CN220202022U - Auxiliary anode device of roll-to-roll magnetron sputtering vacuum coating machine - Google Patents
Auxiliary anode device of roll-to-roll magnetron sputtering vacuum coating machine Download PDFInfo
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- CN220202022U CN220202022U CN202321159237.5U CN202321159237U CN220202022U CN 220202022 U CN220202022 U CN 220202022U CN 202321159237 U CN202321159237 U CN 202321159237U CN 220202022 U CN220202022 U CN 220202022U
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- auxiliary anode
- roll
- magnetron
- anode plate
- power supply
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- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 20
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 20
- 238000009413 insulation Methods 0.000 claims abstract description 17
- 230000005611 electricity Effects 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims description 3
- 230000000694 effects Effects 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims 1
- 230000005684 electric field Effects 0.000 abstract description 6
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 241001391944 Commicarpus scandens Species 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses an auxiliary anode device of a roll-to-roll magnetron sputtering vacuum coating machine, which comprises a bias power supply, wherein the negative electrode of the bias power supply is connected with a vacuum insulation electric lead-in terminal, the vacuum insulation electric lead-in terminal is connected with a supporting rod, the upper end position of the supporting rod is connected with an auxiliary anode plate, the lower end position of the supporting rod is provided with an insulation seat, the left side position and the right side position of the supporting rod are respectively provided with a magnetron target A and a magnetron target B, the magnetron targets are cathodes, the working principle of the magnetron targets is that electrons generated when the magnetron targets work under the action of an electric field E are enabled to completely run to the auxiliary anode plate without running to a base film, the base film is protected, twenty to two hundred volts of voltage is set for the bias power supply when the magnetron targets work, twenty to two hundred volts of negative bias voltage is set for the auxiliary anode plate, and more than ninety five percent of harmful electrons generated when the magnetron targets work can be captured by the auxiliary anode plate, so that the base film can be effectively protected.
Description
Technical Field
The utility model belongs to the technical field of auxiliary anode devices of roll-to-roll magnetron sputtering vacuum coating machines, and particularly relates to an auxiliary anode device of a roll-to-roll magnetron sputtering vacuum coating machine.
Background
The auxiliary anode device of the roll-to-roll magnetron sputtering vacuum coating machine is a device for assisting anode current transmission and control, in the roll-to-roll magnetron sputtering vacuum coating machine, an anode is an important component, ion bombardment and electron release in the sputtering process are controlled through current transmission, the auxiliary anode device can help the anode to better play a role, the auxiliary anode device is usually composed of a plurality of electrodes, the electrodes can be respectively connected with the anode to form a circuit, the main function of the auxiliary anode device is to enhance the transmission and control of anode current, so that the efficiency and stability of the sputtering process are improved, and meanwhile, the auxiliary anode device can also help to reduce the heat and voltage fluctuation of the anode, so that the service life of the anode is prolonged.
The thickness of the base film is less than ten micrometers, and after the surface of the base film is plated with a metal film layer, a conductor with the same potential with the equipment cavity is formed, so that harmful charged particles generated by the magnetic control target can run to the base film, and the base film is easy to break down and break down due to the fact that the thickness of the base film is relatively thin.
Disclosure of Invention
The utility model aims to provide an auxiliary anode device of a roll-to-roll magnetron sputtering vacuum coating machine, which solves the problems that the thickness of a base film is less than ten micrometers, a conductor with the same potential as a device cavity is formed after a metal film layer is coated on the surface of the base film, and harmful charged particles generated by a magnetron target run to the base film, and the base film is broken down and broken due to the fact that the thickness of the base film is relatively thin.
In order to achieve the above purpose, the present utility model provides the following technical solutions: the utility model provides an auxiliary anode device of roll-to-roll magnetron sputtering vacuum coating machine, includes bias power supply, bias power supply's negative pole is connected vacuum insulation electricity and is introduced the terminal, vacuum insulation electricity is introduced the terminal and is connected the bracing piece, the upper end position department of bracing piece is connected with auxiliary anode plate, the lower extreme position department of bracing piece is provided with insulating seat, the left and right sides position department of bracing piece is provided with magnetron target A and magnetron target B respectively.
Preferably, the magnetron targets a and B are cathodes, the auxiliary anode plate is located at the front side of the magnetron targets a and B, the magnetron targets a are arranged as NSNs, the magnetron targets B are arranged as SNS, and the magnetron targets a and B and the auxiliary anode plate form a closed magnetic field to further restrict harmful electrons generated by the magnetron.
Preferably, the auxiliary anode plate makes electrons generated during the working of the magnetic control target A and the magnetic control target B completely run to the auxiliary anode plate through the action of magnetic field constraint and negative bias without running to the base film to form a protective effect on the base film.
Preferably, the auxiliary anode plates can be used in a plurality of groups on the equipment, and the auxiliary anode plates are provided with supporting rods, insulating seats, vacuum insulation electric introduction terminals and bias power supplies for the magnetic control target A and the magnetic control target B.
Preferably, the auxiliary anode plate, the support rod, the insulating seat, the vacuum insulation electric lead-in terminal and the bias power supply form an auxiliary anode device, the auxiliary anode plate is made of magnetic conduction materials, the length of the auxiliary anode plate is identical to that of the magnetic control target A and the magnetic control target B of the equipment, the width and the thickness of the auxiliary anode plate are eighty millimeters and ten millimeters respectively, and the auxiliary anode plate is positioned between the magnetic control target A and the magnetic control target B and is higher than the forty millimeters of the target surface.
Preferably, the auxiliary anode plate is provided with two supporting rods, and the auxiliary anode plate is insulated by using an insulating seat and a vacuum cavity.
Preferably, the auxiliary anode plate is provided with a bias power supply, the negative electrode of the bias power supply is connected with the auxiliary anode, and the positive electrode of the bias power supply is connected with the equipment cavity.
Preferably, the voltage of the bias power supply is set to twenty to two hundred volts when the bias power supply works, the auxiliary anode plate is provided with a negative bias voltage of twenty to two hundred volts, and more than ninety five percent of harmful electrons generated by the magnetic control target A and the magnetic control target B are captured by the auxiliary anode plate so as to protect the base film.
Preferably, the auxiliary anode plate is provided with high voltage, so that the ionization rate of sputtering of the magnetic control target A and the magnetic control target B can be enhanced when the magnetic control target A and the magnetic control target B work, and the compactness and the binding force of a film layer are improved.
Compared with the prior art, the utility model provides an auxiliary anode device of a roll-to-roll magnetron sputtering vacuum coating machine, which has the following beneficial effects:
the magnetic control target is a cathode, the equipment cavity is an anode, and the working principle of the magnetic control target is that electrons collide with argon atoms in the process of flying to a substrate under the action of an electric field E, so that Ar positive ions and new electrons are generated by ionization of the electrons; the new electrons fly to the substrate, ar ions fly to the cathode target in an accelerating way under the action of an electric field, and bombard the surface of the target with high energy, so that the target material is sputtered. In the sputtered particles, neutral target atoms or molecules are deposited on a substrate to form a film, and secondary electrons generated by the deposition are subjected to an electric field and a magnetic field to generate a drift in the direction indicated by E (electric field) x B (magnetic field), which is abbreviated as E x B drift, and the motion track of the drift approximates a cycloid. In the case of a toroidal magnetic field, electrons move in a circular motion in a nearly cycloid fashion around the target surface, their path of motion is not only long, but also confined within the plasma region near the target surface, and a large amount of Ar is ionized in this region to bombard the target, thereby achieving a high deposition rate. As the number of collisions increases, the energy of the secondary electrons is depleted, gradually moving away from the target surface and eventually depositing on the substrate under the influence of the electric field E. Because the winding roller of the device is communicated with the cavity, the base film is also changed into an anode after being coated with the metal film layer, and a part of charged particles can run onto the base film.
Drawings
FIG. 1 is a schematic diagram of an auxiliary anode device of a roll-to-roll magnetron sputtering vacuum coating machine according to the present utility model.
Fig. 2 is a schematic diagram of a partial enlarged structure of an auxiliary anode device of a roll-to-roll magnetron sputtering vacuum coating machine according to the utility model.
In the figure: 1. an auxiliary anode plate; 2. a support rod; 3. an insulating base; 4. vacuum insulated electrical lead-in terminals; 5. a bias power supply; 6. a magnetic control target A; 7. and a magnetic control target B.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
The utility model provides an auxiliary anode device of a roll-to-roll magnetron sputtering vacuum coating machine as shown in fig. 1-2, which comprises a bias power supply 5, wherein the negative electrode of the bias power supply 5 is connected with a vacuum insulation electric lead-in terminal 4, the vacuum insulation electric lead-in terminal 4 is connected with a support rod 2, the upper end position of the support rod 2 is connected with an auxiliary anode plate 1, the lower end position of the support rod 2 is provided with an insulation seat 3, and the left side position and the right side position of the support rod 2 are respectively provided with a magnetron target A6 and a magnetron target B7.
The auxiliary anode device consists of an auxiliary anode plate 1, a support rod 2 of the anode plate, an insulating seat 3, a vacuum insulation electric lead-in terminal 4 and a bias power supply 5, wherein the auxiliary anode device is arranged in front of a magnetic control target, electrons generated during the work of the magnetic control target completely run to the auxiliary anode plate 1 without running to a base film under the action of magnetic field restraint and negative bias, the base film is protected, the auxiliary anode device can be used in a plurality of groups on equipment, and a set of auxiliary anode device is generally matched for two magnetic control targets.
As shown in fig. 1 and 2, the magnetron targets A6 and B7 are cathodes, the auxiliary anode plate 1 is positioned at the front side of the magnetron targets A6 and B7, the magnetron targets A6 are arranged as NSNs, the magnetron targets B7 are arranged as SNS, the magnetron targets A6 and B7 and the auxiliary anode plate 1 form a closed magnetic field to further restrict harmful electrons generated by the magnetron, the auxiliary anode plate 1 makes the electrons generated by the magnetron targets A6 and B7 during operation run to the auxiliary anode plate 1 through the action of magnetic field restriction and negative bias without running to the base film to form a protective effect on the base film, the auxiliary anode plate 1 can be used in multiple groups on equipment, the auxiliary anode plate 1 is provided with a support rod 2, an insulating seat 3, a vacuum insulation electric lead-in terminal 4 and a bias power supply 5 for the magnetron targets A6 and B7, the auxiliary anode plate 1, the support rod 2, the insulating seat 3, the vacuum insulation electric lead-in terminal 4 and the bias power supply 5 form an auxiliary anode device, the auxiliary anode plate 1 is made of magnetic conduction materials, the length of the auxiliary anode plate 1 is the same as the length of a magnetic control target A6 and a magnetic control target B7 of the equipment, the width and the thickness of the auxiliary anode plate 1 are eighty millimeters and ten millimeters respectively, the auxiliary anode plate 1 is positioned between the magnetic control target A6 and the magnetic control target B7 and is higher than the forty millimeters of the target surface, the auxiliary anode plate 1 is provided with two support rods 2, the auxiliary anode plate 1 is insulated by using an insulating seat 3 and a vacuum cavity, the auxiliary anode plate 1 is provided with a bias power supply 5, the negative electrode of the bias power supply 5 is connected with the auxiliary anode, the positive electrode of the bias power supply 5 is connected with the equipment cavity, the voltage of the bias power supply 5 is set to twenty to two hundred volts during operation, the auxiliary anode plate 1 is provided with twenty to two hundred volts of negative bias, and harmful electrons generated by the magnetic control target A6 and the magnetic control target B7 can be captured by the auxiliary anode plate 1 to protect a base film, the auxiliary anode plate 1 is provided with high voltage, so that the magnetron targets A6 and B7 can enhance the ionization rate of sputtering of the magnetron targets A6 and B7 and improve the compactness and the binding force of the film layer during working.
The auxiliary anode device has very good protection effect on the plastic film double-sided metal plating film layer and the copper foil and aluminum foil vacuum plating film, and can be applied to the production of the composite copper foil PET film double-sided vacuum copper plating and the composite aluminum foil PET film double-sided vacuum aluminum plating of the lithium battery current collector.
Finally, it should be noted that: the foregoing description is only illustrative of the preferred embodiments of the present utility model, and although the present utility model has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments described, or equivalents may be substituted for elements thereof, and any modifications, equivalents, improvements or changes may be made without departing from the spirit and principles of the present utility model.
Claims (7)
1. The utility model provides an auxiliary anode device of roll-to-roll magnetron sputtering vacuum coating machine, its characterized in that, including bias power supply (5), vacuum insulation electricity introduction terminal (4) are connected to the negative pole of bias power supply (5), vacuum insulation electricity introduction terminal (4) connect bracing piece (2), the upper end position department of bracing piece (2) is connected with auxiliary anode plate (1), the lower extreme position department of bracing piece (2) is provided with insulating seat (3), the left and right sides position department of bracing piece (2) is provided with magnetron target A (6) and magnetron target B (7) respectively.
2. The auxiliary anode device of the roll-to-roll magnetron sputtering vacuum coating machine according to claim 1, wherein the auxiliary anode device comprises: the magnetron targets A (6) and B (7) are cathodes, the auxiliary anode plate (1) is located at the front side of the magnetron targets A (6) and B (7), the magnetron targets A (6) are arranged to be NSN, the magnetron targets B (7) are arranged to be SNS, and the magnetron targets A (6) and B (7) and the auxiliary anode plate (1) form a closed magnetic field to further restrict harmful electrons generated by magnetic control.
3. The auxiliary anode device of the roll-to-roll magnetron sputtering vacuum coating machine according to claim 2, wherein the auxiliary anode device comprises: the auxiliary anode plate (1) enables electrons generated during the working of the magnetic control target A (6) and the magnetic control target B (7) to completely run to the auxiliary anode plate (1) through the magnetic field constraint and the negative bias effect, and the electrons do not run to the base film to form a protective effect on the base film.
4. The auxiliary anode device of the roll-to-roll magnetron sputtering vacuum coating machine according to claim 2, wherein the auxiliary anode device comprises: the auxiliary anode plates (1) can be used in a plurality of groups on equipment, and the auxiliary anode plates (1) are provided with support rods (2), insulating seats (3), vacuum insulation electric introduction terminals (4) and bias power supplies (5) for the magnetic control targets A (6) and the magnetic control targets B (7).
5. The auxiliary anode device of the roll-to-roll magnetron sputtering vacuum coating machine according to claim 4, wherein the auxiliary anode device comprises: auxiliary anode plate (1), bracing piece (2), insulating seat (3), vacuum insulation electricity lead-in terminal (4) and bias voltage power supply (5) are constituteed and are assisted positive pole device, auxiliary anode plate (1) adopts the material preparation of magnetic conduction, the length of auxiliary anode plate (1) is the same with magnetron target A (6) and magnetron target B (7) length of equipment, the width and the thickness of auxiliary anode plate (1) are eighty millimeters and ten millimeters respectively, auxiliary anode plate (1) is in the centre of magnetron target A (6) and magnetron target B (7) and be higher than the target surface forty millimeters.
6. The auxiliary anode device of the roll-to-roll magnetron sputtering vacuum coating machine according to claim 5, wherein the auxiliary anode device comprises: the auxiliary anode plate (1) is provided with two supporting rods (2), and the auxiliary anode plate (1) is insulated by using an insulating seat (3) and a vacuum cavity.
7. The auxiliary anode device of the roll-to-roll magnetron sputtering vacuum coating machine according to claim 5, wherein the auxiliary anode device comprises: the auxiliary anode plate (1) is provided with a bias power supply (5), the negative electrode of the bias power supply (5) is connected with the auxiliary anode, and the positive electrode of the bias power supply (5) is connected with the equipment cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321159237.5U CN220202022U (en) | 2023-05-15 | 2023-05-15 | Auxiliary anode device of roll-to-roll magnetron sputtering vacuum coating machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321159237.5U CN220202022U (en) | 2023-05-15 | 2023-05-15 | Auxiliary anode device of roll-to-roll magnetron sputtering vacuum coating machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220202022U true CN220202022U (en) | 2023-12-19 |
Family
ID=89156541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321159237.5U Active CN220202022U (en) | 2023-05-15 | 2023-05-15 | Auxiliary anode device of roll-to-roll magnetron sputtering vacuum coating machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220202022U (en) |
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2023
- 2023-05-15 CN CN202321159237.5U patent/CN220202022U/en active Active
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