CN220149647U - Magnetron sputtering coating device - Google Patents
Magnetron sputtering coating device Download PDFInfo
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- CN220149647U CN220149647U CN202321650840.3U CN202321650840U CN220149647U CN 220149647 U CN220149647 U CN 220149647U CN 202321650840 U CN202321650840 U CN 202321650840U CN 220149647 U CN220149647 U CN 220149647U
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- magnetron sputtering
- sputtering coating
- target
- coating device
- rod
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- 238000000576 coating method Methods 0.000 title claims abstract description 44
- 239000011248 coating agent Substances 0.000 title claims abstract description 42
- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 31
- 238000004544 sputter deposition Methods 0.000 claims abstract description 16
- 230000005540 biological transmission Effects 0.000 claims abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 7
- 238000007747 plating Methods 0.000 claims abstract description 4
- 229920003023 plastic Polymers 0.000 claims description 4
- 239000000758 substrate Substances 0.000 description 17
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- 230000005684 electric field Effects 0.000 description 8
- 239000013077 target material Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 238000004891 communication Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- -1 argon ions Chemical class 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
The utility model provides a magnetron sputtering coating device, which comprises: a film plating box; the working chamber sets up in the inside of coating film case, and one side of working chamber inside is provided with the spout, and the opposite side of working chamber inside is provided with the spacing groove, and the inside fixed mounting of spacing groove has the gag lever post, and threaded device is installed in the inside rotation of spout, and threaded device's one side screw thread engagement has drive arrangement. The utility model provides a magnetron sputtering coating device, which is characterized in that a distance between a target and a base material on a transmission device is observed through a range finder, an external power supply is controlled to be connected with a driving device to engage a threaded device for rotation, so that the threaded device is in threaded engagement with the distance between the sputtering device and the transmission device.
Description
Technical Field
The utility model relates to the field of coating, in particular to a magnetron sputtering coating device.
Background
The magnetron sputtering is that electrons collide with argon atoms in the process of flying to a substrate to be coated under the action of an electric field E, so that Ar positive ions and new electrons are generated by ionization of the electrons; the new electrons fly to the substrate to be coated, ar ions fly to the cathode target in an accelerating way under the action of an electric field, and bombard the surface of the target with high energy, so that the target is sputtered, and neutral target atoms or molecules are deposited on the substrate to be coated to form a film in sputtered particles.
The magnetron sputtering coating is a coating technology which takes a coating material as a target cathode, bombards the target material by utilizing argon ions to generate cathode sputtering, and sputters target material atoms onto a workpiece to form a deposition layer.
However, as the coating is performed, the target connected with the cathode is continuously consumed, so that the thickness of the target is reduced, the distance between the target and the substrate to be processed is continuously increased along with the consumption process, and the stabilizing effect on the coating of the substrate is reduced.
Therefore, it is necessary to provide a magnetron sputtering coating device to solve the above technical problems.
Disclosure of Invention
The utility model provides a magnetron sputtering coating device, which solves the problems that as coating is carried out, a target material connected with a cathode is continuously consumed, so that the thickness of the target material is reduced, the distance between the target material and a substrate to be processed is continuously increased along with the consumption process, and the stabilizing effect on the coating of the substrate is reduced.
In order to solve the technical problems, the utility model provides a magnetron sputtering coating device, which comprises: a film plating box;
the working cavity is arranged in the coating box, a chute is formed in one side of the interior of the working cavity, a limit groove is formed in the other side of the interior of the working cavity, a limit rod is fixedly arranged in the limit groove, a thread device is rotatably arranged in the chute, a driving device is in threaded engagement with one side of the thread device, and a sputtering device is in threaded engagement with the outer surface of the thread device;
the range finder is arranged in the middle of the top of the inner cavity of the working cavity, and a transmission device is arranged at the bottom of the inner cavity of the working cavity.
Preferably, the driving device comprises a servo motor, and a first bevel gear is fixedly connected to the outer surface of an output shaft of the servo motor.
Preferably, the thread device comprises a reciprocating screw rod, and a second bevel gear is fixedly arranged at the top of the outer surface of the reciprocating screw rod.
Preferably, the sputtering device comprises a target, a cathode is arranged at the top of the target, a movable rod is fixedly arranged in the middle of the inside of the target, a threaded hole is formed in one side of the top of the movable rod, and a limiting hole is formed in the other side of the top of the movable rod.
Preferably, a communicating groove is formed in one side of the sliding groove, a graduated scale is fixedly arranged in the communicating groove, a connecting rod is fixedly arranged on one side of the bottom of the moving rod, and an observation device is fixedly arranged on one side of the bottom end of the connecting rod.
Preferably, the observation device comprises a movable ruler, and an observation tube is arranged on one side inside the movable ruler.
Preferably, the observation tube is made of transparent plastic, so that the numerical value on the surface of the movable ruler can be observed conveniently.
Compared with the related art, the magnetron sputtering coating device provided by the utility model has the following beneficial effects:
the utility model provides a magnetron sputtering coating device, which is characterized in that a distance between a target and a base material on a transmission device is observed through a range finder, an external power supply is controlled to be connected with a driving device to engage a threaded device for rotation, so that the threaded device is in threaded engagement with the distance between the sputtering device and the transmission device.
Drawings
FIG. 1 is a schematic diagram of a magnetron sputtering coating device according to a first embodiment of the present utility model;
FIG. 2 is an enlarged schematic view of the portion A shown in FIG. 1;
FIG. 3 is a schematic view of the sputtering apparatus shown in FIG. 1;
FIG. 4 is a schematic structural diagram of a second embodiment of a magnetron sputtering coating device according to the present utility model;
FIG. 5 is an enlarged schematic view of the portion B shown in FIG. 4;
fig. 6 is a schematic view of the observation device shown in fig. 5.
Reference numerals in the drawings: 1. the device comprises a film coating box, 2, a working cavity, 3, a distance meter, 4, a driving device, 41, a servo motor, 42, a first bevel gear, 5, a screw device, 51, a reciprocating screw rod, 52, a second bevel gear, 6, a sliding chute, 7, a limit groove, 8, a limit rod, 9, a sputtering device, 91, a target, 92, a cathode, 93, a movable rod, 94, a threaded hole, 95, a limit hole, 10, a transmission device, 11, a communication groove, 12, a graduated scale, 13, a connecting rod, 14, an observation device, 141, a movable scale, 142 and an observation tube.
Detailed Description
The utility model will be further described with reference to the drawings and embodiments.
Referring to fig. 1, fig. 2 and fig. 3 in combination, fig. 1 is a schematic structural diagram of a first embodiment of a magnetron sputtering coating device according to the present utility model; FIG. 2 is an enlarged schematic view of the portion A shown in FIG. 1;
fig. 3 is a schematic view of the sputtering apparatus shown in fig. 1. A magnetron sputtering coating device, comprising: a film plating box 1;
the working cavity 2 is arranged in the coating box 1, a chute 6 is formed in one side of the interior of the working cavity 2, a limit groove 7 is formed in the other side of the interior of the working cavity 2, a limit rod 8 is fixedly arranged in the limit groove 7, a thread device 5 is rotatably arranged in the chute 6, a driving device 4 is in threaded engagement with one side of the thread device 5, and a sputtering device 9 is in threaded engagement with the outer surface of the thread device 5;
the range finder 3, the range finder 3 set up in the centre at working chamber 2 inner chamber top, the bottom of working chamber 2 inner chamber is provided with transmission 10.
The coating box 1 is made of transparent plastic, the chute 6 is arranged on the left side of the inner cavity of the working cavity 2, and the limit groove 7 is arranged on the right side of the inner cavity of the working cavity 2.
The driving device 4 comprises a servo motor 41, and a first bevel gear 42 is fixedly connected to the outer surface of an output shaft of the servo motor 41.
The output shaft of the servo motor 41 rotates to drive the first bevel gear 42 to rotate, and the first bevel gear 42 rotates to engage the second bevel gear 52.
The screw thread device 5 comprises a reciprocating screw rod 51, and a second bevel gear 52 is fixedly arranged on the top of the outer surface of the reciprocating screw rod 51.
The second bevel gear 52 rotates to drive the reciprocating screw 51 to rotate.
The sputtering device 9 comprises a target 91, a cathode 92 is arranged at the top of the target 91, a moving rod 93 is fixedly arranged in the middle of the inside of the target 91, a threaded hole 94 is formed in one side of the top of the moving rod 93, and a limiting hole 95 is formed in the other side of the top of the moving rod 93.
The sputtering device 9 is a conventional device, an electric field is generated between the cathode 92 and the substrate, then electrons fly to the substrate under the action of the electric field and collide with argon atoms in the flying process, so that argon atoms are ionized to generate argon positive ions and new electrons, the new electrons are continuously transmitted to the substrate, the argon ions fly to the target 91 arranged at the cathode 92 under the action of the electric field in an accelerating manner, and finally the surface of the target 91 is bombarded with high energy, so that the target 91 is sputtered, neutral target atoms or molecules are deposited on the substrate to form a film in sputtered particles, and a coating process is finished.
The moving rod 93 is in threaded engagement with the outer surface of the reciprocating screw rod 51 through a threaded hole 94, and is sleeved on the outer surface of the limiting groove 7 through a limiting hole 95.
The working principle of the magnetron sputtering coating device provided by the utility model is as follows:
when the device works, firstly, a user places a substrate on the top surface of the transmission device 10, the output shaft of the motor drives the transmission wheel to transmit the transmission belt to move to drive the substrate to move, meanwhile, an electric field is generated between the cathode 92 and the substrate, then electrons fly to the substrate under the action of the electric field and collide with argon atoms in the flying process to ionize the argon atoms, argon positive ions and new electrons are generated, the new electrons are continuously transmitted to the substrate, the argon ions fly to the target 91 arranged on the cathode 92 under the action of the electric field in an accelerating way, and finally, the surface of the target 91 is bombarded with high energy to cause the target 91 to sputter, so that neutral target atoms or molecules are deposited on the substrate to form a film in sputtered particles, and then a coating process is completed.
The distance meter 3 can continuously observe the distance between the base material and the target material 91 on the transmission device 10 and display the distance on an externally connected data meter, a user can control the output shaft of the servo motor 41 to rotate through an external power supply according to the distance value, the output shaft of the servo motor 41 rotates to drive the first bevel gear 42 to rotate to engage the second bevel gear 52 to rotate, the second bevel gear 52 rotates to drive the reciprocating screw rod 51 to rotate, the reciprocating screw rod 51 rotates to engage the threaded hole 94 of the moving rod 93 in the sputtering device 9 in a threaded manner, the moving rod 93 can only move up and down under the limitation of the chute 6, and the distance between the target material 91 and the base material is adjusted.
Compared with the related art, the magnetron sputtering coating device provided by the utility model has the following beneficial effects:
the utility model provides a magnetron sputtering coating device, which is characterized in that a distance meter 3 is used for observing the distance between a target 91 and a base material on a transmission device 10, an external power supply is controlled to be connected with a driving device 4 to engage a threaded device 5 for rotation, so that the threaded device 5 is in threaded engagement with the distance between the sputtering device 9 and the transmission device 10.
Second embodiment
Referring to fig. 4, 5 and 6, another magnetron sputtering coating device is provided according to a second embodiment of the present utility model. The second embodiment is merely a preferred manner of the first embodiment, and implementation of the second embodiment does not affect the implementation of the first embodiment alone.
Specifically, the difference of the magnetron sputtering coating device provided by the second embodiment of the utility model is that a communication groove 11 is formed in one side of the chute 6, a graduated scale 12 is fixedly installed in the communication groove 11, a connecting rod 13 is fixedly installed on one side of the bottom of the moving rod 93, and an observation device 14 is fixedly installed on one side of the bottom end of the connecting rod 13.
The communication groove 11 communicates with the left side of the chute 6, and the connecting rod 13 is fixed to the left side of the bottom of the moving rod 93.
The observation device 14 comprises a movable ruler 141, and an observation tube 142 is arranged on one side inside the movable ruler 141.
The movable scale 141 is sleeved on the surface of the graduated scale 12 through the observation tube 142.
The observation tube 142 is made of transparent plastic, so that the numerical value of the surface of the movable ruler 141 can be observed conveniently.
The working principle of the magnetron sputtering coating device provided by the utility model is as follows:
when the device works, firstly the sputtering device 9 moves up and down on the outer surface of the reciprocating screw rod 51, the moving ruler 141 is driven to move on the outer surface of the graduated scale 12 by the movement of the connecting rod 13, and the observation tube 142 is convenient for operators to observe the graduations which are opposite when the surface of the graduated scale 12 moves.
Compared with the related art, the magnetron sputtering coating device provided by the utility model has the following beneficial effects:
the utility model provides a magnetron sputtering coating device, which is characterized in that a transparent observation device 14 is arranged at the bottom of a movable rod 93 and sleeved on a graduated scale 12.
The foregoing description is only illustrative of the present utility model and is not intended to limit the scope of the utility model, and all equivalent structures or equivalent processes or direct or indirect application in other related technical fields are included in the scope of the present utility model.
Claims (7)
1. A magnetron sputtering coating device, comprising: a film plating box;
the working cavity is arranged in the coating box, a chute is formed in one side of the interior of the working cavity, a limit groove is formed in the other side of the interior of the working cavity, a limit rod is fixedly arranged in the limit groove, a thread device is rotatably arranged in the chute, a driving device is in threaded engagement with one side of the thread device, and a sputtering device is in threaded engagement with the outer surface of the thread device;
the range finder is arranged in the middle of the top of the inner cavity of the working cavity, and a transmission device is arranged at the bottom of the inner cavity of the working cavity.
2. The magnetron sputtering coating device according to claim 1, wherein the driving device comprises a servo motor, and a first bevel gear is fixedly connected to the outer surface of an output shaft of the servo motor.
3. The magnetron sputtering coating device according to claim 1, wherein the screw thread device comprises a reciprocating screw rod, and a second bevel gear is fixedly arranged on the top of the outer surface of the reciprocating screw rod.
4. The magnetron sputtering coating device according to claim 1, wherein the sputtering device comprises a target, a cathode is arranged at the top of the target, a movable rod is fixedly arranged in the middle of the inside of the target, a threaded hole is formed in one side of the top of the movable rod, and a limiting hole is formed in the other side of the top of the movable rod.
5. The magnetron sputtering coating device according to claim 4, wherein a communicating groove is formed in one side of the sliding groove, a graduated scale is fixedly arranged in the communicating groove, a connecting rod is fixedly arranged on one side of the bottom of the moving rod, and an observation device is fixedly arranged on one side of the bottom end of the connecting rod.
6. The magnetron sputtering coating device according to claim 5, wherein the observation device comprises a movable ruler, and an observation tube is arranged on one side of the interior of the movable ruler.
7. The magnetron sputtering coating device according to claim 6, wherein the observation tube is made of transparent plastic material, so that the numerical value on the surface of the movable ruler can be observed conveniently.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321650840.3U CN220149647U (en) | 2023-06-27 | 2023-06-27 | Magnetron sputtering coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321650840.3U CN220149647U (en) | 2023-06-27 | 2023-06-27 | Magnetron sputtering coating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220149647U true CN220149647U (en) | 2023-12-08 |
Family
ID=89012669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321650840.3U Active CN220149647U (en) | 2023-06-27 | 2023-06-27 | Magnetron sputtering coating device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220149647U (en) |
-
2023
- 2023-06-27 CN CN202321650840.3U patent/CN220149647U/en active Active
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