 1, wherein the baffle mechanism (72) comprises a baffle (721) and rotating plates (722) arranged at two ends of the baffle (721), the two rotating plates (722) are respectively rotatably connected to a top wall and a bottom wall of the vacuum chamber (1), and two ends of the target (71) are respectively connected to the two rotating plates (722) and are connected to a rotation axis of the rotating plates (722).

3. The vacuum coating system according to claim 2, wherein the rotating plate (722) is in running fit with the vacuum chamber (1) through a rotating shaft, wherein the rotating shaft of one rotating plate (722) extends out of the vacuum chamber (1), and a driving device (723) is arranged outside the vacuum chamber (1) to drive the rotating shaft to rotate.

4. The vacuum coating system according to claim 1, wherein the inner side wall of the vacuum chamber (1) is convexly provided with a plurality of rectangular chambers (11), and the target device (7) is arranged in the rectangular chambers (11).

5. Vacuum coating system according to claim 1, characterized in that the axis of rotation of the target device (7) is parallel to the axis of rotation of the substrate turret (2).

6. The vacuum coating system according to any one of claims 1 to 5, wherein the vacuum chamber is a cylindrical chamber, the substrate turnover frame (2) is a cylindrical frame, and the vacuum chamber is coaxial with the substrate turnover frame (2).

7. The vacuum coating system according to claim 6, wherein the vacuum chamber (1) comprises a chamber body and a chamber cover, the chamber cover is hinged on the side wall of the chamber body, the chamber cover is in a cylindrical structure when being matched with the chamber body, the cross section of the chamber cover is in a minor arc, and the cross section of the chamber body is in a major arc.

8. The vacuum coating system according to any one of claims 1 to 5, further comprising a plurality of substrate holder rotation mechanisms (3) and a plurality of substrate mounting plates (4);

the substrate frame rotation mechanism (3) comprises fixed gears (31) and a plurality of substrate frame fixing pieces (32), wherein the fixed gears (31) are fixedly arranged in the vacuum cavity (1), the plurality of substrate frame fixing pieces (32) are arranged on the outer side of the substrate turnover frame (2) along the fixed gears (31) in an annular array and are rotationally connected with the substrate turnover frame (2), and each substrate turnover frame (2) is provided with a driven gear (33) meshed with the fixed gears (31);

the substrate mounting plate (4) is disposed on the substrate holder fixture (32).

9. The vacuum coating system according to claim 8, wherein the substrate turnover frame (2) comprises two mounting plates (21) parallel to each other and a column (22) connecting the two mounting plates (21), and the two mounting plates (21) are respectively rotatably connected with the top wall and the bottom wall of the vacuum chamber (1).

10. The vacuum coating system according to claim 9, wherein the two mounting plates (21) are located outside the substrate holder rotation mechanism (3) and are further provided with substrate holder fixing mounting structures in an annular array.